제어로봇시스템학회:학술대회논문집
- 2001.10a
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- Pages.31.2-31
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- 2001
Plasma control Using a Linear Quadratic Regulated RF Impedance Match Process
- Kim, Byung-Whan (Sejong Univ.) ;
- Park, Jang-Hyun (Korea Univ.) ;
- Park, Gwi-Tae (Korea Univ.)
- Published : 2001.10.01
Abstract
A real-time control strategy is presented for plasma control Rather than in-situ plasma variables, this is based on realtime measurements of two electrical positions that correspond to two match motors. Using the rf match monitor system, the positions were collected. The process of impedance matching was identified with variations in process factors, including rf power, pressure, and O
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