• Proceedings of the KIEE Conference
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• 1995.11a
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• pp.438-440
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• 1995

The impedance characteristics and plasma parameters were experimentally studied in a weakly magnetized planar type, inductively coupled plasma (ICP) system. Compared with non-magnetized for system higher power transfer efficiency, stable impedance matching, enhancement of plasma density and higher electron temperature can be obtained. Such improvements are mainly due to the excitation of deeply penetrating electromagnetic wave and reduction of radial loss of electrons. In particulary, $SF_6$ (sulfur hexafluride) plasma shows unstable impedance matching in non-magnetized ICP because electronegativity of $SF_6$ effects on plasma characteristics. But, magnetized inductively coupled $SF_6$ plasma shows enough impedance matching stability to be applicable to the polysilicon etching in semiconductor process.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.63 no.12
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• pp.1661-1666
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• 2014

In this paper, a compact planar ultra wideband (UWB, 3.1~10.6GHz) multiple-input multiple-output (MIMO) antenna is proposed. This antenna consists of two monopole planar UWB antennas and T-shaped stub decoupling between two antennas. The T-shaped stub improve the isolation characteristic at the wide band. The evolution strategy(ES) algorithm is employed to optimized design. As a result, optimized antenna has a return loss less than -10dB and the isolation less than -15dB from 3.1GHz to 10.6GHz. During the optimization process, the antenna gain is enhanced at lower band and the envelope correlation coefficient(ECC) is lower than 0.003.

• Korean Journal of Geomatics
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• v.5 no.1
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• pp.35-42
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• 2005

Precise geometric registration is required in multi-source data fusion process to obtain synergistic results successfully. However, most of the previous studies focus on the assumption of perfect registration or registration in a limited local area with intuitively derived simple geometric model. In this study, therefore, we developed a robust method for geometric registration based on a systematic model that is derived from the geometry associated with the data acquisition processes. The key concept of the proposed approach is to utilize smooth planar patches extracted from LIDAR data as control surfaces to adjust exterior orientation parameters of the aerial images. Registration of the simulated LIDAR data and aerial images was performed. The experimental results show that the RMS value of the geometric discrepancies between two data sets is decreased to less than ${\pm}0.30\;m$ after applying suggested registration method.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.10 no.6
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• pp.373-377
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• 2000

For 6H-SiC single crystals which was obtained by sublimation growth (modified Lely process), the relation between the defects and the etch pits to be formed at the site of dislocations were discussed. Typical hexagonal etch pits were formed on (0001) basal plane. The similar hexagonal etch pit shapes were formed on the site of micropipe defects and it was realized that internal planar defects was formed with the same matrix crystal structure as grown crystals, through the observation of the etching morphology at those internal defects.

• Structural Engineering and Mechanics
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• v.4 no.1
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• pp.9-23
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• 1996

The behaviour of elasto-plastic planar arches subjected to dynamic loads in presented. The governing equations are formulated through the dynamic equations and compatibility conditions. The latter is established by applying the generalized conjugate segment analogy. Bending moments at the nodes and axial forces in the members are considered as primary variables in the elastic regime. They are supplemented by the rotations at the nodes and dislocations in the elements when plastic hinges occur. Newmark-${\beta}$ method is adopted in the time marching process. The interaction diagram of each element is treated as the yield surface for the element and the associated flow rule is enforced as plastic flow occurs. The method provides good prediction of dynamic response of elasto-plastic arches while requiring small core storage and short computer time.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.4
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• pp.261-266
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• 1998

In developing the high density memory device, the etching of fine pattern is becoming increasingly important. Therefore, definition of ultra fine line and space pattern and minimization of damage and contamination are essential process. Also, the high density plasma in low operating pressure is necessary. The candidates of high density plasma sources are electron cyclotron resonance plasma, helicon wave plasma, helical resonator, and inductively coupled plasma. In this study, planar type magnetized inductively coupled plasma etcher has been built. The density and temperature of Ar plasma are measured as a function of rf power, flow rate, external magnetic field, and pressure. The oxide etch rate and selectivity to polysilicon are measured as the above mentioned conditions and self-bias voltage.

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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• 2006.05a
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• pp.3-7
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• 2006

Development of light sources has been constantly grown for a high efficacy and long life. And, the design of luminaires has ben developed for the reflection and refraction of light mechanism. But it has been not enough to study for the refraction of light mechanism. Therefore, this study aims to study for the refraction of light mechanism to using Monte-Carlo method and Ray-tracing method. In addition, the purpose of this study is to shu calculation process for development of 3 dimensional planar prism design algorithm in orer to use the results of photometric data that is able to obtain various luminous intensity distribution.

• The Bulletin of The Korean Astronomical Society
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• v.44 no.1
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• pp.77.2-77.2
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• 2019

NGC 4522 is one of the best-known examples among the Virgo galaxies undergoing active ram pressure stripping. There have been a number of detailed observational and theoretical studies on this galaxy to constrain its stripping and star formation history. However, the impact of ram pressure on the multi-phased ISM, in particular molecular gas which plays an important role in star formation, is still not fully understood. NGC 4522, as a system where the extra-planar molecular gas is identified, is an ideal case to probe in depth how ram pressure affects molecular gas properties. Aiming to get more theoretical insights on the detailed stripping process of multi-phased ISM and its consequences, we have conducted simulations using the TIGRESS which could reproduce the realistic ISM under comparable conditions as NGC 4522. In this work, we compare the fraction of gas mass to stellar mass, star formation rates and gas depletion time scales of NGC 4522 with those measured from the simulations, not only inside the disk but also in the extra-planar space.

• Current Optics and Photonics
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• v.6 no.3
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• pp.260-269
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• 2022

Segmented planar imaging detector for electro-optical reconnaissance (SPIDER) is an emerging technology for optical imaging. However, this novel detection approach is faced with degraded imaging quality. In this study, a 6 × 6 planar waveguide is used after each lenslet to expand the field of view. The imaging principles of field-plane waveguide structures are described in detail. The local multiple-sampling simulation mode is adopted to process the simulation of the improved imaging system. A novel image-reconstruction algorithm based on deep learning is proposed, which can effectively address the defects in imaging quality that arise during image reconstruction. The proposed algorithm is compared to a conventional algorithm to verify its better reconstruction results. The comparison of different scenarios confirms the suitability of the algorithm to the system in this paper.

• Journal of IKEEE
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• v.22 no.4
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• pp.1234-1237
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• 2018

For 4H-SiC trench MOSFET which can reduce on-resistance and switching losses compared to 4H-SiC planar MOSFET, the optimization study for decrease of sub-trench was carried out. In order to decrease sub-trench, Ar reshape process was used and trench shapes were observed as a function of temperature and process time. As a result, it was confirmed that the process conditions for $1500^{\circ}C$ and 20 min were most effective for the suitable trench profiles. In addition, dry/wet oxidation was performed at the Ar reshaped-samples to observe the oxidation thickness with different crystal orientations.