• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.223-223
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• 2003

광통신에는 광신호의 전송과 광신호 처리에 처리 과정에서 광 손실을 수반하므로 각 요소별로 광신호 증폭이 반드시 필요하다. 또한 광통신망의 완전 광화를 위해서는 제조 공정이 간단하여 가격이 저렴하고, 높은 신뢰성과 높은 증폭 효율을 가지면서 다른 부품과의 집적화가 가능한 광도파로형 광증폭기가 요구되고 있다 그러나 실리카는 광통신 파장대인 1.55$\mu\textrm{m}$대역의 증폭이 가능한 Er 이온에 대한 용해도가 50ppm 이하로 낮아 lmol% 이상 고농도로 Er 이온을 첨가하여 높은 증폭 효율을 얻는데 한계를 가지고 있다. 따라서 본 연구에서는 Er 이온에 대하여 높은 용해 특성을 가지고 있어 고농도 Er 이온 도핑이 가능한 알루미나에 Er을 1-2 mol% 첨가하여 광발광 특성을 조사하였다. Er이 첨가된 알루미나 나노 졸은 Al(NO$_3$)$_3$ㆍ9$H_2O$와 Er(NO$_3$)$_3$.5$H_2O$가 일정 양 용해된 수용액에 NH$_4$OH를 가하여 침전물을 얻고 여과 및 수세하여 졸 입자의 함량이 약 5wt%가 되게 이온교환수와 해교제인 초산을 소량 가하여 10$0^{\circ}C$에서 약 50시간 열처리하는 방법으로 제조하였다. Er이 첨가된 알루미나 코팅막은 Er 이 첨가된 알루미나 나노 졸에 GPS(3-glycidoxypropyltriethoxysilane)를 Al에 대하여 7 mol% 가하여 스핀 코팅법으로 제조하였다. Si 기판에 코팅하고, 상온에서 90$0^{\circ}C$까지 각 1시간 열처리한 코팅막의 광 발광 특성은 Er 이온의 첨가량과 열처리로 변화된 알루미나 코팅막의 결정상과 연계하여 논의 될 것이다. X-선 회절법으로 분석한 알루미나 코팅막의 온도에 따른 결정상은 boehmite 상에서 약 50$0^{\circ}C$이후에 ${\gamma}$-Al$_2$O$_3$로 전이하고 있다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.156-156
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• 2003

수평 전기로에서 ZnIn$_2$S$_4$ 다결정을 합성하여 HWE(Hot Wall Epitaxy)방법으로 2nIn2S4단결정 박막을 반절연성 GaAs(100)기판 위에 성장시켰다. ZnIn2S4 단결정 박막은 증발원의 온도를 610 $^{\circ}C$, 기판의 온도를 450 $^{\circ}C$로 성장시켰고 성장 속도는 0.5 $\mu\textrm{m}$/hr로 확인되었다. ZrIn2S4 단결정 박막의 결정성의 조사에서 10 K에서 광발광(photoluminescence) 스펙트럼이 433 nm (2.8633eV)에서 exciton emission스펙트럼이 가장 강하게 나타났으며, 또한 이중결정 X-선 요동곡선(DCRC)의 반폭치(FWHM)도 133 arcsec로 가장 작아 최적 성장 조건임을 알 수 있었다. Hall 효과는 van der Pauw방법에 의해 측정되었으며, 온도에 의존하는 운반자 농도와 이동도는 293K에서 각각 8.51$\times$$10^{17}$ electron/$cm^{-3}$ 291 $\textrm{cm}^2$/v-s였다. ZnIn2S4 단결정 박막의 광전류 단파장대 봉우리들로부터 10 K에서 측정된 $\Delta$Cr(crystal field splitting)은 0.1678 eV, $\Delta$So(spin orbit coupling)는 0.0148 eV였다. 10 K의 광발광 측정으로부터 고품질의 결정에서 볼 수 있는 free exciton 과 매우 강한 세기의 중성 주개 bound exciton등의 피크가 관찰되었다. 이때 중성 주개 bound exciton의 반치폭과 결합 에너지는 각각 9 meV와 26 meV 였다. 또한 Haynes rule에 의해 구한 불순물의 활성화 에너지는 130 meV 였다.다.

• Journal of the Korean Vacuum Society
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• v.5 no.3
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• pp.206-212
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• 1996

$In_{1-x}Ga_xAs$ epitaxial layers were grown at 76 Torr by low pressure metalorganic chemical vapor deposition (LP-MOCVD). Growth rate did not change much with growth temperature. Surface morphology of $In_{1-x}Ga_xAs$ epitaxial layer was affected by lattice mismatch, growth temperature and $AsH_3/(TMIn+TMGa)$ ratio. A high quality epilayer showed a full width at half maximum of 2.8 meV by photoluminescence measurement at 5K. The composition of the $In_{1-x}Ga_xAs$ was determined by the relative gas phase diffusion of TMIn and TMGa. Lattice mismatch and growth temperature were the most important variables that determine the electrical properties of $In_{1-x}Ga_xAs$ epitaxial layers. At optimized growth condition, it was possible to obtain a high quality $In_{1-x}Ga_xAs$ epilayers with a electron concentration as low as $8{\times}10^{14}/cm^3$ and an electron mobility as high as 11,000$\textrm{cm}^2$/Vsec at room temperature.

• Journal of the Korean Applied Science and Technology
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• v.24 no.3
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• pp.238-245
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• 2007

$Eu^{3+}$ doped $YGdO_3$ phosphors particles which have fine size and narrow size distribution with non aggregated uniform morphology were prepared by solvent evaporation method for the improvement of emission efficiency. Several parameters have been investigated in this study such as the influences of composition ratio of host materials, calcination temperature, amount of activator, surfactant, pH and flux on the photoluminescence intensity, particle size and dispersion. $Eu^{3+}$ doped $YGdO_3$ phosphor presented a strong narrow band emission peak at 612nm. The maximum emission intensity of$YGdO_3:Eu^{3+}$ occurred when $Eu^{3+}$ concentration is 3wt% under vacuum ultra violet excitation. Prepared phosphors were found to have small round-shaped particles about 150nm in size. The addition of PVA as a surfactant inhibits the grain growth and the agglomeration of particles efficiently by reducing the oxygen bridge bonds. As the pH reduces, PL intensity increase due to reducing the formation of oxygen bridge bonds. The particles prepared from solvent evaporation method with 5wt% LiCl were found to have 120% PL intensity compare to particles prepared without LiCl flux.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.14-14
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• 2006

Homoepitaxial growth of GaN on n-type GaN substrates was carried out by hydride vapor phase epitaxy (HVPE) method. This enables us to reduce or to eliminate the bowing of the GaN substrate caused by thermal mismatch. As a result, the two opposite crystal surfaces have been found to possess low dislocation density. The surface polarity of the homoepitaxially grown GaN was confirmed by both etching of the surface and conversion beam electron diffraction(CBED). The surface morphology and the photoluminescencemeasurement indicated that the surface properties of N-polar face of the homoepitaxlally grown GaN are quite different from the initial N-polar face of the heteroepitaxially grown GaN substrate Also, both surfaces of the GaN substrate were characterized by room temperature Double crystal X-ray diffraction (DCXRD) and photoluminescence measurement.

• Korean Journal of Materials Research
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• v.11 no.8
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• pp.636-640
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• 2001

In order to improve the optical Performance of green emitting phosphor for plasma display panel (PDP) application, the wet chemical method for preparing $Zn_{2-x}$ $SiO_4$:xMn (xi=0.02. 0.08) phosphor was designed. The spherical phosphor particles were obtained and the size can be between 0.5$\mu\textrm{m}$ and 2$\mu\textrm{m}$. The formation of phosphor, which had the willemite structure, was completed at relatively low temperature of 108$0^{\circ}C$. Also, photoluminescence Properties of the phosphors prepared were investigated under vacuum ultraviolet excitation. In particular, the emission intensity of Zn$_2$SiO$_4$:0.08Mn phosphor having the 1$\mu\textrm{m}$ of particle size was higher than that of commercial phosphor by 40%. The decay time of zinc silicate powder prepared as containing 8 mole% of manganese has been measured as 7.8ms.

• Journal of the Korean Vacuum Society
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• v.15 no.4
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• pp.427-433
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• 2006

We have fabricated nanodot arrays by using phase separated (PS- b- PMMA) diblock copolymer film and anodic aluminum oxide (AAO) membrane as templates with hexagonal arrays of cylindrical microdomains perpendicular to the substrate. Pulsed laser deposition technique was used to deposit various kinds of materials including Ag, Ni, ZnO, Si:Er, and Co/Pt onto Si substrates. The size and separation of nanodots correspond to those of the templates used, The density of nanodots was estimated to be $6{\times}10^{11}/cm^2$ and $1{\times}10^{10}/cm^2$ when the diblock copolymer and AAO were used, respectively. In particular, the optical properties of ZnO and Si: Er nanodot arrays were investigated and the strong photoluminescence at 380 nm and $1.54{\mu}m$ was observed from ZnO and Si:Er nanodot arrays, respectively.

• Journal of the Korean Vacuum Society
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• v.15 no.3
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• pp.301-307
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• 2006

We have investigated optical properties of p-modulation doped In(Ga)As quantum dots (QDs) on InP substrate with a comparison with the undoped QDs. Photoluminscence (PL) intensity of doped QDs at 10 K was about 10 times weaker than that of undoped QD sample. The decay time of doped QD sample at its PL peak, obtained from the time-resolved PL (TR-PL) experiment at 10 K, was very fast compared to that of undoped sample. We interpret that this fast decay time of the doped QD sample comes from the addition of non-radiative recombination paths, which are originated from the doping-related defects.

• Korean Journal of Materials Research
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• v.11 no.8
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• pp.363-363
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• 2001

In order to improve the optical Performance of green emitting phosphor for plasma display panel (PDP) application, the wet chemical method for preparing $Zn_{2-x}$ $SiO_4$:xMn (xi=0.02. 0.08) phosphor was designed. The spherical phosphor particles were obtained and the size can be between 0.5$\mu\textrm{m}$ and 2$\mu\textrm{m}$. The formation of phosphor, which had the willemite structure, was completed at relatively low temperature of 108$0^{\circ}C$. Also, photoluminescence Properties of the phosphors prepared were investigated under vacuum ultraviolet excitation. In particular, the emission intensity of Zn$_2$SiO$_4$:0.08Mn phosphor having the 1$\mu\textrm{m}$ of particle size was higher than that of commercial phosphor by 40%. The decay time of zinc silicate powder prepared as containing 8 mole% of manganese has been measured as 7.8ms.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.16 no.5
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• pp.181-188
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• 2006

Rutile single crystals grown by skull melting method were cut parallel and perpendicular to growth axis, and both sides of the cut wafers (${\phi}5.5mmx1.0mm$) were then polished to be mirror surfaces. The black wafers were changed into pale yellow color by annealing in air at 1200 and $1300^{\circ}C$ for $3{\sim}15\;and\;10{\sim}50$ hours, respectively. After annealing, structural and optical properties were examined by specific gravity (S.G), SEM-electron backscattered pattern (SEM-EBSP), X-ray diffraction (XRD), FT-IR transmittance spectra, laser Raman spectroscopy (LRS), photoluminescence (PL) and X-ray photoelectron spectroscopy (XPS). These results are analyzed increase of weight in air, decrease of weight in water and specific gravity, shown secondary phase of needle shape, diffusion of oxygen ion and increase of $Ti^{3+}$. From the above results, we suggest that the skull melting method grown rutile single crystals contain defect centers such as $O_v,\;Ti^{3+},\;O_v-Ti^{3+}$ interstitials and $F^+-H^+$.