• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.81-81
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• 2008

Applications of CdS films in this study are to exhibit a high conductivity when they are exposed at light with visible wavelength and sequentially to show a low conductivity in dark state. For this purpose, CdS films should have a high photosensitivity, still maintaining a high conductivity at a visible light. In this study, CdS films were prepared at room temperature on glass substrates by rf magnetron sputtering. In order to increase the photo-conductivity in visible light, various defect levels should be located within the CdS band gap. In order to nucleate the defect sites within the CdS band gap, CdS films were deposited on glass substrates at room temperature using various $H_2$/(Ar+$H_2$) flow ratios by an rf magnetron sputtering. Through the investigation of the structural and photoconductive properties of CdS films by an addition of hydrogen, the relationship between photo- and dark-resistance in CdS films was investigated in detail. 200-nm-thick CdS films for photoconductive sensor applications were prepared at various $H_2$/(Ar+$H_2$) flow ratios on glass substrates at room temperature by rf magnetron sputtering. Sulfur concentration in CdS films crystallized at room temperature with (002) preferred orientation depends directly on the hydrogen atmosphere and the surface roughness of the films gradually increases with increasing hydrogen atmosphere. Films deposited at 8% of $H_2$/(Ar+$H_2$) exhibit an abrupt decrease of dark- and photo-resistance, showing a low photo-sensitivity ($R_{dark}/R_{photo}$). Onthe other hand, films deposited at a hydrogen atmosphere of 42% exhibit a photo-sensitivity of $5\times10^3$, maintaining a photo-resistance of an approximately $2\times10^4\Omega$/square. The dark- and photo-resistance values of CdS films were related with a composition, surface roughness, and defect sites within the band gap.

• 한국결정학회지
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• 제9권1호
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• pp.53-63
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• 1998

HWE 방법에 의해 Cd1-xZnxS 박막을 (100)방향을 Si 기판 위에 성장시켰다. 증발원과 기판의 온도를 각각 600℃, 440℃로 하여 성장시킨 Cd1-xZnxS 박막의 이중 결정 X-선 요동곡선(DCRC)의 반폭치(FWHM)값이 265 arcsec로 가장 작았다. Van der Pauw 방법으로 Hall효과를 측정하여 운반자 농도와 Hall 이동도의 온도 의존성을 조사하였다. 광전도 셀의 특성으로 spectral response, 최대 허용소비전력(MAPD), 광전류와 암전류(pc/dc)의 비 및 응답시간을 측정하였다. Cd0.53Zn0.47S광전도 셀을 Cu증기 분위기에서 열처리한 경우 감도(γ)는 0.99, pc/dc은 1.65 ×10 7 그리고 최대 허용소비전력(MAPD)은 338mW, 오름시간 (rise time)은 9.7ms, 내림시간(decay time)은 9.3ms로 가장 좋은 광전도 특성을 얻었다.

• 한국인쇄학회지
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• 제18권2호
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• pp.103-111
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• 2000

We synthesized hexapyrrolylbenzene(HPB) an octapyrrolylenaphthalene(OPN) and measured photocurrent and darkcurrent of them. At the result, photocurrent of HBP/TiOPc and OPN/TiOPc systems were 1.81E-11 and 1.04E-10 at electric field 4.4$\times$10$^3$V/cm, and efficiency of them were 16 and 167 respectively.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1998년도 IUMRS-ICEM ABSTRACT BOOK
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• pp.71.1-71
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• 1998

• 대한기계학회논문집
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• 제19권10호
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• pp.2678-2689
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• 1995

In this study, a new hot-wire anemometer which has greater sensitivity than that of a constant temperature anemometer (CTA) was proposed. In contrast to CTA, the wire working resistance of the new anemometer increases with flow velocity, that is, the operating mode of the wire becomes variable temperature. The variable temperature anemometer(VTA) was made by substituting a voltage controlled variable resistor such as photoconductive cell or transistor for one of the resistors in the bridge. By positively feeding back the bridge top signal to the input side of these electronic components, the wire overheat ratio could be increased with velocity automatically. Static response analyses of the VTA, constant voltage anemometer (CVA) and CTA were made in detail and calibration experiments were performed to validate the proposed operating principle. The wire operating resistance of the CVA decreases with velocity and this leads to lower sensitivity than that of a CTA. But the sensitivity of the newly proposed VTA is superior to that of a CTA, since the wire overheat ratio increases with velocity. Consequently, it is found that the major factor that is responsible for large sensitivity of a VTA is not the working resistance itself but the change of the wire working resistance with velocity.

• 센서학회지
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• 제7권1호
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• pp.17-22
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• 1998

$4{\mu}m$ 두께의 a-Se 광도전막을 이용한 HARP (high-gain avalanche rushing amorphous photoconductor) 촬상관을 제작하고 그 특성을 조사하였다. 타겟전압이 360 V 이상으로 증가함에 따라 촬상관의 신호전류는 급격하게 증가하였으나 암전류는 490 V의 전압까지 3.2 nA이하로 억제되었다. $1.1{\times}10^{6}V/cm$의 전기장에서 440 nm의 파장에 대한 타겟의 양자효율은 약 4.3으로 나타났다. 또한 촬상관의 진폭응답은 800 TV line에서 7.5 %였으며 잔상은 3.4%였다.

• 대한전자공학회논문지
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• 제26권4호
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• pp.73-80
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• 1989

영상감지막으로 사용되는 PbO광도전막을 산소압, 증착속도 및 기판온도 등의 조건을 변화시켜 가면서 유도성가열증착법으로 제조하였다. 이 때 증착조건이 PbO막의 구조적 및 전기적 특성에 미치는 영향을 SEM사진, X선회절도 및 전류-전압특성 등을 통해 조사 하였다. 이 결과로 부터 정방정계의 구조의 적색PbO가 <110> 및 <101> 방향으로 우세하게 성장할 때 광전류대 암전류의 비와 광전변환률이 증가함을 알 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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• pp.263-266
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• 2004

The stochiometric mix of evaporating materials for the $ZnGa_2Se_4$ single crystal thin films were prepared from horizental furnace. The polycrystal structure obtaind from the power x-ray diffraction was defect chalcopyrite. The lattice costants $a_0\;and\;c_0\;were\;a_0=5.51\;A,\;c_0=10.98\;A$. To obtains the single crystal thin films, $ZnGa_2Se_4$ mixed crystal were deposited on throughly etched Si(100) by the Hot Wall Epitaxy (HWE) system. The temperates of the source and the substrate were $590^{\circ}C\;and\;450^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the double crystal X-ray diffraction(DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. In order to explore the applicability as a photoconductive cell, we measured the sensitivity($\gamma$), the ratio of photocurrent to dark current(pc/dc), maximum allowable rower dissipation(MAPD), spectral response and response time.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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• pp.304-308
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• 2004

The $Cd_{1-x}Zn_xS$ thin films were grown on the Si(100) wafers by a hot wall epitaxy method(HWE). The source and substrate temperature are $600^{\circ}C\;and\;440^{\circ}C$ respectively. The crystalline structure of epilayers was investigated by double crystal X-ray diffraction(DCXD). Hall effect on the sample was measured by the van der Pauw method and studied on the carrier density and mobility dependence on temperature. In order to explore the applicability as a photoconductive cell, we measured the sensitivity($\gamma$), the ratio of photocurrent to darkcurrent(pc/dc), maximum allowable power dissipation(MAPD), spectral response and response time. The results indicated that the photoconductive characteristic were the best for the $Cd_{0.53}Zn_{0.47}S$ samples annealed in Cu vapor compare with in Cd, Se, air and vacuum vapour. Then we obtained the sensitivity of 0.99, the value of pc/dc of $1.65{\times}10^7$, the MAPD of 338mW, and the rise and decay time of 9.7ms and 9.3ms, respectively

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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• pp.381-384
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• 2004

The stochiometric nix of evaporating materials for the $AgInS_2$ single crystal thin films were prepared from horizontal furnace. The polycrystal structure obtaind from the power x-ray diffraction was chalcopyrite. The lattice costants $a_0\;and\;c_0$ were $a_0=5.86(5.82)\;A,\;c_0=11.355(11.17)\;A$. To obtains the single crystal thin films, $AgInS_2$ mixed crystal were deposited on throughly etched GaAs(100) by the Hot Wall Epitaxy(HWE) system. The temperates of the source and the substrate were $590^{\circ}C\;and\;450^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the double crystal X-ray diffraction(DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. In order to explore the applicability as a photoconductive cell, we measured the sensitivity($\gamma$), the ratio of photocurrent to dark current (pc/dc), maximum allowable power dissipation(MAPD), spectral response and response time.