• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.296-300
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• 2002

Thin films of Hydrogenated amorphous carbon(a-C:H) are generally exhibited by high electrical resistivities from 10$^2$ to 10$\^$16/ Ω$.$cm, resulting in an interesting material for high power, high temperature MIS devices applications. The hydrogenated amorphous carbon(a-C:H) films were deposited on silicon and glass using an rf plasma enhanced CVD method. The resultant film properties were evaluated in the respect of material based on r.f. power variation. The hydrogenated amorphous carbon(a-C:H) films of thickness ranging from 30 to 50 m were deposited at the pressure of 1 ton with the mixture of methane and hydrogen. We have used rf-IR( courier transform IR) and AFM(Atomic force microscopy) for determining physical properties and current-voltage(I-V) measurement for electrical Properties.

• Journal of the Korean institute of surface engineering
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• v.53 no.6
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• pp.343-350
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• 2020

The degradation of mechanical properties of nitride coatings to steel substrates is one of the main challenges for industrial applications. In this study, plasma nitriding treatment was used in order to increase the mechanical properties of Mo-Cu-N coating to the H13 tool steel. The nanostructured Mo-Cu-N coating was deposited using pulsed DC magnetron sputtering method with a single alloy Mo-Cu target. Mechanical properties of MoN-Cu coated samples after nitriding were found to be relatively better than non-nitrided MoN-Cu coating.

• Journal of the Korean Ceramic Society
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• v.45 no.2
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• pp.94-98
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• 2008

Silicon nitride($Si_3N_4)$ is one of the most widely used structural ceramic materials. However silicon nitride is difficult to sinter because of its strong covalent bonding characteristics. In this study, $Si_3N_4$ ceramics were fabricated by spark plasma sintering process with $Y_2O_3$ and $Al_2O_3$ addition to improve the sinterability and the mechanical properties and their phase transformation behavior, microstructure and mechanical properties were evaluated. Fully densified $Si_3N_4$ ceramics could be obtained by spark plasma sintering process at a lower temperature than conventional sintering method. The formation of network microstructure was affected by the addition of $Al_2O_3$ because it could accelerate a to ${\alpha}$ to ${\beta}$ phase transformation of $Si_3N_4$. As a result, the mechanical properties depended on amounts of $Al_2O_3$ addition. The hardness value increased with increasing ${\alpha}$-phase fraction, but fracture toughness value increase with increasing ${\beta}$-phase fraction.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.37-37
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• 2001

TiN coatings were applied for VarIOUS application fields, because of a good wear-resistance and a high hardness. Typically, TiN thin films show the hardness of 25GPa and friction coefficient of 0.6. However, in many field, one is looking for a more improved tool which has low friction coefficient and high wear resistance. The main motivation of this study is to characterize the influence of copper dopant content on TiN thin films. Ti-Cu-N thin films were deposited onto D2 steel substrates by PVD processing with various magnetron current densities (Cu contents). In this work, we synthesized titanium nitride films similar with reported typical titanium nitride films and synthesized Ti-Cu-N thin films with the addition of elemental copper which is measured improved hardness more than pure TiN films with copper content variables. This films has preferred oriented films of (111) direction. In addition, It was found that there is a strong correlation between content of various metal and film characteristics such as preferred orientation, grain size, hardness and friction coefficient and so, in future study, improved mechanical properties of TiN films can be controlled by change in target current density. The Ti-Cu-N film will show apparent hardness improvement and mechanical properties enhancement, when doping element is added onto TiN thin films. Film structure, chemical composition, mechanical properties were investigated by means of X-ray diffraction(XRD), scanning electron microscopy(SEM), transmission electron microscopy (TEM), energy dispersive spectroscopy(EDS), wear resistance tester and nanohardness tester.

• The Korean Journal of Ceramics
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• v.2 no.4
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• pp.212-215
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• 1996

This paper focuses the strength and wear resistance of CVD diamond films. The strength of free-standing CVD diamond films synthesized by microwave plasm CVD, DC plasma CVD, RF plasma CVD and arc discharge plasma jet CVD has been measured by three-point bending test. The wear resistance of CVD diamod films has been evaluated by the pin-on-disk type testing. diamond films coated on the base of sintered tungsten carbide pin by hot filament CVD have been rubbed with a sintered diamond disk in muddy water. Volume removed wear of CVD diamond has been compared with stellite, WC alloy and bearing steel.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05e
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• pp.92-95
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• 2003

In this paper, the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber, a RF power of 13.56MHz was applied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar-I line, luminance were investigated. At this time the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10~60m Torr, 10~300W respectively.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.10
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• pp.850-854
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• 2001

In this study, carbon nanotubes was vertically grown pm Ni/Cr-deposited glass substrates by Inductively Coupled Plasma Chemical Vapor Deposition. Using Radio-Frequence(RF) plasma below temperature of 600$^{\circ}C$. The grown CNTs shows field emission properties and high quality materials. Turn-on fields and current density showed 5V/${\mu}$m and 1.06${\times}$10$\^$-6/ A/$\textrm{cm}^2$, respectively.

• Journal of Magnetics
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• v.11 no.4
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• pp.156-159
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• 2006

We have studied the magnetic properties of the CuNi nanoparticles for three different sizes prepared by plasma and chemical techniques. The magnetization is enormously enhanced with decreasing the nanoparticle size. This enhanced magnetic moment shows almost inversely linear temperature dependence, which could be interpreted by the Langevin-type superparamagnetism. The field dependence exhibits ferromagnetic-like behavior with weak hysteresis, which could described in terms of uncompensated spin and/or surface anisotropy. In addition, the magnetic data suggest that the CuNi nanoparticles produced by the plasma method result in significantly less oxidized metallic nanoparticles than those prepared by other techniques.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.823-826
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• 2008

Phosphate glass added the various alkali additives is one of the substitutive materials for the barrier-ribs in plasma display panel. The results of differential thermal analysis and coefficient of thermal expansion show that the alkali oxides affect the thermal properties of phosphate glass.

• Proceedings of the KIEE Conference
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• 1995.11a
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• pp.323-325
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• 1995

An Inductively Coupled Plasma(ICP) was employed to prepare the Diamond-Like Carbon film with $CH_4$ gas. We observed the changes of mechanical, optical properties and internal stress of the films according to the variation of discharge power and negative-self bias. When weak magnetic field is applied, the properties of film are observed to change drastically. In magnetized case, the micro-hardness and the internal stress increase up to critical point and droped down in marked contrast to unmagnetized case. It suggests that large amount of ion flux exists due to high dissociation rate of the reactive radicals in plasma with magnetic field as reported elsewhere. As a result of FT-IR absorption measurement it could be confirmed that the $CH_x$ bonding and the micro-hardness and the internal stress decreased with the increase of negative-self bias.