• The Transactions of The Korean Institute of Electrical Engineers
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• v.65 no.10
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• pp.1706-1711
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• 2016

Electromagnetic wave simulation was performed to predict characteristics of manufactured cutoff probe at low temperature magnetized plasma medium. Microwave cutoff probe is designed for research the properties of magnetized inductively coupled plasma. It was shown that the cutoff probe method can safely be used for weakly magnetized high density plasma sources. Cutoff probe system with two port network analyzer has been prepared and applied to measure electron density distributions in large area, 13.56MHz driven weakly magnetized inductively coupled plasma source. The results shown that, the plasma frequency confirmed cut-off characteristics in low temperature plasma. Especially, cut-off characteristics was found at upper hybrid resonance frequency in the environment of the magnetic field. In case of a induced weak magnetic field in inductively coupled plasma, plasma density estimated from the cutoff frequency in the same way at unmagnetized plasma due to nearly same plasma frequency and upper hybrid resonance frequency. The plasma density is increased and uniformity is improved by applying a induced weak magnetic field in inductively coupled plasma.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.66 no.11
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• pp.1600-1604
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• 2017

Mo-Cu alloys have been widely used for heat sink materials, vacuum technology, automobile and many other applications due to their excellent physical and electronic properties. Especially, Mo-Cu composites with 5~20 wt% copper are widely used for the heavy duty service contacts due to their excellent properties like low coefficient of thermal expansion, wear resistance, high temperature strength and prominent electrical and thermal conductivity. In most of the applications, high dense Mo-Cu materials with homogeneous microstructure are required for high performance, which has led in turn to attempts to prepare ultra-fine and well-dispersed Mo-Cu powders in different ways, such as spray drying and reduction process, electroless plating technique, mechanical alloying process and gelatification-reduction process. However, most of these methods were accomplished at high temperature (typically degree), resulting in undesirable growth of large Cu phases; furthermore, these methods usually require complicated experimental facilities and procedure. In this study, Mo-Cu alloying were prepared by planetary ball milling (PBM) and spark plasma sintering (SPS) and the effect of Cu with contents of 5~20 wt% on the microstructure and properties of Mo-Cu alloy has been investigated.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05c
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• pp.178-181
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• 2003

In this work, we etched PZT films with various additive gases ($O_2$ and Ar) in $Cl_2/CF_4$ plasmas, while mixing ratio was fixed at 8/2. After the etching, the plasma induced damages are characterized in terms of hysteresis curves, leakage current, retention properties, and switching polarization. When the electrical properties of PZT etched in $O_2$ or Ar added $Cl_2/CF_4$ were compared, the value of remanent polarization in $O_2$ added $Cl_2/CF_4$ plasma is higher than that in Ar. added plasma. The maximum etch rate of the PZT thin films was 145 nm/min for 30% Ar added $Cl_2/CF_4$ gas having mixing ratio of 8/2 and 110 nm/min for 10% $O_2$ added to that same gas mixture. In order to recover the ferroelectic properties of the PZT thin films after etching, we annealed the etched PZT thin films at $550^{\circ}C$ in an $O_2$ atmosphere for 10 min. From the hysteresis curves, leakage current, retention property and switching polarization, the reduction of the etching damage and the recovery via the annealing was turned out to be more effective when $O_2$ was added to $Cl_2/CF_4$ than Ar. X-ray diffraction (XRD) showed that the structural damage was lower when $O_2$ was added to $Cl_2/CF_4$. And the improvement in the ferroelectric properties of the annealed samples was consistent with the increased intensities of the (100) and the (200) PZT peaks.

• Polymer(Korea)
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• v.35 no.6
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• pp.565-573
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• 2011

The nanocomposites containing graphene oxide (GO) were prepared in order to improve the mechanical properties of poly(methyl methacrylate)/aluminum hydroxide (PMMA/AH) composites. GO was prepared from graphite by oxidation of Hummers method followed by exfoliation with thermal treatment. The surface of GO was modified by oxygen plasma in various exposure times from 0 to 70 min to improve interfacial compatibility. Compared with PMMA/AH composites, the nanocomposites containing GO modified with oxygen plasma for the exposure time up to 50 min showed significant increases in flexural strength, flexural modulus, Rockwell hardness, Barcol hardness, and Izod impact strength. The morphology of fracture surface showed an improved interfacial adhesion between PMMA/AH composites and GO, which was properly treated with oxygen plasma. The mechanical properties of nanocomposites were deteriorated by increasing the content of GO above 0.07 phr due to the nonuniform dispersion of GO.

• Proceedings of the KWS Conference
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• 1993.05a
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• pp.76-78
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• 1993

• Proceedings of the Korean Vacuum Society Conference
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• 2001.02a
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• pp.107-107
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• 2001

• Proceedings of the Membrane Society of Korea Conference
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• 2002.05a
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• pp.94-97
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• 2002

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.149-149
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• 1999

• Proceedings of the Materials Research Society of Korea Conference
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• 1993.11a
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• pp.68-68
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• 1993

• Proceedings of the Materials Research Society of Korea Conference
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• 1996.05a
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• pp.44-44
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• 1996