• Transactions on Electrical and Electronic Materials
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• 제12권4호
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• pp.144-147
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• 2011

In this work, we present a study regarding the etching characteristics on titanium nitride (TiN) thin films using an inductively coupled plasma system. The TiN thin film was etched using a $N_2/BCl_3$/Ar plasma. The studied etching parameters were the gas mixing ratio, the radio frequency (RF) power, the direct current (DC)-bias voltages, and the process pressures. The baseline conditions were as follows: RF power = 500 W, DC-bias voltage = -150 V, substrate temperature = $40^{\circ}C$, and process pressure = 15 mTorr. The maximum etch rate and the selectivity of the TiN to the $SiO_2$ thin film were 62.38 nm/min and 5.7, respectively. The X-ray photoelectron spectroscopy results showed no accumulation of etching byproducts from the etched surface of the TiN thin film. Based on the experimental results, the etched TiN thin film was obtained by the chemical etching found in the reactive ion etching mechanism.

• 한국ITS학회 논문지
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• 제10권1호
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• pp.42-48
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• 2011

본 논문에서는 GaN HEMT (Gallium Nitride High Electron Mobility Transistor) bare-chip을 이용하여 X-대역에서 수동로드 풀(Passive load-pull)을 수행하였다. 열로 인한 특성 변화가 최소화 된 동작 조건을 얻기 위해 드레인 바이어스 전압과 입력 RF 신호를 펄스로 인가하였다. 전자기장 시뮬레이션과 회로 시뮬레이션을 병행하여, 와이어 본딩 효과를 고려하여 드레인 경계면에서의 정확한 임피던스 정합 회로를 구현하였다. 임피던스를 변화시키기 위해 마이크로스트립 라인 스터브의 길이가 조절 가능한 회로를 설계하였다. 펄스 로드 풀 실험 결과 8.5 GHz에서 9.2 GHz 대역에서 최대 42.46 dBm의 출력 전력을 얻었으며, 58.7%의 드레인 효율 특성을 얻었다.

• ETRI Journal
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• 제34권6호
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• pp.885-891
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• 2012

This paper proposes a high-efficiency power amplifier (PA) with uneven bias. The proposed amplifier consists of a driver amplifier, power stages of the main amplifier with class AB bias, and an auxiliary amplifier with class C bias. Unlike other CMOS PAs, the amplifier adopts a current-mode transformer-based combiner to reduce the output stage loss and size. As a result, the amplifier can improve the efficiency and reduce the quiescent current. The fully integrated CMOS PA is implemented using the commercial Taiwan Semiconductor Manufacturing Company 0.18-${\mu}m$ RF-CMOS process with a supply voltage of 3.3 V. The measured gain, $P_{1dB}$, and efficiency at $P_{1dB}$ are 29 dB, 28.1 dBm, and 37.9%, respectively. When the PA is tested with 54 Mbps of an 802.11g WLAN orthogonal frequency division multiplexing signal, a 25-dB error vector magnitude compliant output power of 22 dBm and a 21.5% efficiency can be obtained.

• 대한전자공학회논문지TC
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• 제45권12호
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• pp.1-6
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• 2008

본 논문에서는 전력증폭기의 입력신호의 크기에 따라 CMOS class-E 전력증폭기의 게이트와 드레인의 바이어스 전압을 조절함으로써 낮은 출력전력에서도 80% 이상의 고효율 특성을 갖는 CMOS class-E 전력증폭기를 설계하였다. 입력신호의 포락선을 검파하여 전력증폭기의 바이어스 전압을 조절하는 방법을 이용하였고, 동작주파수는 2.14GHz, 출력전력은 22dBm에서 25dBm, 전력부가효율은 모든 입력전력레벨에서 80.15%에서 82.96%의 특성을 얻을 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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• pp.84-87
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• 2003

Carbon nitride ($CN_x$) films were prepared by reactive RF magnetron sputtering system with DC bias at various deposition conditions and the electrical properties were investigated. The films were characterized by fourier transform infrared (FTIR) spectroscopy, and X-ray photoelectron spectroscopy (XPS). The metal-insulator-semiconductor (MIS) capacitor which has $Al/CN_x/Si$ structure was designed and fabricated to investigate the capacitance-voltage (C-V) characteristics. Dielectric constant of carbon nitride films is very small.

• 한국통신학회논문지
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• 제30권11A호
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• pp.1104-1109
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• 2005

본 논문에서는 주파수 채배기 이론에 근거하여 단일 능동소자로 입력된 기본 LO 주파수($f_{LO}$)의 3차 고조파 성분($3f_{LO}$)의 진폭이 최대가 되는 바이어스 전압을 선택하여 두 입력신호($f_{RF}$, $f_{LO}$)에 대해서 고차 출력신호성분($f_{RF}{\pm}3f_{LO}$)이 최대가 되는 고조파 먹서(harmonic mixer)를 설계 및 제작하였다. 제안된 설계 방법에 의해서 제작된 고조파 먹서는 플라스틱(Plastic) 패키지의 MESFET 소자를 사용하여 기존 Ka-대역에서 동작하는 믹서 회로들이 나타내는 높은 부품 가격, 생산성 및 회로의 복잡도 문제를 해결할 수 있었으며 RF 주파수신호($f_{RF}$=33.5GHz)에 대해서 LO 주파수 신호($f_{LO}$=11.5 GHz)의 3차 고조파 신호($3f_{LO}$=34.5 GHz)가 최대가 되는 게이트 바이어스 전압을 선택하여 중간주파수($3f_{LO}-f_{RF}$=1.0GHz)에서 -10 dB의 낮은 변환 손실 특성을 나타내었다.

• 전자공학회논문지D
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• 제35D권5호
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• pp.1-10
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• 1998

A GaAs MMIC composed of VCO (voltage controlled oscillator) and mixer for PCS receiver has been developed using 1.mu.m ion implanted GaAs MESFET process. The VCO consists of a colpitts-type oscillator with a dielectric resonator and the circuit configuration of the mixer is a dual-gate type with an asymmetric combination of LO and RF FETs for the improvement of intermodulation characteristics. The common-source self-biasing is used in all circuits including a buffer amplifier and mixer, achieving a single power supply (3V) operation. The total power dissipation is 78mW. The VCO chip shows a phase noise of-99 dBc/Hz at 100KHz offset. The combined VCO/mixer chip shows a flat conversion gain of 2dB, the frequency-tuning factor of 80MHz/volts in the varacter bias ranging from 0.5V to 0.5V , and output IP3 of dBm at varactor bias of 0V. The fabricated chip size is 2.5mm X 1.4mm.

• 전자공학회논문지A
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• 제31A권10호
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• pp.71-78
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• 1994

We have developed GaAs power metal semiconductor field effect transistors (MESFETs) for 4.7V operation under 900 MHz using a low-high deped structures grown by molecular beam epitaxy (MBE). The fabricted MESFETs with a gate widty of 7.5 mm and a gate length of 1.0.mu.m show a saturated drain current (Idss) of 1.7A and an uniform transconductance (Gm) of around 600mS, for gate bias ranged from -2.4 V to 0.5 V. The gate-drain breakdown voltage is measured to be higher than 25 V. The measured rf characteristics of the MESFETs at a frequency of 900 MHz are the output power of 31.4 dBm and the power added efficiency of 63% at a drain bias of 4.7 V.

• 센서학회지
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• 제5권1호
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• pp.51-56
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• 1996

Structural properties of rf sputtered boron nitride films were studied as a function of deposition parameters such as nitrogen pressure, substrate temperature and substrate bias using X-ray photoelectron spectroscopy and Auger electron spectroscopy. Composition and information on chemical bonding of resultant films was determined by XPS. XPS core level spectra showed that ratio of boron to nitrogen varied from 3.11 to 1.45 with respect to partial nitrogen pressure. Curve fitting of XPS spectra revealed three kinds of bonding mechanism of boron in the films. XPS peak positions of both B 1s and N 1s shifted to higher energy with higher nitrogen pressure as well as increase in substrate bias voltage. AES was used to see possible contamination of films by carbon or oxygen as well.

• 열처리공학회지
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• 제36권3호
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• pp.115-120
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• 2023

ZnO/Cu/ZnO (ZCZ) thin film deposited on the glass substrate with DC and RF magnetron sputtering was rapid thermal annealed (RTA) and then effect of thermal temperature on the opto-electical and transparent heater properties of the films were considered. The visible transmittance and electrical resistivity are depends on the annealing temperature. The electrical resistivity decreased from 1.68 × 10^-3 Ωcm to 1.18 × 10^-3 Ωcm and the films annealed at 400℃ show a higher transmittance of 78.5%. In a heat radiation test, when a bias voltage of 20 V is applied to the ZCZ film annealed at 400℃, its steady state temperature is about 70.7℃. In a repetition test, the steady state temperature is reached within 15s for all of the bias voltages.