• Title/Summary/Keyword: Packaging cost

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The Effect of Acetonitrile on the Texture Properties of Sodium Silicate Based Silica Aerogels (아세토니트릴 첨가가 물유리 기반 실리카 에어로겔의 기공구조에 미치는 영향)

  • Kim, Younghun;Kim, Taehee;Shim, Jong Gil;Park, Hyung-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.4
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    • pp.143-148
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    • 2018
  • Sodium silicate based silica aerogels are lower in cost than silica alkoxide based silica aerogels, but the demand is decreasing as their physical properties are lowered. In this research, acetonitrile as a drying control chemical additive (DCCA) is added in the sol state to improve the pore-structural properties of sodium silicate based silica aerogel by preventing the agglomeration of particles and cross-linked bond. The sodium silicate based silica aerogel by ambient pressure drying were prepared by sol-gel process. Acetonitrile/$Na_2SiO_3$ molar ratio of 0, 0.05, 0.1, 0.15, and 0.2 was added to the sol state. The physical properties of the final product were analyzed using Fourier transform infrared, contact angle measurement, Brunauer-Emmett-Teller and Barrett-Joyner-Halenda measurements and field emission scanning electron microscopy. It was confirmed that the sample with adding 0.15 molar ratio of acetonitrile and sodium silicate showed a high specific surface area ($577m^2/g$), a high pore volume (3.29 cc/g), and a high porosity (93%) comparable to the pore-structural properties of silica alkoxide based silica aerogels.

Room Temperature Imprint Lithography for Surface Patterning of Al Foils and Plates (알루미늄 박 및 플레이트 표면 미세 패터닝을 위한 상온 임프린팅 기술)

  • Tae Wan Park;Seungmin Kim;Eun Bin Kang;Woon Ik Park
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.2
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    • pp.65-70
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    • 2023
  • Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

Recent Progress in Micro In-Mold Process Technologies and Their Applications (마이크로 인몰드 공정기술 기반 전자소자 제조 및 응용)

  • Sung Hyun Kim;Young Woo Kwon;Suck Won Hong
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.2
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    • pp.1-12
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    • 2023
  • In the current era of the global mobile smart device revolution, electronic devices are required in all spaces that people interact with. The establishment of the internet of things (IoT) among smart devices has been recognized as a crucial objective to advance towards creating a comfortable and sustainable future society. In-mold electronic (IME) processes have gained significant industrial significance due to their ability to utilize conventional high-volume methods, which involve printing functional inks on 2D substrates, thermoforming them into 3D shapes, and injection-molded, manufacturing low-cost, lightweight, and functional components or devices. In this article, we provide an overview of IME and its latest advances in application. We review biomimetic nanomaterials for constructing self-supporting biosensor electronic materials on the body, energy storage devices, self-powered devices, and bio-monitoring technology from the perspective of in-mold electronic devices. We anticipate that IME device technology will play a critical role in establishing a human-machine interface (HMI) by converging with the rapidly growing flexible printed electronics technology, which is an integral component of the fourth industrial revolution.

Electrical Properties of Two-dimensional Electron Gas at the Interface of LaAlO3/SrTiO3 by a Solution-based Process (용액 공정을 통해 제조된 LaAlO3/SrTiO3 계면에서의 이차원 전자 가스의 전기적 특성)

  • Kyunghee Ryu;Sanghyeok Ryou;Hyeonji Cho;Hyunsoo Ahn;Jong Hoon Jung;Hyungwoo Lee;Jung-Woo Lee
    • Journal of the Microelectronics and Packaging Society
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    • v.31 no.1
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    • pp.43-48
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    • 2024
  • The discovery of a two-dimensional electron gas (2DEG) at the interface of LaAlO3 (LAO) and SrTiO3 (STO) substrates has sparked significant interest, providing a foundation for cutting-edge research in electronic devices based on complex oxide heterostructures. However, conventional methods for producing LAO thin films, typically employing techniques like pulsed laser deposition (PLD) within physical vapor deposition (PVD), are associated with high costs and challenges in precisely controlling the La and Al composition within LAO. In this study, we adopted a cost-effective alternative approach-solution-based processing-to fabricate LAO thin films and investigated their electrical properties. By adjusting the concentration of the precursor solution, we varied the thickness of LAO films from 2 to 65 nm and determined the sheet resistance and carrier density for each thickness. After vacuum annealing, the sheet resistance of the conductive channel ranged from 0.015 to 0.020 Ω·s-1, indicating that electron conduction occurs not only at the LAO/STO interface but also into the STO bulk region, consistent with previous studies. These findings demonstrate the successful formation and control of 2DEG through solution-based processing, offering the potential to reduce process costs and broaden the scope of applications in electronic device manufacturing.

Surface Nano-to-Micro Patterning for Rubber Magnet Composite via Extreme Pressure Imprint Lithography (극압 임프린트 리소그래피를 통한 자성고무 복합재 표면 미세 패터닝 기술)

  • Eun Bin Kang;Yu Na Kim;Woon Ik Park
    • Journal of the Microelectronics and Packaging Society
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    • v.31 no.3
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    • pp.18-23
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    • 2024
  • Nanoimprint lithography (NIL) is widely used to form structures ranging from micro to nanoscale due to its advantage of generating high-resolution patterns at a low process cost. However, most NIL processes require the use of imprint resists and external elements such as ultraviolet light or heat, necessitating additional post-processes like etching or metal deposition to pattern the target material. Furthermore, patterning on flexible and/or non-planar films presents significant challenges. This study introduces an extreme pressure imprint lithography (EPIL) process that can form micro-/nano-scale patterns on the surface of a flexible rubber magnet composite (RMC) film at room temperature without an etching process. The EPIL technique can form ultrafine structures over large areas through the plastic deformation of various materials, including metals, polymers, and ceramics. In this study, we demonstrate the process and outcomes of creating a variety of periodic structures with diverse pattern sizes and shapes on the surface of a flexible RMC composed of strontium ferrite and chlorinated polyethylene. The EPIL process, which allows for the precise patterning on the surface of RMC materials, is expected to find broad applications in the production of advanced electromagnetic device components that require fine control and changes in magnetic orientation.

Fabrication of passive-aligned optical sub-assembly for optical transceiver using silicon optical bench (실리콘 광학벤치를 사용한 수동정렬형 광송수신기용 광부모듈의 제작)

  • Lee, Sang-Hwan;Joo, Gwan-Chong;Hwang, nam;moon, Jong-Tae;Song, Min-Kyu;Pyun, Kwang-Eui;Lee, Yong-Hyun
    • Korean Journal of Optics and Photonics
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    • v.8 no.6
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    • pp.510-515
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    • 1997
  • Packaging takes an extremely important element of optical module cost due primarily to the added complication of alignment between semiconductor devices and optical fiber, and many efforts have been devoted on reducing the cost by eliminating the complicated optical alignment procedures in passive manner. In this study, we fabricated silicon optical benches on which the optical alignments are accomplished passively. To improve the positioning accuracy of a flip-chip bonded LD, we adopted fiducial marks and solder dams which are self-aligned with V-groove etch patterns, and a stand-off to control the height and to improve the heat dissipation of LD. Optical sub-assemblies exhibited an average efficiency of -11.75$\pm$1.75 dB(1$\sigma$) from the LD-to-single mode fiber coupling and an average sensitivity of -35.0$\pm$1.5 dBm from the fiber and photodetector coupling.

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Camera Imaging Lens Fabrication using Wafer-Scale UV Embossing Process

  • Jeong, Ho-Seop;Kim, Sung-Hwa;Shin, Dong-Ik;Lee, Seok-Cheon;Jin, Young-Su;Noh, Jung-Eun;Oh, Hye-Ran;Lee, Ki-Un;Song, Seok-Ho;Park, Woo-Je
    • Journal of the Optical Society of Korea
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    • v.10 no.3
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    • pp.124-129
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    • 2006
  • We have developed a compact and cost-effective camera module on the basis of wafer-scale-replica processing. A multiple-layered structure of several aspheric lenses in a mobile-phone camera module is first assembled by bonding multiple glass-wafers on which 2-dimensional replica arrays of identical aspheric lenses are UV-embossed, followed by dicing the stacked wafers and packaging them with image sensor chips. This wafer-scale processing leads to at least 95% yield in mass-production, and potentially to a very slim phone with camera-module less than 2 mm in thickness. We have demonstrated a VGA camera module fabricated by the wafer-scale-replica processing with various UV-curable polymers having refractive indices between 1.4 and 1.6, and with three different glass-wafers of which both surfaces are embossed as aspheric lenses having $230{\mu}m$ sag-height and aspheric-coefficients of lens polynomials up to tenth-order. We have found that precise compensation in material shrinkage of the polymer materials is one of the most technical challenges, in orderto achieve a higher resolution in wafer-scaled lenses for mobile-phone camera modules.

A Study on Recycling of Waste Polyethylene Film (폐폴리에틸렌 필름의 재활용에 관한 연구)

  • Lee, Hwan-Kwang
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.9 no.1
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    • pp.182-188
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    • 2008
  • The compounds of recycled polyethylene(PE) and fly-ashes were prepared. Polymers used were sorted PE from mixed plastics of household waste and Low Density Polyethylene(LDPE) and Linear Low Density Polyethylene(LLDPE) recycled from the scrap of packaging film plants. Fly-ashes were from the power plant and from the household waste incinerator. The tensile strength of recycled LDPE and LLDPE compounds decreased and the flexural modulus increased with greater amount of the power plant fly-ash. Anthracite fly-ash gave rise to slightly higher tensile and flexural strength of the LLDPE mixtures than bituminous coal fly-ash presumably due to higher content of unburned carbon. The incinerator fly-ash introduced to household waste PE enhanced both tensile strength and flexural modulus of the compounds. When LDPE and household waste PE were used together, the synergistic effect of incinerator fly-ash to household waste PE was offset by reduced crystallization of LDPE due to the filler particle. The compounds of household waste PE and incinerator fly-ash might be applied to structural materials for such as sewage pipe, which reduces the waste treatment cost and conserve the environment and resources.

Dry aging of beef; Review

  • Dashdorj, Dashmaa;Tripathi, Vinay Kumar;Cho, Soohyun;Kim, Younghoon;Hwang, Inho
    • Journal of Animal Science and Technology
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    • v.58 no.5
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    • pp.20.1-20.11
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    • 2016
  • The present review has mainly focused on the specific parameters including aging (aging days, temperature, relative humidity, and air flow), eating quality (flavor, tenderness and juiciness), microbiological quality and economic (shrinkage, retail yields and cost) involved beef dry aging process. Dry aging is the process where beef carcasses or primal cuts are hanged and aged for 28 to 55 d under controlling environment conditions in a refrigerated room with $0^{\circ}$ to $4^{\circ}C$ and with relative humidity of 75 to 80 %. However there are various opinions on dry aging procedures and purveyors of such products are passionate about their programs. Recently, there has been an increased interest in dry aging process by a wider array of purveyors and retailers in the many countries. Dry aging process is very costly because of high aging shrinkage (6 to 15 %), trims loss (3 to 24 %), risk of contamination and the requirement of highest grades meat with. The packaging in highly moisture-permeable bag may positively impact on safety, quality and shelf stability of dry aged beef. The key effect of dry aging is the concentration of the flavor that can only be described as "dry-aged beef". But the contribution of flavor compounds of proteolysis and lipolysis to the cooked dry aged beef flavor is not fully known. Also there are limited scientific studies of aging parameters on the quality and palatability of dry aged beef.

Direct Transfer Printing of Nanomaterials for Future Flexible Electronics

  • Lee, Tae-Yun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.3.1-3.1
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    • 2011
  • Over the past decade, the major efforts for lowering the cost of electronics has been devoted to increasing the packaging efficiency of the integrated circuits (ICs), which is defined by the ratio of all devices on system-level board compared to the area of the board, and to working on a larger but cheaper substrates. Especially, in flexible electronics, the latter has been the favorable way along with using novel nanomaterials that have excellent mechanical flexibility and electrical properties as active channel materials and conductive films. Here, the tool for achieving large area patterning is by printing methods. Although diverse printing methods have been investigated to produce highly-aligned structures of the nanomaterials with desired patterns, many require laborious processes that need to be further optimized for practical applications, showing a clear limit to the design of the nanomaterial patterns in a large scale assembly. Here, we demonstrate the alignment of highly ordered and dense silicon (Si) NW arrays to anisotropically etched micro-engraved structures using a simple evaporation process. During evaporation, entropic attraction combined with the internal flow of the NW solution induced the alignment of NWs at the corners of pre-defined structures. The assembly characteristics of the NWs were highly dependent on the polarity of the NW solutions. After complete evaporation, the aligned NW arrays were subsequently transferred onto a flexible substrate with 95% selectivity using a direct gravure printing technique. As proof-of-concept, flexible back-gated NW field effect transistors (FETs) were fabricated. The fabricated FETs had an effective hole mobility of 0.17 $cm2/V{\cdot}s$ and an on/off ratio of ${\sim}1.4{\times}104$. These results demonstrate that our NW gravure printing technique is a simple and effective method that can be used to fabricate high-performance flexible electronics based on inorganic materials.

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