• 제목/요약/키워드: Phonon band

검색결과 58건 처리시간 0.043초

풀밴드 몬데카를로 방법을 이용한 GaAs 임팩트이온화의 온도 의존성에 관한 연구 (A Study on the Temperature dependent Impact ionization for GaAs using the Full Band Monte Carlo Method)

  • 고석웅;유창관;정학기
    • 한국정보통신학회논문지
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    • 제4권3호
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    • pp.697-703
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    • 2000
  • 임팩트이온화현상은 소자의 크기가 점점 작아지면서, 높은 에너지에 있는 hot carrier 전송 을 해석하기 위해 매우 중요하므로 소자의 시뮬레이션에 정확한 임팩트이온화모델이 필수적이다. 털 연구에서는 의사포텐셜방법을 사용하여 풀밴드모델을 구하고, 임팩트이온화율은 수정된 Keldysh 공식을 이용하여 유도하였다. 본 연구에서는 Gahs 임팩트이은화의 온도의존특성을 조사하기 위하여 Monte Carlo 시뮬레이터를 제작하여 임팩트이온화계수를 구하였다. 결과적으로, 임팩트이온화계수는 300K에서 실험값과 잘 일치하였다. 또한 에너지는 전계가 증가할수록 증가하고, 높은 온도에서는 포논 산란의 emission mode가 높기 때문에 에너지가 감소함을 알 수 있었다. 임팩트이온화의 대수 fitting 함수 식은 온도와 전계에 대해 2차식으로 표현하였다. 대수 fitting 함수의 오차는 대부분 5%이내에 머물렀다. 그러므로 대수식으로 표현된 임팩트 이온화계수는 온도에 의존함을 알았고, 임팩트이온화계수를 구하는데 시간을 절약할 수 있다.

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실리콘-게르마늄 합금의 전자 소자 응용 (SiGe Alloys for Electronic Device Applications)

  • 이승윤
    • 한국진공학회지
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    • 제20권2호
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    • pp.77-85
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    • 2011
  • 실리콘(Si)에 비해 상대적으로 밴드 갭이 작고, 열전도도가 낮으며, 기존의 Si 반도체 공정 기술과 호환이 가능한 실리콘-게르마늄(SiGe) 합금은 트랜지스터, 광수신 소자, 태양전지, 열전 소자 등 다양한 전자 소자에서 사용되고 있다. 본 논문에서는 SiGe 합금이 전자소자에 응용되는 원리 및 응용과 관련된 기술적인 논제들을 고찰한다. Si에 비해 밴드 갭이 작은 게르마늄(Ge)이 그 구성 원소인 SiGe 합금의 밴드 갭은 Si과 Ge의 분률과 상관없이 항상 Si의 밴드 갭 보다 작다. 이러한 SiGe의 작은 밴드 갭은 전류 이득의 손실 없이 베이스 두께를 감소시키는 것을 가능하게 하여 바이폴라 트랜지스터의 동작속도를 향상시킨다. 또한, Si이 흡수하지 못하는 장파장 대의 빛을 SiGe이 흡수하여 광전류를 생성하게 함으로써 태양전지의 변환효율을 증가시킨다. 질량이 서로 다른 Si 및 Ge 원소의 불규칙적인 분포에 의해 발생하는 포논 산란 효과 때문에 SiGe 합금은 순수한 Si 및 Ge과 비교할 때 낮은 열전도도를 갖는다. 낮은 열전도도 특성의 SiGe 합금은 전자 소자 구조 내에서의 열 손실을 억제하는데 효과가 있으므로 Si 반도체 공정 기반의 열전 소자의 구성 물질로서 활용이 기대된다.

변형된 SSD법에 의한 InP 단결정 성장에 관한 연구 (A study on the InP single crystal growth by modified SSD method)

  • 송복식;문동찬;김선태
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1992년도 하계학술대회 논문집 B
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    • pp.803-805
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    • 1992
  • The InP single crystals were grown by Modified Synthesis Solute Diffusion (SSD) method and its properties were investigated. The crystal growth rate and lattice constant $a_{\circ}$ of the grown crystals were 1.8mm/day, 5.867${\AA}$ respectively. Etch pits density along growth direction of crystal had nearly uniformity' about (2-6)x10 $cm^{-2}$ from first freeze part to last freeze part. The carrier concentration, mobility and resistivity varied from 6.25 x $10^{15}cm^{-3}$, 4218 $cm^{2}$/V sec and 1.38 x $10^{-1}{\Omega}^{-cm}$ at the first freeze part to 8.8x$10^{-3}cm^{-3}$, 4012 $cm^{2}$/V.sec and 1.43 X $10^{-1}{\Omega}^{-cm}$ at the last freeze part. In the photoluminescence at 10K, the radiation transitions were observed by the near band edge recombination, D-A pair recombination and its phonon replica in the undoped InP.

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비정질 Sb-Bi-Te 박막의 전기적 특성에 관한 연구 (A Study on the Electrical Properties of Amorphous Sb-Bi-Te Thin Films)

  • 이준신;이재형
    • 한국전기전자재료학회논문지
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    • 제15권3호
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    • pp.220-226
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    • 2002
  • Amorphous $Sb_{2-x}Bi_xTe_3$ (x = 0.0, 0.5 and 1.0) thin films were prepared by vacuum evaporation. The resistivity of 7he films decreases from 1.4{\times}10^{-2}$ to $8.84{\times}10^{-5}\Omega cm$ and the type of conductivity changes from p to n with the increase of the x value of the films. D.C. conduction studies on these films ate performed at various electric fields in the temperature range of 303-403 K. At low electric fields, two types of conduction mechanisms, i.e. the variable range hopping and the phonon assisted hopping are found to be responsible for the conduction, depending upon the temperature. The activation energy decreases from 0.082 to 0.076 eV in the temperature range of 303-363 K and from 0.47-0.456 eV in the second range of 363-403 K, indicating the shift of the Fermi level towards the conduction band edge and hence the change of the conduction from P to n type with the increase of the Bi concentration. Poole-Frankel emission dominates at high fields. The shape of the potential well of the localized centre is deduced and the mean free path of the charge carriers is also calculated.

변형된 SSD법에 의한 InP결정 성장 (InP crystal growth by modified SSD method)

  • 송복식;정성훈;문동찬;김선태
    • E2M - 전기 전자와 첨단 소재
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    • 제8권3호
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    • pp.291-297
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    • 1995
  • The InP crystals have been grown by modified synthesis solute diffusion (SSD) method and its properties have been investigated. The crystals have been grown by lowering the crucible quartz for growth in the furnace and crystal growth rate is 1.8mm/day. The lattice constant a. of the grown crystals is 5.867.angs.. Etch pits density along growth direction of crystal changes from 3.0*10.sup 3/cm$\^$-2/ of first freeze part to 6.7*10$\^$4/cm$\^$-2/ of last freeze part and the radial direction of wafer shows nearly uniform distribution. The resistivity and the carrier concentration of the grown crystals are 1.43*10$\^$-1/.ohm.-cm, 7.7*10$\^$15/cm$\^$-3/ at room temperature, respectively. In the photolurninescence at 10K, the radiation transitions are observed by the near band edge recombination, a pair recombination due to Si donor - Zn acceptor and its phonon replica in the InP. The activation energy by Zn diffusion in undoped n-InP crystals is 1.22eV.

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Temperature-dependent photoluminescence study on aluminum-doped nanocrystalline ZnO thin films by sol-gel dip-coating method

  • Nam, Giwoong;Park, Hyunggil;Yoon, Hyunsik;Kim, Soaram;Leem, Jae-Young
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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    • pp.131-133
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    • 2012
  • The photoluminescence (PT) properties of Al-doped ZnO thin films grown by the sol-gel dip-coating method have been investigated. At 12 K, nine distinct PL peaks were observed at 2.037, 2.592, 2.832, 3.027, 3.177, 3.216, 3.260, 3.303, and 3.354 eV. The deep-level emissions (2.037, 2.592, 2.832, and 3.027 eV) were attributed to native defects. The near-band-edge (NBE) emission peaks at 3.354, 3.303, 3.260, 3.216, and 3.177 eV were attributed to the emission of the neutral-donor-bound excitons (D0X), two-electron satellite (TES), free-to-neutral-acceptors (e,A0), donor-acceptor pairs (DAP), and second-order longitudinal optical (2LO) phonon replicas of the TES (TES-2LO), respectively. According to Haynes' empirical rule, we calculated the energy of a free exciton (FX) to be 3.374 eV. The thermal activation energy for D0X in the nanocrystalline ZnO thin film was found to be ~25 meV, corresponding to the thermal dissociation energy required for D0X transitions.

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Vapor Transport Epitaxy에 의한 GaN의 성장과 특성 (Growth and Properties of GaN by Vapor Transport Epitaxy)

  • 이재범;김선태
    • 한국재료학회지
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    • 제16권8호
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    • pp.479-484
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    • 2006
  • Highly c-axis oriented poly-crystalline GaN with a dimension of $1{\sim}3\;{\mu}m$ was deposited on $c-Al_2O_3$ substrate by vapor transport epitaxy (VTE) method at the temperature range of $900{\sim}1150^{\circ}C$. XRD intensities from (00'2) plane of grown GaNs were increased with reaction conditions which indicate the improvement of the crystal quality. In the PL spectra measured at 10 K, the spectrum composed with the neutral-donor bound exciton-related emission at 3.47 eV, crystal defect-related emission band at 3.42 eV and with its phonon replicas. The fact that intensity of $I_2$ were increased and FWHM were decreased with growth conditions means that the quality of GaN crystals were improved. With this simple VTE technology, we confirm that the GaNs were simply deposited on sapphire substrate and crystal quality related to optical properties of GaN grown by VTE were relatively good. PL emission without deep level emission in spite of polycrystalline structure can be applicable to the fabrication of large area and low cost optical devices using poly-GaN grown by VTE.

Optical characteristics of p-type ZnO epilayers doped with Sb by metalorganic chemical vapor deposition

  • Kwon, B.J.;Cho, Y.H.;Choi, Y.S.;Park, S.J.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.122-122
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    • 2010
  • ZnO is a widely investigated material for the blue and ultraviolet solid-state emitters and detectors. It has been promoted due to a wide-band gap semiconductor which has large exciton binding energy of 60 meV, chemical stability and low radiation damage. However, there are many problems to be solved for the growth of p-type ZnO for practical device applications. Many researchers have made an efforts to achieve p-type conductivity using group-V element of N, P, As, and Sb. In this letter, we have studied the optical characteristics of the antimony-doped ZnO (ZnO:Sb) thin films by means of photoluminescence (PL), PL excitation, temperature-dependent PL, and time-resolved PL techniques. We observed donor-to-acceptor-pair transition at about 3.24 eV with its phonon replicas with a periodic spacing of about 72 meV in the PL spectra of antimony-doped ZnO (ZnO:Sb) thin films at 12 K. We also investigate thermal activation energy and carrier recombination lifetime for the samples. Our result reflects that the antimony doping can generate shallow acceptor states, leading to a good p-type conductivity in ZnO.

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백색 레이저 조명용 Y3Al5O12:Ce3+,Pr3+ 단결정 특성 (Properties of Y3Al5O12:Ce3+,Pr3+ Single Crystal for White Laser Lightings)

  • 강태욱;임석규;김종수;이봉
    • 반도체디스플레이기술학회지
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    • 제17권4호
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    • pp.37-41
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    • 2018
  • $Y_3A_{l5}O_{12}:Ce^{3+},Pr^{3+}$ single crystal phosphor was prepared by floating zone method. single crystal was confirmed to have a Ia-3d (230) space group of cubic structure and showed regular morphology. The optical properties, single crystal exhibited a emission band from green, yellow wide wavelength and 610nm, 640nm red wavelength vicinity. The luminance maintenance rate was decreased by phonon with increasing temperature, but high luminance is maintained more than powder phosphor. In addition, $Y_3A_{l5}O_{12}:Ce^{3+},Pr^{3+}$ single crystal phosphor was applied to a high power blue laser diode, we implemented high power white laser lightings. and it was confirmed that thermal properties over time, due to the effective heat transfer of complete crystal structure. We confirmed that excellent radiant heat properties than powder phosphor was applied to a high power white laser diode.

Indium doping induced defect structure evolution and photocatalytic activity of hydrothermally grown small SnO2 nanoparticles

  • Zeferino, Raul Sanchez;Pal, Umapada;Reues, Ma Eunice De Anda;Rosas, Efrain Rubio
    • Advances in nano research
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    • 제7권1호
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    • pp.13-24
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    • 2019
  • Well-crystalline $SnO_2$ nanoparticles of 4-5 nm size with different In contents were synthesized by hydrothermal process at relatively low temperature and characterized by transmission electron microscopy (TEM), microRaman spectroscopy and photoluminescence (PL) spectroscopy. Indium incorporation in $SnO_2$ lattice is seen to cause a lattice expansion, increasing the average size of the nanoparticles. The fundamental phonon vibration modes of $SnO_2$ lattice suffer a broadening, and surface modes associated to particle size shift gradually with the increase of In content. Incorporation of In drastically enhances the PL emission of $SnO_2$ nanoparticles associated to deep electronic defect levels. Although In incorporation reduces the band gap energy of $SnO_2$ crystallites only marginally, it affects drastically their dye degradation behaviors under UV illumination. While the UV degradation of methylene blue (MB) by undoped $SnO_2$ nanoparticles occurs through the production of intermediate byproducts such as azure A, azure B, and azure C, direct mineralization of MB takes place for In-doped $SnO_2$ nanoparticles.