• Journal of Advanced Marine Engineering and Technology
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• v.22 no.5
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• pp.712-720
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• 1998

The effect of H2:N2 gas ratio on the case thickness hardness and nitrides formation in the sur-face of SCM440 machine structural steel have been studied by micro-pulse plasma process. The thickness of compound layer increased with the increase of nitrogen content in the gas com-position. The maximum thickness of compound layer the maximum case depth and the maximum surface hardness were about 15.8${\mu}m$, 400${\mu}m$ and Hv765 respectively in the nitriding condition of 250Pa and 70% nitrogen content at $520^{\circ}C$ for 7hrs. Generally only nitride phases such as ${\'{\gamma}}$($Fe_4N$)$\varepsilon(Fe_2}{_3N}$ phases were detected in compound and diffusion layer by XRD analysis. The amount of $\varepsilon(Fe_2}{_3N}$ phase increased with the increase of nitrogen content. The relative amounts and kind of phases formed in the nitrided case changed with the change of nitrogen content in the gas composition.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.05b
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• pp.115-119
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• 2004

This paper is investigated about the effect of vibration of the water surface for hydrogen gas generation by non-thermal plasma. The vibration of the water surface is more powerful with increasing applied voltage. In this experimental reactor which is made of multi-needle and plate, the maximum acquired hydrogen production rate is about 6.8[ml/sec]. Although the generation of hydrogen gas is increased with elevating time, it is saturated after specific time due to the volume of reactor and the saturation of taylor cone.

• Applied Science and Convergence Technology
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• v.26 no.6
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• pp.189-194
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• 2017

Effects of gas injection scheme and rf driving current configuration in a dual turn inductively coupled plasma (ICP) system were analyzed by 3D numerical simulation using CFD-ACE+. Injected gases from a tunable gas nozzle system (TGN) having 12 horizontal and 12 vertical nozzles showed different paths to the pumping surface. The maximum velocity from the nozzle reached Mach 2.2 with 2.2 Pa of Ar. More than half of the injected gases from the right side of the TGN were found to go to the pump without touching the wafer surface by massless particle tracing method. Gases from the vertical nozzle with 45 degree slanted angle soared up to the hottest region beneath the ceramic lid between the inner and the outer rf turn of the antenna. Under reversed driving current configuration, the highest rf power absorption region were separated into the two inner islands and the four peaked donut region.

• Journal of electromagnetic engineering and science
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• v.18 no.1
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• pp.63-69
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• 2018

This work demonstrates attenuation effects of plasma on waves propagating in the 26.5-40 GHz range. The effect is investigated via experiments measuring the transmission between two Ka-band horn antennas set 30 cm apart. A dielectric-barrier-discharge (DBD) plasma generator with a size of $200mm{\times}100mm{\times}70mm$ and consisting of 20 layers of electrodes is placed between the two antennas. The DBD generator is placed in a $400mm{\times}300mm{\times}400mm$ acrylic chamber so that the experiments can be performed for plasma generated under various conditions of gas and pressure, for instance, in air, Ar, and He environments at 0.001, 0.05, and 1 atm of pressure. Attenuation is calculated by the difference in the transmission level, with and without plasma, which is generated with a bias voltage of 20 kV in the 0.1-1.4 kHz range. Results show that the attenuation varies from 0.05 dB/m to 9.0 dB/m depending on the environment. Noble gas environments show higher levels of attenuation than air, and He is lossier than Ar. In all gas environments, attenuation increases as pressure increases. Finally, electromagnetic models of plasmas generated in various conditions are provided.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.863-865
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• 2001

In this study, RuO$_2$thin films were etched in inductively coupled $O_2$plasma. Etching characteristics of RuO$_2$thin films including etch rate and selectivity were evaluated as a function of rf power in $O_2$plasma and gas mixing ratio in $O_2$/Ar plasma. In $O_2$ plasma, the etch rate of RuO$_2$thin film increases as rf power increases. In $O_2$/Ar plasma, the etch rate of RuO$_2$thin film increases up to 10% Ar, but decrease with furthermore increasing Ar mixing ratio. The enhanced etch rate can be obtained with increasing rf power and small addition of Ar gas.

• Journal of the Korean Ceramic Society
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• v.29 no.9
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• pp.681-688
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• 1992

Ultrafine Si3N4 and Si3N4+SiC mixed powders were synthesized through thermal plasma chemical vapor deposition(CVD) using a hybrid plasma, which was characterized by the supersposition of a radio-frequency plasma and arc jet. The reactant SiCl4 was injected into an arc jet and completely decomposed in a hybrid plasma, and the second reactant CH4 and/or NH3 mixed with H2 were injected into the tail flame through double stage ring slits. In the case of ultrafine Si3N4 powder synthesis, reaction efficiency increased significantly by double stage injection compared to single stage one, although crystallizing behaviors depended upon injection speed of reactive quenching gas (NH3+N2) and injection method. For the preparation of Si2N4+SiC mixed powders, N/C composition ratio could be controlled by regulating the injection speed of NH3 and/or CH4 reactant and H2 quenching gas mixtures as well as by adjusting the reaction space.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.324-325
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• 2008

In this Study, We fabricated a plasma discharge cluster with external electrodes which can be applied to flexible backlight in a polymer substrate and investigated the discharge characteristics. The Sealing process was progressed in vacuum chamber, which enable to fabricate plasma discharge cluster. The results of discharge characteristics show that the static memory margin of plasma discharge cluster was increased, as Ne/Xe(5%) gas pressure was increased. also, When gas pressure was 100torr at 600um of electrode gap, we have obtained high luminance of a plasma discharge cluster.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.401-404
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• 2003

This paper investigates the effect of plasma treatment of aluminum on the fracture toughness of aluminum/CFRP composites, The surface of the aluminum panel was treated by a DC plasma. The plasma treatment was carried out at volume ratio of acetylene gas to nitrogen gas of 5:5 and the treatment times used was 30 sec. The fracture toughness of plasma-treated aluminum/CFRP' composites was compared with that of untreated aluminum/CFRP composites and The fracture surface of aluminum/CFRP composites was compared with SEM. The results showed that fracture toughness of plasm-treated aluminum/CFRP composites was about 50% higher than that of untreated aluminum/CFRP composites.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.58 no.12
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• pp.2474-2479
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• 2009

This paper presents an atmospheric microplasma-jet device for bio~medical application. The microplasma-jet device consists of four components; a thin Ni anode, porous alumina insulator, a stainless steel cathode and an aluminum case. The anode has 8 holes, and hole diameter and depth are $200 {\mu}m$ and $60 {\mu}m$, respectively. The discharge test was performed in atmospheric pressure using nitrogen gas and AC voltage at the optimum gas flow rate of 4 Vmin. The plasma-jet is ejected stably for the input voltage ranging from 5.5 to $9.5 kV_{p-p}$. The plasma becomes dense as the input voltage increases, which was verified by the hydrophilicity change of PMMA surface treated by the plasma. The temperature increasement of the aluminum film exposed to plasma-jet illustrates that the micro plasma-jet device is feasible for bio-medical application.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.51 no.9
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• pp.413-416
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• 2002

It was reported that low temperature plasma developed by our group was apparently homogeneous and stable at atmospheric pressure, and was generated if the alumina was used as a dielectric insulating material and Ar gas as a plasma gas. This is a structure in which the dielectric materials are covered and arranged in parallel in the one side of electrode. In this experiment, we discovered that dielectric material was important to generate normal electric discharge. To examine the effect of dielectric material on the electric discharge characteristic, the voltage and current of the plasma was measured and the electrical effect of dielectric material was examined. Also, it was applied to an etching of tin oxide films.