• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.212-213
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• 2006

Polymer thick film resistor paste was fabricated using various materials. Inorganic materials of carbon black and graphite were selected as fillers and epoxy resin was selected as organic material. Solvent with high boiling temperature was applied to adjust viscosity. A designed test coupon pattern was used to evaluate fabricated resistors. Aspect ratio of 1 was selected for evaluating resistor values. Electrical properties of fabricated resistors were measured and their values analyzed in relation to paste composition. PTF fabricated using carbon black as fillers achieved resistor value of $530{\Omega}/sq$.

• 한국광학회지
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• 제2권3호
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• pp.149-152
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• 1991

리튬나이오베이트 결정에 Ti를 열확산시켜 광도파로를 만드는 방법에서 문제가 되는 out-diffusion(삼출) 문제를 해결하는 방안으로 확산과정 이전에 $SiO_2$ 박막을 시료 위해 입히고 Ti을 열확산시켜 광도파로를 제조하는 방법을 제안하였으며, 기존의 방법에 의해서 만들어진 광도파로와 본 연구의 방법에 의해서 만든 광도파로의 근시야상(near field pattern)을 비교하였다.

• 소성∙가공
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• 제14권6호
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• pp.570-576
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• 2005

Powder Injection Molding(PIM) has recently been recognized as an advanced manufacturing technology for low-cost mass production of metal or ceramic parts of complicated geometry With this regards, design technology of dental scaler tip PIM mold, which has complex shape and small core pin (diameter=0.6mm), with the help of computer-aided analysis of powder injection molding process was developed. Computer-aided analysis for dental scaler tip mold was implemented by finite element method with non-Newtonian fluid, modified Cross model viscosity, PvT data of powder/binder mixture. Compter-aided analysis results, such as filling pattern, weldline formation, air vent position prediction were compared with experimental result, and eventually have been shown good agreement. The core pin (diameter=0.6mm) deflection analysis of dental scaler tip PIM mold during PIM filling process was also investigated before mold fabrication.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.57-57
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• 2010

Self assembled $Zn_{x-1}Cd_xS$ nanowires, synthesized on a Indium tin oxide coated glass substrate with low composition of Cd as x=0.09, were fabricated non-precursor via a co-evaporation method using of solid sources of CdS and ZnS. We studies that ZnCdS nanowires are dislocation-free and the single crystalline hexagonal wurtzite structure showed by transmission electron microscopy and selected area electron diffraction pattern. Cathode luminescence spectra showed an near band edge peak at 383nm originated from nanowires at 80K and 300K. Core level spectra of the Cd 3d, Zn 2p and S 2p in the ZnCdS nanorods were obtained by x-ray photoelectron spectroscopy. Prepared ZnCdS nanorods showed different shape with increase of substrate temperature at the growth.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.509-513
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• 2005

In order to increase productivity in conventional stereolithography. Microstereolithography using a digital micramirror device $(DMD^{TM})$ as a dynamic patter generator is proposed The deviation from a level of clear optical images to a level of a photopolymer surface is a key for the fabrication of an accurate 3D structure. so this deviation is minimized by controlling the viscosity of FA1260T with organic solvents. After finding the appropriate process valuables (exposure time of optical images. layer thickness of each layer). the feasibility of microstructures such as a microgear and a microsphere is then demonstrated. Microstereolithography wi th $DMD^{TM}$ might eventually replace conventional laser induced microstereolithography market such as in the manufacturing of jewels and medical parts.

• 한국정밀공학회지
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• 제21권5호
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• pp.24-31
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• 2004

Masking effect of the nanoscratched silicon (100) surface was studied and applied to a maskless nanofabrication technique. First, the surface of the silicon (100) was machined by ductile-regime nanomachining process using the scratch option of the Nanoindenter${ \circledR}$ XP. To clarify the possibility of the nanoscratched silicon surfaces for the application to wet etching mask, the etching characteristic with a KOH solution was evaluated at room temperature. After the etching process, the convex nanostructures were made due to the masking effect of the mechanically affected layer. Moreover, the height and the width of convex structures were controlled with varying normal loads during nanoscratch.

• 한국표면공학회지
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• 제25권3호
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• pp.126-132
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• 1992

Recent VLSI requires materials with high dielectric constant in order to reduce their storage capacitor areas. Thin TaOx film was formed from Ta(OCH3)5 by photo-CVD method at a low temperature. The result shows that the film obtained by photo-CVD method is this study has good step coverage, high dielectric constant (20-25) and low leakage current. The high strong peaks from Ta(4f), Ta(4d), and O(ls) levels were observed by XPS analysis. From the diffraction pattern and TEM prcture analysis, the TaOx thin film was observed to be amorphous. This kind of the deposition method could be considered to be a very promising method applied to VLSI.

• 방사선산업학회지
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• 제5권3호
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• pp.243-247
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• 2011

In this study, a convenient method for the selective immobilization of single strand DNA (ssDNA) on a polymer surface was described. A positively charged polyelectrolyte, poly(diallyldimethylammonium chloride) (PDDA), was spin-coated on a tissue culture petridish and the micropatterns of the PDDA were formed by selective ion implantation through a pattern mask. The surface property of the implanted PDDA was investigated by using a surface profiler and FT-IR spectrometer. Cy3-labeled ssDNA was selectively immobilized on the PDDA patterns through ionic interaction and thus, well-defined ssDNA patterns were obtained.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2005년도 추계 학술대회
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• pp.183-187
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• 2005

Thin films of diblock copolymers may be suitable for semiconductor device applications since they enable patterning of ordered domains with dimensions below photolithographic resolution over wafer-scale area. We obtained nanometer-scale cylindrical structure of dibock copolymer of polystyrene-block-poly(methylmethacrylate), PS-b-PMMA, also demonstrate pattern transfer of the nanoporous polymer using both reactive ion etching. The size of fabricated naonoholes were about 10 nm. Fabricated nanopattern surface was observed by field emission scanning electron microscope (FESEM).

• Current Optics and Photonics
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• 제5권5호
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• pp.506-513
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• 2021

An arrayed diffractive optical element design for the beam-shaping of a multi-array light source is proposed. This is an essential device for recent optical security and face recognition applications. In practice, we devise a DC noise reduction technique featuring high fabrication error tolerance regarding the multi-array light source diffractive optical elements, as a necessary part of the proposed design method. The spherical diverging illumination leads to DC-conjugate noise spreading. The main idea is tested experimentally, and the multi-array light source diffraction pattern is investigated numerically.