• 제목/요약/키워드: Polymeric waveguide

검색결과 44건 처리시간 0.018초

고굴절률 불화폴리이미드를 이용한 광도파로 위상변조기 제작 및 특성 분석 (Optical-waveguide Phase Modulators Based on High-refractive-index Fluorinated Polyimide)

  • 이은수;천권욱;진진웅;오민철
    • 한국광학회지
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    • 제32권4호
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    • pp.180-186
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    • 2021
  • 불화폴리이미드는 우수한 광투과율과 광학적 굴절률이 높은 특징을 가지며 이를 이용하여 제작된 폴리머 광도파로 위상변조기는 광손실이 작고 저전력으로 안정적인 위상제어가 가능하게 된다. 본 논문에서는 고굴절률 불화폴리이미드를 이용하여 광도파로 위상변조기를 설계하고 제작하여 특성을 분석하였다. 광도파로를 제작하여 손실을 측정하기에 효율적인 새로운 방법을 제시하였고, 제작된 폴리이미드 광도파로의 전파손실은 0.9 dB/cm로 확인되었다. 위상변조기는 π 위상변화를 위해 9.1 mW의 전력을 필요로 하였으며, 기존 폴리머 위상변조기 대비 응답속도가 10배 정도 향상된 290 μs 정도의 응답시간을 가지는 것을 확인하였다.

3차원 광연결용 수직방향 광도파로 열광학 스위치 (Vertically Integrated Waveguide Thermo-Optic Switch for Three-Dimensional Optical Interconnection)

  • 김기홍;신상영;최두선
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2002년도 추계학술대회 논문집
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    • pp.111-114
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    • 2002
  • We propose and fabricate a vertically integrated waveguide thermo-optic switch. It controls the optical path between two vertically stacked waveguide. As a first step, we fabricate polymeric waveguides. The measured propagation loss is ranged from 0.3 db/cm to 0.4 dB/cm at the wavelength of 1.55 $\mu\textrm{m}$. We fabricate the proposed vertically integrated waveguide thermo-optic switch to demonstrate its preliminary feasibility. The measured crosstalk is better than -10 db. The power consumption is about 500 mW. Further effort is necessary to improve its performance.

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폴리머 광도파로열을 이용한 파장 분할 다중화기의 제작 (Fabrication of a wavelength division multiplexer based on the polymeric arrayed-waveguide grating)

  • 오태원;이원영;신상영
    • 전자공학회논문지D
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    • 제34D권11호
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    • pp.70-75
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    • 1997
  • a wavelength division multiplexer based on a polymeric arrayed-waveguide grating has been designed and fabricated. A 4-channel multiplexer with a spacing of 3.2 nm is designe dby using te 2-dimensional beam propagation method. A UV-curable epoxy, NOA73, is used for the core layer, and a passive polymer, PMMA, for the cladding layer. The polymer waveguides are fabricated by the reactive ion etching method and their optical properties are characterized. The fabricted device has a center wavelength of 1548.3 nm, and the wavelength spacing between the channels is 3.2nm. The measured crosstalk is better than -18dB.

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나노 임프린트 기술을 이용한 폴리머 도파로 기반의 브래그 격자형 파장 필터 (Polymeric Wavelength Filter Based on a Bragg Grating Using Nanoimprint Technique)

  • 안세원;이기동;김도환;진원준;이상신
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권5호
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    • pp.267-271
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    • 2006
  • A polymeric waveguide-type wavelength filter based on a Bragg grating has been proposed and fabricated using the simple nanoimpring technique, for the first time to our knowledge. An ultraviolet transparent stamp with the single-mode waveguide pattern incorporating a surface-relief-type Bragg grating was specially designed selective dry-etching process. Using this stamp, the device fabrication was substantially involving just a single-step process of imprint followed by polymer spin-coating. The achieved maximum reflection was higher than 25 dB at the center wavelength of 1569 nm. And the 3-dB bandwidth was 0.8 nm for the device length of 1.5 cm.

Hot Embossing기술을 이용한 병렬 광접속용 고분자 광도파로 제작 (Fabrication of polymeric optical waveguides for parallel optical interconnection using hot embossing technique)

  • 최춘기;김병철;한상필;안승호;정명영
    • 한국광학회지
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    • 제13권3호
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    • pp.223-227
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    • 2002
  • 병렬 광접속용 다중모드 고분자 광도파로를 제작하였으며, 도파로 구조는 LIGA 공정에 의해 제작된 니켈 성형 마스터에 의해 hot embossing기술을 이용하여 성형하였다. 도파로 크기가 48$\times$47$\mu\textrm{m}$$^{2}$인 다중모드 광도파로를 단순 2단계 공정에 의해 제작하였으며, 0.85$\mu\textrm{m}$과 1.3$\mu\textrm{m}$ 파장대역에서 측정한 다중모드 광도파로의 도파손실은 각각 0.38dB/cm와 0.66dB/cm이었다.

광표백으로 유기되는 복굴절을 이용한 전기광학 폴리머 광도파로 편광기의 제작 (Fabrication of integrated optical waveguide polarizer by utilizing the birefringence induced by photobleaching in an electro-optic polymer)

  • 안세원;이상신;신상영
    • 전자공학회논문지D
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    • 제34D권4호
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    • pp.73-78
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    • 1997
  • A polymeric waveguide TE-pass polarier operating at wavelengths around 1.55.mu.m is realized by utilizing the birefringence induced by photoleaching at room temperature. To implement the polarizer, the photobleached waveguide supporting only TE mode is integrated in the middle of the etched rib waveguide that supports TE and TM modes. It has a simple structure and requires no high temperature process like poling. The measured polarization extinction ratio is about 21dB and the estimted excess loss is about 0.4dB.

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Polymeric Waveguides with Bragg Gratings in the Middle of the Core Layer

  • Jeong, In-Soek;Park, Hae-Ryeong;Lee, Sang-Won;Lee, Myung-Hyun
    • Journal of the Optical Society of Korea
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    • 제13권2호
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    • pp.294-298
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    • 2009
  • In this paper we proposed a new Bragg grating waveguide in order to improve reflectivity and to achieve compactness. Bragg gratings with various thicknesses were engraved in the middle of the core layer with a length of 3 mm. For the sake of cost-effectiveness, the $3^{rd}$ order Bragg grating waveguides were fabricated via conventional photolithography. The maximum reflectivities for the fixed width waveguide of $6{\mu}m$ with the 0.1 and $0.3{\mu}m$-thick Bragg gratings were, -13.14 and -6.25 dB, respectively, and the Bragg wavelengths were 1562.28, 1564.10 nm, respectively. A slight increase in the Bragg grating thickness can result in a remarkable reduction in the length of the Bragg grating waveguide with a fixed reflectivity.

InP 광도파로의 식각 특성 (Fabrication and Characteristics of InP-Waveguide)

  • 박순룡;김진우;오범환;우덕하;김선호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.824-827
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    • 2000
  • Fabrication of InP-based photonic devices by dry etch Process is important for clear formation of waveguide mesa structure. We have developed more efficient etch process of the inductively coupled plasma (ICP) with low damages and less polymeric deposits for the InP-based photonic devices than the reactive ion etching (RIE) technique. We report the tendency of etch rate variation by the process parameters of the RF power, pressure, gas flow rate, and the gas mixing ratio. The surface roughness of InP-based waveguide structure was more improved by the light wet etching in the mixed solution of H$_2$SO$_4$:H$_2$O (1:1)

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나노임프린트 방법을 이용한 폴리머 광도파로 열 격자 (Polymeric Arrayed Waveguide Grating Based on Nanoimprint Technique Using a PDMS Stamp)

  • 임정규;이상신;이기동
    • 한국광학회지
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    • 제17권4호
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    • pp.317-322
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    • 2006
  • 본 논문에서는 폴리머 광도파로 열 격자(arrayed waveguide grating: AWG)를 나노임프린트 방법을 이용하여 제안하고 구현하였다. 빔전파방법을 도입하여 소자를 설계하고 해석하였다. 균일한 접착 및 분리 특성을 갖는 임프린트용 PDMS(polydimethylsiloxane) 스탬프(stamp)를 쿼츠 글래스 물질로 만들어진 마스터 몰드를 이용하여 개발하였다. 이 PDMS 스탬프로 폴리머층을 눌러서 소자 패턴을 형성하고 폴리머를 스핀코팅하여 소자를 완성하였다. 이러한 소자는 식각공정 없이 간단한 스핀코팅과 임프린트 공정만으로 만들어지기 때문에 대량 생산에 적합할 것이다. 제작된 폴리머 AWG 소자의 출력 채널 수는 8개, 채널 간격은 0.8nm, 각 채널의 중심파장은 1543.7nm $\sim$ 1548.3nm 였다. 평균적인 채널 누화와 대역폭은 각각 $\sim$10dB와 0.8nm였다.