• Journal of the Korean Ceramic Society
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• v.45 no.7
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• pp.380-386
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• 2008

Optimized volume production of nanoscale phosphor powders synthesized by radio frequency (RF) plasma process was developed for the application to plasma display panels. The nano powders were synthesized by feeding the both solid and liquid type precursors, and nanoparticle phosphors were characterized in terms of particle size, shape, and photoluminescence (PL) intensities. Computer simulation was performed in advance to determine the process parameters, and nano phosphors were evaluated by comparing with current commercial micron-sized phosphor powders. Practical feeding of both solid and liquid type precursor was proved to be effective for volume production.The developed process showed a potential as a production method for red, blue and green phosphor although the PL intensity still needs further improvement.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.88-88
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• 2003

Optical Emission Spectroscopy(OES) is a very important technology for real-time monitoring of plasma in a reactor during dry etching process. OES technology is non-invasive to the plasma process. It can be used to collect information on excitation and recombination between electrons and ions in the plasma. It also helps easily diagnose plasma intensity and monitor end-point during plasma etch processing. We studied high density planar inductively coupled BCl$_3$ and BCl$_3$/Ar plasma with an OES as a function of processing pressure, RIE chuck power, ICP source power and gas composition. The scan range of wavelength used was from 400 nm to 1000 nm. It was found that OES peak Intensity was a strong function of ICP source power and processing pressure, while it was almost independent on RIE chuck power in BCl$_3$-based planar ICP processes. It was also worthwhile to note that increase of processing pressure reduced negatively self-induced dc bias. The case was reverse for RIE chuck power. ICP power and gas composition hardly had influence on do bias. We will report OES results of high density planar inductively coupled BCl$_3$ and BCl$_3$/Ar Plasma in detail in this presentation.

• Corrosion Science and Technology
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• v.6 no.6
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• pp.286-290
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• 2007

Biocompatible Hydroxy apatite (HAp) coatings on metallic substrate by plasma spray techniques have been developed. Long-term credibility of plasma spray HAp coatings has been evaluated in physiological saline by electrochemical measurements. It was found that the corrosion resisitance of SUS316L based HAp/Ti conbined coatings was excellent even after more than 10 weeks long-term immersion. It was shown that postal heat treatment improved both the crystallinity and corrosion resistance of HAp. By lowering cooling rate during heat treatment process, less cracks produced in HAp coating layer, which lead to higher credibility of HAp during immersion in physiological saline. The ICP results showed that the dissolution level of substrate metallic ions was low and HAp coatings produced in this research can be acceptable as biocompatible materials. Also, the concentration of dissolved ions from HAp coatings with postal heat treatment was lower compared to those from samples without postal heat treatment. The adherence of HAp coatings with Ti substrate and other mechanical properties were also assessed by three-point bending test. The poor adhesion of HAp coating to titanium substrate can be improved by introducing a plasma spray titanium intermediate layer.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.121-121
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• 2011

Graphene formed by chemical vapor deposition was exposed to the various plasmas of Ar, O2, N2, and H2 to examine its effects on the bonding properties of graphene to metal. Upon the Ar plasma exposure of patterned graphene, the subsequently deposited metal electrodes remained intact, enabling successful fabrication of field effect transistor (FET) arrays. The effects of enhancing adhesion between graphene and metals were more evident from O2 plasmas than Ar, N2, and H2 plasmas, suggesting that chemical reaction of O radicals induces hydrophilic property of graphene more effectively than chemical reaction of H and N radicals and physical bombardment of Ar ions. From the electrical measurements (drain current vs. gate voltage) of field effect transistors before and after Ar plasma exposure, it was confirmed that the plasma treatment is very effective in controlling bonding properties of graphene to metals accurately without requiring buffer layers.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.153-153
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• 2015

Application of the plasma is already highlighted as a new technology in the last few years. In these days, there are lots of attempt in various application with plasma in that it is known as an effective treatment to animal, plants, material and so on. Plasma in liquid, one of new plasma applications, has advantages in ability to treat bio-cell or solutions. For example, electro-surgery, water purification, radical generation and so on. Especially, plasma discharge in solutions is very useful technique and difficult to generate due to electrolysis, vaporization and something else. In this study, we have performed plasma discharge and checked sustainability of plasma in solution(saline 0.9%). And we have measured basic characteristics of plasma in liquid. Such as electrical energy and plasma density are calculated from discharging current and voltage. Also, its thermal energy is measured with IR camera.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2022.05a
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• pp.27-30
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• 2022

The plasma process, which has many advantages in terms of efficiency and environment compared to conventional process methods, is widely used in semiconductor manufacturing. Plasma Sheath is a dark region observed between the plasma bulk and the chamber wall surrounding it or the electrode. The Plasma Sheath Monitoring Sensor (PSMS) measures the difference in voltage between the plasma and the electrode and the RF power applied to the electrode in real time. The PSMS data, therefore, are expected to have a high correlation with the state of plasma in the plasma chamber. In this study, a model for predicting the state of nitrogen ions in the plasma chamber is training by a deep learning machine learning techniques using PSMS data. For the data used in the study, PSMS data measured in an experiment with different power and pressure settings were used as training data, and the ratio, flux, and density of nitrogen ions measured in plasma bulk and Si substrate were used as labels. The results of this study are expected to be the basis of artificial intelligence technology for the optimization of plasma processes and real-time precise control in the future.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.210-214
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• 2007

Silicon nanoparticles are widely studied as a material with great potential for wide applications. For application to present industry, it should be easy to control the characteristics of nanoparticle including the size and structure. In this paper, we investigated the formation of Si nanoparticle using pulse plasma technology. Plasma technology is already quite common in device industry and the size of nanoparticle can be easily controlled according to plasma pulse duration. An inductively-coupled plasma chamber with RF power (13.56 MHz) was used with DC-biased grid $(-200\sim+200\;V)$ installed above the substrate. In order to measure the shape and size of nanoparticle, TEM was used. It was found that the size of nanoparticles can be controlled well with the plasma pulse duration and the collection efficiency is increased with the use of either negative or positive DC-bias.

• The Korean Journal of Ceramics
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• v.4 no.1
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• pp.20-24
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• 1998

Thin films of diamond-like carbon(DLC) can be successfully deposited by using a magnetron plasma chemical vapor deposition (CVD) method with an rf(13.56 MHz) plasma of $C_dH_8$. Plasma characteristics are analyzed as a function of the magnetic field. As the magnetic field increases, both electron temperature ($T_e$) and density ($n_e$)increase, but the negative dc self-bias voltage (-$V_{ab}$) decreases, irrespective of gas pressures in the range of 1~7 mTorr. High deposition rates have been obtained even at low gas pressures, which may be attributed to the increased mean free path of electrons in the magentron plasma. Effects of rf power and additive gas on the structural properties of DLC films aer also examined by using various technique namely, TED(transmissio electron diffraction) microanalysis, FTIR, and Raman spectroscopies.

• Journal of the Korean Ceramic Society
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• v.46 no.4
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• pp.385-391
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• 2009

Need for plasma resistant ceramic materials has been continuously increased in semiconductor and display industry requiring plasma processing to realize ultra fine circuit process. Among promising candidates, alumina ceramics have still some advantages with respect to its economic aspect. In this study, fabrication of plasma resistant alumina ceramics was tried, and its processing optimization was also aimed. Careful processing control and thereby uniform microstructure of $Al_2O_3$ gave rise to enhanced plasma resistance, even comparable to market-governing commercial $Al_2O_3$. A further study is needed concerning ${\beta}-Al_2O_3$ materials system, presumably playing a decisive role in decreasing plasma resistance of $Al_2O_3$ ceramics.

• Journal of Applied Biological Chemistry
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• v.42 no.2
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• pp.81-84
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• 1999

Blood glue was prepared to reutilize porcine blood. Plasma proteins after lyophilization were treated by addition of wood flour, sodium hydroxide, sodium silicate, and hydrated lime to make blood glue with a suitable adhesivity. Characteristics of the prepared blood glue was monitored by measuring the viscosity with time, and the relationship between degree of hydrolysis of plasma proteins by addition of various amounts of sodium hydroxide and adhesivity was studied. To prevent the emission of formaldehyde during manufacturing of plywood by blood glue, the cross-linking reaction of plasma protein with formaldehyde was also examined. Fourier transform infrared, circular dichroism, and fluorescence spectroscopy study showed that blood plasma proteins react with formaldehyde, resulting in removal of formaldehyde by cross-linking reaction.