• 제목/요약/키워드: R/D

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우리나라 R&D 관련 산업과 정보통신산업 연관관계 분석 (An Analysis of Co-relations of R&D-related Industry and IT Industry)

  • 조병선;조상섭
    • 전자통신동향분석
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    • 제22권4호통권106호
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    • pp.183-191
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    • 2007
  • 본 연구에서는 최근에 빠르게 성장하고 있는 R&D 관련 산업의 국민경제적 위치와 타산업과의 연관관계를 파악함으로써, R&D 관련 산업의 중요성과 앞으로의 방향을 제시하기 위하여 최근 한국은행에서 발행한 2000년도와 2003년도의 산업연관분석자료를 이용하여, R&D 관련 산업구조와 정보통신산업과의 연관관계를 파악하였다. 연구결과 2000년도에 비하여 2003년도의 산업연관분석에 따를 경우에 R&D 관련 산업의 생산활동 증가는 정보통신산업의 생산 및 부가가치활동에 보다 낮은 영향을 미치는 것으로 나타났으며, 이는 정보통신산업에 대한 R&D 관련 산업의 영향력이 약간 낮아지는 산업구조를 보여주기 때문에 정보통신산업 안에서 R&D 정책과 정보통신산업 밖에서 실시하는 R&D 정책에 대한 고려 및 효과측정이 동시에 이루어져야 할 필요성을 제시하는 것으로, 보다 국가 전체적이고 체계적인 R&D 정책적 고려가 필요함을 보여 주었다.

제조업 기반 R&D 조직에서의 품질경영 (Evaluation of TQM Implementation in Manufacturing-based R&D Organizations)

  • 홍순욱
    • 한국경영과학회지
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    • 제34권1호
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    • pp.101-121
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    • 2009
  • The research literature presents that Total Quality Management (TQM) has been successfully embraced by firms for strategic and operational management in the last decades. However few studios analyze the role of TQM practices in the R&D environment. The objective of this study is to evaluate TQM practices implemented in manufacturing-based R&D organizations with respect to R&D performance. Our research model is primarily based on Malcolm Baldrige Criteria for Performance Excellence framework, including three moderating variables (industry type, organization size, quality management system certification), to propose hypotheses on the relationships between leadership practice, management practice and R&D performance. Results of canonical correlation analysis using data from 130 R&D organizations show that in aggregate leadership practice is positively related to management practice which is, in turn, positively related to R&D performance. These relationships are, however, affected by the moderating variables. Our results imply that TQM practices can be strategically adopted in the R&D organization.

중점연구개발과제 도출을 위한 기술기획 모델-공공부문의 정보통신기술개발계획을 중심으로- (R&D Project Selection Models in the Public Sector)

  • 임명환
    • 기술혁신연구
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    • 제5권1호
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    • pp.266-287
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    • 1997
  • The purpose of this paper is to purpose methods and procedures by which we can set up technology planning scheme essential for R'||'&'||'D(or technology) planning in public sector (governmental and government-sponsored institutions), and can develop and select "main R'||'&'||'D projects" which are crucial to R'||'&'||'D planning, were quite specifically discussed in case of I'||'&'||'T(Information '||'&'||' Telecommunications) sector, so that they may not remain theoretical but may be practically applicable to real R'||'&'||'D programs. In this paper, the concept of technology planning was defined as a procedure for establishing nominal planning to acquire technologies efficiently for a specific sector. More detailed definition optimal technology-acquisition strategy, i.e., analyzing technological development '||'&'||' environ-ment, establishing R'||'&'||'D objectives as promising technology opportunities, selecting main R'||'&'||'D projects, allocating resources and so on."The"main R'||'&'||'D projects by technology sectors and by planning phases and then deciding on priority. Scoring method was rsed in assessment phase. Summing up, this paper suggested technology planning scheme of methods and procedures for sorting out required technologies, developing and assessing public R'||'&'||'D projects, and finally selecting main R'||'&'||'D projects.

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전력산업 R&D 프로젝트의 효율성 및 효과성 평가 (Evaluation of R&D Projects in Electric Power Industry with Efficiency and Effectiveness)

  • 박성민;김헌;백동현
    • 산업공학
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    • 제22권3호
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    • pp.192-204
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    • 2009
  • Based on the characteristics of 'Korean electric power industry R&D programs', this study proposes a new performance evaluation framework where electric power industry related R&D projects are scrutinized. The abovementioned R&D programs have their own goals and especially they emphasize the effectiveness as well as the efficiency of each subordinate R&D project. Hence, in this framework, a performance evaluation procedure is established and then a mathematical model is developed according to the procedure. The model calculates performance evaluation indices for a set of R&D projects integrating the effectiveness with the efficiency of each R&D project. In a case study with an empirical dataset, statistical significance is tested on the integrated performance evaluation indices of R&D projects regarding organizational types and program categories considered.

우리기업 R&D 성과의 영향요인: 전자부품기업을 중심으로 (Factors Affecting R&D Performance of Korean Electronics Part Companies)

  • 김정화;조성복;이성우;정선양
    • 기술경영경제학회:학술대회논문집
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    • 기술경영경제학회 2004년도 제24회 동계학술대회 논문집
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    • pp.202-221
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    • 2004
  • Technology is the most important determination factor on firm`s competitiveness. It helps firms to secure sustainable competitive advantages. Therefore Korean electronics part firms have increased their R&D investment since the 1990s. But their R&D management capabilities seem to be low level. Empirical study was undertook to verify factors that effect on R&D performance with enhancing R&D management capabilities. To accomplish the purpose, data collected valid samples in Seoul and Kyunggi Province. Using SPSSWIN 10.0package, regression analysis was used to verify hypotheses. This study verify that important factors of 4th R&D generation effect on improving R&D performance. Therefore Korean electronics firms must learn advanced firms in developed countries. Based on learning and accumulating R&D management capabilities, Korean electronics part firms should establish their firm-specific R&D management model.

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철도 연구개발투자와 지식축적량 분석 (The analysis of the railroad R&D investment and R&D Stock)

  • 박만수;이희성;문대섭
    • 한국철도학회:학술대회논문집
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    • 한국철도학회 2009년도 춘계학술대회 논문집
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    • pp.791-794
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    • 2009
  • Each nation of the world is intensively propelling the R&D investment to solve the financial crisis and worldwide economic recession occurred from last year. This means the world economic is under economic system based on the knowledge. So, The R&D is continuously propelled for possession of the technology through the R&D stock and which is core in the knowledge based economic system. In this world stream, our government is also increasing the R&D investment and checked the technology level through surveying the R&D stock and corn parison of each industry or world. The R&D investment of the railroad is continued but there is no data of the R&D stock. So, surveying the railroad R&D stock and comparing with korea industry is processed.

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Synthesis and Structure-Activity Relationships of Novel Compounds for the Inhibition of TNF-$\alpha$ Production

  • Park, Joon-Seok;Baik, Kyong-Up;Son, Ho-Jung;Lee, Jae-Ho;Lee, Se-Jong;Choi, Jae-Youl;Park, Ji-Soo;Yoo, Eun-Sook;Byun, Young-Seok;Park, Myung-Hwan
    • Archives of Pharmacal Research
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    • 제23권4호
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    • pp.332-337
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    • 2000
  • This study describes the synthesis, in vitro evaluation and molecular modeling study of novel compounds for the inhibition of TNF-$\alpha$production, Among these compounds, 2-[3-(cyclopentyloxy)-4-methoxyphenyl]-1-isoindolinone (9) was selected as a lead compound and its pyridine derivative 10 was more potent in activity and safer than rolipram.

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New Cu Process and Short Channel TFT

  • Yang, J.Y.;Hong, G.S.;Kim, K.;Bang, J.H.;Ryu, W.S.;Kim, J.O.;Kang, Y.K.;Yang, M.S.;Kang, I.B.;Chung, I.J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1189-1192
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    • 2009
  • Short channel a-Si:H TFT devices with Cu electrodes have been investigated. Short channel TFTs are defined by new plasma etch process. When the channel length becomes shorter, the TFT characteristics (threshold voltage, off current, sub threshold voltage, etc.,) are degraded. These degraded characteristics can be improved through the hydrogen plasma treatment and new gate insulator structure. Using these processes, 15.0 inch XGA LCD panel was fabricated successfully where the channel length of the TFT devices was about 2.5 micrometers.

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The effect of plasma damage on electrical properties of amorphous GaInZnO film

  • Kim, Min-Kyu;Park, Jin-Seong;Jeong, Jae-Kyeong;Jeong, Jong-Han;Ahn, Tae-Kyung;Yang, Hui-Won;Lee, Hun-Jung;Chung, Hyun-Joong;Mo, Yeon-Gon;Kim, Hye-Dong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.640-643
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    • 2007
  • The effect of plasma damage was investigated on amorphous gallium-indium-zinc oxide (a-GIZO) films and transistors. Ion-bombardment by plasma process affects to turn semiconductor to conductor materials and plasma radiation may degrade to transistor electrical properties. All damages are easily recovered with a $350^{\circ}C$ thermal annealing.

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