• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.1859-1861
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• 2000

The high temperature thermal plasma technology applied to waste treatment has undoubtedly gained high importance owing to its outstanding properties such as flexibility, compact reactor. and clean treatment as the environmental problem goes to a main issue in public talks, because the thermal plasma with temperature of around 10,000K or little less is particularly suitable for waste treatment. Since the thermal plasma is, in general, governed by a number of parameters, some complicated and elaborate controls might be mandatory. The high maintenance cost caused by big input power has been a main obstacle to the growth of the waste treatment plant based on thermal plasma technology, but the recent R&D on the waste-to-energy shows that the problem could be solved soon. In this paper, the authors introduce the current R&D activity related to three-phase ac plasma torch in KERI.

• Journal of the Semiconductor & Display Technology
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• v.16 no.4
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• pp.59-62
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• 2017

In this paper, atmospheric pressure plasma treatment was proposed for high performance indium gallium zinc oxide thin film transistor (IGZO TFT). RF Ar plasma treatment is performed at room temperature under atmospheric pressure as a simple and cost effective channel surface treatment method. The experimental results show that field effect mobility can be enhanced by $2.51cm^2/V{\cdot}s$ from $1.69cm^2/V{\cdot}s$ to $4.20cm^2/V{\cdot}s$ compared with a conventional device without plasma treatment. From X-ray photoelectron spectroscopy (XPS) analysis, the increase of oxygen vacancies and decrease of metal-oxide bonding are observed, which suggests that the suggested atmospheric Ar plasma treatment is a cost-effective useful process method to control the IGZO TFT performance.

• Journal of the Semiconductor & Display Technology
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• v.23 no.2
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• pp.100-106
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• 2024

To generate the plasma required in dry cleaning processes, the plasma chamber must be supplied with a high-quality AC voltage with a voltage of more than 1 kV and a frequency of 400 kHz. In the existing research, many methods to supply high power have been studied, but how to improve the quality of the power for high-quality plasma has been relatively little studied. In this paper, we propose a study to improve the quality of RF power circuit for high-quality plasma generation in dry cleaning method. Existing methods in the environment of full-bridge-based RF power circuits must perform PWM duty control in the light load region. This causes distortions in the waveform, resulting in poor power quality, which directly leads to poor plasma quality. To solve these problems, a half-bridge switching method is proposed and the improvement in waveform quality is verified. To verify the feasibility of the design and control algorithm proposed in this paper, an RF power circuit prototype is fabricated and the proposed design and control method is verified through simulation and actual experiments under dummy load.

• Nuclear Engineering and Technology
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• v.56 no.8
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• pp.3236-3241
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• 2024

Ion cyclotron resonance heating (ICRH) is an important auxiliary heating method applied to the China Fusion Engineering Test Reactor, which can effectively heat the ions and electrons in plasma. Owing to the harsh nuclear environment, neutronic analyses are required to verify tritium self-sufficiency and neutron-shielding requirements. In this study, a neutronics analysis of the ICRH antenna was conducted using the COre and System integrated engine for Reactor Monte Carlo (cosRMC) code to estimate the neutron flux, radiation damage, nuclear heating, gas generation rate of key components, and tritium breeding ratio (TBR), providing data support for the subsequent optimization of the shielding design. In addition, the neutron flux of the coils around the antenna was calculated to prevent the entry of neutrons that damage the magnetic field coils through the gaps between the port plugs and antenna, and the shielding effects of the port-plug antenna on the surrounding components were analyzed. Finally, the results obtained using the cosRMC and MCNP codes were compared, which and presented good agreement, thus verifying the reliability of the neutronic analysis using the cosRMC code.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.263-265
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• 2005

In the alternative current plasma display panel(AC-PDP) technology, it is very important to remove the image sticking for improving an image quality. In this paper, we have investigated the driving method of alternative current plasma display panel(AC-PDP) for preventing image sticking. We have investigated the driving method of alternative current plasma display panel(AC-PDP) for preventing image sticking. The preventing method of image sticking was proposed by adopting the Sticking Remove Pulse(SRP). The variation of brightness is most affected by the MgO to be formed at the surface of the phosphor layer. As a result, the image sticking is reduced when the driving method adopted an SRP.

• Applied Science and Convergence Technology
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• v.24 no.1
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• pp.16-21
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• 2015

The characteristics of an atmospheric pressure plasma jet (APPJ) in He discharge are measured with electrical and optical diagnostics methods. The discharge phenomenon in one cycle of the APPJ was diagnosed using intensified charge coupled device (ICCD) imaging. The gate mode images show that the propagation of plasma bullets happens only when the applied voltage on the inner conductor is positive. Moreover, the Schlieren image of the plasma jet shows that the laminar flow is changed into a turbulent flow when the plasma jet is turned on, especially when the gas flow rate increases.

• Proceedings of the KIPE Conference
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• 2003.07b
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• pp.611-615
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• 2003

In this paper, a operation characteristics and analysis of the HB(half bridge) inverter for remote plasma system are studied. the remote plasma system is cleaning system for the chemical vapor deposition (CVD) chamber in semiconductor processing. The remote plasma system is powered by the RF generator The main power stage of the RF generator is used for the HB PWM inverter with an low pass filter in the secondary circuit of the transformer. The detailed mode analysis of HB invertor was described. The operation characteristics of Remote Plasma Source are verified by simulation and experimental results.

• Fibers and Polymers
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• v.6 no.2
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• pp.113-120
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• 2005

Helium-oxygen plasma treatments were conducted to modify poly(trimethylene terephthalate) (PIT) and poly(ethylene terephthalate) (PET) warp knitted fabrics under atmospheric pressure. Lubricant and contamination removals by plasma etching effect were examined by weight loss $(\%)$ measurements and scanning electron microscopy (SEM) analysis. Surface oxidation by plasma treatments was revealed by x-ray photoelectron spectroscopy (XPS) analyses, resulting in formation of hydrophilic groups and moisture regain $(\%)$ enhancement. Low-stress mechanical properties (evaluated by Kawabata evaluation system) and bulk properties (air permeability and bust strength) were enhanced by plasma treatment. Increasing interfiber and interyarn frictions might play important roles in enhancing surface property changes by plasma etching effect, and then changing low-stress mechanical properties and bulk properties for both fabrics.

• Applied Science and Convergence Technology
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• v.23 no.1
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• pp.44-47
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• 2014

In this study, we investigated the basic properties of N-doped ethylcyclohexene plasma polymer thin films that deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition (PECVD) method with controlled ammonia flow rate. Ethylcyclohexene was used as organic precursor with hydrogen gas as the precursor bubbler gas. Additionally, ammonia ($NH_3$) gas was used as nitrogen dopant. The as-grown polymerized thin films were analyzed using ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, UV-Visible spectroscopy, and water contact angle measurement. We found that with increasing plasma power, film thickness is gradually increased while optical transmittance is drastically decreased. However, under the same plasma condition, water contact angle is decreased with increasing $NH_3$ flow rate. The FT-IR spectra showed that the N-doped ethylcyclohexene plasma polymer films were completely fragmented and polymerized from ethylcyclohexane.

• Journal of the Korean Society of Propulsion Engineers
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• v.26 no.6
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• pp.1-9
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• 2022

This study introduces the calculation model of ionization composition and electrical conductivity for metallic plasma for practical application to modeling and simulation of modern electrical detonators. The present model includes the correction for non-ideality of dense plasma conditions which are expected in electrical explosion of bridge in detonators. The computational results for copper plasma show favorable agreement with experimental data for a wide range of plasma temperature and high density conditions and the model is proper for detonator modeling with good prediction accuracy.