• 제목/요약/키워드: PT 100

검색결과 607건 처리시간 0.024초

Floating P-well 전압 감지 방법과 수평형 절연 게이트 바이폴라 트랜지스터(LIGBT)를 이용한 새로운 1200V 절연 게이트 바이폴라 트랜지스터(IGBT)의 보호회로 (A New 1200V PT-IGBT with Protection Circuit employing the Lateral IGBT and Floating p-well Voltage Sensing Scheme)

  • 조규헌;지인환;한영환;이병철;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.99-100
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    • 2006
  • 절연 게이트 바이폴라 트랜지스터 (Insuialed atc Bipolar Transistor : IGBT)는 높은 전류구동 능력과 높은 입력 임피던스 특성으로 인해 대전력 스위칭 소자로 널리 응용되고 있다. 특히, 대용량 모터 구동을 위해 응용되는 경우, 모터의 부하 특성상, 모터의 단락에 의한 단락 회로 (Short-circuit fault) 현상을 비롯한 클램핑 다이오드의 파손으로 인한 unclamped 유도성 부하 스위칭 (UIS) 상황에서 견딜 수 있도록 설계되어야 한다. 이를 위해, 이전 연구를 통해 Floating p-well을 600V급 IGBT에 도입함으로써 UIS 상황에서 IGBT가 견딜 수 있는 에너지(항복 에너지)륵 증가시키고 Floating p-weil 전압을 감지함으로써 단락 회로 상황에서 IGBT가 보호될 수 있도록 보호회로를 제안하고 검증하였다. 그러나 이 보호회로는 수평형 금속 산화막 반도체 전계 효과 트랜지스터 (Latcral MOSFET)로 제작됨으로써 보호회로 기능을 수행하기 위해서는 넓은 면적을 요구하였다. 또한, 정상적인 동작 상황에서 오류를 감지 (오류 감지: False detection)하는 동작으로 인해 추가적인 filter를 요구함으로써 보호회로 동작 속도를 감소시켰다. 이러한 단점을 해결하기 위해, 수평형 절연 게이트 바이폴라 트랜지스터 (Lateral IGBT : LIGBT)를 보호회로에 적용함으로써 LIGBT의 높은 전류 구동능력을 이용하여 기존 보호회로 면적의 30% 수준의 보호회로를 구현하였다. 또한, 구현된 보호회로는 오류 감지 현상을 제거함으로써 보호회로의 동작 속도를 개선하였다. 제안된 보호회로와 1200V급 IGBT는 7장의 마스크를 이용한 표준 수평형 IGBT 공정을 이용하여 제작되었으며, 특히, 전자빔 조사를 이하여 턴오프 속도를 개선함으로써 고속 스위칭에 적합하도록 최적화 되었다.

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산화 바나디움, 몰리브데늄, 리티움계 융제법에 의한 합성 Emerald 단결정 육성 (Single crystal growth of synthetic emerald by flux method of Vandadium - Molybdenum - Lithium oxide system)

  • 최의석;김무경;이종민;안영필;서청교;안찬준
    • 한국결정성장학회지
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    • 제6권1호
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    • pp.44-55
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    • 1996
  • 천연 베릴을 이용하여 $V_20_5$, $Mo0_3$, $Li_2O$계 융제 및 첨가제 조성, 베렬의 용해도 그 리고 결정성장 온도와 같은 결정성창 조건을 제어하여 에메랄드 단결정을 성장시켰다. Flux와 첨가제를 조정하여 저온($1100^{\circ}C$ 이하)에셔 용해성이 높은 과포화 용융체를 만들고 온도 구배 (${\Delta}t 100^{\circ}C$), 열진동 효과 등을 정멀 제어 조정하므로써 고품질의 대형 emerald 단결정을 성장 시킬 수 있었다. 성장된 에메랄드 단결정의 특성은 굴절률 : 1.56 - 1.57, 비중 : 2.65 - 2.67인 6각 주상($c^*m$ : 1000, 1010)의 취록색 투명 단결정이였다.

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AFM을 이용한 나노급 $Ge_2Sb_2Te_5$의 전기적 특성

  • 배병주;홍성훈;조중연;오상철;황재연;이헌
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 춘계학술발표대회
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    • pp.21.1-21.1
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    • 2009
  • 상변화 메모리는 비휘발성 메모리이면서 빠른 동작 속도, 낮은 동작 전압 등 다양한 장점을 지니고 있어 차세대 메모리로 주목 받고 있다. 최근 상변화 메모리의 동작 전류를 감소시키기 위해 상변화 물질 및 전극 물질에 대한 연구를 진행하고 있으며, 소자의 크기를 최소화 하기 위한 연구가 진행되고 있다. 본 연구에서는 나노 임프린트 리소그래피와 전도성 AFM을 이용하여 나노급 상변화 물질의 특성을 평가하였다. 나노급 상변화 물질을 형성하기 위해 열경화성 나노 임프린트 리소그래피를 이용하여 $Ge_2Sb_2Te_5$(GST)/Mo/SiO2 기판 위에 200nm급 홀 패턴을 형성하였다. 홀 패턴에 Cr을 증착하여 리프트 오프 한 뒤 Cr을 하드 마스크로 사용하여 GST를 식각하였다. 그 결과, Mo 하부 전극 위에200nm 지름과 100nm 높이를 가지는 GST 나노 기둥을 형성하였다. GST 나노 기둥의 전기적 특성 평가를 위해 저항 측정 장비 및 펄스 발생기와AFM을 사용하였다. AFM은 접촉 모드로 설정하였으며, Pt가 코팅된 AFM tip을 사용하여 Cr 하드 마스크와 함께 상부 전극으로 사용하였다. GST 나노 기둥을 초기화 시키기 위해 I-V sweep을 하였으며, 그 결과 $1M\Omega$에서 $10\;k\Omega$으로 저항이 변화함을 확인하였다. GST 나노 기둥은 2V, 5ns의 리셋 펄스에서 비정질로 변화하였으며, 1.3V, 150ns의 셋 펄스에서 결정질로 변화하였다. 이 동작 전압으로 5번의 스위칭 특성을 평가하였으며, 이 결과는 소자 형태의 200nm 급GST의 특성과 유사하여 나노급 상변화 물질을 테스트하는 새로운 방법으로 사용될 수 있을 것이다.

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2-(4-시아노페닐) 아미노 -1,4-나프탈렌디온-3-피리디니움 퍼클로레이트 (PQ5)의 항혈소판작용 (Antiplatelet Activity of 2-(4-Cyanophenyl) amino-1,4-naphthalenedione-3-pyridinium perchlorate (PQ5))

  • 김도희;이수환;최소연;문창현;문창현;김대경;유충규
    • 약학회지
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    • 제43권6호
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    • pp.809-817
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    • 1999
  • The effect of 2-(4-cyanophenyl)amino-1,4-naphthalenedione-3-pyridinium perchlorate (PQ5) on pla-telet aggregation and its action mechanisms were investigated with rat platelet. PQ5 inhibited the platelet aggregation induced by collagen ($6{\;}{\mu\textrm{g}}/ml$), thrombin (0.4 U/ml) and A23187 ($3{\mu}M$) in concentration-dependent manner with $IC_{50}$ values of 5.50, 25.89 and $37.12{\;}{\mu}M$, respectively. PQ5 also significantly reduced the thromboxane $A_2$ (TXA2) formation in a concentration dependent manner. The collagen-induced arachidonic acid (AA) release in [-3H]-AA incorporated platelet, an indication of the phospholipase $A_2$ activity, was decreased by PQ5 pretreatment PQ5 significantly inhibited the activity of thormboxane synthase only at high concentration ($100{\mu}M$), but did not affect the cyclooxygenase activity at all. Collagen-induced ATP release was significantly reduced by PQ5. Calcium-induced platelet aggregation experiment suggests that the elevation of intracellular free $Ca^{2+}$ concentration ($[Ca^{2+}]_i$) by collagen stimulation is decreased by the pretreatment of PQ5, which is due to the inhibition of calcium release from intracellular store and influx from outside of the cell. PQ5 did not showed the effect of anticoagulation as prothrombin time (PT) or activated partial thromboplastin time (APTT). Form these results, it is suggested that PQ5 exerts its antiplatelet activity through the inhibition of the intracellular $Ca^{2+}$ mobilization and the decrease of the $TXA_2$ synthesis.

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핵융합 배가스 중 수소 회수를 위한 촉매반응 특성 연구 (Study on the Characteristics of Catalyst Reaction for Hydrogen Recovery from Nuclear Fusion Exhaust Gas)

  • 정우찬;정필갑;김정원;문흥만
    • 한국수소및신에너지학회논문집
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    • 제26권5호
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    • pp.402-408
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    • 2015
  • In D-T fusion reaction, $D_2$ (duterium) and $T_2$(tritium) are used as fuel gas. The exhaust gas of nuclear fusion includes hydrogen isotopes $Q_2$ (Q means H, D or T), tritiated components ($CQ_4$ and $Q_2O$), CO, $CO_2$, etc. All of hydrogen isotopes should be recovered before released to the atmosphere. This study focused on the recovery of hydrogen isotopes from $CQ_4$ and $Q_2O$. Two kinds of experiments were conducted to investigate the catalytic reaction characteristics of SMR (Steam Methane Reforming) and WGS (Water Gas Shift) reactions using Pt catalyst. First test was performed to convert $CH_4$ into $H_2$ using 6% $CH_4$, 6% CO/Ar feed gas. In the other test, 100% CO gas was used to convert $H_2O$ into $H_2$ at various reaction conditions (reaction temperature, S/C ratio, GHSV). As a result of the first test, $CH_4$ and CO conversion were 41.6%, 57.8% respectively at $600^{\circ}C$, S/C ratio 3, GHSV $2000hr^{-1}$. And CO conversion was 72% at $400^{\circ}C$, S/C ratio 0.95, GHSV $333hr^{-1}$ in the second test.

The Designing of an Air-gap Type FBAR Filter using Leach Equivalent Model

  • Choi, Hyung-Wook;Jung, Joong-Yeon;Lee, Seung-Kyu;Park, Yong-Seo;Kim, Kyung-Hwan;Shin, Hyun-Yong
    • Transactions on Electrical and Electronic Materials
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    • 제7권4호
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    • pp.196-203
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    • 2006
  • An air-gap type FBAR was designed using Leach equivalent model for analyzing a vertical structure of the FBAR. For the top electrode, Pt, and the bottom electrode, Au, of $1.2{\mu}m$ thickness and the piezoelectric of 0.8,urn thickness, the resonance and anti-resonance occurred at 2.401 GHz and 2.460 GHz, respectively. $S_{11}$ was increased and $S_{21}$ was decreased as the resonance area of FBAR was widened. We observed the characteristics of insertion loss, bandwidth and out-of-band rejection of ladder-type FBAR BPF by changing resonance areas of series and shunt resonators and by adding stages. As the resonance area of series resonator was increased, insertion loss was improved but out-of-band rejection was degraded. And as the resonance area of shunt resonator was increased, insertion loss was degraded a little but out-of-band rejection was improved even without adding stages. We, also, changed the shape of the resonance area from square shape to rectangle shape to examine the effects of the resonator shape on the characteristics of the BPF. The best performances were observed when the sizes of series and shunt resonator are $150{\mu}m{\times}l50{\mu}m\;and\;5{\mu}m{\times}50{\mu}m$, respectively. Out-of-band rejection was improved about 10dB and bandwidth was broadened from 30MHz to 100MHz utilizing inductor tuning on $2{\times}2\;and\; 4{\times}2$ ladder-type BPFs.

R.F. 마그네트론 스퍼터링에 의한 제조된 $SrBi_2$$Ta_2$$O_9$ 박막의 C축 배향성장에 미치는 Bi양의 영향 (The Effect of Bi Content on the C-axis Oriented Growth of $SrBi_2$$Ta_2$$O_9$ Thin Films Fabricateed by R.F. Magnetron Sputtering)

  • 배철휘;이전국;이시형;정형진
    • 한국세라믹학회지
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    • 제35권10호
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    • pp.1107-1112
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    • 1998
  • We could obtan c-axis oriented $SrBi_2$$Ta_2$$O_9$ thin films on usual Pt(111)/Ti/$SiO_2$/Si(100) substrate using a r. f. magnetron sputtering technique. According to the increase of sputtering pressure from 250 to 300 mTorr the Bi content and degree of the c-a xis preferred orientation of $SrBi_2$$Ta_2$$O_9$ thin films were increased. By controlling Bi(or $Bi_2O_3$) loss from $SrBi_2$$Ta_2$$O_9$ thin films during post annealing and by inserting $Bi_2O_3$ layer in $SrBi_2$$Ta_2$$O_9$ thin films the effect of Bi content on the c-axis oriented growth of $SrBi_2$$Ta_2$$O_9$ thin films could be investigated without the effect of sputtering pressure. The degree of the c-axis preferred orientation of $SrBi_2$$Ta_2$$O_9$ thin films was increased with increasing with increasing Bi content by control of Bi(or $Bi_2O_3$) loss of $SrBi_2$$Ta_2$$O_9$ thin films. But the c-axis oriented growth of $SrBi_2$$Ta_2$$O_9$ thin films disappeared by the inserting of $Bi_2O_3$ lay-er in $SrBi_2$$Ta_2$$O_9$ thin films.

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Effects of Lanthanides-Substitution on the Ferroelectric Properties of Bismuth Titanate Thin Films Prepared by MOCVD Process

  • Kim, Byong-Ho;Kang, Dong-Kyun
    • 한국세라믹학회지
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    • 제43권11호
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    • pp.688-692
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    • 2006
  • Ferroelectric lanthanides-substituted $Bi_4Ti_3O_{12}$ $(Bi_{4-x}Ln_xTi_3O_{12}, BLnT)$ thin films approximately 200 nm in thickness were deposited by metal organic chemical vapor deposition onto Pt(111)/Ti/SiO$_2$/Si(100) substrates. Many researchers reported that the lanthanides substitution for Bi in the pseudo-perovskite layer caused the distortion of TiO$_6$ octahedron in the a-b plane accompanied with a shift of the octahedron along the a-axis. In this study, the effect of lanthanides (Ln=Pr, Eu, Gd, Dy)-substitution and crystallization temperature on their ferroelectric properties of bismuth titanate $(Bi_4Ti_3O_{12}, BIT)$ thin films were investigated. As BLnT thin films were substituted to lanthanide elements (Pr, Eu, Gd, Dy) with a smaller ionic radius, the remnant polarization (2P$_r$) values had a tendency to increase and made an exception of the Eu-substituted case because $Bi_{4-x}Eu_xTi_3O_{12}$ (BET) thin films had the smaller grain sizes than the others. In this study, we confirmed that better ferroelectric properties can be expected for films composed of larger grains in bismuth layered peroskite materials. The crystallinity of the thin films was improved and the average grain size increased as the crystallization temperature,increased from 600 to 720$^{\circ}C$. Moreover, the BLnT thin film capacitor is characterized by well-saturated polarization-electric field (P-E) curves with an increase in annealing temperature. The BLnT thin films exhibited no significant degradation of switching charge for at least up to $1.0\times10^{11}$ switching cycles at a frequency of 1 MHz. From these results, we can suggest that the BLnT thin films are the suitable dielectric materials for ferroelectric random access memory applications.

Properties Optimization for Perovskite Oxide Thin Films by Formation of Desired Microstructure

  • Liu, Xingzhao;Tao, Bowan;Wu, Chuangui;Zhang, Wanli;Li, Yanrong
    • 한국세라믹학회지
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    • 제43권11호
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    • pp.715-723
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    • 2006
  • Perovskite oxide materials are very important for the electronics industry, because they exhibit promising properties. With an interest in the obvious applications, significant effort has been invested in the growth of highly crystalline epitaxial perovskite oxide thin films in our laboratory. And the desired structure of films was formed to achieve excellent properties. $Y_1Ba_2Cu_3O_{7-x}$ (YBCO) superconducting thin films were simultaneously deposited on both sides of 3 inch wafer by inverted cylindrical sputtering. Values of microwave surface resistance R$_2$ (75 K, 145 GHz, 0 T) smaller than 100 m$\Omega$ were reached over the whole area of YBCO thin films by pre-seeded a self-template layer. For implementation of voltage tunable high-quality varactor, A tri-layer structured SrTiO$_3$ (STO) thin films with different tetragonal distortion degree was prepared in order to simultaneously achieve a large relative capacitance change and a small dielectric loss. Highly a-axis textured $Ba_{0.65}Sr_{0.35}TiO_3$ (BST65/35) thin films was grown on Pt/Ti/SiO$_2$/Si substrate for monolithic bolometers by introducing $Ba_{0.65}Sr_{0.35}RuO_3$ (BSR65/35) thin films as buffer layer. With the buffer layer, the leakage current density of BST65/35 thin films were greatly reduced, and the pyroelectric coefficient of $7.6\times10_{-7}$ C $cm^{-2}$ $K^{-1}$ was achieved at 6 V/$\mu$m bias and room temperature.

$Pb_{1-x}La_{x}Ti_{1-x/4}O_3$(x=0.1)(PLT(10)) 강유전체 박막에서 동적 초전특성의 주파수 의존성에 관한 연구 (A study on the Frequency Dependence of Dynamic Pyroelectric Properties for $Pb_{1-x}La_{x}Ti_{1-x/4}O_3$(x=0.1)(PLT(10)) Ferroelectric Thin Film)

  • 차대은;장동훈;강성준;윤영섭
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.104-107
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    • 2001
  • The fabricated La-modified lead titanate (PLT) thin flirt without poling treatment was investigated for modulation frequency dependence of pyroelectric properties by the dynamic method. $Pb_{1-x}La_{x}Ti_{1-x/4}O_3$PLT (x=0.1) thin film having 10 mol% La content was deposited on a Pt/$TiO_{x}$/$SiO_2$/Si substrate by sol-gel method. The PLT(10) thin film exhibits a relatively excellent dielectric property. The pyroelectric coefficient (p) of the PLT(10) thin film is 6.6 x $10^{-9}$C/$\textrm{cm}^2$.K without frequency dependence. The figure of merits for the voltage responsivity and specific detectivity are 1.03${\times}$$10^{-11}$/C.cm/J and 1.46 x $10^{-9}$C.cm/J, respectively. The PLT(10) thin film has voltage responsivity ($R_{V}$) of 5.15 V/W at 8 Hz. Noise equivalent power (NEP) and specific detectivity (D*) of the PLT(10) thin film are 9.93 x $10^{-8}$W/Hz$^{1/2}$ and 1.81 x $10^{6}$ cmHz$^{1/2}$/W at the same frequency of 100 Hz, respectively. The results means that PLT thin film having 10 mol % La content is suitable for the sensing materials of pyroelectric IR sensors.

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