• 제목/요약/키워드: Purge Process

검색결과 58건 처리시간 0.026초

효율적 SLA 산정의 전략적 접근방법

  • 박혜경
    • 한국전자거래학회:학술대회논문집
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    • 한국전자거래학회 2002년도 e-Biz World Conference
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    • pp.337-339
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    • 2002
  • ㆍ시스템 구축 ㆍNetwork보안 ㆍ서버사양 ㆍApplication 구축 ㆍMaster Data ㆍLegacy System과 Interface ㆍReport(보고서 지원) ㆍOn-Going Support ㆍNew Process지원 ㆍProcess Remodeling ㆍ정기적인 Data Purge ㆍReport(보고서)(중략)

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오비탈 용접법을 적용한 STS 316L 파이프 소재의 용접부 특성에 관한 연구 (A Study on the Welds Characteristics of Stainless Steel 316L Pipe using Orbital Welding Process)

  • 이병우;조상명
    • 동력기계공학회지
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    • 제14권2호
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    • pp.71-77
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    • 2010
  • This paper was studied on microstructure, mechanical properties and corrosion characteristics of 316L stainless steel pipe welds was fabricated by orbital welding process. S-Ar specimen was fabricated by using Ar purge gas and S-$N_2$ specimen was fabricated by using $N_2$ purge gas. Ferrite was not detected in weld metal of S-$N_2$ specimen but the order of 0.13 Ferrite number(FN) was detected in weld metal of S-Ar specimen. Oxygen and Nitrogen concentration of S-$N_2$ specimen was higher than S-Ar specimen on HAZ and inner bead. The welds microstructural characteristics of S-Ar and S-$N_2$ specimens are similar. The microvickers hardness values of S-Ar and S-$N_2$ specimens welds were similar and average values of each regions were in the range of 174~194. The microstructures of S-Ar and S-$N_2$ weld metal were full austenite by primary austenite solidification. The Solidification structures of S-Ar and S-$N_2$ weld metal were formed directional dendrite toward bead center. The potentiodynamic polarization curve of STS 316L pipe welds exhibited typical active, passive, transpassive behaviour. Corrosion current density$(I_{corr.})$ and corrosion rate values of S-Ar specimen in 0.1M HCl solution were $0.95{\mu}A/cm^2$ and $0.31{\mu}A$/year respectively. The values of S-$N_2$ specimen were $1.4{\mu}A/cm^2$ and $0.45{\mu}m$/year.

반도체 및 FPD 분야에 사용되는 $SiH_{4}$ 가스의 공정 안전 고찰 (Review on the Process Safety of $SiH_{4}$ Gas used in Semiconductor and FPD Field)

  • 김중조;김홍
    • 한국안전학회지
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    • 제22권4호
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    • pp.32-36
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    • 2007
  • When the vacuum system for the process of $SiH_{4}$ gas used in the semiconductor and FPD field is partially vented from vacuum to atmospheric state, a fire often occurs due to auto-ignition of $SiH_{4}$ gas. In order to prevent the fire, the concentration of $SiH_{4}$ should be kept under LFL. This means that the higher capacity pump is needed to meet the process conditions as well as the condition that the concentration of $SiH_{4}$ should be kept under LFL. In this article, we conducted the injection of the dilution gas at the manifold between booster pump and dry pump compared with the typical method that the dilution gas was injected into inlet port of booster pump using computer simulation. According to the result, we can flow further more purge gas for safety without any change of the condition in the process chamber, which means that the higher capacity pump is not required for safety in some cases.

고분자전해질 연료전지 Dead-end 운전 최적화에 대한 실험적인 연구 (Experimental Analysis for Optimization of PEM Fuel Cell Dead-end Operation)

  • 이봉구;손영준
    • 한국수소및신에너지학회논문집
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    • 제26권2호
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    • pp.136-147
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    • 2015
  • Dead-ended operation of Proton Exchange Membrane Fuel Cell(PEMFC) provides the simplification of fuel cell systems to reduce fuel consumption and weight of fuel cell. However, the water accumulation within the channel prohibits a uniform supply of fuel. Optimization of the purge strategy is required to increase the fuel cell efficiency since fuel and water are removed during the purge process. In this study, we investigated the average voltage output which depends on two interrelated conditions, namely, the supply gas pressure, purging valve open time. In addition, flow visualization was performed to better understand the water build-up on the anode side and cathode side of PEMFC in terms of a variety of the current density. We analyzed the correlation between the purge condition and water flooding.

저온 원자층증착법으로 제조된 결정질 TiO2 나노 박막 (Crystallized Nano-thick TiO2 Films with Low Temperature ALD Process)

  • 박종성;한정조;송오성
    • 대한금속재료학회지
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    • 제48권5호
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    • pp.449-455
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    • 2010
  • To enhance the efficiency of dye sensitized solar cells, we proposed crystalline anatase-$TiO_{2}$ by using a low temperature process ($150^{\circ}C{\sim}250^{\circ}C$). We successfully fabricated 30 nm-$TiO_{2}$ at a fixed atomic layer deposition condition of 1.0 sec of TDMAT pulse, 20 sec of TDMAT purge, 0.5 sec of H$_{2}$O pulse, and 20 sec of H$_{2}$O purge. In order to examine the microstructure, phase, and band-gap of the TiO$_{2}$ respectively, we employed a Nano-Spec, transmission electron microscope, high resolution XRD, Auger electron spectroscopy, scanning probe microscope, and UV-VIS-NIR. We were able to fabricate a crystalline anatase-phase of 30 nm-TiO$_{2}$ successfully at temperatures above $180^{\circ}C$. Our results showed that our proposed low temperature ALD process (below $200^{\circ}C$) might be applicable to glass and flexible polymer substrates.

초경합금과 강의 Brazing특성에 미치는 열처리의 영향 (Influence of Heat Treatment on Brazing Characteristics between Cemented Carbides and Steel)

  • 김하영;중촌 만;이상학
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2004년도 추계학술발표대회 개요집
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    • pp.43-45
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    • 2004
  • Brazing between cemented carbides and steel for tool investigated by copper alloy brazing filler. Copper alloy filler was high liquidus temperature($990^{\circ}C$), therefor the shank(steel) occurred softening. Because brazing sample was necessary to heat treatment after brazing process. This experiment, influence of austenite time and purge temperature on heat treatment were investigated. As a result, these treatments obtained to high deflective strength In case of austenite time was short and purge temperature was low. Especially, nitride precipitated brazing layers was strongly influenced by the deflective strength.

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비휘발성 메모리 응용을 위한 ALD법을 이용한 HfO2 절연막의 특성 (Properties of HfO2 Insulating Film Using the ALD Method for Nonvolatile Memory Application)

  • 정순원;구경완
    • 전기학회논문지
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    • 제59권8호
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    • pp.1401-1405
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    • 2010
  • We have successfully demonstrated of metal-insulator-semiconductor (MIS) capacitors with $HfO_2$/p-Si structures. The $HfO_2$ film was grown at $200^{\circ}C$ on H-terminated Si wafer by atomic layer deposition (ALD) system. TEMAHf and $H_2O$ were used as the hafnium and oxygen sources. A cycle of the deposition process consisted of 0.1 s of TEMAHf pulse, 10 s of $N_2$ purge, 0.1 s of $H_2O$ pulse, and 60 s of $N_2$ purge. The 5 nm thick $HfO_2$ layer prepared on Si substrate by ALD exhibited excellent electrical properties, including low leakage currents, no mobile charges, and a good interface with Si.

비휘발성 메모리 응용을 위한 ALD법을 이용한 $Al_2O_3$ 절연막의 특성 (Properties of $Al_2O_3$ Insulating Film Using the ALD Method for Nonvolatile Memory Application)

  • 정순원;이기식;구경완
    • 전기학회논문지
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    • 제58권12호
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    • pp.2420-2424
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    • 2009
  • We have successfully demonstrated of metal-insulator-semiconductor (MIS) capacitors with $Al_2O_3/p-Si$ structures. The $Al_2O_3$ film was grown at $200^{\circ}C$ on H-terminated Si wafer by atomic layer deposition (ALD) system. Trimethylaluminum [$Al(CH_3)_3$, TMA] and $H_2O$ were used as the aluminum and oxygen sources. A cycle of the deposition process consisted of 0.1 s of TMA pulse, 10 s of $N_2$ purge, 0.1 s of $H_2O$ pulse, and 60 s of $N_2$ purge. The 5 nm thick $Al_2O_3$ layer prepared on Si substrate by ALD exhibited excellent electrical properties, including low leakage currents, no mobile charges, and a good interface with Si.

액체로켓엔진의 공압류 라우팅 개념 설계 (Conceptual Design of Penumatic System Routing for Liquid Rocket Engine)

  • 김옥구;박순영;정은환
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2017년도 제48회 춘계학술대회논문집
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    • pp.1112-1114
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    • 2017
  • 액체 로켓 엔진은 채택되는 사이클, 하드웨어 구성, 기능 구현상의 짐벌 타입 등에 의해 구성품 배치와 레이아웃의 라우팅이 결정된다. 본 논문에서는 액체로켓엔진에 장착되는 주요 구성품을 기준으로 구동을 담당하는 헬륨(He) 공급 공압라인, 각종 퍼지 공압라인, 주 점화라인 등의 주요 유공압 라인의 개념 라우팅을 수행하였다.

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