• Journal of Sensor Science and Technology
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• v.20 no.4
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• pp.234-237
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• 2011

This paper presents a study into pH Indicator-Embedded hydrogel micro-particles which are encoded various shapes according to the captured indicator. We incorporate various pH indicators into a photo-curable hydrogel, PEG-DA(Poly(ethylene glycol) diacrylate). Using the latest fluidic lithography techniques, we can easily fabricate variously patterned hydrogel particles based on in-situ photopolymerization of the PEG-DA in a micro-fluidic channel. The shape of the particle is related to the pH indicator inside the particle. We demonstrate that the micro pH sensors change their colors according to the pH levels. The micro pH sensors have various characteristics that are related to the curing time, particle size, etc. By changing these conditions, we can adjust the long term stability and reaction time of the hybrid micro pH sensors.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.04a
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• pp.47-48
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• 2006

Electrowetting phenomenon is applied in the various field of technology. One of that is electrowetting display as a paper like electronic paper. Fast response and easy to express a color is goodness. In spite of that, the oil movement of the electrowetting display is irregular. So it doesn't look like uniform. Because of the above reason, electrowetting display using patterned electrode is made and the characteristic of oil movement is observed. Electrode and polymer wall is patterned by photo-lithography. We analyze the oil movement according to the variation of size and the position of etched electrode area.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.495-496
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• 2006

Electrowetting phenomenon is applied in the various field of technology. One of that is electrowetting display as a paper like electronic paper. Fast response and easy to express a color is goodness. In spite of that, the oil movement of the electrowetting display is irregular. So it doesn't look like uniform. Because of above reason, electrowetting display using patterned electrode is made and the characteristic of oil movement is observed. Electrode and polymer wall is patterned by photo-lithography. We analyze the oil movement according to the variation of size and the position of etched electrode area.

• Journal of the Korean Society for Precision Engineering
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• v.27 no.6
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• pp.32-38
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• 2010

Laser material processing technology is adopted in several industry as alternative process which could overcome weakness and problems of present adopted process, especially semiconductor and display industry. In semiconductor industry, laser photo lithography is doing at front-end level, and cutting, drilling, and marking technology for both wafer and EMC mold package is adopted. Laser cleaning and de-flashing are new rising technology. There are 3 kinds of main display industry which use laser technology - TFT LCD, AMOLED, Touch screen. Laser glass cutting, laser marking, laser direct patterning, laser annealing, laser repairing, laser frit sealing are major application in display industry.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.269-269
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• 2013

Redox cycling in between the two working electrodes in an electrochemical cell can lead a great signal enhancement. In this work, we report on a systematic examination of current amplification along with the decrease in the gap distance of a nanogap device which was fabricated by the combination of photo and chemical lithography [1]. The gap distance was controlled by the chemical lithographic process of surfacecatalyzed growth of metallic layer on pre-defined electrodes with wider initial gap. Enhancement of the redox current of ferri/ferrocyanide was observed upon gap distance reduction and the current is amplified about a thousand times in this redox system when the gap distance was decreased from 200 nm to 30 nm. The experimental results were discussed on the basis of the cyclic voltammetry (CV), atomic force microscopy (AFM) and scanning electron microscopy (SEM).

• Journal of the Semiconductor & Display Technology
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• v.8 no.3
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• pp.25-30
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• 2009

In this study, we synthesized novel UV-curable binders and applied for negative photoresist of display device. First, we synthesized UV-curable binders by radical polymerization with a mixture of Styrene/Methyl methacrylate/Methacrylic acid/Glycidyl methacrylate/N-Cyclohexylmaleimide at a fixed composition. Following the first step, we prepared a negative photoresist mixture optimized with photo sensitive initiator and others for the litho test. And then, we studied resolution and film retention with molecular weight of each binders and numerical value of Alkaline Desolution Rate(ADR). As a result of the litho test, we found that if the novel polymers have same numerical value of ADR, the resolution decreased and the film retention increased with the increasing of molecular weight of photoresist binder.

• Proceedings of the PSK Conference
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• 2003.10b
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• pp.67.3-68
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• 2003

The purpose of this study is to improve repeatability of a non-invasive blood glucose measurement. The portable NIR system that was newly integrated by our lab includes a tungsten halogen lamp, a specialized reflectance fiber optic probe and a photo diode array type InGaAs detector, which was developed by a microchip technology based on the lithography. Reflectance NIR spectra of finger tip were recorded by using a fiber optic probe. The probe was fixed in the system and subjects put their finger on the probe head. (omitted)

• Journal of Industrial Technology
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• v.43 no.1
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• pp.49-55
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• 2023

Cluster tools are extensively employed in various wafer fabrication processes within the semiconductor manufacturing industry, including photo lithography, etching, and chemical vapor deposition. Contemporary fabrication facilities encounter customer orders with technical specifications that are similar yet slightly varied. Consequently, modern fabrications concurrently manufacture two or three different wafer types using a cluster tool to maximize chamber utilization and streamline the flow of wafer lots between different process stages. In this review, we introduce two methods of concurrent processing of multiple wafer types: 1) concurrent processing of multiple wafer types with different job flows, 2) concurrent processing of multiple wafer types with identical job flows. We describe relevant research trends and achievements and discuss future research directions.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.15 no.4
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• pp.1838-1843
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• 2014

Nanoimprint lithography (NIL) fabrication process is regarded as the main alternative to existing expensive photo-lithography in areas such as micro- and nano-electronics including optical components and sensors, as well as the solar cell and display device industries. Functional patterns, including anti-reflective moth-eye pattern, photonic crystal pattern, fabricated by NIL can improve the overall efficiency of such devices. To successfully imprint a nano-sized pattern, the process conditions such as temperature, pressure, and time should be appropriately selected. In this paper, a cavity-filling process of the moth-eye pattern during the thermal-NIL within the temperature range, where the polymer resist shows the viscoelastic behaviors with consideration of stress relaxation effect of the polymer, were investigated with three-dimensional finite element analysis. The effects of initial thickness of polymer resist and imprinting pressure on cavity-filling process has been discussed. From the analysis results it was found that the cavity filling can be completed within 100 s, under the pressure of more than 4 MPa.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.36D no.10
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• pp.23-30
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• 1999

We experimented on the sub 50nm patterning using E-beam lithography system. SAL601 negative E-beam resist was used for this experiment. In order to utilize the maximum ability of E-beam system, firstly, we reduced the PR thickness to 100nm, and the field size to 200 ${um}m$. Then PEB (Post Expose Bake) time/temperature, which is one of the very important factors when SAL601 is used, were reduced for minimum line width. In addition, digitizing is optimized for better results. Quantum wire and quantum dot which can be used for nanoscale memory device, such as single electron memory device, are fabricated using these developed lithography techniques.