• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.5
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• pp.294-297
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• 2016

Titanium oxide ($TiO_2$) thin films were fabricated by unbalanced magnetron (UBM) sputtering. The fabricated $TiO_2$ films were treated by oxygen plasma under various RF powers. We investigated the characteristics of oxygen plasma treatment on the surface, structural, and physical properties of $TiO_2$ films prepared at various plasma treatment RF powers. UBM sputtered $TiO_2$ films exhibited higher contact angle value, smooth surface, and amorphous structure. However, the rms surface roughness $TiO_2$ films were rough, and the contact angle value was decreased with the increase of the plasma treatment RF power Also, the hardness value of $TiO_2$ film as physical properties was slightly increased with the increase of the plasma treatment RF power. In the results, the performance of $TiO_2$ films for self cleaning critically depended on the with the plasma treatment RF power.

• Korean Journal of Metals and Materials
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• v.50 no.7
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• pp.545-548
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• 2012

The optical and electronic properties of Indium Tin Oxide (ITO) thin films deposited on a RF-plasma treated glass substrate were investigated by X-Ray Photoelectron Spectroscopy (XPS), Ultra-violet Photoelectron Spectroscopy (UPS), Reflected Electron Energy Loss Spectroscopy (REELS). The modification of glass substrates was carried out by varying the time of the plasma surface treatment in an oxygen atmosphere. The focus of this research was to examine how the optical and electronic properties of ITO thin films change with the plasma treatment time. The surface energy increased since the carbon bonds were removed from the surface after the glass substrate received the surface treatment. The ITO thin films produced on the glass substrate with surface treatment showed that the high optical transmittance was approximately 85%. The measured band gap energy was as high as 3.23 eV when the plasma treatment time was 60 s and the work function after the treatment was increased by 0.5 eV in comparison to that before the treatment of 60 s. The ITO thin film exhibited an excellent sheet resistance of $2.79{\Omega}/{\Box}$. We found that the optical and electronic properties of ITO thin films can be improved by RF-plasma surface treatment.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.8
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• pp.696-701
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• 2005

This paper was investigated the changes of surface properties of high-temperature-vulcanized (HTV) semiconductive silicone rubber due to oxygen plasma discharge. The modifications produced on the silicone rubber surface by oxygen plasma were accessed using Fourier transform infrared spectroscopy(FTIR), X-ray photoelectron spectroscopy(XPS), contact angle and Surface Roughness Tester. The results of the chemical analysis Showed that C-H bonds were broken due to plasma discharge and Silica-like bonds (SiOx, x=$3\~4$) increased. It is thought that the above changes lead to the increase of surface energy of high-temperature-vulcanized (HTV) semiconductive silicone rubber also, Surface roughness was increased with cleavage of side-chains and oxidation process, it confirmed change as the SEM. The micromorphology of surface and hydrophobicity due to plasma discharge based on our results were discussed.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.52 no.6
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• pp.261-266
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• 2003

We investigated the effect of oxygen plasma treatment of indium-tin oxide(ITO) surface on the performance of electroluminescence(EL) devices. ITO surface treated oxygen plasma has been analyzed using atomic force microscope(AFM) and X-ray photoelectron spectroscopy(XPS), to investigate the relations between the properties of the ITO surface and the properties of the current-voltage-luminance(I-V-L) characteristics of the fabricated OLED with the structure of ITO(plasma treatment) / TPD / Alq$_3$/ Al. It is found that the oxygen plasma treatment of ITO anode improve the hole injection of the OLED due to the modification of the surface states. The treated ITO anode nay be low voltage with high luminance efficiency.

• Journal of the Korean institute of surface engineering
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• v.31 no.6
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• pp.325-333
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• 1998

A duplex surface treatment process of simultaneous aluminizing-chromizing process followed by plasma nitriding was performed on AISI HI3 steel and STS 403 steel. The properties of these duplex-treated steels were investigated and were compared with those of steels treated by single process of either simultaneous aluminizing-chromizing or plasma nilriding, in terms of microstructure, microhardness and high temperature wear resistance. Sim~dtaneous alumizing-chromizing process was done using a 2-step coating cycle and plasma nitriding process was done at $530^{\circ}C$ for 1.5 hour. AISI HI3 steel and STS 403 steel showed a FeA1 compound layer of approximately 350$\mu\textrm{m}$ thickness on the surface after simultaneous diffusion coating and nitrided layer of approximately 70-80$\mu\textrm{m}$ formed after the subsequent plasma nitriding process. The microhardness was improved much more by the duplex surface heatment than only by plasma nitriding. In addition the duplex treated specimens showed an improved high temperature wear resistance.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2000.04a
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• pp.87-96
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• 2000

The properties of polyimide for interlayer dielectric applications are investigated during plasma etching of aluminum on it. Chlorine-based plasma generally used for aluminum etching results in an increase in the (dielectric constant of polyimide, while $SF_6$ plasma exhibits a high polyimide etch rate and a reducing effect of the dielectric constant. The leakage current of polyimide is significantly suppressed after plasma exposure. An optimal combination of Al etch with $Cl_6$ plasma and polyimide etch with $SF_6$ plasma is expected to be a good tool for realizing multilevel metallization structures.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.05b
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• pp.25-28
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• 2005

This paper was investigated the changes of surface properties of high-temperature-vulcanized(HTV) semiconductive silicone rubber due to oxygen plasma discharge. The modifications produced on the silicone surface by oxygen plasma were accessed using x-ray photoelectron spectroscopy(XPS), contact angle and Scanning Electron Microscope(SEM). The results of the chemical analysis showed that C-H bonds were broken due to plasma discharge and Silica-like bonds (SiOx. x=3~4) increased. It is thought that the above changes lead to the increase of surface energy of high-temperature-vulcanized(HTV) semiconductive silicone rubber. The micromorphology of surface and hydrophobicity due to plasma discharge based on our results were discussed.

• Textile Coloration and Finishing
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• v.8 no.3
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• pp.59-65
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• 1996

Cotton fabrics were treated by low temperature plasma and/or cellulase, and its physical and dyeing properties were investigated. All the pretreatments of the cotton with low temperature plasma of oxygen, nitrogen and argon slowed down the rate of weight loss of cotton in cellulase solution. Plasma pretreatment did not show any strength retention effect on cotton fiber in the subsequent cellulase treatment. Pretreatment of cotton with low temperature oxygen plasma decreased the rate of dyeing in direct dye bath, while cellulase or plasma/cellulase pretreatment increased the rate. Equilibrium dye uptake of cotton was not changed greatly by the pretreatments except the normal untreated cotton showed more or less high uptake. The pretreatment of cellulase with a water-soluble carbodiimide reduced the enzymatic activity, and did not show any strength retention of cotton in enzymatic weight loss.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2000.11a
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• pp.80-88
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• 2000

The plasma spray technics has known as one of the surface modification methods to improve the mechenical properties or the functional charactristics of materials. This paper has been aimed to investigate the effects of plasma sprayed conditions, such as spray distance and arc power level, on sliding wear properties of plasma sprayed $Al_2$O$_3$-40%TiO$_2$coating layer. The sliding wear test using pin-on-disc type wear machine, has been conducted in several sliding speed for coating layer sparyed under different conditions. The result of this paper is that the wear resistance of plasma sprayed $Al_2$O$_3$-40%TiO$_2$coating layer is fluctuated with tile spray distance and the arc power level. The wear resiatance could be improved with decreasing the spray distance and with increasing the arc power level.

• Textile Coloration and Finishing
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• v.33 no.3
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• pp.113-119
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• 2021

Polypropylene fiber has the advantages of light weight, heat retention and antibacterial properties, but it is difficult to expand its market because it cannot be dyed or imparted functionality due to its hydrophobic properties. Atmospheric pressure plasma processing can modify the surface of the fiber and create polar functional groups on the surface of the fiber. In this study, an experiment was conducted on the hydrophilization of the ultra-hydrophobicity of polypropylene through plasma processing and surface changes before and after plasma processing. The ultra-hydrophobicity of polypropylene is the cause of impossible for dyeing and imparting functionality. Untreated polypropylene became hydrophilic, and it was confirmed that the ratio of oxygen and carbon(O/C) increased about 11 times from untreated polypropylene 0.017 to plasma-treated polypropylene 0.190.