• Title/Summary/Keyword: Precision nano measurement

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Arbitrary Cutting of a single CNT tip in Nanogripper using Electrochemical Etching

  • Lee Junsok;Kwak Yoonkeun;Kim Soohyun
    • International Journal of Precision Engineering and Manufacturing
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    • v.6 no.2
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    • pp.46-49
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    • 2005
  • Recently, many research results have been reported about nano-tip using carbon nanotube because of its better sensing ability compared to a conventional silicon tip. However, it is very difficult to identify the carbon nanotube having proper length for nano-tip and to attach it on a conventional tip. In this paper, a new method is proposed to make a nano-tip and to control its length. The electrochemical etching method was used to control the length by cutting the carbon nanotube of arbitrary length and it was possible to monitor the process through current measurement. The etched volume of carbon nanotube was determined by the amount of applied charge. The carbon nanotube was successfully cut and could be used in the nanogripper.

Mechanical Property Measurement in Nano Imprint Process (나노 임프린트 공정에서의 기계적 물성 측정)

  • 김재현;이학주;최병익;강재윤;오충석
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.6
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    • pp.7-14
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    • 2004
  • 나노 임프린트 기술은 기존의 광학적 리소그라피 (optical lithography) 기술보다 저렴한 비용으로 나노 구조물을 대량으로 제조할 수 있을 것으로 기대되고 있는 기술이다. 현재까지 반도체 공정기술의 주류를 이루고 있는 광학적인 리소그라피 기술은, 100nm이상의 CD(Critical Dimension)를 가지는 구조물들을 정밀하게 제조하여, 미소전자공학 (microelectronics) 소자, MEMS/MEMS, 광학소자 등의 제품들을 대량으로 생산하는 데에 널리 활용되고 있다. 반도체 소자의 고집적화 경향에 따라 100 nm 이하의 CD를 가지는 나노 구조물들을 제조할 필요성이 높아지고 있지만, 광학적인 방법으로는 광원의 파장보다 작은 구조물들을 제조하기가 어렵다. 보다 짧은 파장을 가지는 광원을 이용하는 리소그라피 장비가 계속적으로 개발되고 있으나, 그에 따른 장비 비용 및 제조 단가가 기하급수적으로 증가하고 있다.(중략)

A Study on the Dynamic Design of Anti-Vibration Structures for Nano-class Measuring System (나노 측정시스템을 위한 방진 구조물의 동적 설계에 관한 연구)

  • 전종균;김강부;백재호
    • Journal of the Semiconductor & Display Technology
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    • v.2 no.3
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    • pp.37-43
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    • 2003
  • It is necessary to design the anti-vibration system of precision machinery for a quality assurance. However, in general, the allowable vibration limit is not well known. In this paper, the vibration criteria for foundation of sensitive machinery is proposed and anti-vibration system is designed by using vibration measurement results of foundation. Also, the finite element analysis is performed to verify the effectiveness of the designed anti-vibration system and to determine the allowable dynamic loads of precision measuring system. The results of this study will be helpful for the future design of anti-vibration structures with nano scale measuring system.

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Study of Dual Servo System for Measurement System of Mechanical Property (재료의 기계적 물성측정 시험장치를 위한 이중서보 시스템에 관한 연구)

  • 최현석;송치우;한창수;이형욱;최태훈;이낙규;나경환
    • Journal of the Semiconductor & Display Technology
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    • v.2 no.2
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    • pp.31-37
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    • 2003
  • This paper presents a measurement system of mechanical property using dual servo system. There are many kinds of method to measure material properties such as tensile test, indention and bending test. It is highly required to measure the properties of nano-sized material and structure. However, It is need more accurate measurement system, more stable and frequency response than conventional test. In this paper, we designed the dual servo system for a measuring instrument The dual servo system consisting of a coarse stage and a fine motion stage with VCM and PZT is proposed. Mechanical mechanism is designed with the leaf spring type of flexure hinge joint. Lead compensator is applied to this control system, and is designed by PQ method.

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Measurement of Grating Pitch Standards using Optical Diffractometry and Uncertainty Analysis (광 회절계를 이용한 격자 피치 표준 시편의 측정 및 불확도 해석)

  • Kim Jong-Ahn;Kim Jae-Wan;Park Byong-Chon;Kang Chu-Shik;Eom Tae-Bong
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.8 s.185
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    • pp.72-79
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    • 2006
  • We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.

Measurement of Tensile Properties for Carbon Nano Tubes Using Nano Force Sensor (나노 힘 센서를 이용한 탄소나노튜브 인장물성 측정)

  • Nahm Seung-Hoon;Baek Un-Bong;Park Jong-Seo;Lee Yun-Hee;Kwon Sung-Hwan;Kim Am-Kee
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.73-76
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    • 2005
  • Carbon nanotubes (CNTs) have attracted an increasing attention due to their superior mechanical properties and potential application in industries. The strength of CNT has been predicted or calculated through several simulation techniques but actual experiments on stress-strain behavior are rare due to its dimensional limit, nanoscale positioning/manipulation, and instrumental resolution. We have attempted to observe straining responses of a multi-walled carbon nanotube (MWNT) by performing an in-situ tensile testing in a scanning electron microscope. The carbon nanotube, having its both ends attached on a cantilever force sensor and Y-shaped support, was elongated by a computer-controlled nanomanipulator. Linear deformation and fracture behaviors of MWNT were successfully observed and its force-displacement curve was also measured from the bending stiffness and displacement of the force sensor and manipulator.

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Pitch Measurement of One-dimensional Gratings Using a Metrological Atomic Force Microscope and Uncertainty Evaluation (미터 소급성을 갖는 원자간력 현미경을 이용한 1차원 격자 피치 측정과 불확도 평가)

  • Kim Jong-Ahn;Kim Jae Wan;Park Byong Chon;Eom Tae Bong;Kang Chu-Shik
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.4
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    • pp.84-91
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    • 2005
  • We measured the pitch of one-dimensional (ID) grating specimens using a metrological atomic force microscope (M-AFM). The ID grating specimens a.e often used as a magnification standard in nano-metrology, such as scanning probe microscopy (SPM) and scanning electron microscopy (SEM). Thus, we need to certify the pitch of grating specimens fur the meter-traceability in nano-metrology. To this end, an M-AFM was setup at KRISS. The M-AFM consists of a commercial AFM head module, a two-axis flexure hinge type nanoscanner with built-in capacitive sensors, and a two-axis heterodyne interferometer to establish the meter-traceability directly. Two kinds of ID grating specimens, each with the nominal pitch of 288 nm and 700 nm, were measured. The uncertainty in pitch measurement was evaluated according to Guide to the Expression of Uncertainty in Measurement. The pitch was calculated from 9 line scan profiles obtained at different positions with 100 ㎛ scan range. The expanded uncertainties (k = 2) in pitch measurement were 0.10 nm and 0.30 nm for the specimens with the nominal pitch of 288 nm and 700 nm. The measured pitch values were compared with those obtained using an optical diffractometer, and agreed within the range of the expanded uncertainty of pitch measurement. We also discussed the effect of averaging in the measurement of mean pitch using M-AFM and main components of uncertainty.

Nanometrological Application of X-ray Interferometry (엑스선 간섭계를 이용한 초정밀측정)

  • 엄천일
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.6
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    • pp.40-45
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    • 2000
  • 교정은 모든 측정분야에서 어렵고 까다로운 주제인데, 특히 정전센서, 레이저간섭계, AFM, STM 등을 포함하는 나노메트롤로지(nanometrology : 나노측정) 분야에서는 그러하다. 나노측정에서는 전체 측정범위가 센서들의 한계분해능 값과 비슷한데, 이러한 측정에서 높은 소급성을 유지하기는 매우 어렵기 때문이다.(중략)

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