• Title/Summary/Keyword: Plasma distribution

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A Study on the measurement of Electron Energy Distribution Function in Ar plasma measured by the waveforms of Langmuir probe voltages (Langmuir 프로브 전압의 파형에 따른 아르곤 플라즈마의 전자에너지 분포함수 측정에 관한 연구)

  • Kim, Du-Hwan;Park, Jeong-Hu
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.48 no.5
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    • pp.391-395
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    • 1999
  • In this paper, we have obtained the Electron Energy Distribution Function(EEDF) in plasma by using two differentiators and investigated the EEDFs by sawtooth and triangle waveform voltages with the working pressures and the positions of single probe. It is found that as the working pressure is decreased, the EEDFs approach to theMaxwellian distribution independent of the waveforms of probe voltage. On the otherhand, as the position of probe is moved from the center of the plasma to its edge, the EEDF of sawtooth waveform probe voltage approaches to the Maxwellian distribution, but the EEDF of triangle waveform probe voltage deviates from the Maxwellian distribution.

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Electromagnetic Electron-Cyclotron Wave for Ring Distribution with Alternating Current (AC) Electric Field in Saturn Magnetosphere

  • Haridas, Annex Edappattu;Kanwar, Shefali;Pandey, Rama Shankar
    • Journal of Astronomy and Space Sciences
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    • v.39 no.2
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    • pp.35-42
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    • 2022
  • During their respective missions, the spacecraft Voyager and Cassini measured several Saturn magnetosphere parameters at different radial distances. As a result of information gathered throughout the journey, Voyager 1 discovered hot and cold electron distribution components, number density, and energy in the 6-18 Rs range. Observations made by Voyager of intensity fluctuations in the 20-30 keV range show electrons are situated in the resonance spectrum's high energy tail. Plasma waves in the magnetosphere can be used to locate Saturn's inner magnetosphere's plasma clusters, which are controlled by Saturn's spin. Electromagnetic electron cyclotron (EMEC) wave ring distribution function has been investigated. Kinetic and linear approaches have been used to study electromagnetic cyclotron (EMEC) wave propagation. EMEC waves' stability can be assessed by analyzing the dispersion relation's effect on the ring distribution function. The primary goal of this study is to determine the impact of the magnetosphere parameters which is observed by Cassini. The magnetosphere of Saturn has also been observed. When the plasma parameters are increased as the distribution index, the growth/damping rate increases until the magnetic field model affects the magnetic field at equator, as can be seen in the graphs. We discuss the outputs of our model in the context of measurements made in situ by the Cassini spacecraft.

Spectroscopic Measurement of Temperature Distribution in Some Plasma Jets (분광학적 방법에 의한 Plasma Jet의 온도분석 측정)

  • 전춘생;박용관;임명선
    • 전기의세계
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    • v.26 no.2
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    • pp.104-110
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    • 1977
  • This paper investigates temperature distribution of plasma jets which used argon gas, and nitrogen gas mixed with argon as working fluids in spectroscopic method, and studies correlations between them main results are as follows; 1) The temperature at the center of plasma jet increases with are current and gas flow, and decreases with magnetic flux density along the axial direction. 2) The changing rate of temperature of plasma jet in the radial direction decreases rapidly beyond 2mm from central axis. 3) Temperature drop rate of plasma jet in the central axis direction appears most apparant beyond 13mm above the nozzle exit. 4) When argon gas mixed with a small amount of nitrogen, plasma temperature increases at same are current compared with the case of argon gas only.

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A study on the E-beam resist characteristics of plasma polymerized styrene (플라즈마중합 스티렌 박막의 e-beam 레지스트 특성에 관한 연구)

  • 이덕출;박종관
    • Electrical & Electronic Materials
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    • v.7 no.5
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    • pp.425-429
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    • 1994
  • In this paper, we study on the plasma polymerized styrene as a negative electron-beam resist. Plasma polymerized thin film was prepared using an interelectrode inductively coupled gas-flow type reactor. We show that polymerization parameters of thin film affect sensitivity and etching resistance of the resist. Molecular weight distribution of plasma polymerized styrene is 1.41-3.93, and deposition rates of that are 32-383[.angs./min] with discharge power. Swelling and etching resistance becomes . more improved with increasing discharge power during plasma polymerization. Etch rate by RIE is higher than that by plasma etching.

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2D Kinetic Simulation of Partially Magnetized Capacitively Coupled Plasma Sources (2차원 동역학 시뮬레이션을 활용한 부분적으로 자화된 용량성 결합 플라즈마 전산 모사)

  • Sung Hyun Son;Junbeom Park;Kyoung-Jae Chung
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.1
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    • pp.118-123
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    • 2023
  • Partially magnetized capacitively coupled plasma (CCP) sources are investigated using a two-dimensional kinetic simulation code named EDIPIC-2D. A converging numerical solution was obtained for CCP with a 60 MHz power source, while properly capturing the dynamics of electrons and power absorption over a single RF period. The effects of magnetic fields with different orientations were evaluated. Axial magnetic fields caused changes in the spatial distribution of plasma density, affecting the loss channel. Transverse magnetic fields enhanced stochastic heating near the powered electrode, leading to an increase in plasma density while the significant E×B drift loss compensated for this rise.

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An Experimental Study on Multiple ICP & Helicon Source for Oxidation in Semiconductor Process

  • Lee, Jin-Won;Na, Byoung-Keun;An, Sang-Hyuk;Chang, Hong-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.271-271
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    • 2012
  • Many studies have been investigated on high density plasma source (Electron Cyclotron Resonance, Inductively Coupled Plasma, Helicon plasma) for large area source after It is announced that productivity of plasma process depends on plasma density. In this presentation, we will propose the new concept of the multiple source, which consists of a parallel connection of ICP sources and helicon plasma sources. For plasma uniformity, equivalent power (especially, equivalent current in ICP & Helicon) should distribute on each source. We design power feeding line as coaxial transmission line with same length of ground line in each source for equivalent power distribution. And we confirm the equivalent power distribution with simulation and experimental result. Based on basic study, we develop the plasma source for oxidation in semiconductor process. we will discuss the relationship between the processing parameters (With or WithOut magnet, operating pressure, input power ). In ICP, plasma density uniformity is uniform. In ICP with magnet (or Helicon) plasma density is not uniform. As a result, new design (magnet arrangement and gas distributor and etc..) are needed for uniform plasma density in ICP with magnet and Helicon.

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Empirical Modeling of the Global Distribution of Magnetosonic Waves with Ambient Plasma Environment using Van Allen Probes

  • Kim, Kyung-Chan
    • Journal of Astronomy and Space Sciences
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    • v.39 no.1
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    • pp.11-22
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    • 2022
  • It is suggested that magnetosonic waves (also known as equatorial noise) can scatter radiation belt electrons in the Earth's magnetosphere. Therefore, it is important to understand the global distribution of these waves between the proton cyclotron frequency and the lower hybrid resonance frequency. In this study, we developed an empirical model for estimating the global distribution of magnetosonic wave amplitudes and wave normal angles. The model is based on the entire mission period (approximately 2012-2019) of observations of Van Allen Probes A and B as a function of the distance from the Earth (denoted by L*), magnetic local time (MLT), magnetic latitude (λ), and geomagnetic activity (denoted by the Kp index). In previous studies the wave distribution inside and outside the plasmasphere were separately investigated and modeled. Our model, on the other hand, identifies the wave distribution along with the ambient plasma environment-defined by the ratio of the plasma frequency (fpe) to the electron cyclotron frequency (fce)-without separately determining the wave distribution according to the plasmapause location. The model results show that, as Kp increases, the dayside wave amplitude in the equatorial region intensifies. It thereby propagates the intense region towards the wider MLT and inward to L* < 4. In contrast, the fpe/fce ratio decreases with increasing Kp for all regions. Nevertheless, the decreasing aspect differs between regions above and below L* = 4. This finding implies that the particle energy and pitch angle that magnetosonic waves can effectively scatter vary depending on the locations and geomagnetic activity. Our model agrees with the statistically observed wave distribution and ambient plasma environment with a coefficient of determination of > 0.9. The model is valid in all MLTs, 2 ≤ L* < 6, |λ| < 20°, and Kp ≤ 6.

Effects of Pulse Modulations on Particle Growth m Pulsed SiH4 Plasma Chemical Vapor Deposition Process (펄스 SiH4 플라즈마 화학기상증착 공정에서 입자 성장에 대한 펄스 변조의 영향)

  • Kim, Dong-Joo;Kim, Kyo-Seon
    • Journal of Industrial Technology
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    • v.26 no.B
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    • pp.173-181
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    • 2006
  • We analyzed systematically particle growth in the pulsed $SiH_4$ plasmas by a numerical method and investigated the effects of pulse modulations (pulse frequencies, duty ratios) on the particle growth. We considered effects of particle charging on the particle growth by coagulation during plasma-on. During plasma-on ($t_{on}$), the particle size distribution in plasma reactor becomes bimodal (small sized and large sized particles groups). During plasma-off ($t_{off}$), there is a single mode of large sized particles which is widely dispersed in the particle size distribution. During plasma on, the large sized particles grows more quickly by fast coagulation between small and large sized particles than during plasma-off. As the pulse frequency decreases, or as the duty ratio increases, $t_{on}$ increases and the large sized particles grow faster. On the basis of these results, the pulsed plasma process can be a good method to suppress efficiently the generation and growth of particles in $SiH_4$ PCVD process. This systematical analysis can be applied to design a pulsed plasma process for the preparation of high quality thin films.

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Characteristics calculation on radio frequency power transfer in a planar inductively coupled plasma source (평면형 유도결합 플라즈마 장치에서의 RF 전력 전달 특성 계산)

  • 이정순;정태훈
    • Journal of the Korean Vacuum Society
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    • v.8 no.3B
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    • pp.368-375
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    • 1999
  • The Maxwell equation and the transformer equivalent-circuit model are applied to a radio frequency planar inductively coupled plasma. The spatial distribution of the vector potential, the magnetic field, and the electric field are obtained analytically. As a result, the plasma current, the mutual inductance between the coil and the plasma, and the self inductance of plasma are found to increase with increasing skin depth. The spatial distribution of absorbed power has maximum where the antenna coil exists, and has a similar profile to that of the induced electric field. The power transfer efficiency is found to increase with increasing gas pressure before a saturation around p+ 20mTorr, while it shows an increase with the plasma density before a slight decrease around a density of $5\times10^{11}/\textrm{cm}^3$.

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