• Title/Summary/Keyword: Plasma Simulation

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당뇨병 환자의 혈당 변동에 대한 시스템다이내믹스 모델 개발 (Development of System Dynamics Model for the Variation of Plasma Glucose Levels in Patients with Type 2 Diabetes)

  • 최은옥;곽찬영
    • 한국시스템다이내믹스연구
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    • 제9권1호
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    • pp.155-170
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    • 2008
  • The purpose of this study was to develop a system dynamics model for management of glucose metabolism disorders that demonstrated dynamic relationships between insulin and plasma glucose levels over the time. The model was developed to 1) represent the physiology of glucose metabolism for an normal adult subject, 2) to draw causal loop diagram that demonstrate feedback systems of glucose regulation in normal condition and pathologic condition of the type 2 diabetes, 3) to develop an interactive computer simulation model for management of glucose metabolism disorders. The simulation results showed the plasma glucose level for normal persons varied from 75 to 140 which was consistent with clinical findings. As an example for patients we selected a case which varied from 110 to 310. Two types of interventions were chosen to review the model; meal control and insulin administration. The simulation results for those cases also matched well with clinical findings. The developed model can be used as an effective educational tool for patients to develop healthy lifestyle choices. The results also provide a blueprint for health providers to maintain normal blood glucose levels in diabetes patients.

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레이저 가공시 에너지 전달과 Plume 효과 (Laser- Plume Effects on Radiation Energy Transfer in Materials Processing)

  • Kang, Kae-Myung;Kim, Kwang-Ryul
    • 한국재료학회지
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    • 제12권1호
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    • pp.27-35
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    • 2002
  • In laser materials processing, localized heating, melting and evaporation caused by focused laser radiation forms a vapor on the material surface. The plume is generally an unstable entity, fluctuating according to its own dynamics. The beam is refracted and absorbed as it traverses the plume, thus modifying its power density on the surface of the condensed phases. This modifies material evaporation and optical properties of the plume. A laser-produced plasma plume simulation is completed using axisymmetric, high-temperature gas dynamic model including the laser radiation power absorption, refraction, and reflection. The physical properties and velocity profiles are verified using the published experimental and numerical results. The simulation results provide the effect of plasma plume fluctuations on the laser power density and quantitative beam radius changes on the material surface. It is proved that beam absorption, reflection and defocusing effects through the plume are essential to obtain appropriate mathematical simulation results. It is also found that absorption of the beam in the plume has much less direct effect on the beam power density at the material surface than defocusing does and helium gas is more efficient in reducing the beam refraction and absorption effect compared to argon gas for common laser materials processing.

Aerosol Deposition Nozzle Design for Uniform Flow Rate: Divergence Angle and Nozzle Length

  • Kim, Jae Young;Kim, Young Jin;Jeon, Jeong Eun;Jeon, Jun Woo;Choi, Beom Soo;Choi, Jeong Won;Hong, Sang Jeen
    • 반도체디스플레이기술학회지
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    • 제21권2호
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    • pp.38-44
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    • 2022
  • Plasma density in semiconductor fabrication equipment becomes higher to achieve the improved the throughput of the process, but the increase of surface corrosion of the ceramic coated chamber wall has been observed by the increased plasma density. Plasma chamber wall coating with aerosol deposition prefer to be firm and uniform to prevent the potential creation of particle inside the chamber from the deformation of the coating materials, and the aerosol discharge nozzle is a good control factor for the deposited coating condition. In this paper, we investigated the design of the nozzle of the aerosol deposition to form a high-quality coating film. Computational fluid dynamics (CFD) study was employed to minimize boundary layer effect and shock wave. The degree of expansion, and design of simulation approach was applied to found out the relationship between the divergence angle and nozzle length as the key parameter for the nozzle design. We found that the trade-off tendency between divergence angle and nozzle length through simulation and quantitative analysis, and present the direction of nozzle design that can improve the uniformity of chamber wall coating.

Fabrication and Simulation of Fluid Wing Structure for Microfluidic Blood Plasma Separation

  • Choe, Jeongun;Park, Jiyun;Lee, Jihye;Yeo, Jong-Souk
    • Applied Science and Convergence Technology
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    • 제24권5호
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    • pp.196-202
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    • 2015
  • Human blood consists of 55% of plasma and 45% of blood cells such as white blood cell (WBC) and red blood cell (RBC). In plasma, there are many kinds of promising biomarkers, which can be used for the diagnosis of various diseases and biological analysis. For diagnostic tools such as a lab-on-a-chip (LOC), blood plasma separation is a fundamental step for accomplishing a high performance in the detection of a disease. Highly efficient separators can increase the sensitivity and selectivity of biosensors and reduce diagnostic time. In order to achieve a higher yield in blood plasma separation, we propose a novel fluid wing structure that is optimized by COMSOL simulations by varying the fluidic channel width and the angle of the bifurcation. The fluid wing structure is inspired by the inertial particle separator system in helicopters where sand particles are prevented from following the air flow to an engine. The structure is ameliorated in order to satisfy biological and fluidic requirements at the micro scale to achieve high plasma yield and separation efficiency. In this study, we fabricated the fluid wing structure for the efficient microfluidic blood plasma separation. The high plasma yield of 67% is achieved with a channel width of $20{\mu}m$ in the fabricated fluidic chip and the result was not affected by the angle of the bifurcation.

펄스파워를 이용한 실린더형 전극간 금속 플라즈마 생성현상의 전산유동해석 (COMPUTATIONAL MODELING AND SIMULATION OF METAL PLASMA GENERATION BETWEEN CYLINDRICAL ELECTRODES USING PULSED POWER)

  • 김경진;곽호상;박중윤
    • 한국전산유체공학회지
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    • 제19권4호
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    • pp.68-74
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    • 2014
  • This computational study features the transient compressible and inviscid flow analysis on a metallic plasma discharge from the opposing composite electrodes which is subjected to pulsed electric power. The computations have been performed using the flux corrected transport algorithm on the axisymmetric two-dimensional domain of electrode gap and outer space along with the calculation of plasma compositions and thermophysical properties such as plasma electrical conductivity. The mass ablation from aluminum electrode surfaces are modeled with radiative flux from plasma column experiencing intense Joule heating. The computational results shows the highly ionized and highly under-expanded supersonic plasma discharge with strong shock structure of Mach disk and blast wave propagation, which is very similar to muzzle blast or axial plasma jet flows. Also, the geometrical effects of composite electrodes are investigated to compare the amount of mass ablation and penetration depth of plasma discharge.

Beam 전자와 중성 Plasma 사이의 상호작용에 관한 2차원적 수치계산 (TWO DIMENSIONAL SIMULATION OF BEAM INJECTION INTO NEUTRAL PLASMA)

  • 선종호;민경욱
    • Journal of Astronomy and Space Sciences
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    • 제7권2호
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    • pp.113-123
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    • 1990
  • 전자 beam이 중성 plasma계에 들어왔을 때의 상호작용을 이차원 정전 model을 사용하여 수치계산을 한 결과 beam의 밀도변화에 따라 상호작용이 큰 변화를 보이는 것으로 나타났다. beam 전자의 밀도가 주변 전자의 밀도보다 낮을 때는 많은 양의 beam들이 주변 plasma와의 상호작용을 통해 위상공간에서 vortex 구조를 보이며 입사지역으로부터 멀리 진행할 수 있었던 반면 beam 전자들의 밀도가 높을 때는 대부분의 beam 전자들이 입사지역으로 되돌아오는 희귀전류를 형성하였다. 이 때 자기장의 게기에 따라 전자보다 훨씬 질랴이 큰 ion들이 가속될 수도 있으며 전자들의 전파와 상호작용의 양상이 크게 바뀔 수 있는 것으로 나타났다.

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플라즈마 식각장치내 노즐의 위치에 따른 희박기체유동 및 알루미늄 식각률의 변화에 관한 연구 (Effects of Nozzle Locations on the Rarefied Gas Flows and Al Etch Rate in a Plasma Etcher)

  • 황영규;허중식
    • 대한기계학회논문집B
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    • 제26권10호
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    • pp.1406-1418
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    • 2002
  • The direct simulation Monte Carlo(DSMC) method is employed to calculate the etch rate on Al wafer. The etchant is assumed to be Cl$_2$. The etching process of an Al wafer in a helicon plasma etcher is examined by simulating molecular collisions of reactant and product. The flow field inside a plasma etch reactor is also simulated by the DSMC method fur a chlorine feed gas flow. The surface reaction on the Al wafer is simply modelled by one-step reaction: 3C1$_2$+2Allongrightarrow1 2AIC1$_3$. The gas flow inside the reactor is compared for six different nozzle locations. It is found that the flow field inside the reactor is affected by the nozzle locations. The Cl$_2$ number density on the wafer decreases as the nozzle location moves toward the side of the reactor. Also, the present numerical results show that the nozzle location 1, which is at the top of the reactor chamber, produces a higher etch rate.

EPD 신호궤적을 이용한 개별 웨이퍼간 이상검출에 관한 연구 (A Study on Wafer to Wafer Malfunction Detection using End Point Detection(EPD) Signal)

  • 이석주;차상엽;최순혁;고택범;우광방
    • 제어로봇시스템학회논문지
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    • 제4권4호
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    • pp.506-516
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    • 1998
  • In this paper, an algorithm is proposed to detect the malfunction of plasma-etching characteristics using EPD signal trajectories. EPD signal trajectories offer many information on plasma-etching process state, so they must be considered as the most important data sets to predict the wafer states in plasma-etching process. A recent work has shown that EPD signal trajectories were successfully incorporated into process modeling through critical parameter extraction, but this method consumes much effort and time. So Principal component analysis(PCA) can be applied. PCA is the linear transformation algorithm which converts correlated high-dimensional data sets to uncorrelated low-dimensional data sets. Based on this reason neural network model can improve its performance and convergence speed when it uses the features which are extracted from raw EPD signals by PCA. Wafer-state variables, Critical Dimension(CD) and uniformity can be estimated by simulation using neural network model into which EPD signals are incorporated. After CD and uniformity values are predicted, proposed algorithm determines whether malfunction values are produced or not. If malfunction values arise, the etching process is stopped immediately. As a result, through simulation, we can keep the abnormal state of etching process from propagating into the next run. All the procedures of this algorithm can be performed on-line, i.e. wafer to wafer.

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Improvement of Proton Beam Quality from the High-intensity Short Pulse Laser Interaction with a Micro-structured Target

  • Seo, Ju-Tae;Yoo, Seung-Hoon;Pae, Ki-Hong;Hahn, Sang-June
    • Journal of the Optical Society of Korea
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    • 제13권1호
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    • pp.22-27
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    • 2009
  • Target design study to improve the quality of an accelerated proton beam from the interaction of a high-intensity short pulse laser with an overdense plasma slab has been accomplished by using a two-dimensional, fully electromagnetic and relativistic particle-in-cell (PIC) simulation. The target consists of a thin core part and a thick peripheral part of equivalent plasma densities, while the ratio of the radius of the core part to the laser spot size, and the position of the peripheral part relative to the fixed core part were varied. The positive effects of this core-peripheral target structure could be expected from the knowledge of the typical target normal sheath acceleration (TNSA) mechanism in a laser-plasma interaction, and were apparently evidenced from the comparison with the case of a conventional simple planar target and the case of the transversal size reduction of the simple planar target. Improvements of the beam qualities including the collimation, the forward directionality, and the beam divergence were verified by detailed analysis of relativistic momentum, angular directionality, and the spatial density map of the accelerated protons.

플라즈마 처리와 결합된 Cu 촉매반응 화학기상증착법의 메커니즘과 고종횡비 패턴의 충진양상 전산모사에 대한 연구 (Study on the Mechanism and Modeling for Super-filling of High-Aspect-Ratio Features with Copper by Catalyst Enhanced Chemical Vapor Deposition Coupled with Plasma Treatment)

  • 김창규;이도선;이원종
    • 대한금속재료학회지
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    • 제49권4호
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    • pp.334-341
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    • 2011
  • The mechanism behind super-filling of high-aspect-ratio features with Cu by catalyst-enhanced chemical vapor deposition (CECVD) coupled with plasma treatment is described and the metrology required to predict the filling feasibility is identified and quantified. The reaction probability of a Cu precursor was determined as a function of substrate temperature. Iodine adatoms are deactivated by the bombardment of energetic particles and also by the overdeposition of sputtered Cu atoms during the plasma treatment. The degree of deactivation of adsorbed iodine was experimentally quantified. The quantified factors, reaction probability and degree of deactivation of iodine were introduced to the simulation for the prediction of the trench filling aspect by CECVD coupled with plasma treatment. Simulated results show excellent agreement with the experimental filling aspects.