• 제목/요약/키워드: Polishing machine

검색결과 219건 처리시간 0.027초

Ultrasonically Assisted Grinding for Mirror Surface Finishing of Dies with Electroplated Diamond Tools

  • Isobe, Hiromi;Hara, Keisuke;Kyusojin, Akira;Okada, Manabu;Yoshihara, Hideo
    • International Journal of Precision Engineering and Manufacturing
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    • 제8권2호
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    • pp.38-43
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    • 2007
  • This paper describes ultrasonically assisted grinding used to obtain a glossy surface quickly and precisely. High-quality surfaces are required for plastic injection molding dies used in the production of plastic parts such as dials for cellular phones. Traditionally, in order to finish the dies, manual polishing by a skilled worker has been required after the machining processes, such as electro discharge machining (EDM), which leaves an affected layer, and milling, which leaves tooling marks. However, manual polishing causes detrimental geometrical deviations of the die and consumes several days to finish a die surface. Therefore, a machining process for finishing dies without manual polishing to improve the surface roughness and form accuracy would be extremely valuable. In this study, a 3D positioning machine equipped with an ultrasonic spindle was used to conduct grinding experiments. An electroplated diamond tool was used for these experiments. Generally, diamond tools cannot grind steel because of excessive wear as a result of carbon atoms diffusing into bulk steel and chips. However, ultrasonically assisted grinding can achieve a fine surface (roughness Rz of $0.4{\mu}m$) on die steel without severe tool wear. The final aim of this study is to realize mirror surface grinding for injection molding dies without manual polishing. To do this, it is necessary to fabricate an electroplated diamond tool with high form accuracy and low run-out. This paper describes a tool-making method for high precision grinding and the grinding performance of a self-electroplated tool. The ground surface textures, tool performance and tool life were investigated A ground surface roughness Rz of 0.14 um was achieved Our results show that the spindle speed, feed rate and cross feed affected the surface texture. One tool could finish $5000mm^2$ of die steel surface without any deterioration of the ground surface roughness.

구경 1 m 정밀 비구면 연마기 제작 (Fabrication of a Polishing Machine for 1 m Diameter Aspheric Surface)

  • 이원용;임동건;이재협;이회윤;송재봉;이윤우;이인원
    • 한국광학회:학술대회논문집
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    • 한국광학회 2002년도 하계학술발표회
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    • pp.36-37
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    • 2002
  • 위성용 천문 망원경의 개발에 있어 광학계는 대구경화되고 회절한계능의 품질이 요구되고 있다. 한국표준과학연구원에서는 위성용 카메라를 위한 지름 1 m 의 비구면 거울의 제작기술을 확보하고자 하는 연구가 진행 중이다. 현재 지름 600 mm 의 비구면 연마기를 확보하여 테스트 중에 있으며, 지름 1m 비구면 가공을 위한 연마기를 제작 중에 있다. 비구면 가공을 위해서는 측정기술 또한 중요하다. (중략)

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사파이어의 초정밀 연삭 특성 연구 (A Study on the Characteristics of Ultra-Precision Grinding far Sapphires)

  • 김우순;김동현;난바의치
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2003년도 춘계학술대회 논문집
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    • pp.422-427
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    • 2003
  • Sapphire have been ground by the ultra-precision surface grinder having a glass -ceramic spindle of extremely-low thermal expansion with various cup-type resinoid-bonded diamond wheels of #400-#3000 in grain size. Sapphire can be ground in the ductile mode. And also, the surface roughness and grinding conditions has been clarified. The smooth surface of Sapphire less than 1nm RMS, 1nm Ra can be obtained by the ultra-precision grinding without any polishing Process.

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점 전극을 이용한 전해연마법의 제안 (A proposal of the electrochemical polishing method using the point electrode tools)

  • 이승훈
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 1998년도 추계학술대회 논문집
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    • pp.48-53
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    • 1998
  • In this paper, the new electrochemical machining method is proposed for the micro unit fabrication by using the point electrode tools. The precision shape control capacity is improved by using the point electrode method. It was observed that an electric discharge phenomenon occurs during the electrochemical machining process by using the spraying and torrent type electrolyte supply method.

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로렌츠원리에 의한 초정밀 전해연마 특성에 관한 연구 (Study on the Characteristics of Precision Electrochemical Polishing by Using Lorentz's Principle)

  • 김정두
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 1995년도 추계학술대회 논문집
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    • pp.82-85
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    • 1995
  • Magnetic-electrolytic-abrasive polishign(MEAP) systemwas newly developed and the finishing characteristics of Cr-coated roller was analyzed. The paper describes the operational principle of MEAP system and magnetic field effect on the MEAP process by experimental results. The finishing characteristics and optimal finishing condition for Cr-coated roller were experimented and analyzed.

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보정 가공 프로그램을 활용한 비구면 형상정밀도 향상에 관한 연구 (The Performance Improvement of the Aspheric Form Accuracy by Compensation Machining Program)

  • 박요창;양순철;김건희;이영호
    • 한국기계가공학회지
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    • 제4권2호
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    • pp.10-15
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    • 2005
  • For the development of compensation machining program, ultra precision grinding used in ultra precision machine and corrective machining was studied. We explored a new rough grinding technique on optical material such as zerodur. The facility used is a polishing machine with a custom grinding module and a range of diamond resin bond wheel. Surface roughness and form accuracy are measured by surface measurement equipment(Form Talysurf series2). Our compensation machining program has complied with a target of producing surface roughness better than $0.05{\mu}m$ Ra and form accuracy of around $0.05{\mu}m$ Rt and has been unveiled as a work-hour model.

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선박외벽용 작업을 위한 연마장비 힘제어 (Force Control of Robotic Vacuum Sweeping Machine for Shipment)

  • 진태석
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2013년도 춘계학술대회
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    • pp.509-512
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    • 2013
  • 본 논문은 산업용 로봇을 위한 힘 피드백 제어는 사람의 감각을 기반으로 한 작업을 대체하여 구현하기에 적합한 연마 시스템을 제안하였다. 기존 연마작업의 표면 연마, 비드처리, 기계 가공 디버링 등의 공정은 그 복잡성에서 자동화가 가장 곤란하다고 인식되어 주로 인력에 의존 해왔다. 본 연구는 연마 공구를 파지시킨 힘 제어 로봇에 의한 자동 연마 시스템의 구축을 위한 다축로봇 기반의 힘 센서로부터 신호 피드백 제어 방식의 특성을 파악하고 연마 공정에 적응성을 검증했다.

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반도체 CMP 공정용 리테이너 링 재생을 위한 본딩 디스펜서 및 프레스 머신 개발 (Development of Bonding Dispenser and Press Machine to Regenerate Retainer Ring for Semiconductor CMP Process)

  • 박형근
    • 한국전자통신학회논문지
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    • 제19권3호
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    • pp.507-514
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    • 2024
  • 반도체 제조 라인에서는 생산 제품의 원가절감을 위해 지속적인 노력을 기울이고 있고, 화학적 기계적 연마(CMP) 공정에서도 이에 대한 요구가 점점 가속화되고 있으며, 이러한 원가 절감 항목 중 대표적인 것이 5-Zone 링이다. CMP 공정에서 약 150시간을 사용하면 링의 두께가 1mm 미만으로 감소되어 새제품으로 교체해야 한다. 반도체 제조 라인에서는 생산 제품의 원가절감을 위해 지속적인 노력을 기울이고 있고, 화학적 기계적 연마(CMP) 공정에서도 이에 대한 요구가 점점 가속화되고 있으며, 이러한 원가 절감 항목 중 대표적인 것이 5-Zone 링이다. CMP 공정에서 약 150시간을 사용하면 링의 두께가 1mm 미만으로 감소되어 새제품으로 교체해야 한다. 따라서 본 연구에서는 리테이너 링의 마모된 부분을 반복 재생하여 반도체 제조 원가를 낮추며, 산업용 폐기물 처리에 따른 환경 오염을 최소화하기 위해 10g±0.8% 이하의 토출량 오차와 ±1.8% 이하의 압력 균일도를 갖는 본딩 디스펜서 및 프레스 머신을 개발하였다.

Statistical Qualitative Analysis on Chemical Mechanical Polishing Process and Equipment Characterization

  • Hong, Sang-Jeen;Hwang, Jong-Ha;Seo, Dong-Sun
    • Transactions on Electrical and Electronic Materials
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    • 제12권2호
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    • pp.56-59
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    • 2011
  • The characterization of the chemical mechanical polishing (CMP) process for undensified phophosilicate glass (PSG) film is reported using design of experiments (DOE). DOE has been used by experimenters to understand the relationship between the input variables and responses of interest in a simple and efficient way, and it typically is beneficial for determining the appropriatesize of experiments with multiple process variables and making statistical inferences for the responses of interest. The equipment controllable parameters used to operate the machine consist of the down force of the wafer carrier, pressure on the back side wafer, table and spindle speeds (SS), slurry flow (SF) rate, pad condition, etc. None of these are independent ofeach other and, thus, the interaction between the parameters also needs to be understoodfor improved process characterization in CMP. In this study, we selected the five controllable equipment parameters the most recommendedby process engineers, viz. the down force (DF), back pressure (BP), table speed (TS), SS, and SF, for the characterization of the CMP process with respect to the material removal rate and film uniformity in percentage terms. The polished material is undensified PSG which is widely used for the plananization of multi-layered metal interconnects. By statistical modeling and the analysis of the metrology data acquired from a series of $2^{5-1}$ fractional factorial designs with two center points, we showed that the DF, BP and TS have the greatest effect on both the removal rate and film uniformity, as expected. It is revealed that the film uniformity of the polished PSG film contains two and three-way interactions. Therefore, one can easily infer that process control based on a better understanding of the process is the key to success in current semiconductor manufacturing, in which the size of the wafer is approaching 300 mm and is scheduled to continuously increase up to 450 mm in or slightly after 2012.

The effect of alumina and aluminium nitride coating by reactive magnetron sputtering on the resin bond strength to zirconia core

  • Kulunk, Tolga;Kulunk, Safak;Baba, Seniha;Ozturk, Ozgur;Danisman, Sengul;Savas, Soner
    • The Journal of Advanced Prosthodontics
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    • 제5권4호
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    • pp.382-387
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    • 2013
  • PURPOSE. Although several surface treatments have been recently investigated both under in vitro and in vivo conditions, controversy still exists regarding the selection of the most appropriate zirconia surface pre-treatment. The purpose of this study was to evaluate the effect of alumina (Al) and aluminium nitride (AlN) coating on the shear bond strength of adhesive resin cement to zirconia core. MATERIALS AND METHODS. Fifty zirconia core discs were divided into 5 groups; air particle abrasion with 50 ${\mu}m$ aluminum oxide particles ($Al_2O_3$), polishing + Al coating, polishing + AlN coating, air particle abrasion with 50 ${\mu}m$ $Al_2O_3$ + Al coating and air particle abrasion with 50 ${\mu}m$ $Al_2O_3$ + AlN coating. Composite resin discs were cemented to each of specimens. Shear bond strength (MPa) was measured using a universal testing machine. The effects of the surface preparations on each specimen were examined with scanning electron microscope (SEM). Data were statistically analyzed by one-way ANOVA (${\alpha}$=.05). RESULTS. The highest bond strengths were obtained by air abrasion with 50 ${\mu}m$ $Al_2O_3$, the lowest bond strengths were obtained in polishing + Al coating group (P<.05). CONCLUSION. Al and AlN coatings using the reactive magnetron sputtering technique were found to be ineffective to increase the bond strength of adhesive resin cement to zirconia core.