• Title/Summary/Keyword: Phase mask

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Fabrication of the grating array using computer generated phase mask (Computer generated phase mask를 이용한 격자 array 제작)

  • 원형식;김상인;박선택;송석호;오차환;김필수
    • Proceedings of the Optical Society of Korea Conference
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    • 2001.02a
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    • pp.158-159
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    • 2001
  • 파장분할다중 방식에서 필요로 하는 격자들 간의 격자주기 차이는 1nm이하를 요구한다. 따라서, 하나의 위상형 마스크로 서로 다른 주기의 격자를 동시에 제작하려면 하나의 위상형 마스크 패턴들 간에도 nm 정도의 차이를 갖는 미세한 패턴이 있어야 한다. 그러나, 일반적으로 마스크를 제작하는데 이용되는 장비인 전자빔 묘화장치(electron-beam lithographic system)의 분해능은 수십 nm이므로, 그러한 nm 정도의 정확도로서 조합된 마스크 패턴들을 만드는 것은 매우 어렵다. (중략)

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The analysis of optical image encryption using random phase mask (임의 위상판에 의한 광학상 암호화의 분석)

  • 김병철;차성도;신승호
    • Proceedings of the Optical Society of Korea Conference
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    • 2001.02a
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    • pp.72-73
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    • 2001
  • 대용량 정보의 보안이 매우 중요해짐에 따라 활발히 진행 중인 광정보의 보안에 대한 연구 중에서 광학적 위상암호화는 많은 양의 정보를 한린에 암호화하고 해독할 수 있다(·:). 특히 Javidi 등이 제안한 Fresnal 영역 임의 위상판(random phase mask; RPM)을 이용한 암호화 방법은 3차원 위치 정보를 암호화 키로 사용한다. 이와 같은 암호화 방법에 회전에 의한 위상변화를 추가하면 암호화 수준을 높일 수 있다. (중략)

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Holographic optical security system using a reflection photopolymer (반사형 포토폴리머를 이용한 홀로그래픽 광 보안 시스템)

  • Sin, Chang-Won;Kim, Nam;Kim, Min-Su;Jeon, Seok-Hui;Kim, Eun-Gyeong
    • Proceedings of the Optical Society of Korea Conference
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    • 2008.02a
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    • pp.199-200
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    • 2008
  • In this paper, we researched optical characteristics of a holographic optical security system using a reflection recording material and optical random phase mask. The system have the property of optical security key with the phase mask. Also, a reflection recording geometry can reduced a size of the reconstruction system because a input beam to reconstruct a holographic image and a diffraction beam are the same side on the material.

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Optical Encryption based on Visual Cryptography and Interferometry (시각 암호와 간섭계를 이용한 광 암호화)

  • 이상수;서동환;김종윤;박세준;신창목;김수중;박상국
    • Proceedings of the Optical Society of Korea Conference
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    • 2000.08a
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    • pp.126-127
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    • 2000
  • In this paper, we proposed an optical encryption method based in the concept of visual cryptography and interferometry. In our method a secret binary image was divided into two sub-images and they were encrypted by 'XOR' operation with a random key mask. Finally each encrypted image was changed into phase mask. By interference of these two phase masks the original image was obtained. Compared with general visual encryption method, this optical method had good signal-to-noise ratio due to no need to generate sub-pixels like visual encryption.

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Image Security and Personal Identification using CGH and Phase Mask (CGH와 위상 마스크를 이용한 영상 보안 및 개인 인증)

  • 김종윤;박세준;김종찬;김철수;조웅호;김수중
    • Proceedings of the IEEK Conference
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    • 1999.06a
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    • pp.958-961
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    • 1999
  • A new image encoding and identification scheme is proposed for security verification by using CGH(computer generated hologram), random phase mask, and correlation technique. The encrypted image, which is attached to the security product, is made by multiplying QPH(quadratic phase hologram) using SA(simulated annealing) algorithm with a random phase function. The random phase function plays a role of key when the encrypted image is decrypted. The encrypted image could be optically recovered by 2-f system and automatically verified for personal identification. Simulation results show the proposed method cand be used for the reconstruction and the recognition of the encrypted. Image.

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Optical Proximity Correction using Sub-resolution Assist Feature in Extreme Ultraviolet Lithography (극자외선 리소그라피에서의 Sub-resolution assist feature를 이용한 근접효과보정)

  • Kim, Jung Sik;Hong, Seongchul;Jang, Yong Ju;Ahn, Jinho
    • Journal of the Semiconductor & Display Technology
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    • v.15 no.3
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    • pp.1-5
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    • 2016
  • In order to apply sub-resolution assist feature (SRAF) in extreme ultraviolet lithography, the maximum non-printing SRAF width and lithography process margin needs to be improved. Through simulation, we confirmed that the maximum SRAF width of 6% attenuated phase shift mask (PSM) is large compared to conventional binary intensity mask. The increase in SRAF width is due to dark region's reflectivity of PSM which consequently improves the process window. Furthermore, the critical dimension error caused by variation of SRAF width and center position is reduced by lower change in diffraction amplitude. Therefore, we speculate that the margin of SRAF application will be improved by using PSM.

Analysis of Laser-protection Performance of Asymmetric-phase-mask Wavefront-coding Imaging Systems

  • Yangliang, Li;Qing, Ye;Lei, Wang;Hao, Zhang;Yunlong, Wu;Xian'an, Dou;Xiaoquan, Sun
    • Current Optics and Photonics
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    • v.7 no.1
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    • pp.1-14
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    • 2023
  • Wavefront-coding imaging can achieve high-quality imaging along with a wide range of defocus. In this paper, the anti-laser detection and damage performance of wavefront-coding imaging systems using different asymmetric phase masks are studied, through modeling and simulation. Based on FresnelKirchhoff diffraction theory, the laser-propagation model of the wavefront-coding imaging system is established. The model uses defocus distance rather than wave aberration to characterize the degree of defocus of an imaging system. Then, based on a given defocus range, an optimization method based on Fisher information is used to determine the optimal phase-mask parameters. Finally, the anti-laser detection and damage performance of asymmetric phase masks at different defocus distances and propagation distances are simulated and analyzed. When studying the influence of defocus distance, compared to conventional imaging, the maximum single-pixel receiving power and echo-detection receiving power of asymmetric phase masks are reduced by about one and two orders of magnitude respectively. When exploring the influence of propagation distance, the maximum single-pixel receiving power of asymmetric phase masks decreases by about one order of magnitude and remains stable, and the echodetection receiving power gradually decreases with increasing propagation distance, until it approaches zero.

Deep Learning Based Digital Staining Method in Fourier Ptychographic Microscopy Image (Fourier Ptychographic Microscopy 영상에서의 딥러닝 기반 디지털 염색 방법 연구)

  • Seok-Min Hwang;Dong-Bum Kim;Yu-Jeong Kim;Yeo-Rin Kim;Jong-Ha Lee
    • Journal of the Institute of Convergence Signal Processing
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    • v.23 no.2
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    • pp.97-106
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    • 2022
  • In this study, H&E staining is necessary to distinguish cells. However, dyeing directly requires a lot of money and time. The purpose is to convert the phase image of unstained cells to the amplitude image of stained cells. Image data taken with FPM was created with Phase image and Amplitude image using Matlab's parameters. Through normalization, a visually identifiable image was obtained. Through normalization, a visually distinguishable image was obtained. Using the GAN algorithm, a Fake Amplitude image similar to the Real Amplitude image was created based on the Phase image, and cells were distinguished by objectification using MASK R-CNN with the Fake Amplitude image As a result of the study, D loss max is 3.3e-1, min is 6.8e-2, G loss max is 6.9e-2, min is 2.9e-2, A loss max is 5.8e-1, min is 1.2e-1, Mask R-CNN max is 1.9e0, and min is 3.2e-1.