• Journal of the Korean Institute of Telematics and Electronics A
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• v.33A no.12
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• pp.47-52
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• 1996

Cl-based gas chemistry is generally used to etching for al alloy metallization. After the etching of Al alloy with Cl-based gas plasma, residual chlorine on Al alloy reacts with H$_{2}$O due to air exposure and results in Al corrosion. In this study, the corrosion phenomena of Al wer examined with XPS(X-ray photoelectron spectroscopy) and SEM (scanning electorn microscopy). It was confirmed that chlorine mainly existed at the grian boundary of Al alloy after plasma etching of Al alloy with cl-based gas chemistry and Al corrosion was largely generated at the grain boundary of Al alloy. And residual chlorine was passivated by sulfur and fluorine which were generated by SF$_{6}$ plasma. These effects of passivation reduced the Al corrosion due to air exposure.

• Fibers and Polymers
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• v.5 no.1
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• pp.52-58
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• 2004

Previous investigation results revealed that after the Low Temperature Plasma (LTP) treatment, the hydrophilicity of wool fiber was improved significantly. Such improvement enhances the wool dyeing and finishing processes which might be due to the changes of the wool surface to a more reactive one. In this paper, wool fibers were treated with LTP with different gases, namely, oxygen, nitrogen and gas mixture (25 % hydrogen/75 % nitrogen). Investigations showed that chemical composition of wool fiber surface varied differently with the different plasma gas used. The surface chemical composition of the different LTP-treated wool fibers was evaluated with different characterization methods, namely FTIR-ATR, XPS and saturated adsorption value. The experimental results were thoroughly discussed.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.52 no.11
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• pp.508-511
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• 2003

In this paper, electrical characteristics of inductively coupled plasma in an electrodeless fluorescent lamp were investigated using a Langmuir probe with a variation of argon gas pressure. The RF output was applied in the range of 5 ∼ 50 (W) at 13.56 (MHz). The internal plasma voltage of the chamber and the probe current were measured while varying the supply voltage to the Langmuir probe in the range of -100 (V) ∼+100 (V). When the pressure of argon gas was increased, electric current was decreased. There was a significant electric current increase from l0W to 30 〔W〕. Also, when the RF power was increased, electron density was increase. This implies that this method can be used to find an optimal RF rower for efficient light illumination in an electrodeless fluorescent lamp.

• Journal of Powder Materials
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• v.14 no.2 s.61
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• pp.140-144
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• 2007

Using Spark Plasma Sintering process (SPS), consolidation behavior of gas atomized $Mg_{97}Zn_1Y_2$ alloys were investigated via examining the microstructure and evaluating the mechanical properties. In the atomized ahoy powders, fine $Mg_{12}YZn$ particles were homogeneously distributed in the ${\alpha}-Mg$ matrix. The phase distribution was maintained even after SPS at 723 K, although $Mg_{24}Y_5$ particles were newly precipitated by consolidating at 748 K. The density of the consolidated bulk Mg-Zn-Y alloy was $1.86g/cm^3$. The ultimate tensile strength (UTS) and elongation were varied with the consolidation temperature.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.53 no.1
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• pp.20-23
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• 2004

In this paper, the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber, a RF power of 13.56 [MHz] was applied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar I line, luminance were investigated. At this time, the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10∼60 [mTorr], 10∼300 [W], respectively. From emission intensity and lumnance intensity results, the mode transition from E-mode to H-mode was observed. This implies that this method can be used to find an optimal RF power for efficient light illumination in an electrodeless fluorescent lamp.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.557-557
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• 2013

Plasma hardly grows in lowpressure because of lack of collision. But low pressure plasma has useful properties because it has typically low electron density. In here, thermal electron is used to make breakdown in low pressure easily. We changed magnetic field strength and gas to control electron density or temperature. IV characteristic and electron density of the discharge are examined and the characteristic of the discharge in presence of magnetic field is also examined. Results showed that depending on the ionization cross section of the gas, electron density is changed and proper strength of magnetic field is required for high electron density.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.41 no.5
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• pp.483-491
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• 1992

Plasma silicon oxynitride film has been applied as a final passivation layer for semiconductor devices, because it has high resistance to humidity and prevents from alkali ion's penetration, and has low film stress. Structure properties of plasma silicon oxynitride film have been studied experimentally by the use of FT-IR, AES, stress gauge and ellipsometry. In this experiment,Si-N bonds increase as NS12TO/(NS12TO+NHS13T) gas ratio increases. Peaks of Si-N bond, Si-H bond and N-H bond were shifted to high wavenumber according to NS12TO/(NS12TO+NHS13T) gas ratio increase. Absorption peaks of Si-H bond were decreased by furnace anneal at 90$0^{\circ}C$. The atomic composition of film represents that oxygen atoms increase as NS12TO/(NS12TO+NHS13T) gas ratio increases, to the contrary, nitrogen atoms decrease.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1990.10a
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• pp.105-107
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• 1990

In this study, we prepared plasma polymerized thin films as changing the composition rate of the Ar/CO$_2$, 0 to 100%, for analysing the influence of CO$_2$ gas in plasma polymerization. Power source was the RF frequence (13.56MHz), the monomers were styrene and MMA (Methyl-methacrylate), and substrates were glass and KBr(or NaCl) for IR spectroscopy. The molecular structure of plasma polymerized organic thin films was examined by IR, FT-IR, Gas chromatography and so forth.

• Proceedings of the KIEE Conference
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• 2004.11a
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• pp.147-149
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• 2004

Inductively coupled plasma is commonly used for electrodeless lamp due to its ease of plasma generation. Optical characteristics significantly depend on the RF power and gas pressure of the plasma. This paper describes the measurement of spectrum as a function of RF power and gas pressure with a goal of finding optimal operating conditions of the electrodeless lamp. The gas pressure was varied from 10 [mTorr] to 100 [mTorr] and the RF power was varied from 10 [W] to 120 [W]. It was found that the intensity of wavelength tends to be decreased when argon pressure is increased, and the intensity of wavelength is increased as RF power is increased.

• Proceedings of the KIEE Conference
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• 2004.11a
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• pp.299-301
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• 2004

Inductively coupled plasma is commonly used for electrodeless lamp due to its ease of plasma generation. Optical characteristics significantly depend on the RF power and gas pressure of the plasma. This paper describes the measurement of luminous efficacy as a function of RF power and gas pressure with a goal of finding optimal operating conditions of the electrodeless lamp. The gas pressure was varied from 10 [mTorr] to 100 [mTorr] and the RF power was varied from 10 [W] to 120 [W]. It was found that the luminous flux tends to be decreased when argon pressure is increased, and the luminous flux is increased as RF fewer is increased. It was also found that the luminance efficacy is high when the argon pressure is low and when the RF power is low.