• Title/Summary/Keyword: Quantum Gate

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A multilayered Pauli tracking architecture for lattice surgery-based logical qubits

  • Jin-Ho, On;Chei-Yol Kim;Soo-Cheol Oh;Sang-Min Lee;Gyu-Il Cha
    • ETRI Journal
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    • v.45 no.3
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    • pp.462-478
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    • 2023
  • In quantum computing, the use of Pauli frames through software traces of classical computers improves computation efficiency. In previous studies, error correction and Pauli operation tracking have been performed simultaneously using integrated Pauli frames in the physical layer. In such a complex processing structure, the number of simultaneous operations processed in the physical layer exponentially increases as the distance of the surface code encoding logical qubit increases. This study proposes a Pauli frame management architecture partitioned into two layers for a lattice surgery-based surface code and describes its structure and operation rules. To evaluate the effectiveness of our method, we generated a random circuit according to the gate ratios constituting the commonly known quantum circuits and compared the generated circuit with the existing Pauli frame and our method. Simulations show a decrease of about 5% over traditional methods. In the case of experiments that only increase the code distance of the logical qubit, it can be seen that the effect of reducing the physical operation through the logical Pauli frame becomes more important.

Property Comparison of Ru-Zr Alloy Metal Gate Electrode on ZrO2 and SiO2 (ZrO2와 SiO2 절연막에 따른 Ru-Zr 금속 게이트 전극의 특성 비교)

  • Seo, Hyun-Sang;Lee, Jeong-Min;Son, Ki-Min;Hong, Shin-Nam;Lee, In-Gyu;Song, Yo-Seung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.9
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    • pp.808-812
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    • 2006
  • In this dissertation, Ru-Zr metal gate electrode deposited on two kinds of dielectric were formed for MOS capacitor. Sample co-sputtering method was used as a alloy deposition method. Various atomic composition was achieved when metal film was deposited by controlling sputtering power. To study the characteristics of metal gate electrode, C-V(capacitance-voltage) and I-V(current-voltage) measurements were performed. Work function and equivalent oxide thickness were extracted from C-V curves by using NCSU(North Carolina State University) quantum model. After the annealing at various temperature, thermal/chemical stability was verified by measuring the variation of effective oxide thickness and work function. This dissertation verified that Ru-Zr gate electrodes deposited on $SiO_{2}\;and\;ZrO_{2}$ have compatible work functions for NMOS at the specified atomic composition and this metal alloys are thermally stable. Ru-Zr metal gate electrode deposited on $SiO_{2}\;and\;ZrO_{2}$ exhibit low sheet resistance and this values were varied with temperature. Metal alloy deposited on two kinds of dielectric proposed in this dissertation will be used in company with high-k dielectric replacing polysilicon and will lead improvement of CMOS properties.

An Application of Quantum-inspired Genetic Algorithm for Weapon Target Assignment Problem (양자화 유전자알고리즘을 이용한 무기할당)

  • Kim, Jung Hun;Kim, Kyeongtaek;Choi, Bong-Wan;Suh, Jae Joon
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.40 no.4
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    • pp.260-267
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    • 2017
  • Quantum-inspired Genetic Algorithm (QGA) is a probabilistic search optimization method combined quantum computation and genetic algorithm. In QGA, the chromosomes are encoded by qubits and are updated by quantum rotation gates, which can achieve a genetic search. Asset-based weapon target assignment (WTA) problem can be described as an optimization problem in which the defenders assign the weapons to hostile targets in order to maximize the value of a group of surviving assets threatened by the targets. It has already been proven that the WTA problem is NP-complete. In this study, we propose a QGA and a hybrid-QGA to solve an asset-based WTA problem. In the proposed QGA, a set of probabilistic superposition of qubits are coded and collapsed into a target number. Q-gate updating strategy is also used for search guidance. The hybrid-QGA is generated by incorporating both the random search capability of QGA and the evolution capability of genetic algorithm (GA). To observe the performance of each algorithm, we construct three synthetic WTA problems and check how each algorithm works on them. Simulation results show that all of the algorithm have good quality of solutions. Since the difference among mean resulting value is within 2%, we run the nonparametric pairwise Wilcoxon rank sum test for testing the equality of the means among the results. The Wilcoxon test reveals that GA has better quality than the others. In contrast, the simulation results indicate that hybrid-QGA and QGA is much faster than GA for the production of the same number of generations.

Simulation Study of RSFQ OR-gates and Their Layouts for Nb Process (RSFQ OR-gates의 전산모사 실험 및 Nb 공정에 적합한 설계 연구)

  • 남두우;홍희송;강준희
    • Progress in Superconductivity
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    • v.4 no.1
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    • pp.37-41
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    • 2002
  • In this work. we have designed two different kinds of Rapid Single Flux Quantum (RSFQ) OR-gates. One was based on the already developed RSFQ cells and the other was aimed to develop a more compact version. In the first circuit, we used a combination of two D Flip-Flops and a merger and in the other circuit we used a combination of RS Flip-Flops and Confluence Buffer. We tested the circuit performance by using the simulation tools, Xic and Wrspice. We obtained the operation margins of the circuit elements by a margin calculation program, and we obtained the minimum operation margins of $\pm$30%. The circuits were laid out, aimed to fabricate by using the existing KRISS Nb process. KRISS Nb process includes the $Nb/Al_2$$O_3$/Nb trilayer fabricated by DC magnetron sputtering and the reactive ion etching technique for the definition of the features. The major tools used in the layouts were Xic and L-meter.

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Cryogenic voltage sampling for arbitrary RF signals transmitted through a 2DEG channel

  • Kim, Min-Sik;Kim, Bum-kyu;Kim, U.J.;Choi, H.K.;Kim, Ju-Jin;Bae, Myung-Ho
    • Progress in Superconductivity and Cryogenics
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    • v.24 no.2
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    • pp.23-26
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    • 2022
  • A lossless transport of an arbitrary waveform in a frequency range of 106-109 Hz through a conduction channel in a cryogenic temperature is of importance for a high-speed operation of quantum device. However, it is hard to use a commercial oscilloscope to directly detect the waveform travelling in a device located in a cryogenic system. Here, we developed a cryogenic voltage sampling technique by using a Schottky barrier gate prepared on a surface of a GaAs/AlGaAs device, which revealed that an incident rectangle waveform can transport through a 1 mm long two-dimensional conduction channel without waveform deformation up to 20 MHz, while further study is needed to increase the detection frequency.

Characteristics of Si Nano-Crystal Memory

  • Kwangseok Han;Kim, Ilgweon;Hyungcheol Shin
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.1 no.1
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    • pp.40-49
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    • 2001
  • We have developed a repeatable process of forming uniform, small-size and high-density self-assembled Si nano-crystals. The Si nano-crystals were fabricated in a conventional LPCVD (low pressure chemical vapor deposition) reactor at $620^{\circ}c$ for 15 sec. The nano-crystals were spherical shaped with about 4.5 nm in diameter and density of $5{\times}l0^{11}/$\textrm{cm}^2$. More uniform dots were fabricated on nitride film than on oxide film. To take advantage of the above-mentioned characteristics of nitride film while keeping the high interface quality between the tunneling dielectrics and the Si substrate, nitride-oxide tunneling dielectrics is proposed in n-channel device. For the first time, the single electron effect at room temperature, which shows a saturation of threshold voltage in a range of gate voltages with a periodicity of ${\Delta}V_{GS}\;{\approx}\;1.7{\;}V$, corresponding to single and multiple electron storage is reported. The feasibility of p-channel nano-crystal memory with thin oxide in direct tunneling regime is demonstrated. The programming mechanisms of p-channel nano-crystal memory were investigated by charge separation technique. For small gate programming voltage, hole tunneling component from inversion layer is dominant. However, valence band electron tunneling component from the valence band in the nano-crystal becomes dominant for large gate voltage. Finally, the comparison of retention between programmed holes and electrons shows that holes have longer retention time.

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A New Function Embedding Method for the Multiple-Controlled Unitary Gate based on Literal Switch (리터럴 스위치에 의한 다중제어 유니터리 게이트의 새로운 함수 임베딩 방법)

  • Park, Dong-Young
    • The Journal of the Korea institute of electronic communication sciences
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    • v.12 no.1
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    • pp.101-108
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    • 2017
  • As the quantum gate matrix is a $r^{n+1}{\times}r^{n+1}$ dimension when the radix is r, the number of control state vectors is n, and the number of target state vectors is one, the matrix dimension with increasing n is exponentially increasing. If the number of control state vectors is $2^n$, then the number of $2^n-1$ unit matrix operations preserves the output from the input, and only one can be performed the unitary operation to the target state vector. Therefore, this paper proposes a new method of function embedding that can replace $2^n-1$ times of unit matrix operations with deterministic contribution to matrix dimension by arithmetic power switch of the unitary gate. The proposed function embedding method uses a binary literal switch with a multivalued threshold, so that a general purpose hybrid MCU gate can be realized in a $r{\times}r$ unitary matrix.

Channel and Gate Workfunction-Engineered CNTFETs for Low-Power and High-Speed Logic and Memory Applications

  • Wang, Wei;Xu, Hongsong;Huang, Zhicheng;Zhang, Lu;Wang, Huan;Jiang, Sitao;Xu, Min;Gao, Jian
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.1
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    • pp.91-105
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    • 2016
  • Carbon Nanotube Field-Effect Transistors (CNTFETs) have been studied as candidates for post Si CMOS owing to the better electrostatic control and high mobility. To enhance the immunity against short - channel effects (SCEs), the novel channel and gate engineered architectures have been proposed to improve CNTFETs performance. This work presents a comprehensive study of the influence of channel and gate engineering on the CNTFET switching, high frequency and circuit level performance of carbon nanotube field-effect transistors (CNTFETs). At device level, the effects of channel and gate engineering on the switching and high frequency characteristics for CNTFET have been theoretically investigated by using a quantum kinetic model. This model is based on two-dimensional non-equilibrium Green's functions (NEGF) solved self - consistently with Poisson's equations. It is revealed that hetero - material - gate and lightly doped drain and source CNTFET (HMG - LDDS - CNTFET) structure can significantly reduce leakage current, enhance control ability of the gate on channel, improve the switching speed, and is more suitable for use in low power, high frequency circuits. At circuit level, using the HSPICE with look - up table(LUT) based Verilog - A models, the impact of the channel and gate engineering on basic digital circuits (inverter, static random access memory cell) have been investigated systematically. The performance parameters of circuits have been calculated and the optimum metal gate workfunction combinations of ${\Phi}_{M1}/{\Phi}_{M2}$ have been concluded in terms of power consumption, average delay, stability, energy consumption and power - delay product (PDP). In addition, we discuss and compare the CNTFET-based circuit designs of various logic gates, including ternary and binary logic. Simulation results indicate that LDDS - HMG - CNTFET circuits with ternary logic gate design have significantly better performance in comparison with other structures.

Optically Controlled Silicon MESFET Fabrication and Characterizations for Optical Modulator/Demodulator

  • Chattopadhyay, S.N.;Overton, C.B.;Vetter, S.;Azadeh, M.;Olson, B.H.;Naga, N. El
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.10 no.3
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    • pp.213-224
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    • 2010
  • An optically controlled silicon MESFET (OPFET) was fabricated by diffusion process to enhance the quantum efficiency, which is the most important optoelectronic device performance usually affected by ion implantation process due to large number of process induced defects. The desired impurity distribution profile and the junction depth were obtained solely with diffusion, and etching processes monitored by atomic force microscope, spreading resistance profiling and C-V measurements. With this approach fabrication induced defects are reduced, leading to significantly improved performance. The fabricated OPFET devices showed proper I-V characteristics with desired pinch-off voltage and threshold voltage for normally-on devices. The peak photoresponsivity was obtained at 620 nm wavelength and the extracted external quantum efficiency from the photoresponse plot was found to be approximately 87.9%. This result is evidence of enhancement of device quantum efficiency fabricated by the diffusion process. It also supports the fact that the diffusion process is an extremely suitable process for fabrication of high performance optoelectronic devices. The maximum gain of OPFET at optical modulated signal was obtained at the frequency of 1 MHz with rise time and fall time approximately of 480 nS. The extracted transconductance shows the possible potential of device speed performance improvements for shorter gate length. The results support the use of a diffusion process for fabrication of high performance optoelectronic devices.

Newly Synthesized Silicon Quantum Dot-Polystyrene Nanocomposite Having Thermally Robust Positive Charge Trapping

  • Dung, Mai Xuan;Choi, Jin-Kyu;Jeong, Hyun-Dam
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.221-221
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    • 2013
  • Striving to replace the well known silicon nanocrystals embedded in oxides with solution-processable charge-trapping materials has been debated because of large scale and cost effective demands. Herein, a silicon quantum dot-polystyrene nanocomposite (SiQD-PS NC) was synthesized by postfunctionalization of hydrogen-terminated silicon quantum dots (H-SiQDs) with styrene using a thermally induced surface-initiated polymerization approach. The NC contains two miscible components: PS and SiQD@PS, which respectively are polystyrene and polystyrene chains-capped SiQDs. Spin-coated films of the nanocomposite on various substrate were thermally annealed at different temperatures and subsequently used to construct metal-insulator-semiconductor (MIS) devices and thin film field effect transistors (TFTs) having a structure p-$S^{++}$/$SiO_2$/NC/pentacene/Au source-drain. C-V curves obtained from the MIS devices exhibit a well-defined counterclockwise hysteresis with negative fat band shifts, which was stable over a wide range of curing temperature ($50{\sim}250^{\circ}C$. The positive charge trapping capability of the NC originates from the spherical potential well structure of the SiQD@PS component while the strong chemical bonding between SiQDs and polystyrene chains accounts for the thermal stability of the charge trapping property. The transfer curve of the transistor was controllably shifted to the negative direction by chaining applied gate voltage. Thereby, this newly synthesized and solution processable SiQD-PS nanocomposite is applicable as charge trapping materials for TFT based memory devices.

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