• Composites Research
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• v.17 no.4
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• pp.47-52
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• 2004

This paper established the procedure to fabricate the MWNT/PMMA nanocomposite by using together with injection molding and film casting processes. The fabrication process made it possible for MWNTs to be well dispersed in the PMMA matrix and also it could maintain the well-dispersed state effectively. And the mechanical material properties and SEM images of the fractural surface were observed. Moreover, a surfactant was used to disperse MWNTs more effectively and mechanical material properties were also investigated.

• Journal of Sensor Science and Technology
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• v.1 no.2
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• pp.125-130
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• 1992

A resistive-type humidity sensors have been fabricated using cross-linked PMMA thin film as sensing material and their humidity characteristics have been investigated. The sensor coated of the cross-linked PMMA with PVA exhibited largely variation of resistance by increase of relative humidity and less than 3% of hysteresis. Furthermore, the fabricated sensor exhibited superior long-term stability. The response time of the PMMA humidity sensor was about 7 min. for adsorption and about 5 min. for desorption respectively.

• Journal of Electrochemical Science and Technology
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• v.9 no.1
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• pp.1-8
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• 2018

The effect of mixing ratio on the corrosion protection of carbon steel coated by a film composed of poly(vinylidene) fluoride (PVDF) and poly(methyl methacrylate) (PMMA) was examined using electrochemical impedance spectroscopy. Surface crystallization behavior and thermal properties of the PVDF/PMMA coated carbon steel were evaluated using polarized optical microscopy and differential scanning calorimetry, respectively. A Maltese cross-pattern spherulite crystal was observed in the PVDF/PMMA coating film, which became more apparent with increasing PVDF content. The highest corrosion protection performance was achieved with 60 wt.% PVDF-coated carbon steel, and delamination and corrosion reactions were observed for 20 wt.% PVDF-coated carbon steel. Further, corrosion protection performance with an amorphous/crystal mixture (PVDF/PMMA, 60/40 (w/w)) was better than those observed in the amorphous domain and the perfect-crystal domain of the PVDF/PMMA blended coating system.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.14 no.9
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• pp.2065-2070
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• 2010

The diluted PMMA treated $SiO_2$ films as an passivation materials for semiconductor devices was researched by using the FTIR spectra. The diluted PMMA solution with various ratios changed the surface of $SiO_2$ film as the hydrophilic, hydrophobic or hybrid type properties. The sample 7 with little carbon content showed dramatically the chemical variation by the FTIR spectra analysis. Beacuse the little carbon with electrons decreased the polarity and surface energy on the $SiO_2$ film, and then became a stable bonding structure and decreased the leakage current. The FTIR spectra can define the detail variation due to the chemical reaction on the organic thin film, and help to research the characteristic of the organic materials.

• Applied Chemistry for Engineering
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• v.26 no.3
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• pp.251-258
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• 2015

In the study, PLLA with 12,000 g/mol ($M_n$) and 14,000 g/mol ($M_w$) was synthesized from L-lactide, and used to synthesize PLLA-Br intermediate. PLLA-block-PMMA with 84,000 g/mol ($M_n$) and 126,000 g/mol ($M_w$) was finally synthesized from PLLA-Br intermediate. The glass transition temperature ($T_g$) and initial pyrolysis temperature of PLLA-block-PMMA are $95.5^{\circ}C$ and $289^{\circ}C$, respectively. The PLA film of $50{\pm}3{\mu}m$ thickness was prepared by blending PLA with 9 phr PLLA-block-PMMA followed by stretching biaxially at 3 times under $95^{\circ}C$, and annealing at $120^{\circ}C$ for 2 min. The light transmittance at 550 nm and tensile strength of the film are 88.5% and 44.5 MPa, respectively. To enhance the tensile strength of PLA film, it was required to keep the film more than 2 min at $120^{\circ}C$ during the annealing step after a biaxially orientation.

• Applied Chemistry for Engineering
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• v.23 no.1
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• pp.53-58
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• 2012

In order to improve the surface hardness of transparent plastic films, an organic-inorganic hybrid coating solution was sunthesized by the sol-gel method. Coating solutions that were prepared colloidal silica (CS), poly methyl methacrylate (PMMA), vinyltrimethoxysilane (VTMS), and [3-(methacryloyloxy)]propyltrimethoxy silane (MAPTMS) was varied with synthesizing parameters such as kinds of organic silane and weight ratio of CS to PMMA. Such coating solution was bar coated on the PET film, cured, and investigated on the chemical and physical properties of coating film. The organic-inorganic hybrid coating solutions have better properties at the pencil hardness and adhesion of coating film than those of an organic material such as PMMA.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.181.1-181.1
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• 2015

용액 공정을 이용한 Resistive random access memory (ReRAM)은 간단한 공정 과정, 대면적화, 저렴한 가격 등의 장점으로 인해 큰 관심을 받고 있으며, HfOx, TiOx, AlOx 등의 산화물이 ReRAM 절연 막으로 주로 연구되고 있다. 더 나아가 최근에는 organic 물질을 메모리 소자로 사용한 연구가 보고되고 있다. 이는 경제적이며, wearable 또는 flexible system에 적용이 용이하다. 그럼에도 불구하고, organic 물질을 갖는 메모리 소자는 기존의 산화물 소자에 비해 열에 취약하며 전기적인 특성과 신뢰성이 우수하지 못하다는 단점을 가지고 있다. 이를 위한 방안으로 본 연구에서는 AlOx - polymethylmethacrylate (PMMA) blended thin film ReRAM을 제안하였다. 이는 organic물질의 전기적 특성을 개선시킬 뿐 아니라, inorganic 물질을 wearable 소자에 적용했을 때 발생하는 crack과 같은 기계적 물리적 결함을 해결할 수 있는 새로운 방법이다. 먼저, P-type Si 위에 습식산화를 통하여 SiO2 300 nm 성장시킨 기판을 사용하여 electron beam evaporation으로 10 nm의 Ti, 100 nm의 Pt 층을 차례로 증착하였다. 그리고 PMMA 용액과 AlOx 용액을 초음파를 이용하여 혼합한 뒤, 이 용액을 Pt 하부 전극 상에서 spin coating방법으로 1000 rpm 10초, 5000 rpm 30초의 조건으로 증착하였다. Solvent 및 불순물 제거를 위하여 150, 180, $210^{\circ}C$의 온도로 30 분 동안 열처리를 진행하였고, shadow mask를 이용하여 상부 전극인 Ti를 sputtering 방식으로 100 nm 증착하였다. 150, 180, $210^{\circ}C$로 각각 열처리한 AlOx - PMMA blended ReRAM의 전기적 특성은 HP 4156B semiconductor parameter analyzer를 이용하여 측정하였다. 측정 결과 제작된 소자 전부에서 2 V이하의 낮은 동작전압, 안정된 DC endurance (>150cycles), 102 이상의 높은 on/off ratio를 확인하였고, 그 중 $180^{\circ}C$에서 열처리한 ReRAM은 더 높은 on/off ratio를 갖는 것을 확인하였다. 결론적으로 baking 온도를 최적화하였으며 AlOx - PMMA blended film ReRAM의 우수한 메모리 특성을 확인하였다. AlOx-PMMA blended film ReRAM은 organic과 inorganic의 장점을 갖는 wearable 및 system용 비휘발성 메모리소자에 적용이 가능한 경제적인 기술로 판단된다.

• Journal of the Semiconductor & Display Technology
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• v.6 no.4
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• pp.69-73
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• 2007

The MIM(metal-insulator-metal) capacitors with the Al/PMMA/ITO/Glass structures were manufactured according to various PMMA concentration of 1, 2, 4, 6, 8 wt%. The lowest leakage current and the largest capacitance were found to be 2.3 pA and 1.2 nF, respectively, for the device with 2 wt% PMMA concentration. The measured capacitance of the devices was almost same values with the calculated one. The optimum film thickness was obtained at the value of 48 nm, showing that the capacitance and leakage current were 1.92 nF, 0.3 pA at 2 wt%, respectively. From this experiment, the PMMA gate insulator films can be applicable to the organic thin film transistors.

• Polymer(Korea)
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• v.36 no.4
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• pp.507-512
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• 2012

Thin (~650 nm) and ultrathin (~50 nm) films of neat PMMA and PMMA containing 5 wt% of methacryl-polyhedral oligomeric silsesquioxane were prepared in this work. The effects of film thickness and POSS on glass transition temperature ($T_g$) and isothermal physical aging were investigated by means of differential scanning calorimetry (DSC). $T_g$ depression was observed as film thickness was decreased and Ma-POSS molecules were incorporated. Enthalpy relaxation (${\Delta}H_{Relax}$) due to the isothermal physical aging was reduced by ultra-thin film thickness and the addition of Ma-POSS. KWW (Kohlrausch-Williams-Watts) equation was used to fit ${\Delta}H_{Relax}$ vs. aging time data providing the fitting parameters; maximum enthalpy recovery (${\Delta}H_{\infty}$), relaxation time (${\tau}$) and non-exponentiality parameter (${\beta}$).

• Journal of the Microelectronics and Packaging Society
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• v.12 no.2 s.35
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• pp.181-186
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• 2005

We fabricated thin films of polystyrene-block-poly(methyl methacrylate)(PS -b-PMMA) on the self-assembled monolayers(SAM) of 3-(p-methoxyphenyl)propyltrichlorosilane(MPTS) on silicon wafers. Cylindrical nanodomains of PMMA or PS were oriented perpendicular to the surface of silicon wafers due to the neutral affinity of the SAM to PS and PMMA blocks. By selective removal of the PMMA block with UV irradiation and washing, nanoporous films and nanorod assemblies were produced. The nanoporous film can be used for a nanolithographical mask.