• 제목/요약/키워드: Pressure dependency

검색결과 164건 처리시간 0.023초

저온 나노임프린트 공정에서 압력과 폴리머 레지스트 초기 두께의 영향 (Effect of Pressure and Initial Polymer Resist Thickness on Low Temperature Nanoimprint Lithography)

  • 김남웅;김국원;신효철
    • 한국공작기계학회논문집
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    • 제18권1호
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    • pp.68-75
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    • 2009
  • A major disadvantage of thermal nanoimprint lithography(NIL) is the thermal cycle, that is, heating over glass transition temperature and then cooling below it, which requires a significant amount of processing time and limits the throughput. One of the methods to overcome this disadvantage is to make the processing temperature lower Accordingly, it is necessary to determine the effects on the processing parameters for thermal NIL at reduced temperatures and to optimize the parameters. This starts with a clear understanding of polymer material behavior during the NIL process. In this work, the squeezing and filling of thin polymer films into nanocavities during the low temperature thermal NIL have been investigated based upon a two-dimensional viscoelastic finite element analysis in order to understand how the process conditions affect a pattern quality; Pressure and initial polymer resist thickness dependency of cavity filling behaviors has been investigated.

산화물기반 박막트랜지스터 전극용 ITO박막의 제작시 투입 산소 분압 의존성 (Dependency of Oxygen Partial Pressure of ITO Films for Electrode of Oxide-based Thin-Film Transistor)

  • 김경환
    • 반도체디스플레이기술학회지
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    • 제20권2호
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    • pp.82-86
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    • 2021
  • In this study, we investigated the oxygen partial pressure effect of ITO films for electrodes of oxide-based Thin-Film Transistor (TFT). Firstly, we deposited single ITO films on the glass substrate at room temperature. ITO films were prepared at the various partial pressures of oxygen gas 0-7.4% (O2/(Ar+O2)). As increasing oxygen on the process of film deposition, electrical properties were improved and optical transmittance increased in the visible light range (300-800 nm). For the electrode of TFT, we fabricated a TFT device (W/L=1000/200 ㎛) with ITO films as the source and drain electrode on the silicon wafer. Except for the TFT device combined with ITO film prepared at the oxygen partial pressure ratio of 7.4%, We confirmed that TFT devices with ITO films via FTS system operated as a driving device at threshold voltage (Vth) of 4V.

암석재료 인장강도의 동적 증가계수 및 변형률 속도 의존성에 대한 실험적 연구 (An Experimental Study on the Dynamic Increase Factor and Strain Rate Dependency of the Tensile Strength of Rock Materials)

  • 오세욱;최병희;민경조;정용복;조상호
    • 화약ㆍ발파
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    • 제39권1호
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    • pp.10-21
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    • 2021
  • 암석이나 콘크리트와 같은 취성재료는 재료에 동하중이 가해질 때에는 큰 변형률속도 의존성을 보인다. 이는 취성재료의 역학적 성질이 하중속도에 따라 크게 변화할 수 있음을 의미한다. 이런 성질 때문에 취성재료의 변형률속도 의존성은 발파공학이나 암석동역학 문제를 풀 때 반드시 고려해야 할 중요한 사항들 중의 하나이다. 하지만 불행하게도 국내의 경우, 암석이나 여타의 취성재료들의 동적물성을 특성화하는 연구들은 아직 미진한 상태에 있다. 본 연구에서는 거창 화강암과 고강도 콘크리트 시편의 동적특성을 파악하기 위해 홉킨슨 압력봉을 이용하여 동적 인장시험을 실시하였다. 시험방법으로는 ISRM이 제안한 동적 압열시험과 박리시험을 채택하였다. 일반적으로, 고변형률속도 하에서는 후자의 방법이 더 우수한 것으로 알려져 있다. 이들 두 종류의 시험을 실시한 결과, 시편들의 동적 인장강도가 거의 비슷하게 나타났다. 하지만 저자들은 애초에 시험방법에 따라 측정강도가 상이할 것으로 예상했었다. 따라서 서로 다른 방법을 적용했음에도 측정 강도가 비슷하게 나타난 것은 오히려 시험과정에서 어떤 오류가 개입된 것으로도 볼 수 있으므로 후속연구를 통해 이 부분에 대해 상세조사를 수행할 예정이다.

인공슬롯을 고려한 수압파쇄 균열의 발전양상에 관한 연구 (The Analysis of Fracture Propagation in Hydraulic Fracturing using Artificial Slot Model)

  • 최성웅;이희근
    • 터널과지하공간
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    • 제5권3호
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    • pp.251-265
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    • 1995
  • One of the most important matters in stress measurement by hydraulic fracturing technique is the determination of the breakdown pressure, reopening pressure, and shut-in pressure, since these values are the basic input data for the calculation of the in-situ stress. The control of the fracture propagation is also important when the hydraulic fracturing technique is applied to the development of groundwater system, geothermal energy, oil, and natural gas. In this study, a laboratory scale hydraulic fracturing device was built and a series of model tests were conducted with cube blocks of Machon gabbro. A new method called 'flatjack method' was adopted to determine shut-in pressure. The initial stress calculated from the shut-in pressure measured by flatjack method showed much higher accuracy than the stress determined by the conventional method. The dependency of the direction of fracture propagation on the state of the initial stresses was measured by introducin g artificial slots in the borehole made by water jet system. Numerical modeling by BEM was also performed to simulate the fracture propagation process. Both results form numerical and laboratory tests showed good agreement. From this study which provides the extensive results on the determination of shut-in pressure and the control of fracture propagation which are the critical issue in the recent hydraulic fracturing, it is conclued that in-situ stress measurement and the control of fracture propagation could be achived more accurately.

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엑사이머 레이져를 이용한 실리콘웨이퍼의 미세가공

  • 윤경구;이성국;황경현
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 1997년도 춘계학술대회 논문집
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    • pp.1058-1062
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    • 1997
  • Development of laser induced chemical etching technologt with KrF laser are carried out in this study for micromachining of silicon wafer. The paper is devoted to experimental identification of excimer laser induced mechanism of silicon under chlorine pressures(0.02~500torr). Experimental results on pulsed KrF excimer laser etching of silicon in chorine atmosphere are presented. Etching rate dependency on laser fluence and chlorine pressure are discussed on the basis of experimental analysis, it is concluded that accurate digital micro machining process of silicon wafer can achieved by KrF laser induced chemical etching technology.

초전도케이블 냉각유로의 열 및 유동 특성 해석 (The thermal & hydraulic analysis of the cooling passage for HTS power cable)

  • 홍용주;염한길;김효봉;고득용
    • 한국초전도저온공학회:학술대회논문집
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    • 한국초전도저온공학회 2003년도 학술대회 논문집
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    • pp.167-170
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    • 2003
  • The thermal and hydraulic characteristics of the cooling passage for HTS power cable should be carefully investigated to get the highly reliable and economic operation. In this study, the pressure drop and temperature change of the coolant flowing the corrugated passage was estimated using the simple one-dimensional approach, and the temperature distribution in the radial direction was calculated. The results show the dependency of the mass flow rate, thermal conductivities on the cooling performance of the HTS cable.

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글로벌 모델에 의한 저온 고밀도 플루오로카본 플라즈마 특성의 공정변수 의존성 해석 (Analysis of Process Parameter dependency on the characteristics of high density fluoro carbon plasma using global model)

  • 이호준;태흥식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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    • pp.879-881
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    • 1999
  • Radical and ion densities in a CF4 plasma have been calculated as a function of input power density. 9as pressure and feed gas flow rate using simple 0 dimensional global model. Fluorine atom is found to be the most abundant neutral particle. Highly fragmented species such as CF and CF+ become dominant neutral and ionic radical at the high power condition. As the pressure increases. ion density increases but ionization rate decreases due to the decrease in electron temperature. The fractional dissociation of CF4 feed gas decreases with pressure after increasing at the low pressure range. Electron density and temperature are almost independent of flow rate within calculation conditions studied. The fractional dissociation of CF4 monotonically decreases with flow rate. which results in increase in CF3 and decrease in CF density. The calculation results show that the SiO2 etch selectivity improvement correlates to the increase in the relative density of fluorocarbon ion and neutral radicals which has high C/F ratio.

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Simulation of Low Temperature Plasmas for an Ultra Violet Light Source using Coplanar Micro Dielectric Barrier Discharges

  • Bae, Hyowon;Lee, Ho-Jun;Lee, Hae June
    • Applied Science and Convergence Technology
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    • 제25권6호
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    • pp.138-144
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    • 2016
  • The discharge characteristics of pulse-driven coplanar micro barrier discharges for an ultraviolet (UV) light source using Ne-Xe mixture have been investigated using a two-dimensional fluid simulation at near-atmospheric pressure. The densities of electrons, the radiative excited states, the metastable excited states, and the power loss are investigated with the variations of gas pressure and the gap distance. With a fixed gap distance, the number of the radiative states $Xe^*(^3P_1)$ increases with the increasing driving voltage, but this number shows weak dependency on the gas when that pressure is over 400 Torr. However, the number of the radiative states increases with the increase of the gap distance at a fixed voltage, while the power loss decreases. Therefore, a long gap discharge has higher efficiency for UV generation than does a short gap discharge. A slight change in the electrode tilt angle enhances the number of radiative species 2 or 3 times with the same operation conditions. Therefore, the intensity and efficiency of the UV light source can be controlled independently by changing the gap distance and the electrode structure.

동공부피 분포의 계산결과에 미치는 표면장력의 곡률 의존도 효과 (Effect of Curvature Dependency of Surface Tension on the Result of Pore-Volume Distribution Analysis)

  • 조창현;안운선;장세헌
    • 대한화학회지
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    • 제16권6호
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    • pp.341-348
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    • 1972
  • 질소의 흡착 등온곡선을 이용하여 흡착체의 동공부피 분포를 계산하는 과정에서 표면장력의 곡률 의존도 고려 효과를 조사하였다. 즉, 장세헌 등에 의한 표면장력의 곡률 의존도식과 캘빈 식으로부터 주어진 압력에서의 캘빈반경을 구하고, 이것으로부터 흡착체의 동공부피 분포를 계산하였다. 이와 같이하여 얻은 계산 결과를 표면장력의 곡률 의존도를 고려하지 아니한 종래방법에 의한 계산 결과와 비교하였다. 일반적으로 곡률 의존도를 고려해주면 동공부피 분포 곡선의 극대부분이 큰 동공 쪽으로 이동한다. 또한 모세관 응축이 일어나는 상대압력이 종래까지 생각했던 것보다 훨씬 낮아지고 있다. 이러한 효과들은 흡착체의 동공들이 미세해 질수록 더욱 현저하게 일어난다.

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