• 한국재료학회:학술대회논문집
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• 한국재료학회 1998년도 IUMRS-ICEM ABSTRACT BOOK
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• pp.151.1-151
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• 1998

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 춘계학술대회 논문집 센서 박막재료
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• pp.15-17
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• 2001

A new possibility of our atmospheric cold plasma torch has been examined on the surface treatment of an air-exposed vulcanized rubber compound. The plasma treatment effect was evaluated by the bondability with another rubber compound using a polyurethane adhesive.

• 한국환경과학회지
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• 제11권12호
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• pp.1315-1320
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• 2002

Since the enzymatic degradation of microbial poly[(R)-3-hydroxybutyrate-co-3-hydroxyvalerate] (P(3HB-co-3HV)) initially occurs by a surface erosion process, a degradation behavior could be controlled by the change of surface property. In order to control the rate of enzymatic degradation, plasma gas discharge and blending techniques were used to modify the surface of microbial P(3HB-co-3HV). The surface hydrophobic property of P(3HB-co-3HV) film was introduced by CF$_3$H plasma exposure. Also, the addition of small amount of polystyrene as a non-degradable polymer with lower surface energy to P(3HB-co-3HV) has been studied. The enzymatic degradation was carried out at 37 $^{\circ}C$ in 0.1 M potassium phosphate buffer (pH 7.4) in the presence of an extracellular PHB depolymerase purified from Alcaligenes facalis T1. Both results showed the significant retardation of enzymatic erosion due to the hydrophobicity and the enzyme inactivity of the fluorinated- and PS-enriched surface layers.

• Journal of Korean Vacuum Science & Technology
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• 제3권1호
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• pp.24-29
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• 1999

The characteristic behaviors of CH3Br were examined first for the dry etching of polysilicon in a Cl2/CH3Br/O2 plasma. CH3Br is revealed one of the excellent additive gases to control anisotropy of etching profile and to give no undercutting for various typed of polysilicons. CH3Br acts as a passivation precursor on the side wall in etch cavity by forming polymer-like films such as CHxBry(x+y=1,2). The decrease of etch selectivity due to the reaction if the C-containing species from CH3Br with the surface O atoms of SiO2 was overcome by the addition of O2 into plasma, resulting that the selectivity increased by 2~3 times. According to the results of optical emission signals, CH3Br should be dissociated into several fragments to give more hydrogen atoms than bromine atoms in our helical resonator system.

• Elastomers and Composites
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• 제34권2호
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• pp.128-134
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• 1999

타이어 코드용 강철선을 RF 플라즈마를 이용한 acetylene 및 butadiene 가스의 플라즈마 중합으로 코팅하였으며, 타이어용 고무와의 접착력을 TCAT 또는 T-test로 측정하였다. 강철선의 접착력은 사용된 gas, plasma power, 코팅시간 및 가스 압력에 따라 측정하였으며, 플라즈마 중합에 앞서 Ar 플라즈마 에칭으로 타이어 코드를 세척하였다. 또한 $80^{\circ}C$의 증류수에서 7일간 노화시켜 접착력 저하를 고찰하였으며, 접착력 시험 후 타이어 코드 표면을 SEM으로 분석하여 파괴거동을 규명하고자 하였다. 가장 우수한 접착력은 acetylene의 경우 20W, 2분, 25mtorr에서, 그리고 butadiene의 경우는 l0W, 4분, 25mtorr에서 얻을 수 있었으며, Ar 에칭에 의한 접착력 변화는 없었다. 노화에 의한 접착력 저하는 없었으며, 도리어 증가하는 현상을 보였다. SEM 분석에서 강철선의 높은 거칠기와 플라즈마 코팅의 얇은 두께로 인하여 파괴거동 규명에는 한계가 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.76-77
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• 2009

CdS 박막은 에너지 밴드갭이 상온에서 2.42 eV인 직접 천이헝 반도체로써 태양전지 및 광전도 셀과 광센서 등에 널리 사용되고 있다. 본 논문에서는 유연성을 가지고 있는 PC, PET, PEN등 폴리머 기판을 $O_2$ 플라즈마를 사용하고 RF Power 100W, 공정시간 60~1200s의 조건에서 전처리하고, 이 기판을 CBD법을 이용하여 CdS 박막을 증착시켰다. 폴리머 기판의 결정립크기는 180s의 처리시간 부터 증가를 보였으며, 전기적 특성은 60s 와 180s에서 이동도와 비저항이 반비례하는 경향성을 나타내었고 광투과율은 처리시간에 따른 뚜렷한 변화를 보이지 않았다.

• 한국진공학회지
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• 제8권4B호
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• pp.565-571
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• 1999

In this study, high-density plasma etching characteristics of ITO(indium tin oxide) films used for transparent electrode in dispaly devices were investigated. Plasma diagnostic and surface analysis tools were used to understand etch reaction mechanism. The etch rate of ITO was increased by the increase of reactive radicals such as H and $CH_3$ with the addition of moderate amount of $CH_4$ to Ar. However, the addition of excess amount of $CH_4$ decreased possibly due to the increased polymer formation on the ITO surface being etched. The increase of source power and bias boltage increased ITO etch rates but it decreased selectivities over under-layers $(SiO_2, Si_3N_4)$. The increase of working pressure up to 20mTorr also increased ITO etch rates, however the further increased of the pressure decreased ITO etch rates. From the analysis of XPS, a peak related to the polymer of hydrocarbon was observed on the etched ITO surface especially for high $CH_4$ conditions and it appears to affect ITO etch rates.

• Membrane and Water Treatment
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• 제1권2호
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• pp.103-120
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• 2010

Surface modification of microfiltration and ultrafiltration membranes has been widely used to improve the protein adsorption resistance and permeation properties of hydrophobic membranes. Several surface modification methods for converting conventional membranes into low-protein-binding membranes are reviewed. They are categorized as either physical modification or chemical modification of the membrane surface. Physical modification of the membrane surface can be achieved by coating it with hydrophilic polymers, hydrophilic-hydrophobic copolymers, surfactants or proteins. Another method of physical modification is plasma treatment with gases. A hydrophilic membrane surface can be also generated during phase-inverted micro-separation during membrane formation, by blending hydrophilic or hydrophilic-hydrophobic polymers with a hydrophobic base membrane polymer. The most widely used method of chemical modification is surface grafting of a hydrophilic polymer by UV polymerization because it is the easiest method; the membranes are dipped into monomers with and without photo-initiators, then irradiated with UV. Plasma-induced polymerization of hydrophilic monomers on the surface is another popular method, and surface chemical reactions have also been developed by several researchers. Several important examples of physical and chemical modifications of membrane surfaces for low-protein-binding are summarized in this article.

• Transactions on Electrical and Electronic Materials
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• 제12권3호
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• pp.110-114
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• 2011

Polymeric films of high chemical stability and mechanical strength covered with a thin metallic film have been extensively used in various fields as electric and electronic materials. In this study, we have chosen polypropylene (PP) as the polymer due to its outstanding chemical resistance and good creep resistance. We coated thin nickel film on PP films by the electroless plating process. The surfaces of PP films were pre-treated and modified to increase the adhesion strength of metal layer on PP films, prior to the plating process, by an environment-friendly process with atmospheric plasma generated using dielectric barrier discharges in air. The surface morphologies of the PP films were observed before and after the surface modification process using a scanning electron microscope (SEM). The static contact angles were measured with deionized water droplets. The cross-sectional images of the PP films coated with thin metal film were taken with SEM to see the combined state between metallic and PP films. The adhesion strength of the metallic thin films on the PP films was confirmed by the thermal shock test and the cross-cutting and peel test. In conclusion, we made a composite material of metallic and polymeric films of high adhesion strength.

• 폴리머
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• 제26권6호
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• pp.778-784
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• 2002

덱스트란 용액으로 필름을 제조하여 여러 가지 특성들을 살펴보았으며, 가소제 및 가교제를 첨가하거나 저온 플라스마로 표면을 처리함으로써 이러한 특성들을 향상시킬 수 있는 지를 살펴보았다. 덱스트란 필름은 기계적 강도는 우수하였으나 부스러지기 쉽고 수분에 대단히 약한 특성을 보였다 가소제를 첨가할 경우에는 유연성이 크게 개선되는 대신에 기계적 강도가 크게 약화되었다. 하지만, 가소제를 첨가한 다음 가교제로 가교시키거나 함께 첨가할 경우에는 비교적 우수한 기계적 강도와 함께 유연성을 지닌 필름이 제조되었으며, 수분에 대한 저항성도 향상되었다. 또한, 아세틸렌 플라스마로 처리할 경우 필름 자체의 특성은 크게 변하지 않으나 친수성인 표면이 소수성으로 바뀌었다.