Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2003.03a
- /
- Pages.88-88
- /
- 2003
Diagnosis of $BCl_3$ and $BCl_3$ /Ar Plasmas with an Optical Emission Spectroscopy during High Density Planar Inductively Coupled Dry Etching
평판형 고밀도 유도결합 건식 식각시 Optical Emission Spectroscopy를 이용한 $BCl_3$ 와 $BCl_3$ /Ar 플라즈마의 분석
- Cho, Guan-Sik (School of Nano Eng./Institute of Nano-Technology Applications, Inje Univ.) ;
- Wantae Lim (School of Nano Eng./Institute of Nano-Technology Applications, Inje Univ.) ;
- Inkyoo Baek (School of Nano Eng./Institute of Nano-Technology Applications, Inje Univ.) ;
- Seungryul Yoo (School of Nano Eng./Institute of Nano-Technology Applications, Inje Univ.) ;
- Park, Hojin (School of Nano Eng./Institute of Nano-Technology Applications, Inje Univ.) ;
- Lee, Jewon (School of Nano Eng./Institute of Nano-Technology Applications, Inje Univ.) ;
- Kuksan Cho (Clioteck, Inc.) ;
- S. J. Pearton (Department of Materials Sci. and Eng., University of Florida)
- Published : 2003.05.01
Abstract
Optical Emission Spectroscopy(OES) is a very important technology for real-time monitoring of plasma in a reactor during dry etching process. OES technology is non-invasive to the plasma process. It can be used to collect information on excitation and recombination between electrons and ions in the plasma. It also helps easily diagnose plasma intensity and monitor end-point during plasma etch processing. We studied high density planar inductively coupled BCl
Keywords