• 한국인쇄학회지
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• 제16권3호
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• pp.43-60
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• 1998

The photosensitive properties and spectroscopic characteristics in the organic photoconductor(OPC) with carrier generation layer(CGL) of poly(vinylbutyral)(PVB) and polycarbonate(PC) doped with titanyl phthalocyanine(TiOPc) were investigated. The change of crystal structure of TiOPc dispersed with PVB and PC was shown by UV-visible reflective spectrum and FT-IR spectrum and mainly caused by the difference of solubility of solvent and the interaction between TiOPc and binder. The particle size of TiOPc dispersed with PVB measured by SEM was smaller than in PC. The crystal structure of TiOPc dispersed with PVB was amorphous type and in PC was $\alpha$type. It was found that the photosensitive properties of OPC were dependent on the change of absorbance and ionization potential of TiOPc occurred from the difference of crystal structure. In this work, the photosensitivity of OPC of TiOPc dispersed with PVB was better than PC due to the crystal type and the smaller particle size.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.421-421
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• 2008

Generally, the polymer thick-film resistors for embedded organic or hybrid substrate are patterned by screen printing so that the accuracy of resistor pattern is not good and the tolerance of resistance is too high(${\pm}$20~30%). To reform these demerits, a method using Fodel$^{(R)}$ technology, which is the patterning method using a photosensitive resin to be developable by aqueous alkali-solution as a base polymer for thick-film pastes, was recently incorporated for the patterning of thermosetting thick-film resistor paste. Alkali-solution developable photosensitive resin system has a merit that the precise patterns can be obtained by UV exposure and aqueous development, so the essential point is to get the composition similar to PSR(photo solder resist) used for PCB process. In present research, we made the photopatternable resistor pastes using 8 kinds of epoxy acrylates and a conductive carbonblack (CDX-7055 Ultra), evaluated their developing performance, and then measured the resistance after final curing. To become developable by alkali-solution, epoxy acrylate oligomers with carboxyl group were prepared. Test coupons were fabricated by patterning copper foil on FR-4 CCL board, plating Ni/Au on the patterned copper electrode, applying the resistor paste on the board, exposing the applied paste to UV through Cr mask with resistor patterns, developing the exposed paste with aqueous alkali-solution (1wt% $Na_2CO_3$), drying the patterned paste at $80^{\circ}C$ oven, and then curing it at $200^{\circ}C$ during 1 hour. As a result, some test compositions couldn't be developed according to the kind of oligomer and, in the developed compositions, the measured resistance showed different results depending on the paste compositions though they had the same amount of carbonblack.

• 한국섬유공학회:학술대회논문집
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• 한국섬유공학회 2001년도 학술발표회 논문집(Proceedings of the Korean Textile Conference) 상
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• pp.47-50
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• 2001

• Bulletin of the Korean Chemical Society
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• 제14권6호
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• pp.655-657
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• 1993

• 한국응용과학기술학회지
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• 제13권3호
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• pp.145-153
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• 1996

Naphthoquinone-1,2-diazide-5-sulfonyl[NDAS] derivatives members of quinone diazide compound that are utilizable as photosensitive polymer material were synthesized, and photoresist were prepared by mixing these derivatives with m-cresol novolak(a matrix resin) at various weight ratios. Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process. Experimental results showed that, by UV, NDAS derivatives were photoconverted and developer-soluble photoresist were produced. The mixing ratio of 1:4(by mass) of NDAS+p-ydroxybenzophenone+sensitizer and m-cresol novolak gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast.

• 한국인쇄학회지
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• 제13권2호
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• pp.47-53
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• 1995

Photosensitive resin of azide type is good for resolution and inner solvent, but it is really problem to development of practical use because fanctional groups of polymer has many hydrophilic radicals. By careful attention to this point, this study was investigated synthesis term, photo property and development property of composed photosensitive resin of azida type, it is to this effect. 1) H-NMR spectrum of compared DABCI showed amion redical by $\delta$6.0~6.1ppm to substitude for azide radical by amino radical by $\delta$8.9~9.45ppm, and FT-IR absorption spectra showed the absorption bends at 2100cm. 2)FT-IR absorption spectra of PHS1-DAB, PHS2-DAB, CMM-DAB and CHM-DAB showed azida radical pick to be lost at after irradiation by UV light. 3) According to exposuer change of PHS1-DAB, PHS2-DAB, CMM-DAB and CHM-DAB, absorption maximum value of UV spectrum change was 280nm. 4) to compared relative sensitivity of compared photosensitive resin, PHS2-DAB was the best and to compared insolubility rate of compared photosensitive resin, CMM-DAB was the lower. 5)Solubility if NaOH was the best by 1.0mol/$\ell$ and solubility of developing solution of ethanol to water was it in the ratio of 4 to 1.

• 폴리머
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• 제28권6호
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• pp.494-501
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• 2004

시클로부탄-1,2,3,4-테트라카복실산 이무수물, 2-(메타크릴로일옥시)에틸-3,5-디아미노벤조에이트 및 1,3-비스(3-아미노프로필)-1,1,3,3-테트라메틸디실록산을 N-메틸-2-피롤리돈 하에서 용액 중합 반응시켜 알칼리 수용액에서 현상이 가능할 뿐만 아니라 가시광선 영역에서 우수한 광투과성을 보이는 신규 감광성 폴리이미드 전구체인 폴리암산 (PAA-0)을 제조하였다. 광개시제의 존재 하에서 노광 후 열경화된 폴리이미드 박막은 2.38 wt%의 테트라메틸암모니움 히드록사이드 수용액에 용해되지 않는 특성을 보였으며, 이를 이용하여 광에 의한 미세 화상 형성 연구를 수행하였다. 폴리이미드 전구체 박막의 광반응에 적합한 광개시제는 2, 2-디메톡시-2-페닐아세토페논임을 알 수 있었고, 최적 광량은 400∼600 mJ/$\textrm{cm}^2$의 범위에 있음이 확인되었다. 감광성 폴리이미드 전구체는 25$0^{\circ}C$의 온도에서 50분간 열경화시킴으로써 투명한 폴리이미드 박막으로 전환이 되었으며, 유기용제를 비롯한 포토레지스트 제거제에 대한 우수한 내용제성 및 가시광선영역에서의 우수한 광투과 특성을 나타내었다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.816-819
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• 2008

A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that via-holes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.

• 폴리머
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• 제30권2호
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• pp.97-107
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• 2006

방향족 강직사슬 폴리이미드는 높은 주사슬 간의 인력으로 인해 유기용제에 용해되지 않고 상전이온도가 분해 온도보다 높아 응용분야에 많은 제한이 되고 있다. 방향족 폴리이미드의 가공성을 향상시키기 위해서 긴 곁사슬을 도입하면 가공성 향상뿐만 아니라 곁사슬과 주사슬 사이에 독특한 구조를 가지게 됨으로써 새로운 응용분야를 개척할 수가 있다. 본 논문에서는 여러 가지 형태의 곁사슬을 가지는 방향족 폴리이미드의 합성과 화학구조에 따른 물성변화에 대해 논의하고 또한 폴리이미드의 액정배향막, 감광재료, 교대 다층박막, 발광재료 등으로의 응용특성에 관해서도 조감한다.

• 한국인쇄학회지
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• 제16권2호
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• pp.61-74
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• 1998

Some photopolymer, poly(vinyl cinnamoyl acetate)(PVCiA) was synthesized by esterification of polymer(vinyl alcohol)(PVA) with monochloroacetic acid, followed by reaction poly(vinyl monochloroacetate)(PVAhA) and potassium cinnamate. When esterification of PVA with monochloroacetic acid was reacted in the dimethyl sulfoxide(DMSO), in the synthesis of PVChA, it is very good yield and the successive cinnamoyl acetoxyl esterification of PVCiA can be successfully synthesized. But PVCiA is low photosensitive polymer if net added photosensitizing dyes. Here, we synthesized photosensitizing dyes.