• E2M - 전기 전자와 첨단 소재
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• 제9권2호
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• pp.188-195
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• 1996

The AlSi etching process using the MERIE type reactor carried out with different process parameters such as C1$_{2}$ and N$_{2}$ gas flow rate, RF power and chamber pressure. The etching characteristics were evaluated in terms of etch rate, selectivity, uniformity and etched profile. As the N2 gas flow rate is increased, the AlSi etch rate is decreased and uniformity has remained constant within .+-.5%. The etch rate is increased and uniformity is decreased, according to increment of the C1$_{2}$ gas flow rate, RF power and chamber pressure. Selective etching of TEOS with respect to AlSi is decreased as the RF power is increased while it is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, on the other hand, selective etching of photoresist with respect to AlSi is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, it is decreased as the N$_{2}$ gas flow rate is increased.

• 한국전기전자재료학회논문지
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• 제18권3호
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• pp.206-211
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• 2005

The device makers want to make higher density chips on the wafer through scale-down. The change of WSix/poly-Si gate film thickness is one of the key issues under 100 nm device structure. As a new device etching process is applied, end point detection(EPD) time delay was occurred in DPS+ poly chamber of Applied Materials. This is a barrier of device shrink because EPD time delay made physical damage on the surface of gate oxide. To investigate the EPD time delay, the experimental test combined with OES(Optical Emission Spectroscopy) and SEM(Scanning Electron Microscopy) was performed using patterned wafers. As a result, a EPD delay time is reduced by a new chamber seasoning and a new wavelength line through plasma scan. Applying a new wavelength of 252 nm makes it successful to call corrected EPD in WSix/poly-Si stack-down gate etching in the DPS+ poly chamber for the current and next generation devices.

• JSTS:Journal of Semiconductor Technology and Science
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• 제13권4호
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• pp.395-401
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• 2013

In-situ optical emission spectroscopy (OES) is employed for leak detection in plasma etching system. A misprocessing is reported for significantly reduced silicon etch rate with chlorine gas, and OES is used as a supplementary sensor to analyze the gas phase species that reside in the process chamber. Potential cause of misprocessing reaches to chamber O-ring wear out, MFC leaks, and/or leak at gas delivery line, and experiments are performed to funnel down the potential of the cause. While monitoring the plasma chemistry of the process chamber using OES, the emission trace for nitrogen species is observed at the chlorine gas supply. No trace of nitrogen species is found in other than chlorine gas supply, and we found that the amount of chlorine gas is slightly fluctuating. We successfully found the root cause of the reported misprocessing which may jeopardize the quality of thin film processing. Based on a quantitative analysis of the amount of nitrogen observed in the chamber, we conclude that the source of the leak is the fitting of the chlorine mass flow controller with the amount of around 2-5 sccm.

• 한국자동차공학회논문집
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• 제5권3호
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• pp.137-146
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• 1997

Spray characteristics of high pressure injectors for diesel engines have been experimentally studied with special emphasis on the effect of swirl. A constant volume chamber was rotated in order to generate a continuous swirl having the flow field of a solid body rotation, resulting in the linear dependance of the swirl number on the rotating speed of the chamber. Emulsified fuel is injected into the chamber and the developing process of fuel sprays is visualized. The fuel spray developing process in D.I. diesel engine was investigated by this liquid injection technique. The effect of swirl on the spray tip penetration is quantified through modelling. Results show that the spray tip penetration is qualitatively different for low and high pressure injections. For high pressure injection case, a good agreement is achieved between the experimental results and the modeling accounting the effect of swirl. For low pressure injection, a reasonable agreement is obtained. It is found that excessive swirl may cause adverse effect on spray dispersion during the initial combustion period since the spray can not be impinged on chamber wall.

• 반도체디스플레이기술학회지
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• 제22권4호
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• pp.72-75
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• 2023

Carbon neutrality has been emerged as important mission for all the manufacturing industry to reduce energy usage and carbon emission equivalent. Korean semiconductor and display manufacturing industries are also in huge interest by minimize the energy usage as well as to find a less global warming product gases in both etch and cleaning. In addition, Korean government is also investing long term research and development plan for the safe environment in various ways. In this paper, we revisit previous research activities on carbon emission equivalent and current research activities performed in semiconductor process diagnosis research center at Myongji University with respect to the reduction of NF3 usage for the PECVD chamber cleaning, and we present the analytical result of the exhaust gas with residual gas analysis in both 6 inches and 12 inches PECVD equipment. The presented result can be a reference study of the development of new substitution gas in near future to compare the cleaning rate of the silicon oxide deposition chamber.

• 한국기계가공학회지
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• 제18권3호
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• pp.33-40
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• 2019

FDM 3D printers have become widespread, and investment in the 3D printer industry is increasing. Therefore, many 3D printers are released and the functions of products are emphasized. However, to lower unit prices, open-type 3D printers are sold in kit form, and their performance is very low. If the 3D printer has many heat sources and is sealed, there is the possibility that the main accessories (the main board, power supply, and motor) will be damaged by trapped heat. At the same time, if the ambient temperature is low due to the properties of the material, the output quality deteriorates. In this study, we analyzed the temperature rise of the main accessories and the quality of the output by the heat bed when a chamber was added to an open-type 3D printer. We also compared the quality of the output due to the air flow with the temperature rise of the main accessories. Moreover, we found the optimal value. As a result of the quality analysis, it was finally confirmed that the case with the chamber at $95^{\circ}C$ was the best for the printing condition. In addition, in the absence of the chamber, the bending of the specimen was found to be large, and in the case of the chamber, the degree of bending was slightly decreased by 0.05 mm.

• 헤리티지:역사와 과학
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• 제42권3호
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• pp.66-87
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• 2009

적석목곽묘는 목곽 외부에 석재를 쌓거나 채운 다음 목개 위에 일정한 두께로 적석하고 점토로 밀봉한 구조이다. 경주 중심부라는 한정된 공간 속에 거의 모든 지배자가 지속적으로 한 묘제를 사용하였다는 점, 타 지역에서 확인되는 적석 형태와 전혀 다르다는 점 등에서 경주식 적석목곽묘로 정의하고자 한다. 적석목곽묘는 경주 중심부에서 5C 전반대부터 축조되기 시작한다. 평면형태, 목곽, 이중곽, 석재충전, 석단, 순장 등은 이전시기의 목곽묘에서 계보를 잇고 있다. 이외에 석축과 목주, 적석, 성토분구는 적석목곽묘의 출현과 함께 새롭게 나타나는 요소이다. 특히 석축과 목주는 황남대총을 비롯한 지상식 초대형분에서만 확인된다. 석축과 목주, 적석은 모두 성토 분구 축조과정 속에서 하나의 공정을 이루고 있다. 석축은 지상에 설치된 목곽의 외벽을 견고하게 유지시켜 주면서 성토 분구의 하중을 분산 수용한다. 목주는 석축의 붕괴를 방지하기 위한 보조장치로서 횡가목, 버팀목 등과 함께 사용되었다. 적석은 일정 크기의 석재를 갖고 일정한 두께로 목개 상부에 덮었다. 그리고 그 위에 점토로 밀봉한 다음 분구를 성토하였다. 적석은 경주지역의 입지적 특성이 반영된 것으로 파악된다. 경주 중심부의 적석목곽묘는 하천부지가 넓고 평탄한 형산강 동안을 따라 분포한다. 기반층은 대부분 모래와 냇돌로 구성되어 있다. 따라서 성토분구는 모래성분을 많이 함유하고 있다. 목개를 횡가한 다음 바로 성토할 경우 유수에 의한 붕괴 가능성 또한 크다. 고분의 외형을 유지하면서 내부구조물의 파괴를 방지하기 위하여 적석과 점토밀봉이 이루어진 것으로 판단된다. 상부의 봉토가 유실되더라도 하부의 적석은 형태를 어느 정도 유지할 것이기 때문이다. 성토분구는 국가 혹은 단위정치체가 성장단계에 진입하면서 나타나는 하나의 특징이다. 국가 출현단계 이후 성장단계에 진입하면서 사회구조에 변화가 나타나고 이와 맞물려 새롭게 출현한 지배등급에서 전대의 목곽묘와는 다른 적석목곽묘를 축조하기 시작한 것으로 판단된다. 이 과정에서 분구를 함께 성토한 것으로 파악되며, 지배등급의 성격에 따라 규모와 구조에서 차이를 보인다. 평면형태, 곽과 석단, 순장자의 수, 유물의 양과 질 등은 지배등급의 사회적 지위를 반영하고 있다. 따라서 적석목곽묘는 신라가 성장단계에 접어든 시점에 전대의 묘제로부터 분화 발전된 양상을 보이면서 나타난것으로 생각된다.

• 분석과학
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• 제19권6호
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• pp.535-543
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• 2006

현재 반도체 및 LCD(Liquid Crystal Display) 제조 공정에 널리 사용하는 $NF_3$는 국제적으로 대기중 배출량에 대한 규제를 실시 중인 온실가스 중의 하나다. 온실가스의 배출량 감축을 위하여 국내 대상 산업체들은 $NF_3$ 배출량의 감소에 지속적으로 노력을 해 오고 있다. 본 연구는 LCD를 제조하는 국내 3사에 설치된 $NF_3$ 처리용 전기가열방식 스크러버(scrubber)의 제거효율(DRE, Destruction and Removal Efficiency)과 process chamber에서의 $NF_3$ 사용 비율(use rate in process)을 측정하였다. 스크러버의 효율을 정확하게 측정하기 위하여, 비활성 기체인 He을 일정 유량으로 주입시켜주는 방법으로 시료를 채취하고, 정밀 가스질량분석기(Gas-MS)를 이용하여 시료 중 화학종들의 분압을 측정하였다. 세 회사에 설치되어 있는 스크러버의 효율을 측정한 결과, 2004년 이전에 설치한 스크러버의와 그 이후 개선한 스크러버의 DRE는 각각 52%와 95% 이상임을 확인하였다. 또한 Process chamber의 $NF_3$ 사용 효율은 1세대 및 2세대 공정라인에 설치한 RFSC(Radio Frequency Source Chamber)의 경우 75% 보다 낮지만, 3세대 이상 라인에 설치한 RPSC(Remote Plasma Source Chamber)의 경우는 95% 이상으로 측정이 되었다. 반도체 및 디스플레이 공정에 개선된 스크러버와 RPSC식 process chamber를 사용할 경우 $NF_3$ 배출량을 99.95% 이상 줄일 수 있을 것으로 예상된다. 따라서 $NF_3$에 대한 국내 3사의 온실가스 감축 목표가 성공적으로 이루어 질 것으로 예상된다.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2006년도 추계학술대회
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• pp.425-428
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• 2006

Recently, Direct Methanol Fuel Cell (DMFC) for portable devices has been received much attention because DMFC has a possibility of higher energy density than electrical batteries and smaller size than other fuel cells. This paper presents the fabrication and test of a thermopneumatic microactuator with a phase change for DMFC. A microactuator consists of an inlet an outlet a chamber, a heater and a sensor of resistance temperature detector(RTD). The micoractuator is fabricated by the spin-coating process, the lithograph process, the deep RIE process and so on. The total size of microactuator is $20{\times}20{\times}0.53mm^3$. When the current is applied, the heater heats liquid in chamber. As a result the liquid vaporizes. The response of temperature in the chamber was measured using thermocouple The changed temperature is $3^{\circ}C$ for 5 sec at 0.032W.

• 한국분무공학회지
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• 제6권1호
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• pp.25-34
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• 2001

Several efforts to meet the exhaust gas regulation have been undertaken by many researchers in recent years. Main researches are on development of design techniques of intake port and combustion chamber, atomisation of fuel and precise control of air-fuel ratio, post-treatment of exhaust gas and so on. Engine technology is changed from PFI to GDI to correspond with exhaust gas regulation. GDI technique makes it possible to preserve lean air-fuel ratio and control accurate air-fuel ratio. Nevertheless, It is not cleared that information of spray characteristics and atomization process are very dependent on fluctuation of pressure and change of temperature in intake stroke. In this study, a constant volume combustion chamber is manufactured to investigate various fluctuations of in-cylinder pressure for injection duration. It is taken photographs of injection process of conventional GDI injector using PMAS. Then, it was verified experimently that ambient conditions as temperature and pressure of combustion chamber have effects on process of spray growth and atomization of fuel.