• Journal of the Korean institute of surface engineering
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• v.44 no.6
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• pp.264-268
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• 2011

The Molybedenium thin film is generally used on back contact material of CIGS solar cell due to low electrical resistivity and stable thermal expansion coefficient. The Mo thin films deposited on si wafer by the magnetron sputtering method. The research focused on the variation of electrical resistivity of films which deposited with various working pressure at the target power of 2.0 kW(8.4 W/). The lowest resistivity of Mo thin film showed $9.0{\mu}O$-cm at pressure of 1.5 mTorr. However, working pressure increasing up to 50 mTorr, resistivities were highly increased. The results showed that the conductivity of Mo films depended on growing structures and defects in deposition process. Surface morphology, porosity, grain size, oxidation, and bonding structures were analysed by SEM, AFM, spectroscopic ellipsometry (SE), XRD, and XPS.

• Journal of the Korean Society for Heat Treatment
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• v.13 no.6
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• pp.398-404
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• 2000

The Ti-Al-V-N films have been deposited on various substrates by d.c and r.f reactive magnetron sputtering from a Ti-6Al-4V alloy target in mixed $Ar-N_2$ discharges. The films were investigated by means of XRD, AES, SEM/EDX, microhardness, TG and scratch test. The XRD and SEM results indicated that the films were of single B1 NaCl phase having dense columnar structure with the (111) preferred orientation. The composition of Ti-Al-V-N film was the Ti-7.1Al-4.3V-N(wt%) films. Adhesion and microhardness of Ti-Al-V-N films deposited by r.f magnetron sputtering method were better than those deposited by d.c magnetron sputtering method. The anti-oxidation properties of Ti-Al-V-N films were also superior to that of Ti-N film deposited by the same deposition conditions.

• Journal of Magnetics
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• v.12 no.4
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• pp.149-151
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• 2007

The AlCrN films were grown by RF reactive sputtering method under the selected conditions. The Cr concentration was varied by the number of Cr pieces placed on the Al target. The sample quality has been studied by XRD, Auger spectroscopy, optical absorption and electrical resistant measurements. The XRD and Auger results show that the samples consist of a major phase with the $Al_{1-x}Cr_xN$ formula, which has a hexagonal structure, and a few percents at. of oxygen, which may form $Al_2O_3$. There exist the Cr clusters in the samples with high concentration of Cr. The optical absorption measurement provides the information about the band gap that relates strongly to the quality of samples. The quality of samples is also clearly reflected in electrical measurement, i.e., the temperature dependence of resistance exhibits a semiconductor characteristic only for the samples that have no Cr cluster. In these cases, the values of ionization energies $E_a$ can be derived from R(T) plots by using the function R(T) = Ro exp $(E_a/k_BT)$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.764-768
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• 2002

Characteristics of ohmic Co/Si/Co contacts to n-type 4H-SiC are investigated systematically. The ohmic contacts were formed by annealing Co/Si/Co sputtered sequentially. The annealings were performed at $800^{\circ}C$ using RTP in vacuum ambient and $Ar:H_2$(9:1) ambient, respectively. The specific contact resistivity$(\rho_c)$, sheet resistance$(R_s)$, contact resistance$(R_c)$, transfer length$(L_T)$ were calculated from resistance$(R_T)$ versus contact spacing(d) measurements obtained from TLM(transmission line method) structure. While the resulting measurement values of sample annealed at vacuum ambient were $\rho_c=1.0{\tiimes}10^{-5}{\Omega}cm^2$, $R_c=20{\Omega}$ and $L_T$ = 6.0 those of sample annealed at $Ar:H_2$(9:1) ambient were $\rho_c=4.0{\tiimes}10^{-6}{\Omega}cm^2$, $R_c=4.0{\Omega}$ and $L_T$ = 2.0. The physical properties of contacts were examined using XRD and AES. The results showed that cobalt silicide was formed on SiC and Co was migrated into SiC.

• Journal of the Korean institute of surface engineering
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• v.57 no.2
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• pp.105-114
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• 2024

Tempering behavior and mechanical properties in AISI H13 steel, quenched and tempered from 300 ℃ to 700 ℃ for different tempering time (1, 2, 5, 10, 20 hr) were quantitatively investigated by scanning electron microscopy (SEM), x-ray diffractometer (XRD), impact test machine, rockwell apparatus, ball-on-disk tester. Under the condition that the tempering time is 2 hours, the hardness increases slightly as the tempering temperature increases, but decreases rapidly when the tempering temperature exceeds 500 ℃, while the impact energy increases in proportion to the tempering temperature. Friction tests were conducted in dry condition with a load of 30 N, and the friction coefficient and wear rate according to tempering conditions were measured to prove the correlation with hardness and microstructure. In addition, primary tempering from 300 ℃ to 700 ℃ was performed at various times to establish a kinetic model to predict hardness under specific tempering conditions.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.157-160
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• 2001

Three sets of ZnO ceramic devices (reference samples with Matsuoka\`s composition; added 7o MgO, A1$_2$O$_3$, SiO$_2$) have been prepared by the conventional mixed oxide route. These additives were determined by the factors of valences and ionic radiuses. DC accelerated degradation test was performed for analysis of degradation characteristics versus the various additives. The conditions of DC degradation test were 115${\pm}$2$^{\circ}C$ for 12h. Using XRD and SEM, the Phase and microstructure of samples were analyzed respectively. E-J analysis was used to determine ${\alpha}$. Frequency analysis was accomplished to understand the relationship between R$\sub$g/ and $R_{b}$ with the electric stress at the equivalent circuit.

• Journal of the Korean Ceramic Society
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• v.26 no.2
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• pp.201-209
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• 1989

Fine Si-Al-OH coprecipitate powders were prepared from Si- and Al-alkoxides by the hydrolysis method. $\beta$-Sialon powder was obtained from prepared Si-Al-OH coprecipitate by the simultaneous reduction and nitridation method. The syntehsized Sialon powder was pressureless sintered at 175$0^{\circ}C$ for 90 min in N2 atmosphere. The characterization of the Sialon powder was performed with XRD, BET, SEM, TEM and particle size analysis. The sinterability and mechanical properties of sintered bodies were investigated in terms of relative density, M.O.R., fracture toughness, hardness and the morphology of microstructure. The highest values of their mechanical properties were obtained for the $\beta$-Sialon ceramics at Z=1 and those values are as follows : M.O.R., KIC and HV of $\beta$-Sialon ceramics(Z=1) are 499.1 MPa, 5.9MN/m3/2 and 18.7GPa, respectively.

• Journal of the Korean Ceramic Society
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• v.30 no.6
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• pp.499-509
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• 1993

Structures of hematite(${\alpha}$-Fe2O3), Ba-ferrite(BaFe12O19) and Zn2Y(Ba2Zn2Fe12O22) were studied by powder X-ray diffraction(XRD) method. Powder XRD patterns of the ferrites were analyzed with the Rietveld method, and the final refined R-factors were RWP<0.01 and RI<0.03. The lattice parameters refined with hexagonal crystal system were a=5.0342${\AA}$, c=13.746${\AA}$ for hematite, a=5.8928${\AA}$, c=23.201${\AA}$ for Ba-ferrite, and a=5.8763${\AA}$, c=43.567${\AA}$ for Zn2Y. In the hematite, the oxygen parameter is 0.3072 and the Fe-O distances in FeO6octahedron are 1.941${\AA}$ and 2.118${\AA}$, close to the single crystal data of Blake et al.. In the Ba-ferrite, the Fe atom in oxygen trigonal bipyramid is displaced 0.155${\AA}$ away from the BaO3 mirror plane into 4e position. In the Zn2Y, 75% of Zn is located at the oxygen terahedral site in S-block.

• Journal of the Korean institute of surface engineering
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• v.44 no.2
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• pp.44-49
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• 2011

The films formed on AZ31B magnesium alloy were prepared from alkaline solution composed of potassium permanganate and sodium hydroxide. The immersion tests were carried out at the different concentration of sodium hydroxide and pre-treatment method in 5 minute. The morphology and the phase composition of the film were characterized by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The corrosion behavior of the film in 5.0% NaCl solution was evaluated using potentiodyanmic polarization. Open circuit potential in developing film was examined with time. The thin and transparent film was mainly composed of MgO and $Mg(OH)_2$. The film with the best corrosion resistance was obtained at $70^{\circ}C$ bath temperature, 1.6 M concentration of sodium hydroxide and chemical pre-treatment.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.456-459
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• 2000

Thin films of vanadium oxide(V$O_x$) have been deposited by r.f. magnetron sputtering from $V_2$$O_5$ prget in gas mixture of argon and oxygen. Crystal structure, surface morphology, chemical composition and bonding properties of films in-situ annealed in $O_2$ ambient with various heat-treatment conditions are characterized through XRD, SEM, AES, RBS and FTIR measurements. The filrns annealed below 200 $^{\circ}C$are amorphous, and those annealed above 30$0^{\circ}C$ are polycrystalline. The growth of grains and the transition of vanadium oxide into the higher oxide have been obsenred with increasing the annealing temperature and time. The increase of O/V ratio with increasing the annealing temperature and time is attributed to the diffusion of oxygen and the partial filling of oxygen vacancies. It is observed that the oxygen atoms located on the V-0 plane of $V_2$$O_5$ layer participate more readily in the oxidation process.