• 제목/요약/키워드: Phonon scattering

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실험적 포논 평균자유행로 스펙트럼 분포를 이용한 포논 스펙트럼 포논-표면 산란율 모델 (Direct Determination of Spectral Phonon-Surface Scattering Rate from Experimental Data on Spectral Phonon Mean Free Path Distribution)

  • 진재식
    • 대한기계학회논문집B
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    • 제40권9호
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    • pp.621-627
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    • 2016
  • 본 연구에서는 실험적 데이터를 근간으로 박막재료의 스펙트럼(spectrum) 분포 별 포논-표면 산란율을 직접 계산할 수 있는 모델을 제시했다. 실험 측정결과인 포논 평균자유행로(mean free path, MFP) 스펙트럼 분포 별 열전달 기여도로부터 스펙트럼 의존적 포논-표면 산란율을 직접 도출하는 모델을 개발했고, 이 모델을 아직 실험적 방법으로 포논-표면 산란율을 측정하지 못한 $Si_{0.9}-Ge_{0.1}$ 나노선(Nanowire, NW)에 적용하여, $Si_{0.9}-Ge_{0.1}$ NW 내 포논 MFP 스펙트럼 분포를 구하고, 주파수에 따른 포논 전달특성을 살폈다. 이를 바탕으로 $Si_{0.9}-Ge_{0.1}$ NW 단위길이당 포논-표면 산란율을 제시하여, 가로갈래 포논 주파수 의존성을 살폈다. 본 연구에서 제시한 모델은 향후 나노재료의 공학적 응용을 위한 나노구조물 열전달 해석모델 개발 및 나노재료 열전달 특성 조정(tailoring)을 위한 나노재료 최적설계에 활용될 수 있다.

밀리미터 주파수에서 전자의 운동에 대한 Hot Phonon의 영향 연구 (A Study on the Effects of Hot Phonon in Electron Transport at Millimeter-wave Frequencies)

  • 윤태섭
    • 한국전기전자재료학회논문지
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    • 제11권12호
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    • pp.1070-1078
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    • 1998
  • A density of phonon is increased by application of electric field. At this time the phonon which has higher energy than around is called hot phonon is disappeared after 7 picosecond by scattering with electron and loss energy. Since the lifetime of phonon is very short, the effects of hot phonon can be neglected in the low speed semiconductor device, but it must be considered in high speed devices. DC and AC electric fields are applied to bulk GaAs, and the density of phonon is obtained and analyzed for its effects on electron velocity and electron distribution using Monte Carlo simulation method. Under high electric filed the density of hot phonon increased and energy of hot phonon is decreased by scattering with electron on the other hand the energy of electron is increased. Therefore electron move from central valley of conduntion band to satellite vallies and the valocity of electron decrease since the mass of electron in satellite vally is heavier than central vally. In millimeter wave frequencies, the effects of hot phonon increased at higher frequencies.

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포논 분산이 열전달 모델에 미치는 영향 (Impact of Phonon Dispersion on Thermal Conductivity Model)

  • 정재동
    • 대한기계학회논문집B
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    • 제27권8호
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    • pp.1165-1173
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    • 2003
  • The effects of (1) phonon dispersion on thermal conductivity model and (2) differentiation of group velocity and phase velocity are examined for germanium. The results show drastic change of thermal conductivity regardless of the same relaxation time model. Also the contribution of transverse acoustic (TA) phonon and longitudinal acoustic (LA) phonon on the thermal conductivity at high temperatures is reassessed by considering more rigorous dispersion model. Holland model, which is commonly used for modeling thermal conductivity, underestimates the scattering rate for TA phonon at high frequency. This leads the conclusion that TA is dominant heat transfer mode at high temperatures. But according to the rigorous consideration of phonon dispersion, the reduction of thermal conductivity is much larger than the estimation of Holland model, thus the TA at high frequency is expected to be no more dominant heat transfer mode. Another heat transfer mechanism may exist at high temperatures. Two possible explanations we the roles of (1) Umklapp scattering of LA phonon at high frequency and (2) optical phonon.

Phonon Dispersion이 열전달 모델에 미치는 영향 (Impact of Phonon Dispersion on Thermal Conductivity Model)

  • 정재동
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 춘계학술대회
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    • pp.1627-1632
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    • 2003
  • The effect of (1) phonon dispersion in thermal conductivity model and (2) the differentiation of group velocity and phase velocity for Ge is examined. The results show drastic change of thermal conductivity regardless of using same relaxation time model. Also the contribution of transverse acoustic (TA) phonon and longitudinal acoustic (LA) phonon is changed by considering more rigorous dispersion model. Holland model underestimates the scattering rate for high frequency TA, so misleading conclusion, i.e. TA is dominant heat transfer mode at high temperature. But the actual reduction of thermal conductivity is much larger than the estimation by Holland model and high frequency TA is no more dominant heat transfer mode. Another heat transfer mechanism may exist for high temperature. Two possible explanations are (1) high frequency LA by Umklapp scattering and (2) optical phonon.

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GaAsN 전도띠 바닥의 대칭성: 공명라만산란연구 (Symmetry of GaAsN Conduction-band Minimum: Resonant Raman Scattering Study)

  • 성맹제
    • 한국진공학회지
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    • 제15권2호
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    • pp.162-167
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    • 2006
  • [ $GaAs_{1-x}N_{x}$ ]의 전도띠 바닥전자상태의 특성을 Ge 기판위에 성장시킨 $GaAs_{1-x}N_{x}(x{\leq}0.7)$ 박막에 대한 공명라만산란 실험을 수행함으로써 조사하였다. LO(longitudinal optical)-phonon 라만세기의 강한 공명상승이 $E_+$ 뿐만 아니라 $E_0$ 전이에너지 근처에서 관측되었다. 그러나 $E_+$ 전이에너지 아래와 근처에서 관측되는 분명한 LO-phonon 선폭 공명상승과 다양한 X와 L 영역경계 (zone-boundary) phonon의 활성화와는 대조적으로, $E_0$ 전이에너지 근처에서는 어떠한 LO-phonon 선폭 확장공명이나 날카로운 영역경계 phonon의 활성화가 관측되지 않았다. 관찰된 공명라만산란 결과는 GaAsN의 전도띠 바닥전자상태가 비국소화된 bulk GaAs와 거의 흡사한 ${\Gamma}$대칭 상태로 구성되었다는 사실을 의미한다.

$A_{1-x}B_{x}$ 혼합물반도체에서 원자들의 혼합형태에 따른 비극성 Optical 포논산란에 대한 연구 (Study on The Non-polar Optical Phonon Scattering According to The Mixture of Atoms in a $A_{1-x}B_{x}$ Alloy semiconductor)

  • 박일수;전상국
    • 한국전기전자재료학회논문지
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    • 제14권8호
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    • pp.611-617
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    • 2001
  • The non-polar optical phonon scattering in the valence band depends on the masses, ratios, and types of mixtures of constituent atoms. Therefore, the random distribution of atoms in alloy semiconductors should be considered in the analysis of scattering mechanisms. For this purpose, the force equations of n atoms in a unit cell are expressed in a n x n matrix form to obtain the angular frequencies due to the acoustic and non-polar optical phonons. And, n is then assumed to be infinity. When this work is compared with other results published elsewhere, it is concluded that the independence of atomic displacement or amplitude of oscillation as ell as the infinite number of atoms in a unit cell must be taken into account for the random distribution of atoms in alloy semiconductors.

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Investigation on the phonon behavior of MgB2 films via polarized Raman spectra

  • R. P. Putra;J. Y. Oh;G. H. An;H. S. Lee;B. Kang
    • 한국초전도ㆍ저온공학회논문지
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    • 제26권1호
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    • pp.14-19
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    • 2024
  • In this study, we explore the anisotropy of electron-phonon coupling (EPC) constant in epitaxially grown MgB2 films on c-axis oriented Al2O3, examining its correlation with the critical temperature (Tc) and local structural disorder assessed through polarized Raman scattering. Analysis of the polarized Raman spectra reveals angle-dependent variations in the intensity of the phonon spectra. The Raman active mode originating from the boron plane, along with two additional phonon modes from the phonon density of states (PDOS) induced by lattice distortion, was distinctly observed. Persistent impurity scattering, likely attributed to oxygen diffusion, was noted at consistent frequencies across all measurement angles. The EPC values derived from the primary Raman active phonon do not significantly vary with changing observation angles, followed by that the Tc values calculated using the Allen and Dynes formula remain relatively constant across all polarization angles. Although the E2g phonon mode plays a crucial role in the EPC mechanism, the determination of Tc values in MgB2 involves not only electron-E2g coupling but also contributions from other phonon modes.

Strained SGOI n-MOSFET에서의 phonon-limited전자이동도의 Si두께 의존성 (Dependency of Phonon-limited Electron Mobility on Si Thickness in Strained SGOI (Silicon Germanium on Insulator) n-MOSFET)

  • 심태헌;박재근
    • 대한전자공학회논문지SD
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    • 제42권9호
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    • pp.9-18
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    • 2005
  • 60 nm C-MOSFET 기술 분기점 이상의 고성능, 저전력 트랜지스터를 구현 시키기 위해 SiGe/SiO2/Si위에 성장된 strained Si의 두께가 전자 이동도에 미치는 영향을 두 가지 관점에서 조사 연구하였다. 첫째, inter-valley phonon 산란 모델의 매개변수들을 최적화하였고 둘째, strained Si 반전층의 2-fold와 4-fold의 전자상태, 에너지 밴드 다이어그램, 전자 점유도, 전자농도, phonon 산란율과 phonon-limited 전자이동도를 이론적으로 계산하였다. SGOI n-MOSFET의 전자이동도는 고찰된 SOI 구조의 Si 두께 모든 영역에서 일반적인 SOI n-MOSFET보다 $1.5\~1.7$배가 높음이 관찰 되었다. 이러한 경향은 실험 결과와 상당히 일치한다. 특히 strained Si의 두께가 10 nm 이하일 때 Si 채널 두께가 6 nm 보다 작은 SGOI n-MOSFET에서의 phonon-limited 전자 이동도는 일반 SOI n-MOSFET과 크게 달랐다. 우리는 이러한 차이가 전자들이 suained SGOI n-MOSFET의 반전층에서 SiGe층으로 터널링 했기 때문이고, 반면에 일반 SOI n-MOSFET에서는 캐리어 confinement 현상이 발생했기 때문인 것으로 해석하였다. 또한 우리는 10 nm와 3 nm 사이의 Si 두께에서는 SGOI n-MOSFET의 phonon-limited 전자 이동도가 inter-valley phonon 산란율에 영향을 받는 다는 것을 확인하였으며, 이러한 결과는 더욱 높은 드레인 전류를 얻기 위해서 15 nm 미만의 채널길이를 가진 완전공핍 C-MOSFET는 stained Si SGOI 구조로 제작하여야 함을 확인 했다

MOS소자 반전층의 전자이동도에 대한 해석적 모델 (An analytical model for inversion layer electron mobility in MOSFET)

  • 신형순
    • E2M - 전기 전자와 첨단 소재
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    • 제9권2호
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    • pp.174-179
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    • 1996
  • We present a new physically based analytical equation for electron effective mobility in MOS inversion layers. The new semi-empirical model is accounting expicitly for surface roughness scattering and screened Coulomb scattering in addition to phonon scattering. This model shows excellent agreement with experimentally measured effective mobility data from three different published sources for a wide range of effective transverse field, channel doping and temperature. By accounting for screened Coulomb scattering due to doping impurities in the channel, our model describes very well the roll-off of effective mobility in the low field (threshold) region for a wide range of channel doping level (Na=3.0*10$^{14}$ - 2.8*10$^{18}$ cm$^{-3}$ ).

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Optical phonon and scattering in uniaxial crystals

  • Lee, B.C
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.118-118
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    • 2000
  • We investigate Frohlich-like electron--optical-phonon interactionsin uniaxial crytals based on the macroscopic dielectric continuum model. In general, the optical-phonon branches support mixed longitudinal and transverse modes due to the anisotropy. For heterostructures with double interfaces and superlattices, it is known that confined, interface, and half-space optical phonon modes exist in zincblende cystals. In uniaxial structures, additional propagating modes may exist in wurtzite heterosystems due to anisotropic phonon dispersion. This is especially the case when the dielectric properties of the adjacent heterostructure materials do not differ substantially. The dispersion relations and the interaction Hamiltonians for each of these modes are derived.

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