• 제목/요약/키워드: Plasma Properties

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The effect of plasma damage on electrical properties of amorphous GaInZnO film

  • Kim, Min-Kyu;Park, Jin-Seong;Jeong, Jae-Kyeong;Jeong, Jong-Han;Ahn, Tae-Kyung;Yang, Hui-Won;Lee, Hun-Jung;Chung, Hyun-Joong;Mo, Yeon-Gon;Kim, Hye-Dong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.640-643
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    • 2007
  • The effect of plasma damage was investigated on amorphous gallium-indium-zinc oxide (a-GIZO) films and transistors. Ion-bombardment by plasma process affects to turn semiconductor to conductor materials and plasma radiation may degrade to transistor electrical properties. All damages are easily recovered with a $350^{\circ}C$ thermal annealing.

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Adhesion and Electrical Performance by Plasma Treatment of Semiconductive Silicone Rubber (반도전성 실리콘 고무의 플라즈마 표면처리에 따른 접착특성과 절연성능)

  • Hwang, Sun-Mook;Lee, Ki-Taek;Hong, Joo-Il;Huh, Chang-Su
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.5
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    • pp.450-456
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    • 2005
  • In this paper, the effect of adhesion properties of semiconductive-insulating interface layer of silicone rubber on electrical properties was investigated. The modifications produced on the silicone surface by oxygen plasma were accessed using ATR-FTIR, contact angle and Surface Roughness Tester. Adhesion was obtained from T-peel tests of semiconductive layer haying different treatment durations. In addition, ac breakdown test was carried out for elucidating the change of electrical property with duration of plasma treatment. From the results, the treatment in the oxygen plasma produced a noticeable increase in surface energy, which can be mainly ascribed to the creation of O-H and C=O. It is observed that adhesion performance was determined by surface energy and roughness level of silicone surface. It is found that at dielectric strength was increased with improving the adhesion between the semiconductive and insulating interface.

Improving Hydrophilic and Finishing Performance of Dyeable PP through Atmospheric Pressure Plasma Treatment (플라즈마 처리를 통한 가염PP의 친수화도 및 가공성능 향상)

  • Cho, Hang Sung
    • Textile Coloration and Finishing
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    • v.34 no.3
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    • pp.165-172
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    • 2022
  • Polypropylene(PP) is a textile material with various functions such as eco-friendliness, lightness, and elasticity. Although most synthetic fibers can be dyed and finished, but original PP is difficult to dye or finish due to its extremely hydrophobic properties, so its application expansion is limited. In order to solve this problem, dyeable PP was developed, and various researches on textiles for clothing such as mass production technology, fine fiberization and performance improvement are in progress. Plasma treatment is a processing method for modifying the surface of fabrics, and has effects such as hydrophilization, deepening color, improving adhesion, and surface polymerization. In this study, plasma treatment was applied to study changes in hydrophilization properties of dyeable PP, surface changes before and after plasma treatment and performance according to hydrophilization.

Enhanced Hydrophilic Property of TiO2 Thin Film Deposited on Glass Etched with O2 Plasma

  • Kim, Hwa-Min;Seo, Sung Bo;Kim, Dong Young;Bae, Kang;Sohn, Sun Young
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.3
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    • pp.152-155
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    • 2013
  • $TiO_2$ films were deposited on glass substrates with and without $O_2$ plasma etching by using the RF-magnetron sputtering method. We focused on the effect of surface structure on the photoinduced hydrophilic properties of $TiO_2$ films, fabricated on different surface conditions according to the presence or absence of the $O_2$ plasma treatment on glass substrates. The wettability and photoinduced hydrophilic properties of the $TiO_2$ films were investigated according to the changes in water contact angles under UV light irradiations with a very low intensity of 0.1 $mW/cm^2$. The photoinduced hydrophilic properties on the $TiO_2$ formed above the plasma treated glass were also superior to those on the $TiO_2$ formed above the bare glass. This enhanced $TiO_2$ film has been used practically for self cleaning and anti-fogging glasses.

Effects of hydrogen gas on the properties of DLC films deposited by plasma CVD (Plasma CVD에 의한 DLC 박막 제작시 수소가스의 영향)

  • Moon, Yang-Sik;Lee, Jai-Sung;Lee, Hae-Sung;Lee, Jae-Yup;Park, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1532-1535
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    • 1996
  • Diamond-like carbon (DLC) films have been prepared by a widely-used plasma CVD with an rf (13.56MHz) plasma of $CH_4$ gas. The hydrogen incorporated in DLC films plays an important role of determining the film properties, but its exact role has not been clear. In this study, the effect of hydrogen on the film properties of DLC has been examined by adding the hydrogen gas to the $CH_4$ gas during deposition and by exposing the prepared film to the hydrogen plasma. As the content of additive hydrogen gas increases, the density and hardness of the film increase, but the growth rate decreases. The FT-IR spectroscopy results show that the number of C-H bonds decreases with increasing the hydrogen gas. Also, the variation in the position of "G" and "D" peaks due to additive hydrogen, which has been measured by the Raman spectroscopy, indicates of $sp^3$ fraction.

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The Transient Response of CF$_4$ RF Plasmas Using One-dimensional Fluid Model (1차원 유체모델을 이용한 CF$_4$ RF 플라즈마의 과도응답 특성)

  • 소순열;임장섭
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.1
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    • pp.24-29
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    • 2004
  • $CF_4$ gas is one of the most useful gases in modern technologies for semiconductor fabrication. However, there are many problems which should be solved in order to fabricate semiconductor device, for example, etching speed drop due to ion charge-up and etching selectivity drop due to the high electron energy. One of useful method in order to suppress their damages above is pulsed-time modulated plasma (PM). However, transient responses of charged particles occur when the source power is turned-on and -off in PM method. To control plasma properties in detail, such a transient phenomenon must be investigated. In this paper, we investigate $CF_4$ RF plasma properties under a one-dimensional fluid model. And also for dynamic and stable control of $CF_4$ plasmas, we investigated the transient behavior of the plasmas after step up or down of the amplitude of the power source voltage $V_s$(t). Fundamental properties of transient $CF_4$ plasmas was discussed. Furthermore, we intend to discuss new method for pulsed-time plasma modulation.

Fabrication of Agglomerated Cr$_2$O$_3$ Powder for Plasma Spray Coating by Spray Drying Process (분무 건조법에 의한 프라즈마 용사를 Cr$_2$O$_3$조립 분말 제조)

  • 이동원
    • Journal of Powder Materials
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    • v.5 no.1
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    • pp.28-34
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    • 1998
  • Plasma sprayed ceramic coatings are widely used in various industrial fields to improve their properties or to reduce the production cost. The ceramic powders for plasma spray coating have been mainly manufactured by spray drying or fused+crushed process. In this study, chromium oxide which has better mechanical properties than those of the other ceramic was selected and agglomerated chromium oxide powders for plasma spray coating were produced by spray drying process with a various processing condition. The large hollow powders and the harsh surfaced powders are formed at high slurry feed rate more than 163 g/min. and low binder concentration less than 2wt%, respectively. These powders cause the considerable decrease of flowability and apparent density. The powders produced by spray drying process have the spherical shape with the mean size of 45 ${\mu}m$, but these are shown lower apparent density and flowability than the powders produced by fused+crushed powders. The plasma spray coated layers by spray dried powders are shown a different microstructure with that by fused+crushed powders in porosity shape, but their properties such as density, hardness and bond strength are similar.

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Statistical Analysis of Microhardness Variations in Plasma Sprayed $Cr_3C_2-NiCr$ Coatings

  • Li, Jianfeng;Huang, jingqi;Ding, Chuanxian
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.171-178
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    • 1998
  • The microstructure and properties of plasma-sprayed coatings depend on a great number of spraying parameters, random factors, which lead to vibration in these spraying parameters, may in some degree influence the microstructure and properties of the coatings. Therefore, the property values appear certain distributions, and the description and comparison of the properties of plasma-sprayed coatings should be performed employing statistical analysis. In this paper, $Cr_3C_2$-Nicr coatings of different thickness were sprayed onto stainless steel using atmosphere plasma system and adopting three kinds of gun translation speeds. Then the microhardness measurements were performed on polished surface of the coatings. Forty readings were taken and statistically analyzed by calculating the characteristic values, estimating and comparing the means, and assessing whether they belonged to the Normal or Weibull Distribution. This study has found that statistical analysis could discriminate influence of spraying parameters and coating design on microhardness of the $Cr_3C_2$-Nicr coatings from random vibration, which showed that the microharness of the $Cr_3C_2$-Nicr coatings were related to gun translation speed coating thickness.

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Structural Properties of chemically deposited CdS Films on plasma treated PET (고밀도 산소 플라즈마 처리된 폴리머 기판에 성장시킨 CdS 박막의 특성 분석)

  • Song, Woo-Chang;Park, Seung-Beom;Lim, Dong-Gun;Lee, Jae-Hyeong;Park, Jong-Kuk;Park, Ha-Yong;Kim, Jeong-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.228-228
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    • 2008
  • CdS is II-VI semiconductor with a wide band gap of approximately 2.42 eV. CdS is the most popularly employed heterojunction partner to p-CdTe due to its similar chemical properties. In this work, to improvement of the surface properties of the CdS films, PET substrate is treated by high density $O_2$ plasma. CdS films are prepared by chemical bath deposition(CBD) method. In case of the PET substrate with plasma treatment for 2min, the crystalline orientation of CdS films exhibits a strong hexagonal(002). Grain size was increased from 300nm without $O_2$ plasma treatment to 380nm with an $O_2$ plasma treatment.

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Characteristics of Molecular Band Energy Structure of Lipid Oxidized Mammalian Red Blood Cell Membrane by Air-based Atmospheric Pressure Dielectric Barrier Discharge Plasma Treatment

  • Lee, Jin Young;Baik, Ku Youn;Kim, Tae Soo;Jin, Gi-Hyeon;Kim, Hyeong Sun;Bae, Jae Hyeok;Lee, Jin Won;Hwang, Seung Hyun;Uhm, Han Sup;Choi, Eun Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.262.1-262.1
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    • 2014
  • Lipid peroxidation induces functional deterioration of cell membrane and induces cell death in extreme cases. These phenomena are known to be related generally to the change of physical properties of lipid membrane such as decreased lipid order or increased water penetration. Even though the electric property of lipid membrane is important, there has been no report about the change of electric properties after lipid peroxidation. Herein, we demonstrate the molecular energy band change in red blood cell membrane through peroxidation by air-based atmospheric pressure DBD plasma treatment. Ion-induced secondary electron emission coefficient (${\gamma}$ value) was measured by using home-made gamma-focused ion beam (${\gamma}$-FIB) system and electron energy band was calculated based on the quantum mechanical Auger neutralization theory. The oxidized lipids showed higher gamma values and lower electron work functions, which implies the change of surface charging or electrical conductance. This result suggests that modified electrical properties should play a role in cell signaling under oxidative stress.

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