• 제목/요약/키워드: Plasma propagation

검색결과 129건 처리시간 0.027초

주조용 알루미늄 합금의 $Al_2O_3-40%TiO_2$ 용사층에 대한 마멸특성 평가 (Evaluation of Wear Chracteristics for $Al_2O_3-40%TiO_2$Sprayed on Casted Aluminum Alloy)

  • 채영훈;김석삼
    • Tribology and Lubricants
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    • 제15권1호
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    • pp.39-45
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    • 1999
  • The wear behavior of $Al_2$O$_3$-40%TiO$_2$deposited on casted aluminum alloy (ASTM A356) by APS (Air Plasma Spray) against SiC ball has been investigated in this work. Wear tests were carried out at room temperature. The friction coefficient of $Al_2$O$_3$-40%TiO$_2$coating is lower than that of pure $Al_2$O$_3$coating(APS). $Al_2$O$_3$-40%TiO$_2$coating indicated the existence of the optimal coating thickness. It is found that voids and pores of coating surface resulted in the generation of cracks, and the cohesive of splats and the porosity of surface play a role in wear characteristics. It is suggested that the mismatch of thermal expansion of substrate and coating play an important role in wear performance. Tension and compression under thermo-mechanical stress may be occurred by the mismatch between thermal expansion of substrate and coating. The crack propagation above interface is observed in SEM.

공기-플라즈마 방전 시스템에서 화학적 활성종의 생성에 대한 연구 (Study on the Generation of Chemically Active Species using Air-plasma Discharging System)

  • 김동석;박영식
    • 한국물환경학회지
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    • 제28권3호
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    • pp.401-408
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    • 2012
  • High-voltage dielectric discharges are an emerging technique in environmental pollutant degradation, which that are characterized by the production of hydroxyl radicals as the primary degradation species. The initiation and propagation of the electrical discharges depends on several physical, chemical, and electrical parameters such as 1st and 2nd voltage of power, gas supply, conductivity and pH. These parameters also influence the physical and chemical characteristics of the discharges, including the production of reactive species such as OH, $H_2O_2$ and $O_3$. The experimental results showed that the optimum 1st voltage and air flow rate for RNO (N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical) degradation were 160 V (2nd voltage of is 15 kV) and 4 L/min, respectively. As the increased of the 2nd voltage (4 kV to 15 kV), RNO degradation, $H_2O_2$ and $O_3$ generation were increased. The conductivity of the solution was not influencing the RNO degradation and $H_2O_2$ and $O_3$ generation. The effects pH was not high on RNO degradation. However, the lower pH and the conductivity, the higher $H_2O_2$ and $O_3$ generation were observed.

The Effect of Density Gradient on the Self-modulated Laser Wakefield Acceleration with Relativistic and Kinetic Effects

  • Yoo, Seung-Hoon;Kim, Jae-Hoon;Kim, Jong-Uk;Seo, Ju-Tae;Hahn, Sang-June
    • Journal of the Optical Society of Korea
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    • 제13권1호
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    • pp.42-47
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    • 2009
  • The propagation of an intense laser pulse through an upward density-gradient plasma in a self-modulated laser wakefield acceleration (SM-LWFA) is investigated by using particle-in-cell (PIC) simulations. In the fully relativistic and kinetic PIC simulations, the relativistic and kinetic effects including Landau damping enhance the electron dephasing. This electron dephasing is the most important factor for limiting the energy of accelerated electrons. However, the electron dephasing, which is enhanced by relativistic and kinetic effects in the homogeneous plasma, can be forestalled through the detuning process arising from the longitudinal density gradient. Simulation results show that the detuning process can effectively maintain the coherence of the laser wake wave in the spatiotemporal wakefield pattern, hence considerable energy enhancement is achievable. The spatiotemporal profiles are analyzed for the detailed study on the relativistic and kinetic effects. In this paper, the optimum slope of the density gradient for increasing electron energy is presented for various laser intensities.

Modeling the Properties of the PECVD Silicon Dioxide Films Using Polynomial Neural Networks

  • Han, Seung-Soo;Song, Kyung-Bin
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 1998년도 제13차 학술회의논문집
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    • pp.195-200
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    • 1998
  • Since the neural network was introduced, significant progress has been made on data handling and learning algorithms. Currently, the most popular learning algorithm in neural network training is feed forward error back-propagation (FFEBP) algorithm. Aside from the success of the FFEBP algorithm, polynomial neural networks (PNN) learning has been proposed as a new learning method. The PNN learning is a self-organizing process designed to determine an appropriate set of Ivakhnenko polynomials that allow the activation of many neurons to achieve a desired state of activation that mimics a given set of sampled patterns. These neurons are interconnected in such a way that the knowledge is stored in Ivakhnenko coefficients. In this paper, the PNN model has been developed using the plasma enhanced chemical vapor deposition (PECVD) experimental data. To characterize the PECVD process using PNN, SiO$_2$films deposited under varying conditions were analyzed using fractional factorial experimental design with three center points. Parameters varied in these experiments included substrate temperature, pressure, RF power, silane flow rate and nitrous oxide flow rate. Approximately five microns of SiO$_2$were deposited on (100) silicon wafers in a Plasma-Therm 700 series PECVD system at 13.56 MHz.

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Role of Ca in Modifying Corrosion Resistance and Bioactivity of Plasma Anodized AM60 Magnesium Alloys

  • Anawati, Anawati;Asoh, Hidetaka;Ono, Sachiko
    • Corrosion Science and Technology
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    • 제15권3호
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    • pp.120-124
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    • 2016
  • The effect of alloying element Ca (0, 1, and 2 wt%) on corrosion resistance and bioactivity of the as-received and anodized surface of rolled plate AM60 alloys was investigated. A plasma electrolytic oxidation (PEO) was carried out to form anodic oxide film in $0.5mol\;dm^{-3}\;Na_3PO_4$ solution. The corrosion behavior was studied by polarization measurements while the in vitro bioactivity was tested by soaking the specimens in Simulated Body Fluid (1.5xSBF). Optical micrograph and elemental analysis of the substrate surfaces indicated that the number of intermetallic particles increased with Ca content in the alloys owing to the formation of a new phase $Al_2Ca$. The corrosion resistance of AM60 specimens improved only slightly by alloying with 2 wt% Ca which was attributed to the reticular distribution of $Al_2Ca$ phase existed in the alloy that might became barrier for corrosion propagation across grain boundaries. Corrosion resistance of the three alloys was significantly improved by coating the substrates with anodic oxide film formed by PEO. The film mainly composed of magnesium phosphate with thickness in the range $30-40{\mu}m$. The heat resistant phase of $Al_2Ca$ was believed to retard the plasma discharge during anodization and, hence, decreased the film thickness of Ca-containing alloys. The highest apatite forming ability in 1.5xSBF was observed for AM60-1Ca specimens (both substrate and anodized) that exhibited more degradation than the other two alloys as indicated by surface observation. The increase of surface roughness and the degree of supersaturation of 1.5xSBF due to dissolution of Mg ions from the substrate surface or the release of film compounds from the anodized surface are important factors to enhance deposition of Ca-P compound on the specimen surfaces.

Etching characteristics of Al-Nd alloy thin films using magnetized inductively coupled plasma

  • Lee, Y.J.;Han, H.R.;Yeom, G.Y.
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 1999년도 추계학술발표회 초록집
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    • pp.56-56
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    • 1999
  • For advanced TFT-LCD manufacturing processes, dry etching of thin-film layers(a-Si, $SiN_x$, SID & gate electrodes, ITO etc.) is increasingly preferred instead of conventional wet etching processes. To dry etch Al gate electrode which is advantageous for reducing propagation delay time of scan signals, high etch rate, slope angle control, and etch uniformity are required. For the Al gate electrode, some metals such as Ti and Nd are added in Al to prevent hillocks during post-annealing processes in addition to gaining low-resistivity($<10u{\Omega}{\cdot}cm$), high performance to heat tolerance and corrosion tolerance of Al thin films. In the case of AI-Nd alloy films, however, low etch rate and poor selectivity over photoresist are remained as a problem. In this study, to enhance the etch rates together with etch uniformity of AI-Nd alloys, magnetized inductively coupled plasma(MICP) have been used instead of conventional ICP and the effects of various magnets and processes conditions have been studied. MICP was consisted of fourteen pairs of permanent magnets arranged along the inside of chamber wall and also a Helmholtz type axial electromagnets was located outside the chamber. Gas combinations of $Cl_2,{\;}BCl_3$, and HBr were used with pressures between 5mTorr and 30mTorr, rf-bias voltages from -50Vto -200V, and inductive powers from 400W to 800W. In the case of $Cl_2/BCl_3$ plasma chemistry, the etch rate of AI-Nd films and etch selectivity over photoresist increased with $BCl_3$ rich etch chemistries for both with and without the magnets. The highest etch rate of $1,000{\AA}/min$, however, could be obtained with the magnets(both the multi-dipole magnets and the electromagnets). Under an optimized electromagnetic strength, etch uniformity of less than 5% also could be obtained under the above conditions.

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S-RCAT (Spherical Recess Cell Allay Transistor) 구조에 따른 FN Stress 특성 열화에 관한 연구 (The Research of FN Stress Property Degradation According to S-RCAT Structure)

  • 이동인;이성영;노용한
    • 전기학회논문지
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    • 제56권9호
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    • pp.1614-1618
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    • 2007
  • We have demonstrated the experimental results to obtain the immunity of FN (Fowler Nordheim) stress for S-RCAT (Spherical-Recess Cell Array Transistor) which has been employed to meet the requirements of data retention time and propagation delay time for sub-100-nm mobile DRAM (Dynamic Random Access Memory). Despite of the same S-RCAT structure, the immunity of FN stress of S-RCAT depends on the process condition of gate oxidation. The S-RCAT using DPN (decoupled plasma nitridation) process showed the different degradation of device properties after FN stress. This paper gives the mechanism of FN-stress degradation of S-RCAT and introduces the improved process to suppress the FN-stress degradation of mobile DRAM.

고에너지펄스를 이용한 충격파 발생과 응용 (Laser Supported Combustion Waves and Plasma Flows)

  • 이현희;최지혜;곽민철;여재익
    • 한국연소학회:학술대회논문집
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    • 한국연소학회 2007년도 제34회 KOSCO SYMPOSIUM 논문집
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    • pp.27-30
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    • 2007
  • We have been setting up experiments on propagation of shock waves generated by the pulsed laser ablation. One side of a thin metal foil is subjected to laser ablation as a shock wave is generated from a localized spot of high intensity energy source. The resulting reactive shock wave, which penetrates through the foil is reflected by an acoustic impedance which causes the metal foil to high-strain rate deform. This short time physics is captured on an ICCD camera. The focus of our research is generating reactive shock wave and high strain rate deforming of thin metal foil for accelerating micro-particles to a very high speed on the orders of several thousand meter per second. Somce innovative applications of this device will be discussed.

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Study on the Chirped Waveform of the USPR Pulse using the Impulse Response of a Waveguide

  • Roh, Young-Su
    • 조명전기설비학회논문지
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    • 제24권3호
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    • pp.20-26
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    • 2010
  • In ultrashort-pulse reflectometry (USPR), a chirped waveform transformed from the USPR source impulse signal via waveguide makes it possible to employ millimeter-wave mixers for the frequency up-conversion process. Consequently, the frequency bandwidth of the USPR system is sufficiently wide to cover a large portion of the electron density profile of the plasma. Some physical aspects of the chirped waveform, such as maximum amplitude and length, are critical factors to determine the performance of the system. In this paper, the propagation of the USPR impulse signal through a rectangular waveguide is numerically studied to derive the chirped waveform using the impulse response of the waveguide. The results of numerical computation show that the chirped waveform significantly depends on the waveguide cutoff frequency as well as the waveguide length.

Dynamical transition of Josephson vortex lattice in serially stacked ${Bi_2}{Sr_2}{CaCu_2}{O_{8+x}}$ intrinsic Josephson junctions

  • Myung-Ho;Hu-Jong
    • Progress in Superconductivity
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    • 제6권1호
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    • pp.52-55
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    • 2004
  • The inductive coupling theory in serially stacked $Bi_2$$Sr_2$$CaCu_2$$O_{8+x}$ intrinsic Josephson junctions predicts that the lattice structure of the Josephson vortices along the c axis gradually changes from the triangular to the rectangular lattice with increasing the vortex velocity. This lattice transition appears as voltage jumps or sub-branch splitting in the Josephson vortex-flow region of current-voltage characteristics (IVC). We report the IVC in external magnetic fields from 2 to 4 T. The stack, with the lateral size of 1.4${\times}$15 $u\m^2$, was fabricated by using the double-side cleaving technique. The sub-branches in the Josephson vortex-flow region, corresponding to a plasma propagation mode in serially coupled intrinsic Josephson junctions, were also observed in the range of 2∼4T. Switching from one branch to another in Josephson vortex-flow region suggests the structural transition of the moving Josephson vortex lattice.

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