• Title/Summary/Keyword: Photo Printing

Search Result 90, Processing Time 0.026 seconds

Effect of Electrode Formation Process using E-beam Evaporation on Crystalline Silicon Solar Cell (E-Beam evaporation을 이용한 전극 형성 공정이 결정질 실리콘 태양전지에 미치는 영향 분석)

  • Choi, Dongjin;Park, Se Jin;Shin, Seung Hyun;Lee, Changhyun;Bae, Soohyun;Kang, Yoonmook;Lee, Hae-Seok;Kim, Donghwan
    • Current Photovoltaic Research
    • /
    • v.7 no.1
    • /
    • pp.15-20
    • /
    • 2019
  • Most high-efficiency n-type silicon solar cells are based on the high quality surface passivation and ohmic contact between the emitter and the metal. Currently, various metalization methods such as screen printing using metal paste and physical vapor deposition are being used in forming electrodes of n-type silicon solar cell. In this paper, we analyzed the degradation factors induced by the front electrode formation process using e-beam evaporation of double passivation structure of p-type emitter and $Al_2O_3/SiN_x$ for high efficiency solar cell using n-type bulk silicon. In order to confirm the cause of the degradation, the passivation characteristics of each electrode region were determined through a quasi-steady-state photo-conductance (QSSPC).

An Analysis on the Korea Market Competitiveness of Japan Materials Industry -Focus on the Compound and Chemical Products- (일본 소재산업의 대 한국시장 경쟁력 분석 -화합물 및 화학제품을 중심으로-)

  • Kim, Ji-Yong
    • International Commerce and Information Review
    • /
    • v.16 no.4
    • /
    • pp.439-455
    • /
    • 2014
  • Korea-Japan trade has been trade deficit for a long time and therefore this matter must be a settled urgently for continuous economic growth of Korea. For reasons mentioned above, this study pays attention to Japan materials industry which has induced trade deficit in the Korea-Japan trade and this study analyzed competitiveness of Japan materials industry in the Korea market. This study special regard will be paid to the Compound and Chemical Products in Japan materials industry. For attaining the purpose of study, we collected related statistical data and Market Share Index, Trade Specialization Index and Market Comparative Advantage Index used in study methodology From this analysis, we found that most of Japan material products have competitiveness in Korea market and chemical products used in photography & photo sensitized materials, paint & printing ink products particularly have very strong competitiveness in Korea Market.

  • PDF

Research on Dyeing Crafts of Chinese Indigo Dyed Designs (중국 남인염포 염색 공예 연구)

  • Lee, Min-Jeong;Sohn, Hee-Soon
    • The Research Journal of the Costume Culture
    • /
    • v.19 no.2
    • /
    • pp.376-388
    • /
    • 2011
  • The purpose of this study is to examine the types and characteristics of Chinese indigo dyed designs performed until today in private houses of Chinese minority races and to examine the modern value of traditional dyeing crafts of minority races by investigating the cases of utilizing modern private Chinese indigo dyed designs. As the research methodology for theoretical study about the history of Chinese traditional pattern dyeing, the origin, types and characteristics of Chinese indigo dyed designs, the preceding research data, photo data, and Internet data were utilized, and for the empirical research on Chinese traditional dyeing techniques and the cases of utilizing today Chinese indigo dyed designs, the on-site survey on Guizhou and Yunnan was conducted during February and March 2008 and the data were collected and analyzed. Based on the results of this research, it was found that Chinese indigo dyed designs represented Chinese traditional pattern dyeing, which was inherited and developed mainly in Chinese minority races and Chinese. It could be seen that according to geographical distribution and characteristics of each race, the types and characteristics of dyeing techniques were formed, which are classified into the batik of the Miao of Guizhou in the Chinese southwestern region, the tie-dyeing of Bai of Yunnan, and Chinese blue calico(resist printing) of Chinese private houses in the Hunan and Huseo regions, and these represent the three typical Chinese dyeing techniques today. Based on the results of empirical research on the utilizing cases, focusing on the traditional living handicrafts of Chinese minority races, traditional cultural articles, and artworks, the modern values such as practical, cultural, and artistic values of Chinese indigo dyed designs could be rediscovered.

Field Emission Characteristics of Surface-treated CNT Emitter by Ar Ion Bombardment (아르곤 이온에 의해 표면처리된 CNT 에미터의 전계방출 특성)

  • Kwon, Sang-Jik
    • 전자공학회논문지 IE
    • /
    • v.44 no.2
    • /
    • pp.26-31
    • /
    • 2007
  • A surface treatment was performed after the screen printing of a carbon nanotube paste for obtaining the carbon nanotube field emission array(CNT FEA) on the soda-lime glass substrate. In this experiment, Ar ion bombardment was applied as an effective surface treatment method. After making a cathode electrode on the glass substrate, photo sensitive CNT paste was screen-printed, and then back-side was exposure by uv light. Then, the exposed CNT paste was selectively remained by development. After post-baking, the remained CNT paste was bombarded by accelerated Ar ions for removing some binders and exposing only CNTs. As results, the field emission characteristics were strongly depended on the accelerating energy. At 100 eV, the emission was highest and as the acceleration energy increases more then 100 eV, the emission decreased. This was due to the removal of CNT itself as well as binders.

Study on the Compositions of Photosensitive Resistor Paste Using Epoxy Acrylate Oligomers and Conductive Carbonblack (에폭시 아크릴레이트 올리고머와 전도성 카본블랙을 이용한 감광성 저항 페이스트 조성 연구)

  • Park, Seong-Dae;Kang, Nam-Kee;Lim, Jin-Kyu;Kim, Dong-Kook
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.11a
    • /
    • pp.421-421
    • /
    • 2008
  • Generally, the polymer thick-film resistors for embedded organic or hybrid substrate are patterned by screen printing so that the accuracy of resistor pattern is not good and the tolerance of resistance is too high(${\pm}$20~30%). To reform these demerits, a method using Fodel$^{(R)}$ technology, which is the patterning method using a photosensitive resin to be developable by aqueous alkali-solution as a base polymer for thick-film pastes, was recently incorporated for the patterning of thermosetting thick-film resistor paste. Alkali-solution developable photosensitive resin system has a merit that the precise patterns can be obtained by UV exposure and aqueous development, so the essential point is to get the composition similar to PSR(photo solder resist) used for PCB process. In present research, we made the photopatternable resistor pastes using 8 kinds of epoxy acrylates and a conductive carbonblack (CDX-7055 Ultra), evaluated their developing performance, and then measured the resistance after final curing. To become developable by alkali-solution, epoxy acrylate oligomers with carboxyl group were prepared. Test coupons were fabricated by patterning copper foil on FR-4 CCL board, plating Ni/Au on the patterned copper electrode, applying the resistor paste on the board, exposing the applied paste to UV through Cr mask with resistor patterns, developing the exposed paste with aqueous alkali-solution (1wt% $Na_2CO_3$), drying the patterned paste at $80^{\circ}C$ oven, and then curing it at $200^{\circ}C$ during 1 hour. As a result, some test compositions couldn't be developed according to the kind of oligomer and, in the developed compositions, the measured resistance showed different results depending on the paste compositions though they had the same amount of carbonblack.

  • PDF

An Algorithim for Converting 2D Face Image into 3D Model (얼굴 2D 이미지의 3D 모델 변환 알고리즘)

  • Choi, Tae-Jun;Lee, Hee-Man
    • Journal of the Korea Society of Computer and Information
    • /
    • v.20 no.4
    • /
    • pp.41-48
    • /
    • 2015
  • Recently, the spread of 3D printers has been increasing the demand for 3D models. However, the creation of 3D models should have a trained specialist using specialized softwares. This paper is about an algorithm to produce a 3D model from a single sheet of two-dimensional front face photograph, so that ordinary people can easily create 3D models. The background and the foreground are separated from a photo and predetermined constant number vertices are placed on the seperated foreground 2D image at a same interval. The arranged vertex location are extended in three dimensions by using the gray level of the pixel on the vertex and the characteristics of eyebrows and nose of the nomal human face. The separating method of the foreground and the background uses the edge information of the silhouette. The AdaBoost algorithm using the Haar-like feature is also employed to find the location of the eyes and nose. The 3D models obtained by using this algorithm are good enough to use for 3D printing even though some manual treatment might be required a little bit. The algorithm will be useful for providing 3D contents in conjunction with the spread of 3D printers.

Study on $TiO_2$ nanoparticle for Photoelectrode in Dye-sensitized Solar Cell (염료감응형 태양전지의 광전극 적용을 위한 $TiO_2$ nanoparticle 특성 분석)

  • Jo, Seulki;Lee, Kyungjoo;Song, Sangwoo;Park, Jaeho;Moon, Byungmoo
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 2011.11a
    • /
    • pp.57.2-57.2
    • /
    • 2011
  • Dye-sensitized solar cells (DSSC) have recently been developed as a cost-effective photovoltaic system due to their low-cost materials and facile processing. The production of DSSC involves chemical and thermal processes but no vacuum is involved. Therefore, DSSC can be fabricated without using expensive equipment. The use of dyes and nanocrystalline $TiO_2$ is one of the most promising approaches to realize both high performance and low cost. The efficiency of the DSSC changes consequently in the particle size, morphology, crystallization and surface state of the $TiO_2$. Nanocrystalline $TiO_2$ materials have been widely used as a photo catalyst and an electron collector in DSSC. Front electrode in DSSC are required to have an extremely high porosity and surface area such that the dyes can be sufficiently adsorbed and be electronically interconnected, resulting in the efficient generation of photocurrent within cells. In this study, DSSC were fabricated by an screen printing for the $TiO_2$ thin film. $TiO_2$ nanoparticles characterized by X-ray diffractometer (XRD) and scanning electron microscope (SEM) and scanning auger microscopy (SAM) and zeta potential and electrochemical impedance spectroscopy(EIS).In addition, DSSC module was modeled and simulated using the SILVACO TCAD software program. Improve the efficiency of DSSC, the effect of $TiO_2$ thin film thickness and $TiO_2$ nanoparticle size was investigated by SILVACO TCAD software program.

  • PDF

Thick Film Resistors with Low Tolerance Using Photosensitive Polymer Resistor Paste (감광성 폴리머 저항 페이스트를 이용한 Low Tolerance 후막 저항체)

  • Kim, Dong-Kook;Park, Seong-Dae;Lee, Kyu-Bok;Kyoung, Jin-Bum
    • Applied Chemistry for Engineering
    • /
    • v.21 no.4
    • /
    • pp.411-416
    • /
    • 2010
  • In this research, we intended to improve the tolerance of thick film resistor using photosensitive polymer resistor paste which was fabricated with alkali-solution developable photosensitive resin and conductive carbon black. At first, we investigated the effect of the selection of carbon black and photosensitive resin on the resistance range and tolerance level of polymer thick film resistor (PTFR). And then, a difference in resistance tolerance was evaluated according to the coating methods of photosensitive resistor paste on test board. In case that the photosensitive resistor paste was coated on whole surface of test board using screen printing, large positional tolerance was obtained because the formation of the thick film with uniform thickness was difficult. On the other hand, when the paste was coated with roller, the resistive thick film with uniform thickness was formed on the whole board area and the result of resistance evaluation showed low tolerance in ${\pm}10%$ range. The tolerance of PTFR could be improved by combination of the precise patterning using photo-process and the coating process for the resistive thick film with uniform thickness.

Pictorial Record of 'Joseon's Exhibitions of Chinaware and Wooden Works' - Pictorial Record of the Exhibitions of Korean Chinaware and Wooden Works Held in Tokyo, Japan in the 1930s - (『조선도자목공전관(朝陶磁木工展觀)』 도록 - 1930년대 일본 동경에서 개최된 한국 도자기, 목공예 전시회 도록 -)

  • Kim, Sang-yop
    • (The)Study of the Eastern Classic
    • /
    • no.32
    • /
    • pp.425-441
    • /
    • 2008
  • Most of Korea's Kyungmaedorock(auction book: 競賣圖錄) and pictorial record of exhibitions in the modern times were usually published in the 1930s. Although 1930s were periods of the Great Depression when economic slump continued because of the aftereffect of the slump in the stocks issued by the US in 1929, during this period, Japan began regular continental invasion starting from invasion of the northeastern area of China. To curio dealers, the 1930s were 'boom period of curio transaction' and in urban cultural aspects, the period is evaluated as the one when the first step of modernism was formed. Collection, photo-printing and arrangement of the data related to modern exhibitions including the Auction Book being published at that time are very important because they enable us to know characteristics of fine arts in the transition period from paintings & writings to fine arts in addition to enabling us to revert the circulation history of our paintings & writings and curios. Furthermore, these data will become important data for reconstitution of the circulation history of the Eastern Asia's modern art works. Although the pictorial record of Joseon's Exhibitions of Chinaware and Wooden Works(朝鮮陶磁木工展) is a small and thin one, it records our country's high level chinaware and wooden works. Although we can't know the exact time for 'Joseon's exhibitions of chinaware and wooden works', they are assumed to have been held in Tokyo, Japan in the 1930s and there seems to have been sale of works, too. As such, studies of the books such as the auction book and exhibitions under Japanese imperialism have the first importance in the fact that through which we can examine the course of outflow of our art works to Japan. Furthermore, they can be studies of art-sociology that examine flow and phase of recognition and taste of art works of those days. And from now on, comparative studies of auctions and exhibitions being held in Japan such as Tokyo, Osaka and etc. as well as art markets in Seoul during modern times would also be necessary.

Image Watermarking for Copyright Protection of Images on Shopping Mall (쇼핑몰 이미지 저작권보호를 위한 영상 워터마킹)

  • Bae, Kyoung-Yul
    • Journal of Intelligence and Information Systems
    • /
    • v.19 no.4
    • /
    • pp.147-157
    • /
    • 2013
  • With the advent of the digital environment that can be accessed anytime, anywhere with the introduction of high-speed network, the free distribution and use of digital content were made possible. Ironically this environment is raising a variety of copyright infringement, and product images used in the online shopping mall are pirated frequently. There are many controversial issues whether shopping mall images are creative works or not. According to Supreme Court's decision in 2001, to ad pictures taken with ham products is simply a clone of the appearance of objects to deliver nothing but the decision was not only creative expression. But for the photographer's losses recognized in the advertising photo shoot takes the typical cost was estimated damages. According to Seoul District Court precedents in 2003, if there are the photographer's personality and creativity in the selection of the subject, the composition of the set, the direction and amount of light control, set the angle of the camera, shutter speed, shutter chance, other shooting methods for capturing, developing and printing process, the works should be protected by copyright law by the Court's sentence. In order to receive copyright protection of the shopping mall images by the law, it is simply not to convey the status of the product, the photographer's personality and creativity can be recognized that it requires effort. Accordingly, the cost of making the mall image increases, and the necessity for copyright protection becomes higher. The product images of the online shopping mall have a very unique configuration unlike the general pictures such as portraits and landscape photos and, therefore, the general image watermarking technique can not satisfy the requirements of the image watermarking. Because background of product images commonly used in shopping malls is white or black, or gray scale (gradient) color, it is difficult to utilize the space to embed a watermark and the area is very sensitive even a slight change. In this paper, the characteristics of images used in shopping malls are analyzed and a watermarking technology which is suitable to the shopping mall images is proposed. The proposed image watermarking technology divide a product image into smaller blocks, and the corresponding blocks are transformed by DCT (Discrete Cosine Transform), and then the watermark information was inserted into images using quantization of DCT coefficients. Because uniform treatment of the DCT coefficients for quantization cause visual blocking artifacts, the proposed algorithm used weighted mask which quantizes finely the coefficients located block boundaries and coarsely the coefficients located center area of the block. This mask improves subjective visual quality as well as the objective quality of the images. In addition, in order to improve the safety of the algorithm, the blocks which is embedded the watermark are randomly selected and the turbo code is used to reduce the BER when extracting the watermark. The PSNR(Peak Signal to Noise Ratio) of the shopping mall image watermarked by the proposed algorithm is 40.7~48.5[dB] and BER(Bit Error Rate) after JPEG with QF = 70 is 0. This means the watermarked image is high quality and the algorithm is robust to JPEG compression that is used generally at the online shopping malls. Also, for 40% change in size and 40 degrees of rotation, the BER is 0. In general, the shopping malls are used compressed images with QF which is higher than 90. Because the pirated image is used to replicate from original image, the proposed algorithm can identify the copyright infringement in the most cases. As shown the experimental results, the proposed algorithm is suitable to the shopping mall images with simple background. However, the future study should be carried out to enhance the robustness of the proposed algorithm because the robustness loss is occurred after mask process.