• Title/Summary/Keyword: Particle Removal

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An Experimental Study on the Removal Characteristics of Indoor Air Pollutants using an Air Cleaning System (실내 공기정화 시스템에 의한 실내 오염입자의 제거특성에 관한 실험적 연구)

  • 김성찬;이창건;안영철;이재근;강태욱;이감규;구정환
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.15 no.9
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    • pp.733-737
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    • 2003
  • The purpose of this study is to analyze the particle removal characteristics of a commercial air cleaner based on the electrostatic precipitator. The air cleaner consists of a positive corona precharger to precharge particles and a collector to remove the charged particles. The test for particle removal efficiency is conducted with tobacco smoke particles of 1.27${\mu}{\textrm}{m}$ in mass median diameter. The result of one-pass filtration test shows that the filtration efficiency is more than 90% for the particles larger than 2.5 Um, while the efficiency for the particles of 0.5~1.0${\mu}{\textrm}{m}$ in case of 4.18 CMM is 70%. For the test room of 5,800${\times}$3,400${\times}$2,600㎣, the concentration of tobacco smoke particles decreases up to 30% of initial values within 30 minutes due to natural reduction and up to 90% of initial values within 30 minutes with the air cleaner operation.

Study of HVAC system with air cleaning system for indoor air quality of subway station (지하철 역사의 실내공기질 개선을 위한 공조기 적용 공기청정장치 선정에 대한 기초연구)

  • Jung, Yee-Kyeong;Park, Jae-Hong;Lee, Ryang-Hwa;Yoon, Ki-Young;Hwang, Jung-Ho
    • Proceedings of the SAREK Conference
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    • 2008.11a
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    • pp.537-540
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    • 2008
  • A numerical study has been carried out on the optimization of an air cleaning system which was installed in a heating, ventilation and air conditioning system (HVAC) system of subway station for particle removal. Required particle removal efficiencies of three different air cleaning systems were calculated from ventilation rate, and indoor/outdoor concentration of PM10. Mass balance equations of PM10 were used to solve the required particle removal efficiencies. Fibrous filter was considered as an air cleaning system. Calculations were carried out about two different places which were waiting area and platform of subway station, respectively. This study proposed optimized design and operation condition of each air cleaning system.

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Material Removal Rate Modeling of SiO2/TiO2 Mixed-Abrasive Slurry CMP for SiC (SiO2/TiO2 혼합입자 슬러리 SiC CMP의 재료제거율 모델링)

  • Hyunseop Lee
    • Tribology and Lubricants
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    • v.39 no.2
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    • pp.72-75
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    • 2023
  • Silicon carbide (SiC) is used as a substrate material for power semiconductors; however, SiC chemical mechanical polishing (CMP) requires considerable time owing to its chemical stability and high hardness. Therefore, researchers are attempting to increase the material removal rate (MRR) of SiC CMP using various methods. Mixed-abrasive CMP (MAS CMP) is one method of increasing the material removal efficiency of CMP by mixing two or more particles. The aim of this research is to study the mathematical modeling of the MRR of MAS CMP of SiC with SiO2 and TiO2 particles. With a total particle concentration of 32 wt, using 80-nm SiO2 particles and 25-nm TiO2 particles maximizes the MRR at 8 wt of the TiO2 particle concentration. In the case of 5 nm TiO2 particles, the MRR tends to increase with an increase in TiO2 concentration. In the case of particle size 10-25 nm TiO2, as the particle concentration increases, the MRR increases to a certain level and then decreases again. TiO2 particles of 25 nm or more continuously decreased MRR as the particle concentration increased. In the model proposed in this study, the MRR of MAS CMP of SiC increases linearly with changes in pressure and relative speed, which shows the same result as the Preston's equation. These results can contribute to the future design of MAS; however, the model needs to be verified and improved in future experiments.

Dispersion Characteristics of Nonspherical Fume Micro-Particles in Laser Line Machining in Terms of Particle Sphericity (입자 구형도에 따른 레이저 선가공의 비구형 흄 마이크로 입자 산포 특성 연구)

  • Kim, Kyoungjin;Park, Joong-Youn
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.2
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    • pp.1-6
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    • 2022
  • This computational investigation of micro-sized particle dispersion concerns the fume particle contamination over target surface in high-precision laser line machining process of semiconductor and display device materials. Employing the random sampling based on probabilistic fume particle generation distributions, the effects of sphericity for nonspherical fume particles are analyzed for the fume particle dispersion and contamination near the laser machining line. The drag coefficient correlation for nonspherical particles in a low Reynolds number regime is selected and utilized for particle trajectory simulations after drag model validation. When compared to the corresponding results by the assumption of spherical fume particles, the sphericity of nonspherical fume particles show much less dispersion and contamination characteristics and it also significantly affects the particle removal rate in a suction air flow patterns.

A Study on Fine Particle Removal of ESP according to $(NH_4)_2SO_4$ Injection Rate (황산암모늄 주입에 따른 전기집진기(ESP)에서의 미세분진 제거)

  • 서정민
    • Journal of Environmental Science International
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    • v.7 no.4
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    • pp.505-510
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    • 1998
  • This study has been carried out to investigate Electrostatic Precipitator's(ESP) performance enhancement and removal efficiency of fine particle according to (NH4)2SO4injection rate. The following conclusions are derived from the these test results : 1) For plant condition cases, according to the variation of concentration agent [(NH4)2SO4]-10ppm, when inlet dust loading was 2g/m2. And when Inlet dust loading was 3g/m", that was increased to 98 19% 99.16% 99.23%, 99.58%, 2) It Is seen from thins experiments that the increasing 30ppm concentration of (NH4)2SO4 increase the collection efficiency and fine particle omission control.

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Cause of Filtrate Deterioration and Its Improvement in Rapid Filtration (급속여과공정에서 여과수질 저하원인 및 개선방안)

  • Kim, Jin-Keun;Lee, Song-Hee;Kim, Jae-Won
    • Journal of Korean Society of Water and Wastewater
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    • v.24 no.3
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    • pp.333-339
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    • 2010
  • Particle removal is an important step taken at water treatment plants (WTPs) for the safety of tap water due to its proportionality to the pathogen inactivation. Government promulgated a treatment technique for the optimization of filtration including continuous turbidity monitoring using on-line turbidimeters. Based on the turbidity measurements of 460 filters at 31 WTPs operated by K-water, the evaluation of filtration performance and the investigation of major causes related to particle breakthrough were explored. 98.1 % of the filters had an effluent turbidity measurement which was less than 0.1 NTU, but turbidity breakthrough of more than 0.3 NTU was noticed occasionally which is in violation of AWWA 5-Star guidelines. It was shown that the optimization of coagulation, filter-to-waste, the observance of optimal filtration velocity and backwashing process based on filtrate turbidity were crucial for the improvement of filtrate.

Study of Several Silica Properties Influence on Sapphire CMP

  • Wang, Haibo;Zhang, Zhongxiang;Lu, Shibin
    • Journal of Electrical Engineering and Technology
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    • v.13 no.2
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    • pp.886-891
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    • 2018
  • Colloid silica using as abrasive for polishing sapphire has been extensively studied, which mechanism has also been deeply discussed. However, by the requirement of application enlargement and cost reduction, some new problems appear such as silica service life time, particle diameter mixing, etc. In this paper, several influences of colloid silica usage on sapphire CMP are examined. Results show particle diameter and concentration, pH value, service life time, particle diameter mixing heavily influence removal rate. Further analysis discloses there are two main effect aspects which are quantity of hydroxyl group, contact area for abrasive density stacking between abrasive and sapphire. Based on the discussions, a dynamic process of sapphire polishing is proposed.

Characteristics of Particles Structure of Delactosed Nonfat Dry Milk (탈유당 탈지분유의 입자구조 특성에 관한 연구)

  • 송재철;박현정;신완철
    • Journal of the Korean Society of Food Science and Nutrition
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    • v.24 no.2
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    • pp.341-345
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    • 1995
  • In comparison with calcium caseinate, delactosed nonfat dry milk has a greater particle size but also a higher bulk density, reflecting the differences in their composition and physical structure. Particles of delactosed nonfat dry milk were bigger than those of nonfat dry milk as a result of swelling and aggregation. The particle size was shown not to be correlated with the bulk density. The differences in particle characteristics between delactosed nonfat dry milk and nonfat dry milk were caused by the removal of lactose producing highly porous particles. The particles of delactosed nonfat dry milk were observed to be much more irregular, rough, hollow, fragile, and swelling as a result of solvent treatment.

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A Study on recycling of waste concrete for ${PO}_4^{3-}$-P removal contained in livestock wastewater (축산폐수에 함유된 ${PO}_4^{3-}$-P의 제거를 위한 폐콘크리트의 재활용에 관한 연구)

  • 김은호;박진식;성낙창;이영형;신남철;전기일
    • Journal of Environmental Science International
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    • v.8 no.2
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    • pp.227-231
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    • 1999
  • This study was conducted to investigate the removal characteristics of $PO_4^{3-}-P$ contained in livestock wastewater using waste concrete. With small particle size, increased dosage and temperature of water, $PO_4^{3-}-P$ was well removed by waste concrete.$PO_4^{3-}-P$ was removed by adsorption reaction in low pH of the primary phase, but the crystallization reaction predominated for increasing pH with passed time. As a result of adapting the adsorption isotherm equation, $PO_4^{3-}-P$ removal was more affected by the crystallization reaction than the adsorption reaction. In the SEM micrograph, there was no evident change on the waste concreter surface. Particle size was plate-phase before reaction but appeared a dense form to progress in the crystallization reaction.

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Study on Within-Wafer Non-uniformity Using Finite Element Method (CMP 공정에서의 웨이퍼 연마 불균일성에 대한 유한요소해석 연구)

  • Yang, Woo Yul;Sung, In-Ha
    • Tribology and Lubricants
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    • v.28 no.6
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    • pp.272-277
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    • 2012
  • Finite element analysis was carried out using wafer-scale and particle-scale models to understand the mechanism of the fast removal rate(edge effect) at wafer edges in the chemical-mechanical polishing process. This is the first to report that a particle-scale model can explain the edge effect well in terms of stress distribution and magnitude. The results also revealed that the mechanism could not be fully understood by using the wafer-scale model, which has been used in many previous studies. The wafer-scale model neither gives the stress magnitude that is sufficient to remove material nor indicates the coincidence between the stress distribution and the removal rate along a wafer surface.