• Title/Summary/Keyword: Pt^{+4}$metal ion

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Studies on Solvent Extraction and Analytical Application of Metal Dithiocarbamate Complexes(II). Extraction Equilibria of Metal-Dibenzylammonium dibenzyldithiocarbamate Complexes (Dithiocarbamate 금속착물의 용매추출 및 분석적 응용(제2보) Dibenzylammonium dibenzyldithiocarbamate 금속착물의 추출평형)

  • Lee, Jong-Sun;Choi, Jong-Moon;Choi, Hee-Seon;Kim, Young-Sang
    • Analytical Science and Technology
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    • v.9 no.3
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    • pp.221-234
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    • 1996
  • Basic studies for the effective extraction of dibenzylammonium dibenzyldithiocarbamate(DBADBDC) complexes of Ag(I), Pd(II), Au(III) and Pt(IV) into chloroform have been conducted. The effects of pH on the extraction of ligand itself and metal cemplexes showed that DBADBDC itself was uniformly extracted in the pH range of 2~9 and metal complexes were effectively extracted at the pH range as follows. That is, Ag(I) : in an acidic aqua medium, Pd(II) : > 4, Au(III) : wide range, and Pt(IV) : > 3. The distribution ratio and extractabilities were obtained from the partition and extraction equilibria of metal-DBDC complexes between aqueous solution and chloroform. Ag(I) : log D=4.226 : E(%)=99.9% in the aqueous solution of pH 0, Pd(II) : log D=1.804 : E(%)=98.5% at pH 4~7, Au(III) : log D=3.755 : E(%)=99.9% at pH 2~10, and Pt(IV) : log D=0.165 : E(%)=57.2% at pH 8.0. And also mole ratio of metal ion to ligand in complexes were determined by mole ratio method : 1 : 1 for Ag(I) and 1 : 2 for Pd(II), Au(III) and Pt(IV). $Cl^-$ was included as a coordination species in complexes of Au(III) and Pt(IV). Besides, extraction mechanisms of compleses sere examined in the presence of chloride ion in an aquous solution, and extraction reactions and estraction constants could be proposed and calculated, respectively.

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Dielectric properties of Pt/PVDF/Pt modified by low energy ion beam irradiation

  • Sung Han;Yoon, Ki-Hyun;Jung, Hyung-Jin;Koh, Seok-Keun
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.110-110
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    • 1999
  • Polyvinylidenefluoride (PVDF) is most used in piezoelectric polymer industry. Electrode effect on the electrical properties of PVDF has been investigated. al has been used due to fair adhesion for PVDF. Work function of metal plays an important role on the electrical properties of ferroelectrics for top and /or bottom electrode. However, Al has much lower work function than Pt or Au and so leakage current of Al/PVDF/Al may be large. Pt or Au has not been used for electrode of PVDF system due to poor adhesion. PVDF irradiated by Ar+ ion beam with O2 environment takes good adhesion to inert metal. Contact angle of PVDF to triple distilled water was reduced from 75$^{\circ}$ to 31$^{\circ}$ at 1$\times$1015 Ar+/cm2. Working pressure was 2.3$\times$10-4 Torr and base pressure was 5$\times$10-6 Torr. Pt was deposited by ion beam sputtering and thickness of pt film was about 1000$\AA$. in previous study, enhancing adhesion of Pt on PVDF was shown. in this study, effect of electrode on PVDF will be represented.

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Deposition of Alkali Metal Ions at Polypyrrole Film Electrodes Modified with Fullerene (플러렌으로 수식된 피를 고분자 피막전극에 알카리 금속이온의 포집)

  • Cha Seong-Keuck;Lee Sangchun
    • Journal of the Korean Electrochemical Society
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    • v.7 no.1
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    • pp.16-20
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    • 2004
  • To electropolymerize Polypyrrole(ppy) film modified with fullerene $ions(full^-)$ the cell, Au/5 mM pyrrole, 1mM fullerene, 0.1M $TBABF_4,\;CH_2Cl_2/Pt$, was employed to Prepare the wafer-like type of $electrode/ppy(full^-)ppy(full^-){\ldots}$ electrodes. They were applied to deposit alkali metal ions with the cell of Au(quartz crystal analyzer; QCA)/ppy$(full^-)$, 0.01M metal ion(aq.)/Pt. The depositing rate constant of each ion for $Li^+,\;Na^+,\;K^+,\;Rb^+\;and\;Cs^+$, determined from the first order equation was $1.60\times10^{-8},\;3.13\times10^{-11},\;1.38\times10^{-9},\;2.71\times10^{-11}\;and\;2.98\times10^{-12}mo1.s^{-1}$ respectively. The calculated stoichiometry of the ions determined by quartz crystal microbalance(QCM) at the electrodes was $Li_7C_{60},\;Na_4C_{60},\;K_3C_{60},\;Rb_1C_{60}\;and\;Cs_1C_{60}$ respectively.

Epitaxial growth of Pt Thin Film on Basal-Plane Sapphire Using RF Magnetron Sputtering

  • 이종철;김신철;송종환;이충만
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.41-41
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    • 1998
  • Rare earth metal films have been used as a buffer layer for growing ferroelectric t thin film or a seed layer for magnetic multilayer. But when it was deposited on s semiconductor substrates for the application of magneto-optic (MO) storage media, it i is difficult to exactly measure magnetic cons떠nts due to shunting current, and so it n needs to grow metal films on insulator substrate to reduce such effect. Recently, it w was reported that ultra-thin Pt layer were epitaxially grown on A12O:J by ion beam s sputtering in 비떠 high vacuum and it can be used as a seed layer for the growth of C Co-contained magnetic multilayer. In this stu$\phi$, Pt thin film were epi떠xially grown on AI2D3 ($\alpha$)OJ) by RF magnetron s sputtering. The crystalline structure was analyzed by transmission electron microscope ( (TEM) and Rutherford Back Scattering (RBS)/Ion Channeling. In TEM study, Pt was b believed to be twinned on AI잉3($\alpha$)01) su$\pi$ace about Pt(ll1) plane.Moreover, RBS c channeling spectra showed that minimum scattering yield of Pt(111)/AI2O:J(1$\alpha$)OJ) was 4 4% and Pt(11J)/AI2D3($\alpha$)OJ) had 3-fold symmetry.

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Metal Ion Released from Old Prostheses May Affect Oral Lesions: A Pilot Study

  • Ju, Hye-Min;Kim, Ji-Su;Ahn, Yong-Woo;Ok, Soo-Min;Jeong, Sung-Hee
    • Journal of Oral Medicine and Pain
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    • v.43 no.4
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    • pp.131-135
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    • 2018
  • Purpose: To investigate the correlation between the amount of salivary metal ions released from fixed prostheses and the period of restoration insertion, and to evaluate the correlation between the type and amount of metal ions in saliva and oral lesions (OL). Methods: Based on the oldest prosthesis, we divided patients into two groups: more than 5 years (n=19) and less than 5 years (n=10). Patients were also divided into two groups by another criteria: the one with the presence (n=15), and the one with absence (n=14) of OL, and the amounts of metal ions were examined. Metal ions-gold (Au), copper, cobalt (Co), chromium (Cr), nickel, zinc, aluminum, palladium (Pd), tin, and platinum (Pt)-were measured using laser ablation microprobe inductively coupled plasma mass spectrometry. Results: Significantly higher quantities of Co, Pt, and Pd ions were released in patients with fixed prosthesis of more than 5 years (p<0.05). Measurement of the average amount of salivary metal ions was performed on patients with and without OL - Significantly higher amounts of Cr, Pd and Au ions were released in patients with OL (p<0.05). Conclusions: Old prostheses (${\geq}5years$) released metal ions, and among them were Co, Pt and Pd ions more than others. Patients with OL showed significantly higher levels of ion release, especially Cr, Pd and Au. There was a positive correlation between the amount of a certain kind of released metal ions, especially Pd, and the development of OL. Salivary Pd ion released from old prostheses could affect the pathogenesis of OL; therefore, long-term follow-up is important.

The Influence of $O_2$ Gas on the Etch Characteristics of FePt Thin Films in $CH_4/O_2/Ar$ gas

  • Lee, Il-Hoon;Lee, Tea-Young;Chung, Chee-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.408-408
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    • 2012
  • It is well known that magnetic random access memory (MRAM) is nonvolatile memory devices using ferromagnetic materials. MRAM has the merits such as fast access time, unlimited read/write endurance and nonvolatility. Although DRAM has many advantages containing high storage density, fast access time and low power consumption, it becomes volatile when the power is turned off. Owing to the attractive advantages of MRAM, MRAM is being spotlighted as an alternative device in the future. MRAM consists of magnetic tunnel junction (MTJ) stack and complementary metal- oxide semiconductor (CMOS). MTJ stacks are composed of various magnetic materials. FePt thin films are used as a pinned layer of MTJ stack. Up to date, an inductively coupled plasma reactive ion etching (ICPRIE) method of MTJ stacks showed better results in terms of etch rate and etch profile than any other methods such as ion milling, chemical assisted ion etching (CAIE), reactive ion etching (RIE). In order to improve etch profiles without redepositon, a better etching process of MTJ stack needs to be developed by using different etch gases and etch parameters. In this research, influences of $O_2$ gas on the etching characteristics of FePt thin films were investigated. FePt thin films were etched using ICPRIE in $CH_4/O_2/Ar$ gas mix. The etch rate and the etch selectivity were investigated in various $O_2$ concentrations. The etch profiles were studied in varying etch parameters such as coil rf power, dc-bias voltage, and gas pressure. TiN was employed as a hard mask. For observation etch profiles, field emission scanning electron microscopy (FESEM) was used.

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Investigation on Etch Characteristics of FePt Magnetic Thin Films Using a $CH_4$/Ar Plasma

  • Kim, Eun-Ho;Lee, Hwa-Won;Lee, Tae-Young;Chung, Chee-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.167-167
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    • 2011
  • Magnetic random access memory (MRAM) is one of the prospective semiconductor memories for next generation. It has the excellent features including nonvolatility, fast access time, unlimited read/write endurance, low operating voltage, and high storage density. MRAM consists of magnetic tunnel junction (MTJ) stack and complementary metal-oxide semiconductor (CMOS). The MTJ stack is composed of various magnetic materials, metals, and a tunneling barrier layer. For the successful realization of high density MRAM, the etching process of magnetic materials should be developed. Among various magnetic materials, FePt has been used for pinned layer of MTJ stack. The previous etch study of FePt magnetic thin films was carried out using $CH_4/O_2/NH_3$. It reported only the etch characteristics with respect to the variation of RF bias powers. In this study, the etch characteristics of FePt thin films have been investigated using an inductively coupled plasma reactive ion etcher in various etch chemistries containing $CH_4$/Ar and $CH_4/O_2/Ar$ gas mixes. TiN thin film was employed as a hard mask. FePt thin films are etched by varying the gas concentration. The etch characteristics have been investigated in terms of etch rate, etch selectivity and etch profile. Furthermore, x-ray photoelectron spectroscopy is applied to elucidate the etch mechanism of FePt thin films in $CH_4$/Ar and $CH_4/O_2/Ar$ chemistries.

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Platinum-Catalyzed and Ion-Selective Polystyrene Fibrous Membrane by Electrospinning and In-Situ Metallization Techniques

  • Hong, Seung-Hee;Lee, Sun-Ae;Nam, Jae-Do;Lee, Young-Kwan;Kim, Tae-Sung;Won, Sung-Ho
    • Macromolecular Research
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    • v.16 no.3
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    • pp.204-211
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    • 2008
  • A platinum-catalyzed polyelectrolyte porous membrane was prepared by solid-state compression of electrospun polystyrene (PS) fibers and in-situ metallization of counter-balanced ionic metal sources on the polymer surface. Using this ion-exchange metal-polymer composite system, fiber entangled pores were formed in the interstitial space of the fibers, which were surrounded by sulfonic acid sites ($SO_3^-$) to give a cation-selective polyelectrolyte porous bed with an ion exchange capacity ($I_{EC}$) of 3.0 meq/g and an ionic conductivity of 0.09 S/cm. The Pt loading was estimated to be 16.32 wt% from the $SO_3^-$ ions on the surface of the sulfonated PS fibers, which interact with the cationic platinum complex, $Pt(NH_3)_4^{2+}$, at a ratio of 3:1 based on steric hindrance and the arrangement of interacting ions. This is in good agreement with the Pt loading of 15.82 wt% measured by inductively coupled plasma-optical emission spectroscopy (ICP-OES). The Pt-loaded sulfonated PS media showed an ionic conductivity of 0.32 S/cm. The in-situ metallized platinum provided a nano-sized and strongly-bound catalyst in robust porous media, which highlights its potential use in various electrochemical and catalytic systems.

Development of Electrode Materials for Li-Ion Batteries and Catalysts for Proton Exchange Membrane Fuel Cells (리튬 이차전지용 전극 및 연료전지 촉매 소재 연구 개발 동향)

  • Yun, Hongkwan;Kim, Dahee;Kim, Chunjoong;Kim, Young-Jin;Min, Ji Ho;Jung, Namgee
    • Ceramist
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    • v.21 no.4
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    • pp.388-405
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    • 2018
  • In this paper, we review about current development of electrode materials for Li-ion batteries and catalysts for fuel cells. We scrutinized various electrode materials for cathode and anode in Li-ion batteries, which include the materials currently being used in the industry and candidates with high energy density. While layered, spinel, olivine, and rock-salt type inorganic electrode materials were introduced as the cathode materials, the Li metal, graphite, Li-alloying metal, and oxide compound have been discussed for the application to the anode materials. In the development of fuel cell catalysts, the catalyst structures classified according to the catalyst composition and surface structure, such as Pt-based metal nanoparticles, non-Pt catalysts, and carbon-based materials, were discussed in detail. Moreover, various support materials used to maximize the active surface area of fuel cell catalysts were explained. New electrode materials and catalysts with both high electrochemical performance and stability can be developed based on the thorough understanding of earlier studied electrode materials and catalysts.

Electrical Properties by different method of metal complex of G4-48PyP Dendrimer (금속이온 착체방법에 의한 G4-48PyP 덴드리머의 전기적 특성)

  • Kim, S.U.;Jung, S.B.;Kim, C.;Park, J.C.;Chang, J.S.;Kwon, Y.S.
    • Proceedings of the KIEE Conference
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    • 2003.07c
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    • pp.1532-1534
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    • 2003
  • We attempted to fabricate a dendrimer Langmuir-Blodgett(LB) films containing 48 pyridinepropanol functional end group. As the pyridinepropanol functional group could form a complex structure with metal ions. In this study the samples for electrical measurement were fabricated to two types metal complexes with $Pt^{4+}$ ions by LB method. And we have investigated the surface activity at the air-water interface as well as the electrical properties for the monolayers of G4-48PyP dendrimer complex with metal ions($Pt^{4+}$ ions) by different method. In the surface pressure-area(${\pi}$-A) isotherms of the dendrimers, the stable condensed films formed at the air-water interface and the different method of metal complex showed the difference on molecular behavior. We have studied the electrical properties of the ultra thin dendrimer LB films investigated by the current-voltage (I-V) characteristics of metal/dendrimer LB films/metal(MIM) structure. In conclusion, it is demonstrated that the metal ion around G4-48PyP dendrimer can contribute to make formation of network structure among dendrimers and it result from the change of electrical properties.

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