Abstract
For 6H-SiC single crystals which was obtained by sublimation growth (modified Lely process), the relation between the defects and the etch pits to be formed at the site of dislocations were discussed. Typical hexagonal etch pits were formed on (0001) basal plane. The similar hexagonal etch pit shapes were formed on the site of micropipe defects and it was realized that internal planar defects was formed with the same matrix crystal structure as grown crystals, through the observation of the etching morphology at those internal defects.
승화 성장법으로 성장된 6H-SiC 단결정에 대하여 etching을 행하여 형성된 etch pit의 형상과 결함과의 관계에 대하여 고찰하였다. (0001) 기저면에서는 육각형의 전형적인 etch pit이 형성되었다. micropipe에 의해서도 유사한 형태의 pit이 형성되었으며, 면결함에 형성된 etch pits을 통하여 SiC 결정의 내부에 형성된 planar defects도 성장 결정과 동일한 구조를 가지면서 형성됨을 알 수 있었다.
