• Title/Summary/Keyword: Plasma Properties

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Manufacturing and Properties of Al-Al2O3 Composite Coating Layer Using Warm Spray Process (Warm spray를 이용한 알루미늄-알루미나 복합 코팅층의 제조 및 특성)

  • Kwon, Eui-Pyo;Lee, Jong-Kweon
    • Korean Journal of Materials Research
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    • v.27 no.7
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    • pp.374-380
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    • 2017
  • Properties of coatings produced by warm spray were investigated in order to utilize this technique as a repair method for Al tire molds. $Al-(0-10%)Al_2O_3$ composite powder was sprayed on Al substrate by warm spraying, and the microstructure and mechanical properties of the composite coating layer were investigated. For comparative study, the properties of the coating produced by plasma spray, which is a relatively high-temperature spraying process, were also investigated. The composite coating layers produced by the two spray techniques exhibited significantly different morphology, perhaps due to their different process temperatures and velocities of particles. Whereas the $Al_2O_3$ particles in the warm sprayed coating layer maintained their initial shape before the spray, flattened and irregular shape $Al_2O_3$ particles were distributed in the plasma sprayed coating layer. The coating layer produced by warm spray showed significantly higher adhesive strength compared to that produced by plasma spray. Hardness was also higher in the warm sprayed coating layer compared to the plasma sprayed one. Moreover, with increasing the fraction of $Al_2O_3$, hardness gradually increased in both spray coating processes. In conclusion, an $Al-Al_2O_3$ composite coating layer with good mechanical properties was successfully produced by warm spray.

Filler-Elastomer Interactions. 11. Influence of Atmospheric Pressure Plasma on Surface Properties of Nanoscaled Silicas (충전재-탄성체 상호작용. 11. 상압플라즈마 처리가 나노구조의 실리카 표면특성에 미치는 영향)

  • Park, Soo-Jin;Jin, Sung-Yeol;Kaang, Shin-Young
    • Elastomers and Composites
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    • v.40 no.1
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    • pp.22-28
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    • 2005
  • In this work, the effect of oxygen plasma treatment of nano-scaled silica on the mechanical interfacial properties and thermal stabilities of the silica/rubber composites was investigated. The surface properties of the silica were studied in X-ray photoelectron spectroscopy (XPS) and contact angles. And, their mechanical interfacial properties and thermal stabilities of the composites were characterized by tearing energy ($G_{IIIC}$) and thermogravimetric analysis (TGA), respectively. As a result, it was found that the introduction rate of oxygen-containing polar functional groups onto the silica surfaces was increased by increasing the plasma treatment time, resulting in improving the tearing energy. Also, the thermal stabilities of the composites were increased by increasing the treatment time. These results could be explained that the polar rubber, such as acrylonitrile butadiene rubber (NBR), showed relatively a high degree of interaction with oxygen-containing functional groups of the silica surfaces in a compounding system.

Comparative study of plasma effects on human liver normal and cancer cells (정상 간세포와 간암세포의 플라즈마 특성에 관한 비교연구)

  • Kim, Dae-Yeon;Gweon, Bo-Mi;Kim, Dan-Bee;Choe, Won-Ho;Shin, Jennifer H.
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1539-1542
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    • 2008
  • Plasma is 4th state of matters, which consists of electrons, neutral, and ionized particles. In biomedical research, cold plasma, which is generated in atmospheric condition, has been applied to disinfect microorganisms such as bacteria and yeast cells. Because of its low temperature condition, the heat-sensitive medical device can be easily sterilized by the cold plasma treatment. In recent years, the effects of plasma on mammalian cells have arisen as a new issue. Generally, plasma induces intensity dependent necrotic cell death. In this research, we investigate the feasibility of cold plasma treatment for cancer therapy by conducting comparative study of plasma effects on normal and cancer cells. We use THLE-2 (human liver normal cell) and SK-Hep1 (human liver metathetic cancer cell) as our target cells. The needle type of cold plasma is generated by the Helium plasma device. Two types of cells have different onset plasma conditions for the necrosis, which may be explained by difference in electrical properties of these two cell types.

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Luminescence Property of ZnS:Mn,Mg Phosphor with Excitation of Plasma Blue Light Source

  • Ryu, Si Hong;Kim, Wan Kyu;Lee, Seong Eui
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.1
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    • pp.24-27
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    • 2013
  • In this paper, we investigated the effect of luminescence properties of various concentrations of magnesium-doped ZnS:Mn phosphor excited by plasma luminescence device. The PL intensity was evaluated in the range of 300~500 nm excitation wavelengths. We found the highest PL intensity of the phosphors excited by 365 nm and 450 nm was observed at Mg concentrations of 1.4 wt% and 0.8 wt%, respectively. In addition, an emission peak was distinguished at 580 nm wavelength. With increasing Mg dopant level, enhanced PL intensity was observed, which is possibly applicable to color converting materials by blue emission for white light sources. Finally, we evaluated the luminance properties of color converting ZnS:Mn,Mg phosphors with plasma blue light source. the white luminance of plasma light source with CIE(0.36,0.26) was established by color converting phosphors of ZnS:Mn with 0.8 wt% Mg.

Enhanced Anti-reflective Effect of SiNx/SiOx/InSnO Multi-layers using Plasma Enhanced Chemical Vapor Deposition System with Hybrid Plasma Source

  • Choi, Min-Jun;Kwon, O Dae;Choi, Sang Dae;Baek, Ju-Yeoul;An, Kyoung-Joon;Chung, Kwun-Bum
    • Applied Science and Convergence Technology
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    • v.25 no.4
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    • pp.73-76
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    • 2016
  • Multi-layer films of $SiN_x/SiO_x$/InSnO with anti-reflective effect were grown by new-concept plasma enhanced chemical vapor deposition system (PECVD) with hybrid plasma source (HPS). Anti-reflective effect of $SiN_x/SiO_x$/InSnO was investigated as a function of ratio of $SiN_x$ and $SiO_x$ thickness. Multi-layers deposited by PECVD with HPS represents the enhancement of anti-reflective effect with high transmittance, comparing to the layers by conventional radio frequency (RF) sputtering system. This change is strongly related to the optical and physical properties of each layer, such as refractive index, composition, film density, and surface roughness depending on the deposition system.

Synthesis of SiC Nano-powder from TEOS by RF Induction Thermal Plasma (RF 열플라즈마를 이용한 TEOS로 부터의 SiC 나노분말 합성)

  • Ko, Sang-Min;Koo, Sang-Man;Kim, Jin-Ho;Kim, Ji-Ho;Byeon, Myeong-Seob;Hwang, Kwang-Taek
    • Journal of the Korean Ceramic Society
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    • v.48 no.1
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    • pp.1-5
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    • 2011
  • Silicon carbide (SiC) has recently drawn an enormous industrial interest because of its useful mechanical properties such as thermal resistance, abrasion resistance and thermal conductivity at high temperature. RF Thermal plasma (PL-35 Induction Plasma, Tekna CO., Canada) has been utilized for synthesis of high purity SiC powder from cheap inorganic solution (Tetraethyl Orthosilicate, TEOS). It is found that the powders by thermal plasma consist of SiC with free carbon and amorphous silica ($SiO_2$) and, by thermal treatment and HF treatment, the impurities are driven off resulting high purity SiC nano-powder. The synthesized SiC powder lies below 30 nm and its properties such microstructure, phase composition, specific surface area and free carbon content have been characterized by X-ay diffraction (XRD), field emission scanning electron microscopy (FE-SEM), thermogravimetric (TG) and Brunauer-Emmett-Teller (BET).

Plasma Treatments to Forming Metal Contacts in Graphene FET

  • Choi, Min-Sup;Lee, Seung-Hwan;Lim, Yeong-Dae;Yoo, Won-Jong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.121-121
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    • 2011
  • Graphene formed by chemical vapor deposition was exposed to the various plasmas of Ar, O2, N2, and H2 to examine its effects on the bonding properties of graphene to metal. Upon the Ar plasma exposure of patterned graphene, the subsequently deposited metal electrodes remained intact, enabling successful fabrication of field effect transistor (FET) arrays. The effects of enhancing adhesion between graphene and metals were more evident from O2 plasmas than Ar, N2, and H2 plasmas, suggesting that chemical reaction of O radicals induces hydrophilic property of graphene more effectively than chemical reaction of H and N radicals and physical bombardment of Ar ions. From the electrical measurements (drain current vs. gate voltage) of field effect transistors before and after Ar plasma exposure, it was confirmed that the plasma treatment is very effective in controlling bonding properties of graphene to metals accurately without requiring buffer layers.

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Effect of Micro Casting and Plasma-etching on Polycaprolactone Film for Bone (뼈 재생을위한 폴리카프로락톤 필름에 대한 마이크로 캐스팅 및 플라즈마 에칭)

  • Lee, Jae-Yun;Yang, Ji-Hun;Kim, Geun-Hyeong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2018.06a
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    • pp.24-24
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    • 2018
  • One of the challenges in tissue engineering is the design of optimal biomedical scaffolds, which can be governed by topographical surface characteristics, such as size, shape, and direction. Of these properties, we focus on the effects of nano - to micro - sized hierarchical surface. To fabricate the hierarchical surface structure on poly(${\varepsilon}$-caprolactone) (PCL) film, we employed a nano/micro-casting technique (NCT) and modified plasma process. The micro size topography of PCL film was controlled by sizes of the micro structures on lotus leaf. Also, the nano-size topography and hydrophilicity of PCL film were controlled by modified plasma process. After the plasma treatment, the hydrophobic property of the PCL film was significantly changed into hydrophilic property, and the nano-sized structure was well developed, as increasing the plasma exposure time and applied power. The surface properties of the modified PCL film were investigated in terms of initial cell morphology, attachment, and proliferation using osteoblast-like-cells (MG63). In particular, initial cell attachment, proliferation and osteogenic differentiation in the hierarchical structure were enhanced dramatically compared to those of the smooth surface.

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Electrical Properties of Interlayer Low Dielectric Polyimide with Electron Cyclotron Resonance Etching Process (ECR 식각 공정에 따른 층간절연막 폴리이미드의 전기적 특성)

  • 김상훈;안진호
    • Journal of the Microelectronics and Packaging Society
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    • v.7 no.3
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    • pp.13-17
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    • 2000
  • The electrical properties of polyimide for interlayer dielectric applications are investigated with ECR (Electron Cyclotron Resonance) etching process. ECR etching with $Cl_2$-based plasma, generally used for aluminum etching, results in an increase in the dielectric constant of polyimide, while $SF_{6}$ plasma exhibits a high polyimide etch rate and a reducing effect of the dielectric constant. The leakage current of the polyimide is significantly suppressed after plasma exposure. Combination of Al etching with $Cl_2$plasma and polyimide etching with $SF_{6}$ plasma is expected as a good tool for realizing the multilevel metallization structures.

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Optical Properties of Organic Light Emitting Diode and Characteristics of ITO by Variation of Radio Frequency Plasma Power (Radio Frequency Plasma Power변화에 따른 ITO 특성 및 OLED의 광학적 특성)

  • Ki, Hyun-Chul;Kim, Hwe-Jong;Hong, Kyung-Jin;Kim, En-Mei;Gu, Hal-Bon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.1
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    • pp.81-85
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    • 2009
  • We has been analysed optical properties of OLED(organic light emitting diode) and characteristics of ITO(Indium Tin Oxide) in terms of $O_2$ plasma treatment for manufacturing high efficiency OLED, RF power of $O_2$ plasma was changed 25, 50, 100, 200 W. $O_2$ gas flow, gas pressure and treatment time were fixed. Sheet resistance and surface roughness of ITO were measured by Hall-effect measurement system and AFM, respectively. The ranges of sheet resistance and surface roughness were $5.5{\sim}6,06\;{\Omega}$ and $2.438{\sim}3.506\;nm$ changing of RF power, respectively, PM(Passive Matrix)OLED was fabricated with the structure of ITO(plasm treatment)/TPD($400\;{\AA}$)/$Alq_3(600\;{\AA})$/LiF($5\;{\AA}$)/Al($1200\;{\AA}$). Turn-on voltage of PMOLED was 7 V and luminance was $7,371\;cd/m^2$ at the RF power of 25 W, $O_2$ plasma treatment of ITO surface was result in lowering the operating voltage and improving luminance of PMOLED.