• 제목/요약/키워드: Photo Etching

검색결과 117건 처리시간 0.026초

Microabrasive로 처리한 상아질표면에 대한 복합레진의 결합강도에 관한 연구 (A STUDY OF THE BOND STRENGTHS OF COMPOSITE RESIN TO DENTIN SURFACES PREPARED WITH MICROABRASIVE)

  • 최경규;민병순
    • Restorative Dentistry and Endodontics
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    • 제22권1호
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    • pp.61-75
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    • 1997
  • The bond strengths of composite resin to tooth dentin vary with the methods of cavity preparation and surface treatment. Recent developments in techniques of dentinal surface treatment have renewed interest in microabrasive as a means of tooth preparation, The purpose of this study was to determine the effects of a new method of cavity preparation on the bond of composite resin to dentin. Freshly extracted 144 healthy human third molars were used in this study. The dentin surfaces prepared with #600 SiC abrasive paper were divided into control and air abrasion groups according to the method of dentin surface preparation using different combinations of delivery pressure, time, and acid etching. The shear bond strengths were measured after the composite resin (Clearfil Photo Bright) was bonded to prepared dentin surfaces by light-curing using a dentin bonding system (All-bond 2), In addition, the average surface roughness was measured to investigate the effect of differently prepared dentin surfaces on the shear bond strengths. The surface changes of prepared dentin and the debonded dentin surfaces were observed with SEM (S-2300, Hitachi Co., Japan). The following results from this-study were obtained ; 1. There was no significant difference of shear bond strengths according to the changes of delivery pressure and time. 2. The shear bond strengths were lower than the control in the air abraded-only groups, but those of the additional acid-etched groups were higher than the control. 3. The shear bond strengths to all air-abraded surfaces were increased by acid etching. 4. The correlation between shear bond strengths and surface roughness was not certain, although the mean surface roughness of all air-abraded surfaces has increased evidently while it has slightly decreased for additional acid etching. 5. On SEM examination, the dentinal tubules were almost occluded in the air abraded-only groups, but those were opened in the additional acid-etched groups. 6. The debonded surfaces were showed adhesive failure mode in the air abraded- only groups, while those were showed mainly the mixed and cohesive failure mode in the additional acid-etched groups. These results suggest that the layer produced during cavity preparation or surface treatment with air abrasion must be removed for maximum bond strength of composite resin to dentin.

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질소가 도핑된 그라핀을 이용한 고용량의 조절이 가능한 플렉서블 울트라커페시터 (Flexible, Tunable, and High Capacity Ultracapacitor using Nitron-Doped Graphene)

  • 정형모;신원호;최윤정;강정구;최장욱
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 추계학술대회 초록집
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    • pp.163.2-163.2
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    • 2010
  • We developed a simple method to synthesis a nitrogen doped graphene, nitrogen plasma treated graphene (NPG) sheets thought nitrogen plasma etching of graphene oxide (GO). X-ray photo electron spectroscopy (XPS) study of NPG sheets treated at various plasma conditions reveal that N-doping is classified to 3 kinds of binding configurations. The nitrogen doping concentration is at least 1.5 at % and up to 3 at% with changing of ratio of nitrogen configuration in NPG. Our group demonstrate ultracapacitor with high capacity and extremely durable using a NPG sheets that are comparable to pristine graphene supercapacitor, and pseudocapacitor using polymer and metal oxide with redox reaction, capacitance that are three-times higher, and a cycle life that are extremely stable. We also realized flexible capacitor by using the paper electrode that are coated by NPG sheets. NPG paper capacitor presented almost same performance compare with NPG on a metal substrate, and durability is much more enhanced than that. To additionally explain that how different kind of atoms in graphene layers can act as the ion absorption sites, we simulated the binding energy between nitrogen in graphene layer and ions in electrolyte. Increasing the energy density and long cycle life of ultracapacitor will enable them to compete with batteries and conventional capacitors in number of applications.

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Improvement of Photo Current Density in Dye-sensitized Solar Cell by Glass Texturing

  • Nam, Sang-Hun;Suk, Won;Yang, Hee-Su;Hwang, Ki-Hwan;Jin, Hyun;Seop, Kyu;Hong, Byungyou;Boo, Jin-Hyo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.423-423
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    • 2012
  • Recently, many researchers made progress in various studies improving the efficiency of dye-sensitized solar cell. In this paper, we used glass textured by wet-chemical etching process for improvement of photocurrent density in dye-sensitized solar cells. This is owing to increase coefficient of light utilization. Consequently, DSSC using the textured glass exhibit a Jsc of 9.49 mA/$cm^2$, a Voc of 0.73 V and a fill factor (FF) of 0.67 with an overall conversion efficiency of 4.64. This result showed increasing of 20% current density and 16% conversion efficiency using the textured glass. These results suggested that glass texturing was very effective in controlling the light-scattering properties into the photovoltaic cell.

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펨토초레이저와 자기조립박막을 이용한 나노스케일 패터닝 (Nanoscale Patterning Using Femtosecond Laser and Self-assembled Monolayers (SAMs))

  • 장원석;최무진;김재구;조성학;황경현
    • 대한기계학회논문집A
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    • 제28권9호
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    • pp.1270-1275
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    • 2004
  • Standard positive photoresist techniques were adapted to generate nano-scale patterns of gold substrate using self-assembled monolayers (SAMs) and femtosecond laser. SAMs formed by the adsorption of alkanethiols onto gold substrate are employed as very thin photoresists, Alkanethiolates formed by the adsorption of alkanethiols are oxidized on exposure to UV light in the presence of air to alkylsulfonates. Specifically, it is known that deep UV light of wavelength less than 200nm is necessary for oxidation to occur. In this study, ultrafast laser of wavelength 800nm and pulse width 200fs is applied for photolithography. Results show that ultrafast laser of visible range wavelength can replace deep UV laser source for photo patterning using thin organic films. Femtosecond laser coupled near-field scanning optical microscopy facilitates not only the patterning of surface chemical structure, but also the creation of three-dimensional nano-scale structures by combination with suitable etching methods.

New Mechanism of Thin Film Growth by Charged Clusters

  • Hwang, Nong-Moon;Kim, Doh-Yeon
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1999년도 PROCEEDINGS OF 99 INTERNATIONAL CONFERENCE OF THE KACG AND 6TH KOREA·JAPAN EMG SYMPOSIUM (ELECTRONIC MATERIALS GROWTH SYMPOSIUM), HANYANG UNIVERSITY, SEOUL, 06월 09일 JUNE 1999
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    • pp.115-127
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    • 1999
  • The charged clusters or particles, which contain hundreds to thousands of atoms or even more, are suggested to form in the gas phase in the thin film processes such as CVD, thermal evaporation, laser ablation, and flame deposition. All of these processes are also used in the gas phase synthesis of the nanoparticles. Ion-induced or photo-induced nucleation is the main mechanism for the formation of these nanoclusters or nanoparticles inthe gas phase. Charged clusters can make a dense film because of its self-organizing characteristics while neutral ones make a porous skeletal structure because of its Brownian coagulation. The charged cluster model can successfully explain the unusual phenomenon of simultaneous deposition and etching taking place in diamond and silicon CVD processes. It also provides a new interpretation on the selective deposition on a conducting material in the CVDd process. The epitaxial sticking of the charged clusters on the growing surface is gettign difficult as the cluster size increases, resulting in the nanostructure such as cauliflowr or granular structures.

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Width Control in the Photo patterning of PDP Barrier Ribs

  • Kim, Dong-Ju;Kim, Soon-Hak;Hur, Young-June;Kim, Duck-Gon;Lee, Sam-Jong;Jung, Sang-Kwon;Kim, Myeug-Chan;Park, Lee-Soon
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.910-912
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    • 2006
  • Barrier ribs in plasma display panels (PDPs) function to maintain the discharge space between the glass plates as well as to prevent optical cross-talking. The barrier ribs currently employed are typically $300{\mu}m$ pitch, $110{\sim}120{\mu}m$ in height, with upper and lower widths of $50{\mu}m$ and $80{\mu}m$, respectively. It has been reported that barrier ribs can be fabricated by screen-printing, sand blasting, etching and photolithographic processes. In this study, photosensitive barrier rib pastes were formulated and systematically evaluated in terms of photolithographic process variables such as printing, drying, UV exposure, development and sintering. It was found that the use of UV absorbent, polymerization inhibitor and surfactant were very effective in controlling the width uniformity of barrier ribs in the photolithographic method of barrier rib patterning.

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Hierarchical Nanostructure on Glass for Self Cleaning and Antireflective Properties

  • Xiong, Junjie;Das, Sachindra Nath;Kar, Jyoti Prakash;Choi, Ji-Hyuk;Myoung, Jae-Min
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2010년도 춘계학술발표대회
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    • pp.24.1-24.1
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    • 2010
  • In practical operation, the exposed surfaces may get dirty thus degrade the performance of devices. So the combination of self cleaning and antireflection is very desirable for use in outdoor photovoltaic and displaying devices, self cleaning windows and car windshields. For the purpose of self cleaning, the surface needs to be either superhydrophobic or superhydrophilic. However, in practice AR in the visible region and self cleaning are a pair of competitive properties. To satisfy the requirements for superhydrophobic or superhydrophilic surfaces, high surface roughness is required. But it usually cause severely light scattering. Photo-responsive coatings (TiO2, ZnO etc.) can lead to superhydrophilic. However, the refractive indices are high. Thus for porous structure, controlling pore size in the underwavelength scale to reduce the light scattering is very crucial for highly transparent and self cleaning antireflection coating. Herein, we demonstrate a simple method to make high performance broadband antireflection layer on the glass surface, by "carving" the surface by hot alkali solution. Etched glass has superhydrophilic surface. By chemical modification, it turns to superhydrophobic. Enhanced transparency (up to 97%) in a broad wavelength range was obtained by short time etching. Also antifogging effect has been demonstrated, which may offer advantage for devices working at high humidity environment or underwater. Compositional dependence of the properties was observed by comparing three different commercially available glasses.

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블루투스용 초소형 안테나 (A Subminiature Antenna for Bluetooth Applications)

  • 박명실;렌춘;방재훈;안병철
    • 한국산업정보학회논문지
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    • 제12권4호
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    • pp.119-125
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    • 2007
  • 본 논문에서는 블루투스용 초소형 PCB 일체형 안테나를 제안하였다. 제안된 안테나는 인쇄형 역 F 안테나의 공진부 선로를 미앤더 형태로 변형함으로써 크기를 소형화한 구조이다. 안테나의 치수는 널리 사용되는 상용 소프트웨어인 MWSTM를 사용하여 최적화하였다. VSWR 3.5 기준으로 $2.38GHz{\sim}2.45GHz$ 범위의 주파수를 만족시켜 3%의 대역폭을 만족하고 중심주파수에서 최대 VSWR 2.4의 값을 가지며 -0.23dBi의 이득 특성을 보였다. 제안된 안테나의 크기는 $9.65mm{\times}5.95mm$로서 기존의 인쇄형 역 F안테나와 비교 할 때 55%의 면적으로 소형화된 것이다.

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New mechanism of thin film growth by charged clusters

  • Hwang, Nong-Moon;Kim, Doh-Yeon
    • 한국결정성장학회지
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    • 제9권3호
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    • pp.289-294
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    • 1999
  • The charged clusters or particles, which contain hundreds to thousands of atoms or even more, are suggested to from in the gas phase in the thin film processes such as CVD, thermal evaporation, laser ablation, and flame deposition. All of these processes are also phase synthesis of the nanoparticels. Ion-induced or photo-induced nucleation is the main mechanism for the formation of these nanoclusters or nanoparticles in the gas phase. Charge clusters can make a dense film because of its self-organizing characteristics while neutral ones make a porous skeletal structure because of its Brownian coagulation. The charged cluster model can successfully explain the unusual phenomenon of simultaneous deposition and etching taking place in diamond and silicon CVD processes. It also provides a new interpretation on the selective deposition on a conducting material in the CVD process. The epitaxial sticking of the charged clusters on the growing surface is getting difficult as the cluster size increases, resulting in the nanostructure such as cauliflower or granular structures.

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채널 형상에 따른 마이크로채널 PCHE의 열전달 및 압력강하 특성 (The Heat Transfer and Pressure Drop Characteristics on Microchannel PCHE with various Configurations)

  • 김윤호;문정은;이규정
    • 대한설비공학회:학술대회논문집
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    • 대한설비공학회 2008년도 동계학술발표대회 논문집
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    • pp.215-220
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    • 2008
  • A microchannel PCHE is manufactured by the two technologies of micro photo-etching and diffusion bonding. In this paper, heat transfer and pressure drop characteristics by applying various configuration for the flow channel in the microchannel PCHE is experimentally investigated. The flow channel configurations are designed three types such as straight, wavy and offset strip channels. The performance experiment of each configuration is performed for Reynolds numbers in ranges of $100{\sim}700$ under various flow conditions for the hot side and the Reynolds number of cold side is fixed at 350. The inlet temperatures of the hot side and cold side are conducted as $40^{\circ}C$ and $20^{\circ}C$, respectively. The heat transfer performance of wavy channel, which was similar to that of offset strip channel, was much higher than that of straight channel. The effectiveness of wavy channel and offset strip channel was evaluated as about $0.5{\sim}0.9$. The pressure drop of wavy channel was highest among configurations and that of offset strip channel was lower than that of straight channel because the round curved surface of each strip edge was reduced the pressure loss.

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