• Biomolecules & Therapeutics
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• v.4 no.1
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• pp.78-83
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• 1996

The pharmacokinetics and tissue distribution of DA-3285 (recombinant human erythropoietin, recently manufactured by Research Laboratories of Dong-A Pharmaceutical Company) were studied in the laboratory animals. The plasma, urine, and tissue concentration of DA-3285 were measured by a double-antibody sandwich enzyme immunoassay. After intravenous administration of DA-3285, 20, 100, 500 and 2500 units/kg to rats, the plasma concentrations declined polyexponentially with the terminal half-lives of 2.15, 2.10, 2.31, and 2.35 hr, respectively. Total body clearance (20.7∼26.6 mι/hr/kg) and apparent volume of distribution at steady state (57.2∼70.1 mι/kg) were independent of the dose and AUC increased proportionally with the dose. The renal clearance was much lower than total body clearance, suggesting that extrarenal clearance, presumably metabolism , plays a significant role in elimination of DA-3285. In all rat tissues, the tissue to plasma ratios were smaller than unity, indicating less affinity of DA-3285 to rat tissues and was proved by considerably less value of Vdss. After 3 times a week for consecutive 3 weeks i.v. administration of DA-3285, 100 units/kg to rats, the plasma concentrations and pharmacokinetic parameters of DA-3285 were not significantly different from those in a single administration. After s.c. administration to the rat, plasma concentrations of DA-3285 peaked at 6 hr and the extent of bioavailability was 26.7%. In mice, rabbits and dogs, at DA-3285 dose of 100 units/kg, the mean terminal haw-lives were 2.78, 3.05, and 4.01 hr, respectively. Compared with reported data in the literatures, DA-3285 has similar properties to rh-EPO manufactured by other companies in view of pharmacokinetics.

• Journal of the Korean Vacuum Society
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• v.19 no.1
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• pp.45-51
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• 2010

We measured the temperature of target surface inducing by various physical phenomenon on magnetron sputtering target and confirmed the possibilities if the temperature distribution could affect plasma and deposited thin film. The target of magnetron sputtering has two types: round type and rectangular type. In a rectangular target, the concentrated discharge area by corner effect by magnetic field and non-uniform erosion of target are generated. And we found the generation of non-uniform temperature distribution on the target surface from this. This area was $10{\sim}20^{\circ}C$ higher than non-sputtering area. And if particles are generated during sputtering process, they were $20^{\circ}C$ higher than the area where is higher than non-sputtering area. These effects result in non-uniformity of thin films, crack of ceramic target, and shortening target life by non-uniform erosion.

• The Transactions of the Korean Institute of Electrical Engineers P
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• v.62 no.1
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• pp.18-22
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• 2013

This paper describes the information for quantitative simulation of weakly ionized plasma. We must grasp the meaning of the plasma state condition to utilize engineering application and to understand materials of plasma state. Using quantitative simulations of weakly ionized plasma, we can analyze gas characteristic. In this paper, the electron transport characteristic in $CH_4$ has been analysed over the E/N range 0.1~300[Td], at the 300[$_{\circ}\;K$] by the two term approximation Boltzmann equation method and Monte Carlo Simulation. Boltzmann equation method has also been used to predict swarm parameter using the same cross sections as input. The behavior of electron has been calculated to give swarm parameter for the electron energy distribution function has been analysed in $CH_4$ at E/N=10, 100 for a case of the equilibrium region in the mean energy. A set of electron collision cross section has been assembled and used in Monte Carlo simulation to predict values of swarm parameters. The result of Boltzmann equation and Monte Carlo Simulation has been compared with experimental data by Ohmori, Lucas and Carter. The swarm parameter from the swarm study are expected to sever as a critical test of current theories of low energy scattering by atoms and molecules.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.98-99
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• 2012

Deposition of thin films using magnetron sputtering plasmas is a well-developed, classical technology. However, detailed investigations using advanced diagnostics are insufficient in magnetron sputtering, in comparison with plasma-aided dry etching and plasma-enhanced chemical vapor deposition. In this talk, we will show examples of diagnostic works on magnetron sputtering employing metal targets. Diagnostic methods which have fine spatial resolutions are suitable for magnetron sputtering plasmas since they have significant spatial distributions. We are using two-dimensional laser-induced fluorescence spectroscopy, in which the plasma space is illuminated by a tunable laser beam with a planer shape. A charge-coupled device camera with a gated image intensifier is used for taking the picture of the image of laser-induced fluorescence formed on the planer laser beam. The picture of laser-induced fluorescence directly represents the two-dimensional distribution of the atom density probed by the tunable laser beam, when an intense laser with a relatively wide line-width is used. When a weak laser beam with a relatively narrow linewidth is used, the laser-induced fluorescence represents the density distribution of atoms which feel the laser wavelength to be resonant via the Doppler shift corresponding to their velocities. In this case, we can obtain the velocity distribution function of atoms by scanning the wavelength of the laser beam around the line center.

• Proceedings of the KIEE Conference
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• 1997.07e
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• pp.1657-1659
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• 1997

Electron temperature and electron density were measured in a radio-frequency inductively coupled plasma (RFICP) using a probe measurements. Measurement was conducted in an argon discharge for pressures from 10 [mTorr] to 40 [mTorr] and input rf power from 100 [W] to 800 [W], Ar flow rate from 5 [sccm] to 30 [sccm], Spatial distribution electron temperature and electron density were measured for discharge with same aspect ratio (R/L=2). Electron temperature and electron density were discovered depending on both pressure and power, Ar flow rate. Electron density was increased with increasing input power and in creasing pressure, increasing Ar flow rate. Radial distribution of the electron density was peaked in the plasma center. Normal distribution of the electron density was peaked in the center between quartz plate and substrate. From these results, We found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.

• Journal of the Korean Society for Heat Treatment
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• v.12 no.2
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• pp.166-173
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• 1999

Commercial carbon steels containing 0.2~0.55 wt.----C were plasma-nitrided or plasma nitrocarburized at $550^{\circ}C$ for 21.6Ks using $H_2-N_2$ or $H_2-N_2$-CO mixed gas respectively. The characteristics of hardening and wear-resistance of each treatment were studied and compared. And also microstructure of nitrided layer and nitrides formed in compound layer near surface were studied. All plasma-nitrided steels investigated showed remarkable increase of surface hardness with the increase of carbon content. But nitrocarburized steels resulted in higher surface-hardness than plasma-nitrided steels, which means that nitrocarburized has higher surface-hardening effect. Plasma-nitrided steels showed hardness increase in through-thickness direction near surface. And also nitrocarburized steels showed similar hardness distribution in through-thickness direction to that of plasma-nitrided steel. However, nitrocarburized steels had higher cross-sectional maximum-hardness than plasma-nitrided steels as much as 100Hv. Wear test showed that the amount of specific wear was reduced by both plasma-nitriding and nitrocarburized, showing that the amount of specific wear was not related to the hardness. But non-treated specimen showed that the amount of specific wear was related to the hardness.

• Journal of Nutrition and Health
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• v.33 no.6
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• pp.639-646
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• 2000

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05b
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• pp.1-6
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• 2002

Plasma processing of semiconductor materials plays a dominant role in microelectronic technology. During last century, plasma have gone a way from laboratory phenomena to industrial applications due to intensive progress in both scientific and industrial trends. Improvement and development of new experience together with development of plasma theory and plasma diagnostics methods. A most parameters (pressure, flow rate, power density) and various levels of plasma system (energy distribution, volume gas chemistry, transport, heterogeneous effects) to understand the whole process mechanism. It will allow us to choose a correct ways for processes optimization.

• Proceedings of the KSME Conference
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• 2003.04a
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• pp.1736-1741
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• 2003

The characteristics plasma flow of an atmospheric plasma torch used for thermal plasma processing is studied. In general, it is produced by the arc-gas interactions between a cathode tip and an anode nozzle. The performance of non-transferred plasma torch is significantly dependent on jet flow characteristics out of the nozzle. In this work, the distribution of gas flow that goes out to the atmosphere through a plenum chamber and nozzle is analyzed to evaluate the performance of atmospheric plasma torch. Numerical analysis is carried out with various angles of an inlet flow which can create different swirl flow fields. Moreover, the size of plasma plume is experimentally depicted.

• 한국가시화정보학회:학술대회논문집
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• 2003.11a
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• pp.87-90
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• 2003

In this paper, flow characteristics of plasma flow in a micro-tube were investigated experimentally using Micro-PIV. For comparision, the experiments were repeated for DI-water instead of plasma. Both velocity profiles of Plasma and DI-water are well agreed with the theoretical velocity distribution of newtonian fluid. We also carried out generating plasma-in-oil droplet formation at a Y-junction microchannel. In order to clarify the hydrodynamic aspects involved in plasma droplet formation. Rhodamin B were mixed with plasma only for visualization of plasma droplet.