• 제목/요약/키워드: Plasma Simulation

검색결과 484건 처리시간 0.027초

정전 탐침법과 유체시뮬레이션을 이용한 DC플라즈마 특성 연구 (Analysis of DC Plasma using Electrostatic Probe and Fluid Simulation)

  • 손의정;김동현;이호준
    • 전기학회논문지
    • /
    • 제63권10호
    • /
    • pp.1417-1422
    • /
    • 2014
  • Using a parallel plate DC plasma system was prepared. Using this equipment, we investigated the basic discharge characteristics of DC argon plasma in terms of electron density, temperature, voltage and current waveforms and plasma potential. The effects of the electrode gap distance, input voltage, ballast resistance and pressure were measured using electrostatic probe. Plasma simulation using fluid approximation has been performed. External circuit effects was included in the simulation. Measured and calculated current voltage characteristics show similar tendencies.

자기밀폐형 핵융합과 시뮬레이션 (Simulation for Magnetic Confined Nuclear Fusion in Korea)

  • 유광일;권재민;박병호;박건영;나용수
    • 진공이야기
    • /
    • 제1권2호
    • /
    • pp.9-18
    • /
    • 2014
  • In this article, we present a brief explanation of simulation for magnetic confined fusion plasma. Devices for nuclear fusion experiment become large, complex, and expensive these days, so the simulation can be a valuable tool for understanding and expecting the fusion plasma physics. Research areas presented here are plasma equilibrium and instability, turbulence study, heating and current driving, boundary and divertor area plasma physics, and integrated operation scenario study. Traditionally, many foreign codes have been used because those are verified and stable, however our own MHD and gyrokinetic codes with better performance are under developing recently. While researchers have devoted their effort to make and use a simulation code in individual areas, many ones also endeavor to integrate the simulation codes in different areas for thorough understanding of fusion plasma physics.

라인형 플라즈마 소스를 이용한 ALD 공정 연구 (Study of ALD Process using the Line Type Plasma Source)

  • 권기청;조태훈;최진우;송세영;설제윤;이준신
    • 반도체디스플레이기술학회지
    • /
    • 제15권4호
    • /
    • pp.33-35
    • /
    • 2016
  • In this study, a new plasma source was used in the ALD process. Line type plasma sources were analyzed by electric and magnetic field simulation. And the results were compared with plasma density and electron temperature measurement results. As a result, the results of the computer simulation and the diagnosis results of plasma density and electron temperature showed similar tendency. At this time, the plasma uniformity is 95.6 %. $Al_2O_3$ thin film was coated on 6 inch Si-wafer, using this plasma source. The uniformity of the thin film was more than 98% and the thin film growth rate was 0.13 nm/cycle.

Properties of Inductively coupled Ar/CH4 plasma based on plasma diagnostics with fluid simulation

  • 차주홍;손의정;윤용수;한문기;김동현;이호준
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
    • /
    • pp.210.2-210.2
    • /
    • 2016
  • An inductively coupled plasma source was prepared for the deposition of a-C:H thin film. Properties of the inductively coupled plasma source are investigated by fluid simulation including Navier-Stokes equations and home-made tuned single Langmuir probe. Signal attenuation ratios of the Langmuir probe harmonic frequency were 13.56Mhz and 27.12Mhz. Dependencies of plasma parameters on process parameters were accord with simulation results. Ar/CH4 plasma simulation results shown that hydrocarbon radical densities have their lowest value at the vicinity of gas feeding line due to high flow velocity. For input power density of 0.07W/cm3, CH radical density qualitatively follows electron density distribution. On the other hand, central region of the chamber become deficient in CH3 radical due to high dissociation rate accompanied with high electron density. The result suggest that optimization of discharge power is important for controlling deposition film quality in high density plasma sources.

  • PDF

Effects of the Capacitive Field in an Inductively Coupled Plasma Discharge

  • Choe, HeeHwan
    • Applied Science and Convergence Technology
    • /
    • 제26권5호
    • /
    • pp.114-117
    • /
    • 2017
  • Plasma characteristics of two-dimensional inductively coupled discharge simulation is investigated. Impedance of an inductively coupled plasma discharge was considered. Voltage drops across antenna coils and current variation between coils made different profiles of plasma characteristics. Importance of the capacitive field effect in some case was analyzed.

Simulation of a Dually Excited Capacitively Coupled RF Plasma

  • Kim, Heon-Chang;Sul, Yong-Tae;Park, Sung-Jin
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
    • /
    • pp.513-514
    • /
    • 2005
  • In plasma processing reactors, it is common practice to control plasma density and ion bombardment energy by manipulating excitation voltage and frequency. In this paper, a dually excited capacitively coupled rf plasma reactor is self-consistently simulated with a three moment model. Effects of phase differences between primary and secondary voltage waves, simultaneously modulated at various combination of commensurate frequencies, on plasma properties are investigated. The simulation results show that plasma potential and density as well as primary self-dc bias are nearly unaffected by the phase lag between the primary and the secondary voltage waves. The results also show that, with the secondary frequency substantially lower than the primary frequency, secondary self-dc bias remains constant regardless of the phase lag. As the secondary frequency approaches to the primary frequency, however, the secondary self-dc bias becomes greatly altered by the phase lag, and so does the ion bombardment energy at the secondary electrode. These results demonstrate that ion bombardment energy can be more carefully controlled through plasma simulation.

  • PDF

Modelling of Optimum Design of High Vacuum System for Plasma Process

  • Kim, Hyung-Taek
    • International journal of advanced smart convergence
    • /
    • 제10권1호
    • /
    • pp.159-165
    • /
    • 2021
  • Electronic devices used in the mobile environments fabricated under the plasma conditions in high vacuum system. Especially for the development of advanced electronic devices, high quality plasma as the process conditions are required. For this purpose, the variable conductance throttle valves for controllable plasma employed to the high vacuum system. In this study, we analyzed the effects of throttle valve applications on vacuum characteristics simulated to obtain the optimum design modelling for plasma conditions of high vacuum system. We used commercial simulator of vacuum system, VacSim(multi) on this study. Reliability of simulator verified by simulation of the commercially available models of high vacuum system. Simulated vacuum characteristics of the proposed modelling agreed with the observed experimental behaviour of real systems. Pressure limit valve and normally on-off control valve schematized as the modelling of throttle valve for the constant process-pressure of below 10-3 torr. Simulation results plotted as pump down curve of chamber, variable valve conductance and conductance logic of throttle valve. Simulated behaviors showed the applications of throttle valve sustained the process-pressure constantly, stably, and reliably in plasma process.

2차원 동역학 시뮬레이션을 활용한 부분적으로 자화된 용량성 결합 플라즈마 전산 모사 (2D Kinetic Simulation of Partially Magnetized Capacitively Coupled Plasma Sources)

  • 손성현;박준범;정경재
    • 반도체디스플레이기술학회지
    • /
    • 제22권1호
    • /
    • pp.118-123
    • /
    • 2023
  • Partially magnetized capacitively coupled plasma (CCP) sources are investigated using a two-dimensional kinetic simulation code named EDIPIC-2D. A converging numerical solution was obtained for CCP with a 60 MHz power source, while properly capturing the dynamics of electrons and power absorption over a single RF period. The effects of magnetic fields with different orientations were evaluated. Axial magnetic fields caused changes in the spatial distribution of plasma density, affecting the loss channel. Transverse magnetic fields enhanced stochastic heating near the powered electrode, leading to an increase in plasma density while the significant E×B drift loss compensated for this rise.

  • PDF

Multi-Secondary Transformer: A Modeling Technique for Simulation - II

  • Patel, A.;Singh, N.P.;Gupta, L.N.;Raval, B.;Oza, K.;Thakar, A.;Parmar, D.;Dhola, H.;Dave, R.;Gupta, V.;Gajjar, S.;Patel, P.J.;Baruah, U.K.
    • Journal of international Conference on Electrical Machines and Systems
    • /
    • 제3권1호
    • /
    • pp.78-82
    • /
    • 2014
  • Power Transformers with more than one secondary winding are not uncommon in industrial applications. But new classes of applications where very large number of independent secondaries are used are becoming popular in controlled converters for medium and high voltage applications. Cascade H-bridge medium voltage drives and Pulse Step Modulation (PSM) based high voltage power supplies are such applications. Regulated high voltage power supplies (Fig. 1) with 35-100 kV, 5-10 MW output range with very fast dynamics (${\mu}S$ order) uses such transformers. Such power supplies are widely used in fusion research. Here series connection of isolated voltage sources with conventional switching semiconductor devices is achieved by large number of separate transformers or by single unit of multi-secondary transformer. Naturally, a transformer having numbers of secondary windings (~40) on single core is the preferred solution due to space and cost considerations. For design and simulation analysis of such a power supply, the model of a multi-secondary transformer poses special problem to any circuit analysis software as many simulation softwares provide transformer models with limited number (3-6) of secondary windings. Multi-Secondary transformer models with 3 different schemes are available. A comparison of test results from a practical Multi-secondary transformer with a simulation model using magnetic component is found to describe the behavior closer to observed test results. Earlier models assumed magnetising inductance in a linear loss less core model although in actual it is saturable core made-up of CRGO steel laminations. This article discusses a more detailed representation of flux coupled magnetic model with saturable core properties to simulate actual transformers very close to its observed parameters in test and actual usage.

저압 열전자 방전 플라즈마의 Monte Carlo 시뮬레이션 (Monte Carlo Simulation of Thermionic Low Pressure Discharge Plasma)

  • 고욱희
    • 전기학회논문지
    • /
    • 제61권12호
    • /
    • pp.1880-1885
    • /
    • 2012
  • Nonlinear dynamical behaviors in thermionic low pressure discharge are investigated using a particle-in-cell(PIC) simulation. An electrostatic PIC code is developed to model the plasma discharge system including the kinetic effects. The elastic collision, excitation collision, ionization collision, and electron-ion recombination collision are considered in this code. The generated electrons and ions are traced to analyze physical characteristics of the plasma. The simulation results show that the nonlinear oscillation structures are observed for cold plasma in the system and the similar structures are observed for warm plasma with a shift in values of the bifurcation parameter. The detailed oscillation process can be subdivided into three distinct mode; anode-glow, temperature-limited, and double-layer modes.