• Title/Summary/Keyword: Poly silicon/nitride etch stop

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Design and Fabrication of CMOS Micro Humidity Sensor System (CMOS 마이크로 습도센서 시스템의 설계 및 제작)

  • Lee, Ji-Gong;Lee, Sang-Hoon;Lee, Sung-Pil
    • Journal of the Institute of Convergence Signal Processing
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    • v.9 no.2
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    • pp.146-153
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    • 2008
  • Integrated humidity sensor system with two stages operational amplifier has been designed and fabricated by $0.8{\mu}m$ analog mixed CMOS technology. The system (28 pin and $2mm{\times}4mm$) consisted of Wheatstone-bridge type humidity sensor, resistive type humidity sensor, temperature sensors and operational amplifier for signal amplification and process in one chip. The poly-nitride etch stop process has been tried to form the sensing area as well as trench in a standard CMOS process. This modified technique did not affect the CMOS devices in their essential characteristics and gave an allowance to fabricate the system on same chip by standard process. The operational amplifier showed the stable operation so that unity gain bandwidth was more than 5.46 MHz and slew rate was more than 10 V/uS, respectively. The drain current of n-channel humidity sensitive field effect transistor (HUSFET) increased from 0.54 mA to 0.68 mA as the relative humidity increased from 10 to 70 %RH.

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