• Title/Summary/Keyword: Photonic structure

Search Result 219, Processing Time 0.036 seconds

유리기판의 광추출 효율 향상을 위한 마스크 제작 공정 없는 플라즈마 식각 연구

  • Seo, Dong-Wan;Gwon, O-Hyeong;Lee, U-Hyeon;Kim, Ji-Won;Hwang, Gi-Ung
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2013.02a
    • /
    • pp.507-507
    • /
    • 2013
  • 유리기판으로 투과되는 빛들 중에는 내부 전반사나 wave-guided mode로 인하여 손실이 일어나 일반적으로 20%의 광추출 효율을 가진다. 이러한 문제점을 해결하기 위한 연구에는 Photonic Crystal과 같은 주기적인 나노 구조물이 있는데 이러한 구조물을 제작하기 위한 마스크 공정 과정은 대부분 복잡하거나 비싼 단점이 있다. 이에 본 발표에서는 마스크 없이 비정질소다라임 유리의 구조물 생성으로 광 추출 효율이 상승하는지 보고자 하였다. M-ICP (Magnetized-Induced Coupled Plasma)란 용량 결합형 플라즈마와 유도 결합형 플라즈마 두 가지 방식의 플라즈마를 이용한 것인데 용량 결합형 플라즈마를 이용해 이온이 sheath에 의해 가속되어 유리표면에 부딪히고 그에 따라 유리가 식각되는 물리적 식각을 이용하였다. 또한 이온의 밀도를 조절하기 위해 유도결합형 플라즈마 방식을 이용하여 식각률을 높였다. 화학적 식각을 위해서는 CF4와 O2혼합 가스를 이용해 F가 Si와 결합하여 SiF4가 되어 사라지고 탄소잔여물인 C는 O2와 반응하여 제거하였다. 그 결과, 랜덤한 분포를 가지는 미세한 구조물(stochastic sub-wavelength structure)을 유리 표면에 형성할 수 있었고, 또한 다양한 가스 종류와 압력, source power와 bias power, 그리고 시간을 바꿔가며 미세 구조물들을 관찰하였다. 실험 결과, 가시광선 파장 이하의 높이를 갖고 수 마이크로미터의 너비를 갖는 구조물이 전반사되는 빛을 효율적으로 추출하는 것을 산란되는 빛의 정도인 diffusive transmittance 가 기존 0%에서 15% 정도로 증가하는 것으로 스펙트로포토미터 측정을 통해 확인하였다. 이러한 유리 기판 위 구조물 생성방법을 OLED에 적용한다면 적은 비용으로 소자의 효율을 크게 향상 시킬 수 있을 것이다. 또한 본 처리 과정의 장점은 기존의 방법에 필요한 스퍼터링이나 RTA 처리 과정이 필요 없어 공정 단가 절감과 제조 공정의 단순화로 높은 생산성을 얻을 수 있으며 대면적화에도 유리하다.

  • PDF

Fabrication of a Multidirectional Side-firing Optical Fiber Tip and Its Numerical Analysis (다방향 조사가 가능한 광섬유 팁 해석 및 제작)

  • Jung, Deok;Sohn, Ik-Bu;Noh, Young-Chul;Kim, Jin-Hyeok;Kim, Changhwan;Lee, Ho
    • Korean Journal of Optics and Photonics
    • /
    • v.25 no.4
    • /
    • pp.200-206
    • /
    • 2014
  • In this paper, using the value theoretically calculated to emit multidirectionally a beam coming into an optical fiber with diameter of $125{\mu}m$, we modeled and produced a cone-shaped structure at the distal end of the fiber. A numerical simulation was performed for an optical fiber tip in which all incident beams were totally reflected and emitted toward the side, as well as for an optical fiber tip from which the beams could be emitted forward and sideways simultaneously. We produced multidirectional-firing optical fiber tips based on the simulation result and model. Laser fabrication of the optical fiber was done by processing a cone-shaped structure at the distal end of an optical fiber with diameter of $125{\mu}m$ using a femtosecond pulsed laser and polishing the processed surface with a $CO_2$ laser. We also conducted an analysis to compare experimental and simulation results.

Splitting of Surface Plasmon Resonance Peaks Under TE- and TM-polarized Illumination

  • Yoon, Su-Jin;Hwang, Jeongwoo;Lee, Myeong-Ju;Kang, Sang-Woo;Kim, Jong-Su;Ku, Zahyun;Urbas, Augustine;Lee, Sang Jun
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2014.02a
    • /
    • pp.296-296
    • /
    • 2014
  • We investigate experimentally and theoretically the splitting of surface plasmon (SP) resonance peaks under TE- and TM-polarized illumination. The SP structure at infrared wavelength is fabricated with a 2-dimensional square periodic array of circular holes penetrating through Au (gold) film. In brief, the processing steps to fabricate the SP structure are as follows. (i) A standard optical lithography was performed to produce to a periodic array of photoresist (PR) circular cylinders. (ii) After the PR pattern, e-beam evaporation was used to deposit a 50-nm thick layer of Au. (iii) A lift-off processing with acetone to remove the PR layer, leading to final structure (pitch, $p=2.2{\mu}m$; aperture size, $d=1.1{\mu}m$) as shown in Fig. 1(a). The transmission is measured using a Nicolet Fourier-transform infrared spectroscopy (FTIR) at the incident angle from $0^{\circ}$ to $36^{\circ}$ with a step of $4^{\circ}$ both in TE and TM polarization. Measured first and second order SP resonances at interface between Au and GaAs exhibit the splitting into two branches under TM-polarized light as shown in Fig. 1(b). However, as the incidence angle under TE polarization is increased, the $1^{st}$ order SP resonance peak blue-shifts slightly while the splitting of $2^{nd}$ order SP resonance peak tends to be larger (not shown here). For the purpose of understanding our experimental results qualitatively, SP resonance peak wavelengths can be calculated from momentum matching condition (black circle depicted in Fig. 2(b)), $k_{sp}=k_{\parallel}{\pm}iG_x{\pm}jG_y$, where $k_{sp}$ is the SP wavevector, $k_{\parallel}$ is the in-plane component of incident light wavevector, i and j are SP coupling order, and G is the grating momentum wavevector. Moreover, for better understanding we performed 3D full field electromagnetic simulations of SP structure using a finite integration technique (CST Microwave Studio). Fig. 1(b) shows an excellent agreement between the experimental, calculated and CST-simulated splitting of SP resonance peaks with various incidence angles under TM-polarized illumination (TE results are not shown here). The simulated z-component electric field (Ez) distribution at incident angle, $4^{\circ}$ and $16^{\circ}$ under TM polarization and at the corresponding SP resonance wavelength is shown in Fig. 1(c). The analysis and comparison of theoretical results with experiment indicates a good agreement of the splitting behavior of the surface plasmon resonance modes at oblique incidence both in TE and TM polarization.

  • PDF

A study of Luminescence effects of POF-woven Fabric Display by Method of Weaving (직물화 방식에 따른 유연 광섬유 직물 디스플레이의 광원 색채별 발광효과에 관한 연구)

  • Yang, Jin-Hee;Park, Sun-Hyung;Cho, Hyun-Seung;Lee, Joo-Hyeon
    • Science of Emotion and Sensibility
    • /
    • v.16 no.4
    • /
    • pp.517-526
    • /
    • 2013
  • This paper reports on flexible plastic optical fiber (POF) fabric displays which are used to develop light-emitting clothing from photonic fabric. We first evaluated the luminescence value corresponding to different methods of processing flexible optical fibers, types of reflective fabric structure, and colors of the light. Moreover, we tried to identify the optimum conditions of the flexible POF fabric displays to realize high luminescence value. The processing methods that were compared were the "Pre-etching" method and the "Post-etching" method. On the basis of the reflective structure of the fabric, the fabrics were categorized as the "White fabric" and the "Reflective fabric." Analysis results showed that the effect of the processing method is more dominant than that of the types of reflective fabric structure. Further, the capability of the Post-etching method to increase luminescence value is slightly higher than that of the Pre-etching method. Further, the 'Reflective fabric' is slightly more efficacious as the base fabric to increase the luminescence value, than the White fabric is. Thus, optimum increase in luminance can be realized by employing the Post-etching method and the Reflective fabric as the base fabric.

Characteristics of photo-thermal reduced Cu film using photographic flash light

  • Kim, Minha;Kim, Donguk;Hwang, Soohyun;Lee, Jaehyeong
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2016.02a
    • /
    • pp.293.1-293.1
    • /
    • 2016
  • Various materials including conductive, dielectric, and semi-conductive materials, constitute suitable candidates for printed electronics. Metal nanoparticles (e.g. Ag, Cu, Ni, Au) are typically used in conductive ink. However, easily oxidized metals, such as Cu, must be processed at low temperatures and as such, photonic sintering has gained significant attention as a new low-temperature processing method. This method is based on the principle of selective heating of a strongly absorbent film, without light-source-induced damage to the transparent substrate. However, Cu nanoparticles used in inks are susceptible to the growth of a native copper-oxide layer on their surface. Copper-oxide-nanoparticle ink subjected to a reduction mechanism has therefore been introduced in an attempt to achieve long-term stability and reliability. In this work, a flash-light sintering process was used for the reduction of an inkjet-printed Cu(II)O thin film to a Cu film. Using a photographic lighting instrument, the intensity of the light (or intense pulse light) was controlled by the charged power (Ws). The resulting changes in the structure, as well as the optical and electrical properties of the light-irradiated Cu(II)O films, were investigated. A Cu thin film was obtained from Cu(II)O via photo-thermal reduction at 2500 Ws. More importantly, at one shot of 3000 Ws, a low sheet resistance value ($0.2527{\Omega}/sq.$) and a high resistivity (${\sim}5.05-6.32{\times}10^{-8}{\Omega}m$), which was ~3.0-3.8 times that of bulk Cu was achieved for the ~200-250-nm-thick film.

  • PDF

Hole and Pillar Patterned Si Absorbers for Solar Cells

  • Kim, Joondong;Kim, Hyunyub;Kim, Hyunki;Park, Jangho
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2013.02a
    • /
    • pp.226-226
    • /
    • 2013
  • Si is a dominant solar material, which is the second most abundant element in the earth giving a benefit in the aspect in cost with low toxicity. However, the inherent limit of Si has an indirect band gap of 1.1 eV resulting in the limited optical absorption. Therefore, a critical issue has been raised to increase the utilization of the incident light into the Si absorber. The enhancement of light absorption is a crucial to improve the performances and thus relieves the cost burden of Si photovoltaics. For the optical aspect, an efficient design of a front surface, where the incident light comes in, has been intensively investigated to improve the performance of photon absorption. Lambertian light trapping can be attained when the light active surface is ideally rough to increase the optical length by about 50 compared to a planar substrate. This suggests that an efficient design may reduce thickness of the Si absorber from the conventional 100~300 ${\mu}m$ to less than 3 ${\mu}m$. Theoretically, a hole-array structure satisfies an equivalent efficiency of c-Si with only one-twelfth mass and one-sixth thickness. Various approaches have been applied to improve the incident light utilization in a Si absorber using textured structures, periodic gratings, photonic crystals, and nanorod arrays. We have designed hole and pillar structured Si absorbers. Four-different Si absorbers have been simultaneously fabricated on an identical Si wafer with hole arrays or pillar arrays at a fixed depth of 2 ${\mu}m$. We have found that the significant enhanced solar cell performances both for the hole arrayed and pillar arrayed Si absorbers compared to that of a planar Si wafer resulting from the effective improvement in the quantum efficiencies.

  • PDF

Design and analysis of two-dimensional binary phase masks for the fabrication of two-and three-dimensional periodic structures (2차원 및 3차원의 주기적인 구조 제작을 위한 2차원 이진 위상마스크의 설계와 분석)

  • 김남식;원영희;고근하;조두진
    • Korean Journal of Optics and Photonics
    • /
    • v.12 no.1
    • /
    • pp.17-24
    • /
    • 2001
  • Two-dimensional binary-phase diffraction gratings which can be employed to fabricate two- and three-dimensional periodic structures are designed and analyzed using rigorous coupled-wave analysis. These gratings serve as phase-masks which generate several diffracted waves from a normally incident beam and thus can produce a periodic interference pattern in space via nearfield holography. The properties of the diffracted beams can be controlled by varying the polarization and wavelength of the incident beam, surface-profile, groove depth and duty cycle of the mask. For the two-dimensional structure, optimum results can be obtained when the diffraction efficiency of the zero-order beam is minimized while that of the first-order maximized. On the other hand, when the diffraction efficiency of the zero-order is appreciable or even greater than other orders, we can obtain a variety of three-dimensional interference patterns which may be used to fabricate photonic crystals of tetragonal-body-centered and hexagonal structures in a submicron scale. scale.

  • PDF

Polymer Waveguide Apodized Grating for Narrow-Bandwidth High-Reflectivity Wavelength Filters (협대역 고반사 파장 필터 구현을 위한 폴리머 광도파로 에포다이즈드 격자)

  • Lee, Won-Jun;Huang, Guanghao;Shin, Jin-Soo;Oh, Min-Cheol
    • Korean Journal of Optics and Photonics
    • /
    • v.26 no.4
    • /
    • pp.203-208
    • /
    • 2015
  • Wavelength filters are essential components for selecting a certain wavelength channel of a WDM optical communication system. To realize wavelength filters with narrow bandwidth and high reflectivity, an apodized grating structure with length of 15 mm and index modulation of $5{\times}10^{-4}$ was designed. The device exhibited a reflectivity of 95%, 3-dB bandwidth of 0.28 nm, and 20-dB bandwidth of 0.70 nm on an 18 mm grating length.

Characterization of Fe-ACF/TiO2 composite and photocatalytic activity for MB Solution under visible light (Fe-ACF/TiO2 복합체의 특성화와 가시광선조건에서 MB 용액의 광촉매활성)

  • Zhang, Kan;Meng, Ze-Da;Oh, Won-Chun
    • Analytical Science and Technology
    • /
    • v.23 no.3
    • /
    • pp.225-232
    • /
    • 2010
  • In present study, a conventional sol-gel method was used to prepare Fe-ACF/$TiO_2$ composites, a kind of composite photocatalysts, whose capability was evaluated by degrading methylene blue (MB) solution. The particle size, surface structure, crystal phase and elemental identification of the composites prepared were characterized by BET, SEM, XRD and EDX, respectively. The spectra of MB concentration degraded under visible light were obtained by UV/Vis spectrophotometer. These obtained spectra demonstrated the photocaltalytic activity from removal concentrations of MB. It was considered that these photonic activities are induced by a strong synergetic reaction among ACF, $TiO_2$ and Fe in the composite photocatalysts under visible light.

Design and Fabrication of a Polarization-Independent 1 ${\times}$ 8 InGaAsP/InP MMI Optical Splitter (편광에 무관한 1 ${\times}$ 8 InGaAsP/InP 다중모드간섭 광분배기의 설계 및 제작)

  • Yu, Jae-Su;Moon, Jeong-Yi;Bae, Seong-Ju;Lee, Yong-Tak
    • Proceedings of the Optical Society of Korea Conference
    • /
    • 2000.08a
    • /
    • pp.28-29
    • /
    • 2000
  • Optical power splitters and/or couplers are important components for optical signal distribution between channels both in wavelength division multiplexing(WDM) systems and photonic integrated circuits(PICs). Since polarization is usually not known after propagation in an optical fiber, passive WDM components have to be polarization insensitivity, Compared to alternatives such as directional couplers or Y-junction splitters, splitters based on multimode interference(MMI) have found a growing interest in recent yens because of their desirable characteristics, such as compact size, low excess loss, wide bandwidth, polarization independence, and relaxed fabrication tolerances$^{(1)}$ . These devices have been fabricated in polymers, silica, or III-V semiconductor materials. A1 $\times$ 4 MMI power splitter on InP materials that were suitable for application in the 1.55-${\mu}{\textrm}{m}$ region$^{(2)}$ . However, the fabrication process of the structure is too complicated and the photolithography tolerance is very tight. Also, a 1 $\times$ 16 InGaAsP/InP MMI power splitter with an excess loss of 2.2dB and a splitting ratio of 1.5dB was demonstrated by using deep etching$^{(3)}$ . The deep etching of the sidewalls through the entire guide layer of the slab waveguide resulted in a number of drawbacks$^{(4)}$ . (omitted)

  • PDF