• Journal of the Semiconductor & Display Technology
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• v.19 no.3
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• pp.43-48
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• 2020

The demand for stable plasma has been on the rise because of the increased delivery power amount in the chamber for improving productivity, and fast and accurate plasma impedance matching become a crucial performance measure for radio frequency (RF) power system in semiconductor manufacturing equipment. In this paper, the overall impedance matching was understood, and voltage and current values were extracted with voltage - current (VI) probe to measure plasma impedance in real-time. Actual matching data were analyzed to derive calibration coefficient for V and I measurements to understand the characteristics of VI probe, and we demonstrated the tendency of RF impedance matching according to changes in load impedance. This preliminary empirical research can contribute to fast RF matching as well as advanced equipment control for the next level of detailed investigation on embedded system based-RF matching controller.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.68 no.2
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• pp.304-309
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• 2019

This paper presents a CMOS RF-to-DC converter for video surveillance disposable IoT applications. It widely harvests RF energy of 3G/4G cellular low-band frequency range by employing a tunable impedance matching network. The proposed converter consists of the differential-drive cross-coupled rectifier and the matching network with a 4-bit capacitor array. The proposed converter is designed using 130-nm standard CMOS process. The designed energy harvester can rectify the RF signals from 700 MHz to 900 MHz. It has a peak RF-to-DC conversion efficiency of 72.25%, 64.97%, and 66.28% at 700 MHz, 800 MHz, and 900 MHz with a load resistance of 10kΩ, respectively.

• Journal of the Semiconductor & Display Technology
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• v.21 no.2
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• pp.32-37
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• 2022

As semiconductors become finer, equipment must perform precise and accurate processes to achieve the desired wafer fabrication requirement. Radio frequency power delivery system in plasma system plays a critical role to generate the plasma, and the role of impedance matching unit is critical to terminate the reflected radio frequency power by modifying the impedance of the matching network in the plasma equipment. Impedance matching unit contains one fixed inductor and two variable vacuum capacitors whose positions are controlled two step motors. Controlling the amount of vacuum variable capacitor should be made as soon as possible when the mismatched impedance is detected. In this paper, we present the impedance matching algorithm using the phase sensor.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.35 no.12
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• pp.560-566
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• 1986

In the design of an RF discharge system, the electrical equivalence of the gas discharge must be known. With this knowledge, one can design a suitable matching network for a maximum power transfer from the RF generator into the discharge. For this purpose, an experiment has been conducted in which the electrical impedance (conductance and capacitance) was determined as a function of power. In parallel with this, a detailed theoretical analysis has been done and the results are in accord with those of our experiment. Design equations are also given for a simple matching network, and a design example is presented to demonstrate its application. During the actual operation of an RF discharge system, however, it has been often observed that the reflected power tends to vary in small values due to the changes in the impedance of the system. This problem can be relieved by adding an automatic impedance matching circuit to the system and this paper presents such an automatic impedance matching network.

• Journal of the Semiconductor & Display Technology
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• v.15 no.2
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• pp.6-10
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• 2016

In RF plasma processing, when the plasma is generated, there is the difference of impedance between RF generator and plasma source. Its difference is normally reduced by using the matcher and the RF power is transferred efficiently from the power generator to the plasma source. The generated plasma has source impedance that it can be changed during processing by pressure, frequency, density and so on. If the range of source impedance excesses the matching range of the matcher, it cannot match all value of the impedance. In this research, we studied the elevation mechanism of the RF power delivery efficiency between RF generator to the plasma source by using the transmission line and impedance tuning of the plasma source. We focus on two plasma sources (capacitive coupled plasma (CCP), inductive coupled plasma (ICP)) which is most widely used in industry recently.

• Proceedings of the KIEE Conference
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• 1985.07a
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• pp.224-227
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• 1985

During operation of an RF glow discharge system, it can be observed that the reflected power tends to increase in small value, due to changes in the impedance of the system. This problem can be relieved by adding an automatic impedance matching circuit to the system. This paper presents a detailed method of automatically matching the input impedance of a 50 ohm transmission line to an RF glow discharge system at 13.56 MHZ.

• ETRI Journal
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• v.28 no.3
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• pp.355-363
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• 2006

This paper presents a low-cost RF parameter estimation technique using a new RF built-in self-test (BIST) circuit and efficient DC measurement for 4.5 to 5.5 GHz low noise amplifiers (LNAs). The BIST circuit measures gain, noise figure, input impedance, and input return loss for an LNA. The BIST circuit is designed using $0.18\;{\mu}m$ SiGe technology. The test technique utilizes input impedance matching and output DC voltage measurements. The technique is simple and inexpensive.

• Journal of the Semiconductor & Display Technology
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• v.2 no.4
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• pp.13-17
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• 2003

An adaptor is designed for chamber impedance measurement of plasma process. Copper rod, fixed board and compensation circuit are the major components of the adaptor. An adaptor can be to measure chamber impedance on time unless stopping a process and Data to measure can do the database. We can use it to a criteria data for a failure diagnosis. So developed adaptor could be used for diagnosis the plasma process chamber in semiconductor industry.

• Proceedings of the IEEK Conference
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• 2000.07b
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• pp.1001-1004
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• 2000

RFID system is applied to identify, locate and track people, cars, animals. In RFID system, the passive transponder without battery has some benefits than active transponder, such as no restriction in battery exchange and in battery’s life. But it needs auxiliary RF-DC conversion circuit. RF-DC conversion circuit originated from Wireless Power Transmission (WPT). In this paper, RF-DC conversion circuit consists of a microstrip patch antenna and impedance matching circuit, Cock-croft Walton circuit. And RF-DC conversion circuits have two kinds of T-type and Cross-type impedance matching circuits.

• 제어로봇시스템학회:학술대회논문집
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• 2001.10a
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• pp.31.2-31
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• 2001

A real-time control strategy is presented for plasma control Rather than in-situ plasma variables, this is based on realtime measurements of two electrical positions that correspond to two match motors. Using the rf match monitor system, the positions were collected. The process of impedance matching was identified with variations in process factors, including rf power, pressure, and O$_2$ flow rate. A state-space model was obtained basing on autoregressive moving average model. For this model, a linear quadratic regulator was designed and applied. Simulation results revealed that match positions could accurately be regulated to follow certain positions arbitrarily chosen.