• 제목/요약/키워드: Pulsed UV

검색결과 107건 처리시간 0.023초

Pulsed UV 처리수에서의 자연유기물질, 잔류염소 및 소독부산물 생성 거동 (Behavior of Natural Organic Matter(NOM), Chlorine Residual, and Disinfection By-Products(DBPs) Formation in Pulsed UV Treated Water)

  • 손진식;한지희
    • 상하수도학회지
    • /
    • 제26권5호
    • /
    • pp.685-692
    • /
    • 2012
  • UV technology is widely used in water and wastewater treatment. Many researches have been conducted on microbial disinfection and micro pollutant reduction with UV treatment. However, the study on NOM with UV has limited because low/medium pressure UV lamp is not sufficient to affect refractory organics such as NOM. Pulsed UV treatment using UV flash lamp can be operated in the pulsed mode with much greater peak intensity. The pulse duration is typically in microseconds, whereas the interval between pulses is in the order of milliseconds. The high intensity of pulsed UV would mineralize NOM itself as well as change the characteristics of NOM. Chlorine demand and DBPs formation is affected on the changed amounts and properties of NOM. The objective of this study is to investigate the effect on NOM, chlorine residual, and chlorinated DBPs formation with pulsed UV treatment.

하수처리장 방류수의 UV 처리시 유기물질, 잔류염소 및 소독부산물 생성 거동 (Behavior of Organic Matter, Chlorine Residual and Disinfection By-Products (DBPs) Formation during UV Treatment of Wastewater Treatment Plant Effluents)

  • 한지희;손진식
    • 상하수도학회지
    • /
    • 제28권1호
    • /
    • pp.61-72
    • /
    • 2014
  • Study on effluent organic matter (EfOM) characteristic and removal efficiency is required, because EfOM is important in regard to the stability of effluents reuse, quality issues of artificial recharge and water conservation of aqueous system. UV technology is widely used in wastewater treatment. Many reports have been conducted on microbial disinfection and micro pollutant reduction with UV treatment. However, the study on EfOM with UV has limited because low/medium pressure UV lamp is not sufficient to affect refractory organics. The high intensity of pulsed UV would mineralize EfOM itself as well as change the characteristics of EfOM. Chlorine demand and DBPs formation is affected on the changed amounts and properties of EfOM. The objective of this study is to investigate the effect on EfOM, chlorine residual, and chlorinated DBPs formation with low pressure and pulsed UV treatment. The removal of organic matter through low pressure UV treatment is insignificant effect. Pulsed UV treatment effectively removes/transforms EfOM. As a result, the chlorine consumption is changed and chlorine DBPs formation is decreased. However, excessive UV treatment caused problems of increasing chlorine consumption and generating unknown by-products.

Sterilization of Escherichia coli Based on Nd: YAG Resonator with a Pulsed Xenon Flashlamp

  • Kim, Hee-Je;Kim, Dong-Jo;Hong, Ji-Tae;Xu, Guo-Cheng;Lee, Dong-Gil
    • Journal of Electrical Engineering and Technology
    • /
    • 제6권2호
    • /
    • pp.275-279
    • /
    • 2011
  • Sterilization of Escherichia coli (E. coli) is examined using a unique pulsed ultra-violet (UV) elliptical reactor based on Nd:YAG laser resonator, UV radiation from a pulsed xenon flashlamp. The light from the discharge has a broadband emission spectrum extending from the UV to the infrared region with a rich UV contained. Sterilization method by using the UV light is fast, environment-friendly and it does not cause secondary pollution. A Nd:YAG laser resonator having elliptical shape has advantage of concentrating the radiation of the UV light at two foci as the quart sleeve filled with E. coli. The primary objective of this research is to determine the important parameters such as pulse per second (pps), the applied voltage for sterilizing E. coli by using an UV elliptical reactor. From the experiment result, the sterilization effect of UV elliptical reactor is better than that of UV cylindrical reactor, and it can be 99.9% of sterilization at 800V regardless of the pps within 10 minutes.

Pulsed-UV 시스템을 이용한 염소계 유기화합물 및 화약류 제거에 관한 연구 (A Study on Remediation of Chlorinated Hydrocarbons and Explosives using Pulsed-UV System)

  • 이한욱;한종훈;윤여민;이종열;허남국
    • 한국지하수토양환경학회지:지하수토양환경
    • /
    • 제18권1호
    • /
    • pp.78-84
    • /
    • 2013
  • This study was conducted in order to evaluate the removal process for long-term contamination sources including chlorinated hydrocarbons (TCE and PCE) and explosive compounds (TNT, RDX, and HMX) in underground water using a pulsed-UV system. Crystallized cells containing the contaminants were placed 10, 20, and 40 cm away from a lamp that emits pulsed-UV rays in order to examine how the removal efficiency is influenced by the distance between the source of the light and the compounds. Chlorinated hydrocarbons were completely removed in 30 minutes with a distance of 10 cm, while PCE was completely removed even with a distance of 20 cm. In the case of explosive compounds, removal efficiencies slightly varied depending on the compounds. The majority of the compounds were perfectly removed with a contact time of 10 minutes. In particular, for RDX, the results showed that complete removal was obtained within one minute, regardless of the distance from the UV source. The amount of light energy is in inverse proportion to the distance, and thus the energy reaching the compounds severely diminishes as the distance increases. Therefore, the removal efficiency decreased with increasing distance in the system.

펄스 전기장 처리에 의한 수용액의 물성 변화 (Property Change of Solution by Pulsed Electric Field Treatment)

  • 최승필;김찬수;김종오
    • 한국지반환경공학회 논문집
    • /
    • 제12권9호
    • /
    • pp.63-69
    • /
    • 2011
  • 본 연구에서는 펄스 전기장 처리장치를 이용하여 물, 계면활성제 그리고 휴믹산의 물리화학적 변화 특성을 검토하였다. 펄스 전기장 처리에 따른 물의 구조적 특성변화를 검토한 결과, FT-IR 분석에서 C-N 복합구조와 C=O 구조에서 변화가 일어나는 것으로 나타났으며, NMR 분석에서는 물분자의 운동속도 증가폭이 최소 2.3 Hz에서 9.9 Hz로 나타났다. 각각의 계면활성제를 펄스 전기장 처리 한 결과, 양이온 계면활성제와 음이온 계면활성제의 CMC는 각각 1.3%와 9.2% 낮아지는 것으로 나타났고, UV-vis 값은 증가하는 것으로 나타났다. 그러나 휴믹산은 펄스 전기장 처리를 할 경우 UV-vis 값이 감소하는 것으로 나타났다. 펄스 전기장 처리는 물과 유기화합물의 구조적 특성변화에 직접적인 영향을 미치는 것을 확인할 수 있었다.

분위기 산소압변화에 따른 ZnO박막의 UV발광 특성분석 (UV Emission Characterization of ZnO Thin Films Depending on the Variation of Oxygen Pressure)

  • 백상혁;이상열;진범준;임성일
    • 대한전기학회논문지:전기물성ㆍ응용부문C
    • /
    • 제49권2호
    • /
    • pp.103-106
    • /
    • 2000
  • ZnO is a wide-bandgap II-IV semiconductor and has a variety of potnetial applications. ZnO exhibits good piezoelectric, photoelectric and optical properties, and is a good candidate for an electroluminescence device. ZnO films have been deposited on (001) sapphire by PLD technique. Nd:YAG pulsed laser was operated at a wavelength of $\lambda=355nm$. The ZnO films were deposited at oxygen pressures from base to 500 mTorr. The substrate temperatures was increased from $200^{\circ}C\; to\;700^{\circ}C$ films showed strong UV emission by increasing the partial oxygen pressure. We have investigated the relationship between partial oxygen pressure and the intensity of UV emission.

  • PDF

의료 약물주입용 미세 유량 제어 장치 (Fine Flow Controlling Device for Medicine Injection)

  • 조수찬;신보성
    • 마이크로전자및패키징학회지
    • /
    • 제28권4호
    • /
    • pp.51-55
    • /
    • 2021
  • 본 논문은 보통 병원에서 간호사가 수작업으로 진행하는 약물주입 과정을 대신할 수 있는 의료용 미세 유량 제어 장치를 소개한다. 이는 아두이노로 구현되었으며 환자의 지속적인 관리에 도움이 되고자 한다. 기본적으로 연동펌프를 통해 약물이 주입되며 RGB color sensor를 통해 배출액의 색상을 값으로 받아들이고 이 값을 바탕으로 수액백에 달린 연동펌프의 모터 속도를 조절하는 알고리즘을 아두이노 코딩을 통해 구현한다. 전체적인 시스템은 배터리를 통해 작동되며 연구실에서 355nm UV pulsed laser를 통해 제작한 LIG strain sensor의 추가를 통해 수액백으로부터 주입되는 약물의 양을 측정한다. 이렇게 제작된 미세 유량 제어 장치는 모든 과정을 수작업으로 진행해오던 병원에 곧장 사용 가능하며 간호사의 편의를 제공하고자 한다. 이 장치를 통해 한층 향상된 의료서비스를 제공할 수 있다.

분위기 산소압 변화에 따른 ZnO 박막의 발광특성 변화 (Ultraviolet and green emission property of ZnO thin film grown at various ambient pressure)

  • 강정석;심은섭;강홍성;김종훈;이상렬
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
    • /
    • pp.355-357
    • /
    • 2001
  • ZnO thin films were deposited on (001) sapphire substrate at various ambient gas pressure by pulsed laser deposition(PLD). Oxygen was used as ambient gas, and oxygen gas pressure was varied from 1.0${\times}$10$\^$-6/ Torr to 500 mTorr during the film deposition. As oxygen gas pressure increase in the region below critical pressure photoluminescence(PL) intensity in UV and green region increase. As oxygen gas pressure increase in the region above critical pressure photoluminescence(PL) intensity in UV and green region decrease. Each of critical ambient gas Pressures was 350 mTorr for UV emission and 200 mTorr for green emission.

  • PDF

355nm UV 레이저를 이용한 구리 박판 가공 시 어블레이션에 관한 연구 (A Study on Laser Ablation of Copper Thin Foil by 355nm UV Laser Processing)

  • 오재용;신보성
    • 한국정밀공학회지
    • /
    • 제24권2호
    • /
    • pp.134-139
    • /
    • 2007
  • Usually nanosecond pulsed laser processing of metal is mainly affected by the thermal ablation. Many studies of the theoretical analysis and modeling to predict the laser ablation of metal are suggested on the basis of the photothermal mechanism at higher laser fluence. In this paper, we investigate the etching depth and laser fluence of laser ablation of copper foils and propose the simplified SSB Model(Srinivasan-Smrtic-Babu model) to study the photothermal effect of nanosecond pulsed laser ablation. The experimental results show that the photothermal ablation of the 355nm DPSS $NdYVO_{4}$ laser is useful to process the copper thin foils.