• 제목/요약/키워드: Plasma Electrical Conductivity

검색결과 147건 처리시간 0.021초

DLC 박막의 전기전도성, 투과율 및 가스베리어 특성에 관한 연구 (Study on Electrical Conductivity, Transmittance and Gas Barrier Properties of DLC Thin Films)

  • 박새봄;김치환;김태규
    • 열처리공학회지
    • /
    • 제31권4호
    • /
    • pp.187-193
    • /
    • 2018
  • In this study, the electrical conductivity, transmittance and gas barrier properties of diamond-like carbon (DLC) thin films were studied. DLC is an insulator, and has transmittance and oxygen gas barrier properties varying depending on the thickness of the thin film. Recently, many researchers have been trying to apply DLC properties to specific industrial conditions. The DLC thin films were deposited by PECVD (Plasma Enhanced Chemical Vapor Deposition) process. The doping gas was used for the DLC film to have electrical conductivity, and the optimum conditions of transmittance and gas barrier properties were established by adjusting the gas ratio and DLC thickness. In order to improve the electrical conductivity of the DLC thin film, $N_2$ doping gas was used for $CH_4$ or $C_2H_2$ gas. Then, a heat treatment process was performed for 30 minutes in a box furnace set at $200^{\circ}C$. The lowest sheet resistance value of the DLC film was found to be $18.11k{\Omega}/cm^2$. On the other hand, the maximum transmittance of the DLC film deposited on the PET substrate was 98.8%, and the minimum oxygen transmission rate (OTR) of the DLC film of $C_2H_2$ gas was 0.83.

P형 열전분말의 수소환원처리가 상온열전특성에 미치는 영향 (Effect of Hydrogen Reduction Treatment on Room-Temperature Thermoelectric Performance of p-type Thermoelectric Powders)

  • 김경태;장경미;하국현
    • 한국분말재료학회지
    • /
    • 제17권2호
    • /
    • pp.136-141
    • /
    • 2010
  • Bismuth-telluride based $(Bi_{0.2}Sb_{0.8})_2Te_3$ thermoelectric powders were fabricated by two-step planetary milling process which produces bimodal size distribution ranging $400\;nm\;{\sim}\;2\;{\mu}m$. The powders were reduced in hydrogen atmosphere to minimize oxygen contents which cause degradation of thermoelectric performance by decreasing electrical conductivity. Oxygen contents were decreased from 0.48% to 0.25% by the reduction process. In this study, both the as-synthesized and the reduced powders were consolidated by the spark plasma sintering process at $350^{\circ}C$ for 10 min at the heating rate of $100^{\circ}C/min$ and then their thermoelectric properties were investigated. The sintered samples using the reduced p-type thermoelectric powders show 15% lower specific electrical resistivity ($0.8\;m{\Omega}{\cdot}cm$) than those of the as-synthesized powders while Seebeck coefficient and thermal conductivity do not change a lot. The results confirmed that ZT value of thermoelectric performance at room temperature was improved by 15% due to high electric conductivity caused by the controlled oxygen contents present at bismuth telluride materials.

Growth and characterization of BON thin films prepared by low frequency RF plasma enhanced MOCVD method

  • Chen, G.C.;Lim, D.-C.;Lee, S.-B.;Hong, B.Y.;Kim, Y.J.;Boo, J.-H.
    • 한국표면공학회지
    • /
    • 제34권5호
    • /
    • pp.510-515
    • /
    • 2001
  • It was first time that low frequency R.F. derived plasma enhanced MOCVD with frimethylborate precursor was used to fabricate a new ternary compound $BO_{x}$ $N_{y}$ . The formation of BON molecule was resulted from nitrogen nitrifying B-O, and forming the angular molecule structure proved by XPS and FT-IR results. The relationship between hardness and film thickness was studied. An thickness-independent hardness was fond about 10 GPa. The empirical calculation of band-gap and UV test result showed that our deposited $BO_{x}$ $N_{y}$ thin film was semiconductor material with 3.4eV of wide band gap. The electrical conductivity, $4.8$\times$10^{-2}$ /($\Omega$.cm)$^{-1}$ also confirmed that $BO_{x}$ $N_{y}$ has a semiconductor property. The roughness detected from the as-grown films showed that there was no serious bombarding effect due to anion in the plasma occurring in the RF frequency derived plasma.

  • PDF

Energy-controlled Micro Electrical Discharge Machining for an Al2O3-carbon Nanotube Composite

  • Ha, Chang-seung;Son, Eui-Jeong;Cha, Ju-Hong;Kang, Myung Chang;Lee, Ho-Jun
    • Journal of Electrical Engineering and Technology
    • /
    • 제12권6호
    • /
    • pp.2256-2261
    • /
    • 2017
  • Carbon nanotube (CNT) and alumina ($Al_2O_3$) are synthesized into hybrid composites, and an advanced electrical discharge machining (EDM) system is developed for the machining of hard and conductive materials. CNT nanoparticles are mixed with $Al_2O_3$ powder and the $Al_2O_3$/CNT slurry is sintered by spark plasma. The hardness and the electrical conductivity of the $Al_2O_3$/CNT hybrid composite were investigated. The electrical discharge is controlled by a capacitive ballast circuit. The capacitive ballast circuit is applied to the tungsten carbide and the $Al_2O_3$/CNT hybrid composite. The voltage-current waveforms and scanning electron microscope (SEM) images were measured to analyze the characteristics of the boring process. The developed EDM process can manufacture the ceramic based hybrid composites, thereby expecting the variety of applications.

고주파 열플라즈마 토치를 이용한 Ni 금속 입자의 나노화 공정에 대한 전산해석 연구 (Numerical Analysis on RF (Radio-frequency) Thermal Plasma Synthesis of Nano-sized Ni Metal)

  • 남준석;홍봉근;서준호
    • 한국전기전자재료학회논문지
    • /
    • 제26권5호
    • /
    • pp.401-409
    • /
    • 2013
  • Numerical analysis on RF (Radio-Frequency) thermal plasma treatment of micro-sized Ni metal was carried out to understand the synthesis mechanism of nano-sized Ni powder by RF thermal plasma. For this purpose, the behaviors of Ni metal particles injected into RF plasma torch were investigated according to their diameters ($1{\sim}100{\mu}m$), RF input power (6 ~ 12 kW) and the flow rates of carrier gases (2 and 5 slpm). From the numerical results, it is predicted firstly that the velocities of carrier gases need to be minimized because the strong injection of carrier gas can cool down the central column of RF thermal plasma significantly, which is used as a main path for RF thermal plasma treatment of micro-sized Ni metal. In addition, the residence time of the injected particles in the high temperature region of RF thermal plasma is found to be also reduced in proportion to the flow rate of the carrier gas In spite of these effects of carrier gas velocities, however, calculation results show that a Ni metal particle even with the diameter of $100{\mu}m$ can be completely evaporated at relatively low power level of 10 kW during its flight of RF thermal plasma torch (< 10 ms) due to the relatively low melting point and high thermal conductivity. Based on these observations, nano-sized Ni metal powders are expected to be produced efficiently by a simple treatment of micro-sized Ni metal using RF thermal plasmas.

소용량 교류 MHD발전기에 대한 실험적 연구 (Experiment on Small A.C. MHD Power Generator)

  • 전춘생
    • 전기의세계
    • /
    • 제25권5호
    • /
    • pp.79-87
    • /
    • 1976
  • This paper is to investigate the A.C generation of MHD engine, converting directly the kinetic energy of conductive gas in high temperature to electric power by the effect of magnetic field. It is known that there are at least two kinds of method in A.C MHD power generation; one, by sending stationary plasma flow in an alternating or rotating magnetic field and the other, by transmission of pulse type plasma flow in uniform and constant magnetic field, former method is adopted here. In order to raise the total efficiency of close cycle in combination with nuclear power and MHD genertaion, an argon plasma jet is utilized as heat source, which is not mixed with the seed material, and the design data are obtained for A.C MHD generation in small capacity, but induced voltage and power output have the maximum values, 15 voltages and 7.5W respectively due to plasma flow with low conductivity and weak magnetic field.

  • PDF

펄스파워를 이용한 실린더형 전극간 금속 플라즈마 생성현상의 전산유동해석 (COMPUTATIONAL MODELING AND SIMULATION OF METAL PLASMA GENERATION BETWEEN CYLINDRICAL ELECTRODES USING PULSED POWER)

  • 김경진;곽호상;박중윤
    • 한국전산유체공학회지
    • /
    • 제19권4호
    • /
    • pp.68-74
    • /
    • 2014
  • This computational study features the transient compressible and inviscid flow analysis on a metallic plasma discharge from the opposing composite electrodes which is subjected to pulsed electric power. The computations have been performed using the flux corrected transport algorithm on the axisymmetric two-dimensional domain of electrode gap and outer space along with the calculation of plasma compositions and thermophysical properties such as plasma electrical conductivity. The mass ablation from aluminum electrode surfaces are modeled with radiative flux from plasma column experiencing intense Joule heating. The computational results shows the highly ionized and highly under-expanded supersonic plasma discharge with strong shock structure of Mach disk and blast wave propagation, which is very similar to muzzle blast or axial plasma jet flows. Also, the geometrical effects of composite electrodes are investigated to compare the amount of mass ablation and penetration depth of plasma discharge.

반도체 플라즈마 식각 장치의 부품 가공 연구 (A Study of Machining Optimization of Parts for Semiconductor Plasma Etcher)

  • 이은영;김문기
    • 반도체디스플레이기술학회지
    • /
    • 제19권4호
    • /
    • pp.28-33
    • /
    • 2020
  • Plasma etching process employs high density plasma to create surface chemistry and physical reactions, by which to remove material. Plasma chamber includes silicon-based materials such as a focus ring and gas distribution plate. Focus ring needs to be replaced after a short period. For this reason, there is a need to find materials resistant to erosion by plasma. The developed chemical vapor deposition processing to produce silicon carbide parts with high purity has also supported its widespread use in the plasma etch process. Silicon carbide maintains mechanical strength at high temperature, it have been use to chamber parts for plasma. Recently, besides the structural aspects of silicon carbide, its electrical conductivity and possibly its enhanced life time under high density plasma with less generation of contamination particles are drawing attention for use in applications such as upper electrode or focus rings, which have been made of silicon for a long time. However, especially for high purity silicon carbide focus ring, which has usually been made by the chemical vapor deposition method, there has been no study about quality improvement. The goal of this study is to reduce surface roughness and depth of damage by diamond tool grit size and tool dressing of diamond tools for precise dimensional assurance of focus rings.

증착 압력이 a-Si:H막의 전도도와 광학적 특성에 미치는 영향 (Effect of Deposition Pressure on the Conductivity and Optical Characteristics of a-Si:H Films)

  • 전법주;정일현
    • 공업화학
    • /
    • 제10권1호
    • /
    • pp.98-104
    • /
    • 1999
  • 본 연구에서는 ECR플라즈마 화학증착법을 이용하여 반응기내 압력의 변화에 따라 수소화된 무정형 실리콘막을 증착하고 박막내 수소의 함량과 결합구조 및 전기적 특성을 조사하였다. 일반적인 CVD에 의해 제조된 a-Si:H막은 증착속도가 증가할수록 광감도는 감소하지만 ECR플라즈마의 경우 증착속도가 증가할수록 광감도가 향상되었다. 마이크로파 출력과 사일렌/수소 희석비, 반응기내 압력등이 동일한 실험 조건에서 증착시간에 따른 막의 두께는 선형적으로 증가하고 막내에 함유된 수소의 농도는 일정하지만, 반응시간이 짧은 경우 막내에 $SiH_2$결합이 SiH결합보다 많이 형성되어 광전도도를 저하시킬 수 있다. 반응기내 압력이 증가함에 따라 박막내에 SiH결합이 증가하여 광학 에너지 갭을 줄여 광전도도를 향상시킬 수 있었으나 암전도도의 증가로 광감도는 감소하였다. 따라서 양질의 박막을 얻기 위해서는 압력이 낮고 수소기체의 양이 적은 조건에서 성장시켜야 한다.

  • PDF

플라즈마 공정과 전기분해 공정의 간헐 운전이 상추성장과 양액 성분에 미치는 영향 (Effects of Intermittent Operation of Plasma and Electrolysis Processes on Lettuce Growth and Nutrient Solution Components)

  • 김동석;박영식
    • 한국환경과학회지
    • /
    • 제26권1호
    • /
    • pp.109-118
    • /
    • 2017
  • This study was conducted to investigate the effects of intermittent plasma and electrolysis treatments on lettuce (Lactuca sativa var. oak-leaf.), nutrient solution components ($NO_3{^-}-N$, $NH_4{^+}-N$, $PO{_4}^{3-}-P$, $K^+$, $Ca^{2+}$ and $Mg^{2+}$) and environmental parameters (electrical conductivity, total dissolved solids and pH). The recirculating hydroponic cultivation system consisted of planting port, LED lamp, water reservoir and circulating pump. Nutrient solution was circulated in the following order: reservoir ${\rightarrow}$ filtration-plasma or filtration-electrolysis ${\rightarrow}$ planting port ${\rightarrow}$ reservoir. The results showed that nutrient solution components and environmental parameters were changed by plasma or electrolysis treatment. Lettuce growth was not affected by the intermittent plasma or electrolysis treatment with 30 minutes or 90 minutes, respectively. The roots of the lettuce was damaged by excessive plasma and electrolysis treatment. Electrolysis treatment had greater effect on than plasma treatment because of the accumulation of high levels of TRO (Total Residual Oxidants).