• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.304.1-304.1
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• 2016

We have investigated the effect of plasma nitridation of atomic layer deposited-Al2O3 films of monocrystalline Si wafers and the thermal properties of nitridated Al2O3 films. Nitridation was performed on Al2O3 to form aluminum oxynitride (AlON) using NH3 plasma treatment in a plasma-enhanced chemical vapor deposition and it was conducted at temperature of $400^{\circ}C$ with various plasma power condition. After nitridation, we performed firing and forming gas annealing (FGA). For each step, we have observed the minority carrier lifetime and the implied Voc by using quasi-Steady-State photoconductance (QSSPC). We confirmed a tendency to increase the minority carrier lifetime and the implied Voc after the nitridation. On the other hand, the minority carrier lifetime and the implied Voc was decreased after Firing and forming gas annealing (FGA). To get more information, we studied properties of the plasma treated Al2O3 films by using Secondary Ion Mass Spectroscopy (SIMS) and X-ray Photoelectron Spectroscopy (XPS).

• 한국환경과학회지
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• 제12권12호
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• pp.1255-1260
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• 2003

Plasma-photocatalytic oxidation process was applied in the decomposition of Triethylamine(TEA) and Methyl ethyl ketone(MEK). Plasma reactor was made entirely of pyrex glass and consists of 24mm inner diameter, 1,800mm length and discharge electrode of 0.4mm stainless steel. And initial concentrations of TEA and MEK for plasma-photocatalytic oxidation are 100 ppm. Odor gas samples were taken by gas-tight syringe from a glass sampling bulb which was located at reactor inlet and outlet, and TEA and MEK were determined by GC-FID. For plasma process, the decomposition efficiency of TEA and MEK were evaluated by varying different flowrates and decomposition efficiency of TEA and MEK increased considerably with decreasing treatment flowrates. For photocatalytic oxidation process, also the decomposition efficiency of TEA and MEK increased considerably with decreasing treatment flowrates. The decomposition efficiency of MEK was 57.8％, 34.2％, 18.8％ respectively and the decomposition efficiency of TEA was reached all 100％. This result is higher than that of plasma process only, From this study, the results indicate that plasma-photocatalytic oxidation process is ideal for treatment of TEA and MEK.

• 한국전기전자재료학회논문지
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• 제18권10호
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• pp.941-944
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• 2005

In this experiment, OLEDs(Organic Light Emitting Diodes) was fabricated to confirm effect of Plasma treatment which increase the hole injection characteristic from anode. Device structure was $ITO/2-TNATA/{\alpha}-NPD/DPVBi/BAlq/Alq_3/Al:Li$. We used DPVBi (4, 4 - Bis (2,2-diphenylethen-1-yls) - Biphenyl) as a blue emitting material. To optimize the process condition of plasma treatment, we used 2 gases of the oxygen and nitrogen gas under 120 mTorr with 100 W, 200 W, and 400 W plasma power. The current efficiency of $N_2$ plasma is more efficient than that of $O_2$ plasma. At $1000 cd/m^2$, we obtained the maximum current efficiency of 6.45 cd/A using $N_2$ gas with 200 W plasma power.

• 한국표면공학회지
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• 제41권4호
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• pp.134-141
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• 2008

We have developed a numerical model for a remote ICP(inductively coupled plasma) system in 2D and 3D with gas distribution configurations and confirmed it by plasma diagnostics. The ICP source has a Cu tube antenna wound along a quartz tube driven by a variable frequency rf power source($1.9{\sim}3.2$ MHz) for fast tuning without resort to motor driven variable capacitors. We investigated what conditions should be met to make the plasma remotely localized within the quartz tube region without charged particles' diffusing down to a substrate which is 300 mm below the source, using the numerical model. OES(optical emission spectroscopy), Langmuir probe measurements, and thermocouple measurement were used to verify it. To maintain ion current density at the substrate less than 0.1 $mA/cm^2$, two requirements were found to be necessary; higher gas pressure than 100 mTorr and smaller rf power than 1 kW for Ar.

• 한국대기환경학회지
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• 제23권6호
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• pp.727-733
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• 2007

In this study, a newly developed biotrickling system, combined with a non-thermal plasma reactor, was investigated to effectively treat gaseous contaminants such as VOCs (Volatile Organic Compounds). Three kinds of non-thermal plasmas (NTPs) such as a rod type dielectric barrier discharge (DBD) plasma, a packed bead type DBD plasma and a gliding arc (GA) plasma, were tested and compared in terms of power consumption. The rod type DBD plasma was selected as one for integration with biotrickling system due to its relatively high VOC removal efficiency, low power consumption and low pressure drop. Toluene and xylene as representatives of VOCs were used as test gases. The experiment results showed that the efficiency of biotrickling system was especially very low at the high gas concentration and high flow rate and the removal efficiencies of VOCs were considerably enhanced in the biotrickling system, when the DBD plasma was worked in front of that even at the high gas concentration and high flow rate.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.236-236
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• 2011

Silicon oxynitride (SiON) was deposited for gas barrier film on polyethylene terephthalate (PET) using octamethylycyclodisiloxane (Si4O4C8H24, OMCTS) precursor by plasma enhanced chemical vapor deposition (PECVD) at low temperature. The ion flux and substrate temperature were measured by oscilloscope and thermometer. The chemical bonding structure and barrier property of films were characterized by Fourier transform infrared (FT-IR) spectroscopy and the water vapor transmission rate (WVTR), respectively. The deposition rate of films increases with RF bias and nitrogen dilution due to increase of dissociated precursor and nitrogen ion incident to the substrate. In addition, we confirmed that the increase of nitrogen dilution and RF bias reduced WVTR of films. Because, on the basis of FT-IR analysis, the increase of the nitrogen gas flow rate and RF bias caused the increase of the C=N stretching vibration resulting in the decrease of macro and nano defects.

• Korean Membrane Journal
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• 제1권1호
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• pp.65-72
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• 1999

The surface of polypropylene membrane was modified by plasma treatment using Ar,$N_{2}$, $NH_{2}$ and $O_{2}$ Permeabilities for $CO_{2}$, $N_{2}$ and separation factor for $CO_{2}$ relative to $N_{2}$ were measured. The permeation experiments were performed by a variable volume method at $25^{\circ}C$ and 0.303MPa. The effects of the plasma conditions such as treatement time power input gas flow rate and pressure in the reactor on the transport properties of modified membrane were investigated. The surface of the plasma treated membrane was analyzed by means of FTIR-ATR XPS and AFM. The surface structure of the plasma treated membrane was fairly different from that of the untreated membrane. Although the permeation rates for both $CO_{2}$ and $N_{2}$ decreased with increasing plasma treatement time the separation factor was found to be improved by the plasma treatement. The operating conditions of plasma treatement imposed on membranes had notable effect on the permeability and separation factor.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제53권7호
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• pp.377-381
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• 2004

A discharge plasma reactor using a ferroelectric pellet packed bed is now used as a removal means of pollutant gases, such as NOx, SOx and VOCs. When an ac voltage is applied to this plasma reactor, then the pellets are polarized, and great electric fields are formed at each top and bottom contact points of the ferroelectric pellets. Thus the points of each pellet become covered with intense corona discharges, where an electrophysicochemical reaction is taking place strongly However these strong discharges also elevate the temperature of the pellets greatly and concurrently decrease the output ozone generation, as a result, the overall removal efficiency of gas becomes decreased greatly A new configuration of discharge plasma reactor using a ferroelectric pellet layer and a wire-to-wire electrode has been proposed and investigated experimentally. It is found that an intensive microdischarge is taking place on the surface of ac corona-charged ferroelectric pellet layer of the proposed reactor, which concurrently enhances the efficiency of plasma generation greatly And, this type of configuration of plasma reactor utilizing a wire-to-wire electrode and a ferroelectric pellet layer could be used as one of effective plasma reactors to remove pollutant gas.

• Journal of Information Display
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• 제2권4호
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• pp.1-7
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• 2001

This paper investigates the characteristics of a newly developed high density hollow cathode plasma(HCP) system and its application for the etching of silicon wafers. We used $SF_6$ and $O_2$ gases in the HCP dry etch process. This paper demonstrates very high plasma density of $2{\times}10^{12}cm^{-3}$ at a discharge current of 20 rna, Silicon etch rate of 1.3 ${\mu}m$/min was achieved with $SF_6/O_2$ plasma conditions of total gas pressure of 50 mTorr, gas flow rate of 40 seem, and RF power of200W. This paper presents surface etching characteristics on a crystalline silicon wafer and large area cast type multicrystlline silicon wafer. We obtained field emitter tips size of less than 0.1 ${\mu}m$ without any photomask step as well as with a conventional photolithography. Our experimental results can be applied to various display systems such as thin film growth and etching for TFT-LCDs, emitter tip formations for FEDs, and bright plasma discharge for PDP applications. In this research, we studied silicon etching properties by using the hollow cathode plasma system.

• 멤브레인
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• 제4권4호
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• pp.205-212
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• 1994

플라스마 고분자막을 통한 일반기체들(He, $H_2,\;CO_2,\;O_2,\;N_2,\;CH_4$등)의 투과특성을 조사하였으며 IR 분석을 통하여 플라즈마 고분자의 화학적 구조를 살펴 보았다. 플라즈마 고분자막은 불소를 함유한 방향족 화합물의 플라즈마 중합에 의하여 제조하였으며 이 막을 통한 기체투과실험은 $35^{\circ}C$, 1기압에서 행하였다. 이 막들의 투과계수는 투과기체의 분자 크기가 커질수록 감소하는 경향을 나타내었다. 플라즈마 고분자의 $O_2/N_2$ 선택투과도는 상용고분자보다 약간 낮았으나 $CO_2/CH_4$ 선택투과도는 상용고분자보다 매우 높은 것으로 나타났다. FT-IR 분석을 통하여 플라즈마 고분자는 방향족과 지방족 구조를 모두 포함한 구조를 이루고 있다는 것을 알 수 있었다.